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213 条记录 (耗时 0.029 秒)

    Beta-lactam compound and process for production thereof
    111.
    发明授权
    Beta-lactam compound and process for production thereof 失效
    β-内酰胺化合物及其生产方法

    公开(公告)号：US4950660A

    公开(公告)日：1990-08-21

    申请号：US240950

    申请日：1988-09-06

    申请人： Kunio Atsumi ,  Yuichi Yamamoto ,  Kenji Sakagami ,  Ken Nishihata ,  Shinichi Kondo

    发明人： Kunio Atsumi ,  Yuichi Yamamoto ,  Kenji Sakagami ,  Ken Nishihata ,  Shinichi Kondo

    IPC分类号： A61K31/545 ,  A61K31/546 ,  A61P31/04 ,  C07D501/57

    CPC分类号： C07D501/57 ,  Y02P20/55

    摘要： The present invention relates to a cephem compound of formula (III) shown in the description. The compound is useful as an intermediate for the synthesis of .beta.-lactam antibiotics of new class and also to a process for producing the same. The cephem compound (III) is produced by reacting a cephem compound of formula (I) with a nitrogen-containing compound of formula (II) under acid-capturing conditions. The process can be performed easily under mild conditions.

    摘要翻译： 本发明涉及说明书中所示的式（III）的头孢烯化合物。 该化合物可用作合成新类β-内酰胺抗生素的中间体，也可用于生产该类β-内酰胺抗生素的方法。 头孢烯化合物（III）通过在酸捕获条件下使式（I）的头孢烯化合物与式（II）的含氮化合物反应来制备。 该方法可以在温和的条件下容易地进行。

    Immunoglobulin adsorbent and adsorption apparatus
    112.
    发明授权
    Immunoglobulin adsorbent and adsorption apparatus 失效
    免疫球蛋白吸附剂和吸附装置

    公开(公告)号：US4705628A

    公开(公告)日：1987-11-10

    申请号：US849068

    申请日：1986-04-07

    申请人： Yuichi Yamamoto ,  Tadashi Sameshima

    发明人： Yuichi Yamamoto ,  Tadashi Sameshima

    IPC分类号： B01J20/26 ,  A61M1/36 ,  B01J20/10 ,  B01J20/281 ,  B01J20/32 ,  G01N33/543 ,  G01N33/552 ,  G01N33/564 ,  B01D15/00

    CPC分类号： B01J20/3263 ,  A61M1/3679 ,  G01N33/54353 ,  G01N33/552 ,  G01N33/564 ,  A61M2202/0417

    摘要： For the treatment of various diseases including autoimmune diseases such as myathenia gravis, articular rhematism, lupus erythematosus, etc., immunity-related diseases such as glumerulonephritis, bronchial asthma, polyneuritis, etc., organ transplantation such as transplanted kidney rejection, AOB incompatibility bone marrow transplantation, etc., tumor, hypertension, and hepatic insufficiency, immunoglobulin adsorbents comprising a hydroxyl-containing water-insoluble carrier to which a diamine compound having the general formula:NH.sub.2 (CH.sub.2).sub.n NH.sub.2wherein n is an integer having a value of 3 to 9 is attached through a silane coupling agent or a derivative thereof, to which diamine a heterocyclic compound is attached through a difunctional reagent, are useful as they can selectively and efficiently adsorb specific proteins such as immunoglobulins and immune complexes which are pathogenic substances in the diseases, exhibit minimized non-specific adsorption, and are safe and easy to sterilize.

    摘要翻译： 用于治疗诸如重症肌无力，关节性血症，红斑狼疮等自身免疫性疾病的各种疾病，免疫相关疾病如脑性脑炎，支气管哮喘，多发性神经炎等，器官移植如移植肾排斥反应，AOB不相容性骨 骨髓移植等，肿瘤，高血压和肝功能不全，包含含羟基的水不溶性载体的免疫球蛋白吸附剂，其中具有通式：NH 2（CH 2）n NH 2的二胺化合物，其中n是具有值3的整数 至9通过硅烷偶联剂或其衍生物通过双官能试剂连接到杂环化合物上的二胺是有用的，因为它们可以选择性地和有效地吸附特异性蛋白质，例如免疫球蛋白和作为病原体的免疫复合物 疾病，展示最小化非特异性吸附，并且是安全和容易灭菌 。

    Drug administering apparatus
    114.
    发明授权
    Drug administering apparatus 失效
    药物管理机

    公开(公告)号：US4681582A

    公开(公告)日：1987-07-21

    申请号：US743412

    申请日：1985-06-11

    申请人： Yuichi Yamamoto

    发明人： Yuichi Yamamoto

    IPC分类号： A61M1/36 ,  A61K9/00 ,  A61K9/127 ,  A61K9/22 ,  A61M1/00 ,  A61M5/14 ,  A61M5/165 ,  A61M31/00

    CPC分类号： A61K9/127 ,  A61M31/002

    摘要： A drug administering apparatus includes a container with body fluid inlet and outlet ports which communicate with each other, and a liposome agent entrapping a drug therein. An insoluble substance is fixed inside the container and has the liposome agent such that the liposome agent can be brought into contact with the body fluid flowing in the container. The drug entrapped in the liposome is released into the body fluid flowing in the container.

    摘要翻译： 药物给药装置包括具有彼此连通的体液入口和出口的容器，以及将药物截留在其中的脂质体试剂。 将不溶性物质固定在容器内部并具有脂质体试剂，使得脂质体试剂可以与在容器中流动的体液接触。 包埋在脂质体中的药物被释放到在容器中流动的体液中。

    Rotary encoder contact disk
    115.
    发明授权
    Rotary encoder contact disk 失效
    旋转编码器接触盘

    公开(公告)号：US4443670A

    公开(公告)日：1984-04-17

    申请号：US317856

    申请日：1981-11-03

    申请人： Noriaki Nakamura ,  Tomio Kishimoto ,  Yuichi Yamamoto

    发明人： Noriaki Nakamura ,  Tomio Kishimoto ,  Yuichi Yamamoto

    IPC分类号： H03M1/24 ,  G01D5/249 ,  G01D5/25 ,  H01H11/04 ,  H01H19/00 ,  H01H19/58 ,  H01H1/58

    CPC分类号： G01D5/25 ,  H01H19/005 ,  H01H19/585

    摘要： A structure and a method for manufacturing a contact disk for detection of angular position and direction includes a concentrically-arranged planar slip-ring like conductive layer at the innermost region of the disk, a first gear-pattern like conductive layer, having outer teeth, at its midway region, and a second gear-pattern conductive layer, having internal teeth at the outermost region of the disk, all formed on an insulative substrate; the gear-pattern conductive layers are both printed at the same time to insure high accuracy in the position of the conductive layers; crossing parts of the lead connections are printed with the use of an insulative film therebetween.

    摘要翻译： 用于制造用于检测角位置和方向的接触盘的结构和方法包括在盘的最内部区域处的同心布置的平面滑环状导电层，具有外齿的第一齿轮图案状导电层， 在其中间区域和第二齿轮图案导电层，其在盘的最外区域具有内齿，全部形成在绝缘基板上; 同时印刷齿轮图案导电层，以确保导电层位置的高精度; 使用它们之间的绝缘膜印刷引线连接的交叉部分。

    Beam data processing apparatus and particle beam therapy system
    116.
    发明授权
    Beam data processing apparatus and particle beam therapy system 有权
    光束数据处理装置和粒子束治疗系统

    公开(公告)号：US09327140B2

    公开(公告)日：2016-05-03

    申请号：US14115028

    申请日：2011-08-23

    申请人： Taizo Honda ,  Yuichi Yamamoto ,  Yuehu Pu

    发明人： Taizo Honda ,  Yuichi Yamamoto ,  Yuehu Pu

    IPC分类号： G01K1/08 ,  A61N5/10 ,  G21K5/04

    CPC分类号： A61N5/1048 ,  A61N5/1043 ,  A61N5/1075 ,  A61N5/1077 ,  A61N2005/1074 ,  A61N2005/1087 ,  G21K5/04

    摘要： A beam data processing apparatus has a plurality of channel data conversion units that convert a plurality of analogue signals outputted from a position monitor into digital signals, a position size processing unit that calculates a beam position, based on voltage information items obtained through processing by the plurality of channel data conversion units, an abnormality determination processing unit that determines the beam position and generates a position abnormality signal, and an integrated control unit that controls the plurality of channel data conversion units in such a way that while a beam is stopped at an irradiation spot, digital signal conversion processing is implemented two or more times; the channel data conversion unit has a plurality of A/D converters, a demultiplexer that distributes analogue signals, and a multiplexer that switches respective digital signals processed by the A/D converters so as to output them to the position size processing unit.

    摘要翻译： 波束数据处理装置具有多个通道数据转换单元，其将从位置监视器输出的多个模拟信号转换为数字信号，位置大小处理单元，基于通过处理所获得的电压信息项，计算波束位置 多个通道数据转换单元，确定光束位置并产生位置异常信号的异常判定处理单元，以及控制多个通道数据转换单元的集成控制单元，使得当光束停止在 照射点，数字信号转换处理两次以上; 信道数据转换单元具有多个A / D转换器，分配模拟信号的多路分解器和切换由A / D转换器处理的各个数字信号的多路复用器，以便将它们输出到位置大小处理单元。

    Substrate processing system and substrate processing method
    118.
    发明授权
    Substrate processing system and substrate processing method 有权
    基板加工系统和基板加工方法

    公开(公告)号：US08909364B2

    公开(公告)日：2014-12-09

    申请号：US13114103

    申请日：2011-05-24

    申请人： Wataru Tsukinoki ,  Yuichi Yamamoto

    发明人： Wataru Tsukinoki ,  Yuichi Yamamoto

    IPC分类号： H01L21/67 ,  H01L21/677

    CPC分类号： H01L21/67276 ,  H01L21/67745 ,  H01L21/67778

    摘要： Provided is a substrate processing system including a group controller which determines a combination of processing apparatuses having the shortest total processing time including the processing end time in a final processing apparatus, determines a predictable elapsed time up to a processing start time by a predetermined downstream processing apparatus for a wafer lot from a processing end time of the wafer lot by a predetermined processing apparatus in the combination of the processing apparatuses, and determines a timing of discharging the substrate to the predetermined processing apparatus or an upstream processing apparatus of the predetermined processing apparatus so that the predictable elapsed time is set within a predetermined time when the predictable elapsed time exceeds the predetermined time.

    摘要翻译： 提供了一种基板处理系统，其包括：组控制器，其确定在最终处理装置中包括处理结束时间的具有最短总处理时间的处理装置的组合，通过预定的下游处理确定直到处理开始时间的可预测经过时间 在处理装置的组合中，通过预定的处理装置从晶片块的处理结束时间开始的晶片批次装置，并且确定将基板排出到预定处理装置或预定处理装置的上游处理装置的定时 使得可预测的经过时间设定在可预测的经过时间超过预定时间的预定时间内。

    Substrate transfer method for performing processes including photolithography sequence
    120.
    发明授权
    Substrate transfer method for performing processes including photolithography sequence 有权
    用于执行包括光刻序列的处理的基板转印方法

    公开(公告)号：US08702370B2

    公开(公告)日：2014-04-22

    申请号：US13495611

    申请日：2012-06-13

    申请人： Yuichi Yamamoto ,  Tadayuki Yamaguchi ,  Yasuhito Saiga ,  Yoshiaki Yamada

    发明人： Yuichi Yamamoto ,  Tadayuki Yamaguchi ,  Yasuhito Saiga ,  Yoshiaki Yamada

    IPC分类号： H01L21/677

    CPC分类号： H01L21/67225 ,  G03F7/70525 ,  G03F7/7075 ,  G03F7/70991 ,  H01L21/67727 ,  H01L21/67733 ,  Y10S414/135

    摘要： A substrate transfer method for transferring target substrates proceeds in a substrate processing system for performing processes including a photolithography sequence on the target substrates. The system includes a first automated substrate transfer line configured to transfer the target substrates among a plurality of process sections for respectively performing processes on the target substrates, and a second automated substrate transfer line of a cyclical type dedicated to a plurality of process apparatuses of a photolithography process section, which are configured to perform a series of processes in the photolithography sequence, the second automated substrate transfer line being located relative to the first automated substrate transfer line so as for the target substrates to be transferred therebetween. The method includes, in order to proceed with the photolithography sequence, transferring the target substrates among the process apparatuses in the photolithography process section by use of the second automated substrate transfer line.

    摘要翻译： 用于转移目标衬底的衬底转移方法在用于在目标衬底上执行包括光刻序列的处理的衬底处理系统中进行。 该系统包括：第一自动化基板传送线，其被配置为在用于分别在目标基板上执行处理的多个处理部中传送目标基板;以及专用于多个处理装置的循环型第二自动基板传送线 光刻处理部分，被配置为在光刻序列中执行一系列处理，第二自动化基板传送线相对于第一自动基板传送线定位，以使目标基板在其间传输。 该方法包括为了继续进行光刻顺序，通过使用第二自动基板传送线在光刻处理部中的处理装置之间传送目标基板。