High Performance Light-Emitting Devices
    111.
    发明申请
    High Performance Light-Emitting Devices 失效
    高性能发光器件

    公开(公告)号:US20070246705A1

    公开(公告)日:2007-10-25

    申请号:US11573774

    申请日:2004-08-23

    IPC分类号: H01L51/00 H01L21/00

    摘要: An organic light emitting device consists of a layered structure including a top multilayer stack, a bottom multilayer stack, a cavity layer between the top multilayer stack and the bottom multilayer stack, and an organic light emitting region within the cavity layer. The layered structure is constructed such that the product of phase factors ξ1 and ξ2 is. greater than 80% at the center of at least one emitting wavelength region and for a normal viewing angle, wherein where Ra− and Rb+ are the reflectance of the top and bottom multilayer stacks respectively, φa− and φb+ are the phase changes on reflection for the top and bottom multilayer stacks respectively, α1 β1 are respectively the real and imaginary parts of the phase thickness of the cavity layer, α2 and β2 are respectively the real and imaginary parts of the phase thickness of the light-emitting region at the operating wavelength of the device, x is the mean distance of light emitting region from the bottom multilayer stack, n and k are the refractive index and absorption coefficient of the cavity layer, θcavity is the emitting angle inside the cavity layer, and d is the physical thickness of said cavity layer. This condition improves the light output efficiency of the device.

    摘要翻译: 有机发光器件由包括顶层多层堆叠,底层多层堆叠,顶层多层叠层和底层多层堆叠之间的空腔层以及空腔层内的有机发光区域的分层结构组成。 层状结构被构造成使得相位因子x 1和x 2 2的乘积是。 在至少一个发射波长区域的中心处大于80%,并且具有正常的视角,其中R a a和 - 分别是顶部和底部多层叠层的反射率,分别为phi< SUB>和< b>< +分别为顶层和底层多层叠层反射的相变,α1β1分别为相厚度的实部和虚部 腔层,α2和β2分别是器件的工作波长处的发光区域的相位厚度的实部和虚部,x是 距离底层多层堆叠的发光区域的平均距离,n和k是空腔层的折射率和吸收系数,θ是空腔层内的发射角,d是物理层的物理 所述腔层的厚度。 该条件提高了器件的光输出效率。

    Methods of forming trench isolation in the fabrication of integrated circuitry and methods of fabricating integrated circuitry
    112.
    发明授权
    Methods of forming trench isolation in the fabrication of integrated circuitry and methods of fabricating integrated circuitry 有权
    在集成电路的制造中形成沟槽隔离的方法和制造集成电路的方法

    公开(公告)号:US07273796B2

    公开(公告)日:2007-09-25

    申请号:US11087218

    申请日:2005-03-23

    IPC分类号: H01L21/76

    摘要: A method of fabricating integrated circuitry includes depositing a spin-on-dielectric over a semiconductor substrate. The spin-on-dielectric comprises a polysilazane. Only some of the polysilazane is etched from the semiconductor substrate. Such etching comprises exposure to an etching fluid comprising at least one of a) an aqueous fluid having a pH greater than 7.0, or b) a basic fluid solution. After the etching, remaining spin-on-dielectric comprising polysilazane is annealed effective to form an annealed dielectric which is different in composition from the spin-on-dielectric, and preferably having a dielectric constant k which is different from that of the initially deposited spin-on-dielectric.

    摘要翻译: 制造集成电路的方法包括在半导体衬底上沉积旋涂电介质。 旋涂电介质包含聚硅氮烷。 仅从半导体衬底蚀刻一些聚硅氮烷。 这种蚀刻包括暴露于包括a)pH大于7.0的水性流体或b)碱性流体溶液中的至少一种的蚀刻流体。 在蚀刻之后,包括聚硅氮烷的剩余的旋涂电介质退火有效地形成退火电介质,其组成与旋涂电介质不同,并且优选具有不同于初始沉积旋转的介电常数k - 电介质。

    APPARATUS FOR TESTING BENDING STRENGTH
    114.
    发明申请
    APPARATUS FOR TESTING BENDING STRENGTH 有权
    测试弯曲强度的装置

    公开(公告)号:US20070209448A1

    公开(公告)日:2007-09-13

    申请号:US11679188

    申请日:2007-02-27

    IPC分类号: G01N3/20

    摘要: An apparatus for testing bending strength is provided. The apparatus includes a frame, a motor, and a control part. The frame includes an impingement board. The motor includes a piston. A piston head is mounted on an end of the piston for impacting the impingement board. The piston head defines a space configured for receiving a hand-held device. The control part is for controlling the piston to move up and down repeatedly. The apparatus can be used to test a hand-held device's bending strength conveniently.

    摘要翻译: 提供了一种用于测试弯曲强度的装置。 该装置包括框架,马达和控制部件。 框架包括冲击板。 马达包括一个活塞。 活塞头安装在活塞的端部上以冲击冲击板。 活塞头限定了用于接收手持装置的空间。 控制部分用于控制活塞反复上下移动。 该装置可以方便地测试手持装置的弯曲强度。

    Verifying relevance between keywords and web site contents
    115.
    发明授权
    Verifying relevance between keywords and web site contents 失效
    验证关键字和网站内容之间的相关性

    公开(公告)号:US07260568B2

    公开(公告)日:2007-08-21

    申请号:US10826162

    申请日:2004-04-15

    IPC分类号: G06F17/30

    摘要: Systems and methods for verifying relevance between terms and Web site contents are described. In one aspect, site contents from a bid URL are retrieved. Expanded term(s) semantically and/or contextually related to bid term(s) are calculated. Content similarity and expanded similarity measurements are calculated from respective combinations of the bid term(s), the site contents, and the expanded terms. Category similarity measurements between the expanded terms and the site contents are determined in view of a trained similarity classifier. The trained similarity classifier having been trained from mined web site content associated with directory data. A confidence value providing an objective measure of relevance between the bid term(s) and the site contents is determined from the content, expanded, and category similarity measurements evaluating the multiple similarity scores in view of a trained relevance classifier model.

    摘要翻译: 描述了用于验证术语和网站内容之间的相关性的系统和方法。 一方面,检索出价网址中的网站内容。 计算语法上和/或与投标期相关的扩展术语。 内容相似性和扩展的相似度测量是根据投标条件,站点内容和扩展条款的各自组合计算的。 考虑到经过训练的相似性分类器,确定扩展术语和站点内容之间的类别相似度测量。 经过训练的相似性分类器已经从与目录数据相关联的挖掘的网站内容训练。 考虑到训练有素的相关性分类器模型,从评估多重相似度分数的内容,扩展和类别相似度测度中确定提供投标项和站点内容之间的相关性的客观量度的置信度值。

    Method for fabricating piezoelectric element
    116.
    发明申请
    Method for fabricating piezoelectric element 失效
    制造压电元件的方法

    公开(公告)号:US20070130739A1

    公开(公告)日:2007-06-14

    申请号:US10588240

    申请日:2005-01-27

    申请人: Takashi Abe Li Li

    发明人: Takashi Abe Li Li

    IPC分类号: H04R17/00

    摘要: A masking agent is applied as a patterned film 12 to a surface of piezoelectric material 11 to be processed, fluidized by contact with a solvent vapor V and dressed to a domed mask 14 by its surface tension. When the piezoelectric material is dry etched together with the domed mask 14, its surface is processed to a convex profile corresponding to thickness distribution of the domed mask 14. Distribution and shape of the domed mask 14 is controlled by treating the piezoelectric material 11 with an oil repellant 13 so as to limit reflow of the masking agent to a specified region(s). The processed piezoelectric material has a surface profile with a big mass at its center suitable for principal oscillation without spurious oscillation.

    摘要翻译: 将掩模剂作为图案化膜12施加到待加工的压电材料11的表面,通过与溶剂蒸气V接触而流化,并通过其表面张力修整到圆顶形掩模14。 当压电材料与圆顶掩模14一起被干蚀刻时,其表面被加工成对应于圆顶形掩模14的厚度分布的凸形轮廓。圆顶形掩模14的分布和形状通过用压电材料11 防油剂13,以限制掩蔽剂回流到指定的区域。 经处理的压电材料具有在其中心处具有大质量的表面轮廓,适合于主振荡而不产生杂散振荡。

    Collation regression testing
    117.
    发明申请
    Collation regression testing 审中-公开
    整理回归测试

    公开(公告)号:US20070061140A1

    公开(公告)日:2007-03-15

    申请号:US11227034

    申请日:2005-09-15

    IPC分类号: G10L15/00

    CPC分类号: G06F17/2217

    摘要: A method, data processing system, and computer usable code are provided for collation regression testing. Collation elements are extracted from a locale seed file into an element list. A sorted list is generated from the element list both in a released product and an updated product that is being validated. A comparison is performed of the two lists to produce test results indicating a passing or failing of the collation produced by the updated product as compared to the released product.

    摘要翻译: 提供了一种方法,数据处理系统和计算机可用代码用于核对回归测试。 整理元素从区域设置种子文件中提取到元素列表中。 在发布的产品和正在验证的更新的产品中,从元素列表生成排序列表。 对这两个列表进行比较,以产生测试结果,指示与已发布产品相比,由更新的产品产生的排序规则的通过或失败。

    Methods of forming and using memory cell structures
    118.
    发明申请
    Methods of forming and using memory cell structures 有权
    形成和使用记忆细胞结构的方法

    公开(公告)号:US20070035041A1

    公开(公告)日:2007-02-15

    申请号:US11516730

    申请日:2006-09-07

    申请人: Li Li Jiutao Li

    发明人: Li Li Jiutao Li

    IPC分类号: H01L21/44

    摘要: A method of filling vias for a PCRAM cell with a metal is described. A PCRAM intermediate structure including a substrate, a first conductor, and an insulator through which a via extends has a metallic material formed within the via and on a surface of the insulator. The metallic material may be deposited on the surface and within the via. A hard mask of a flowable oxide is deposited over the metallic material in the via to protect the metallic material in the via. A subsequent dry sputter etch removes the metallic material from the surface of the insulator and a portion of the hard mask. After complete removal of the hard mask, a glass material is recessed over the metallic material in the via. Then, a layer of a metal-containing material is formed over the glass material. Finally, a second conductor is formed on the surface of the insulator.

    摘要翻译: 描述了用金属填充PCRAM电池的通孔的方法。 包括基板,第一导体和通孔延伸的绝缘体的PCRAM中间结构具有形成在通孔内和绝缘体表面上的金属材料。 金属材料可以沉积在表面上和通孔内。 可流动氧化物的硬掩模沉积在通孔中的金属材料上,以保护通孔中的金属材料。 随后的干溅射蚀刻从绝缘体的表面和硬掩模的一部分去除金属材料。 在完全去除硬掩模之后,玻璃材料在通孔中的金属材料上凹进。 然后,在玻璃材料上形成含金属材料层。 最后,在绝缘体的表面上形成第二导体。

    Plasma reaction chamber liner comprising ruthenium
    120.
    发明授权
    Plasma reaction chamber liner comprising ruthenium 有权
    包含钌的等离子体反应室衬里

    公开(公告)号:US07131391B2

    公开(公告)日:2006-11-07

    申请号:US10247971

    申请日:2002-09-20

    申请人: Max F. Hineman Li Li

    发明人: Max F. Hineman Li Li

    IPC分类号: H01L21/00 C23C16/00

    摘要: The invention encompasses a method of enhancing selectivity of etching silicon dioxide relative to one or more organic substances. A material comprising one or more elements selected from Group VIII of the periodic table is provided within a reaction chamber; and a substrate is provided within the reaction chamber. The substrate has both a silicon-oxide-containing composition and at least one organic substance thereover. The silicon-oxide-containing composition is plasma etched within the reaction chamber. The plasma etching of the silicon-oxide-containing composition has increased selectivity for the silicon oxide of the composition relative to the at least one organic substance than would plasma etching conducted without the material in the chamber. The invention also encompasses a plasma reaction chamber assembly. The assembly comprises at least one interior wall, and at least one liner along the at least one interior wall. The liner comprises one or more of Ru, Fe, Co, Ni, Rh, Pd, Os, W, Ir, Pt and Ti.

    摘要翻译: 本发明包括提高二氧化硅相对于一种或多种有机物质的选择性的方法。 包含选自元素周期表第Ⅷ族中的一种或多种元素的材料设置在反应室内; 并且在反应室内设置基板。 该基底具有含氧化硅的组合物和至少一种有机物质。 含氧化硅的组合物在反应室内进行等离子体蚀刻。 含有氧化硅的组合物的等离子体蚀刻相对于至少一种有机物质的组合物的氧化硅的选择性高于在室内没有材料进行的等离子体蚀刻。 本发明还包括等离子体反应室组件。 所述组件包括至少一个内壁和沿所述至少一个内壁的至少一个衬套。 衬套包括Ru,Fe,Co,Ni,Rh,Pd,Os,W,Ir,Pt和Ti中的一种或多种。