公开(公告)号：US5895924A

公开(公告)日：1999-04-20

申请号：US602350

申请日：1996-02-16

申请人： Hiroshi Yasuda ,  Akio Yamada ,  Kazushi Ishida ,  Tohru Ikeda ,  Kouzi Takahata

发明人： Hiroshi Yasuda ,  Akio Yamada ,  Kazushi Ishida ,  Tohru Ikeda ,  Kouzi Takahata

IPC分类号： H01L21/027 ,  H01J37/317 ,  H01J37/00

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/30455 ,  H01J2237/31761 ,  H01J2237/31774

摘要： A charged particle beam exposure method is adapted to an exposure apparatus which includes a plurality of exposure systems that simultaneously expose the same pattern. The method includes the steps of (a) generating, by a pattern generating unit in each exposure system, data related to patterns which are to be exposed, (b) deflecting, by a column unit in each exposure system, a charged particle beam onto an object which is mounted on a stage by deflecting the charged particle beam based on the data generated by the pattern generating unit in a corresponding exposure system, and (c) detecting an abnormality in the exposure apparatus during operation of the exposure apparatus based on data which are obtained from corresponding parts of the exposure systems.

摘要翻译： 带电粒子束曝光方法适用于包括同时暴露相同图案的多个曝光系统的曝光装置。 该方法包括以下步骤：（a）通过每个曝光系统中的图案生成单元生成与要曝光的图案相关的数据，（b）通过每个曝光系统中的列单元将带电粒子束偏转到 基于由对应的曝光系统中的图案生成单元产生的数据，通过使带电粒子束偏转来安装在舞台上的物体，以及（c）基于数据在曝光装置的操作期间检测曝光装置中的异常 其从曝光系统的相应部分获得。

公开(公告)号：US5874372A

公开(公告)日：1999-02-23

申请号：US959042

申请日：1997-10-28

申请人： Rokuro Morishita ,  Hiroshi Yasuda ,  Mitsura Seto ,  Hisao Nishinaka ,  Taizo Ikezawa

发明人： Rokuro Morishita ,  Hiroshi Yasuda ,  Mitsura Seto ,  Hisao Nishinaka ,  Taizo Ikezawa

IPC分类号： D03D15/08 ,  D03D3/00

CPC分类号： D03D15/08 ,  Y10T442/3008 ,  Y10T442/3146

摘要： The invention provides a highly stretchable fabric having an elongation percentage of 5 to 45% and a recovery percentage of elongation of at least 70% and comprising spun yarns serving at least as warps or wefts, the fabric being characterized in that the spun yarns contain two-component composite fibers comprising a highly shrinkable polyester component A and a polyester component B less shrinkable than the polyester component A, the composite fibers being so oriented that in the vicinity 5 of the crests of weaving crimps of the spun yarn, the polyester component A faces toward the inner side of the crimps. The invention also provides a process for producing the fabric. The fabric is excellent in stretchability and recovery from elongation and is capable of retaining its appearance and hand.

摘要翻译： 本发明提供了一种高伸缩率的织物，其伸长率为5至45％，伸长率的恢复百分比至少为70％，并且包括至少作为经纱或纬纱的纺织纱线，该织物的特征在于， - 组合复合纤维包含高收缩性聚酯组分A和比聚酯组分A低收缩的聚酯组分B，复合纤维被定向成使得在纺织纱线的编织卷曲的顶端附近，聚酯组分A 面向卷边的内侧。 本发明还提供了一种生产织物的方法。 该织物的拉伸性和伸长率恢复性优异，能够保持其外观和手感。

公开(公告)号：US5573591A

公开(公告)日：1996-11-12

申请号：US425444

申请日：1995-04-20

申请人： Kazuhiro Ikezawa ,  Hiroshi Yasuda ,  Akira Tanikawa ,  Hiroyuki Kojima ,  Koji Hosoda ,  Yoshifumi Kobayashi

发明人： Kazuhiro Ikezawa ,  Hiroshi Yasuda ,  Akira Tanikawa ,  Hiroyuki Kojima ,  Koji Hosoda ,  Yoshifumi Kobayashi

IPC分类号： C30B15/00 ,  C30B29/06 ,  H01L21/208 ,  C30B15/20

CPC分类号： C30B29/06 ,  C30B15/00 ,  Y10T117/1068 ,  Y10T117/1072

摘要： A monocrystal pulling apparatus according to the Czochralski technique, provided with a flow controller which guides a carrier gas supplied from the top of a pulling cheer to the surface of a melt of a material forming the monocrystal and exhausts the silicon oxide vaporizing from the surface of the melt to the outside of the pulling chamber and which surrounds the pulled monocrystal near the surface of the melt and is provided partially inside a crucible, wherein the flow controller has a tubular portion which has an outer diameter smaller than the inner diameter of the crucible and extends substantially perpendicularly along the direction of downward flow of the carrier gas, a constricted diameter portion which constricts in diameter from the bottom end of the tubular portion and forms a bottom gap with the pulled monocrystal, and an engagement portion which projects out from the top of the tubular portion and forms a top gap at the outer circumference of the tubular portion of the flow controller by supporting the flow controller partially in the pulling chamber. As a result, a first flow path through which the carrier gas flows toward said bottom gap is defined between the inside of the tubular portion and the pulled monocrystal, a second flow path is defined comprised of a flow path of the carrier gas passing through the top gap and a flow path of the carrier gas passing from the first flow path through the bottom gap and then passing between the surface of the silicon melt and flow controller. The silicon oxide is exhausted together with the carrier gas through the second flow path to the outside of the pulling chamber.

摘要翻译： 根据切克劳斯基技术的单晶拉制装置，其具有流量控制器，该流量控制器将从拉动振动器的顶部供给的载气引导到形成单晶的材料的熔体的表面，并从其表面蒸发氧化硅 熔化到拉动室的外部并且围绕熔融物表面附近的被拉取的单晶体并且部分地设置在坩埚内部，其中流量控制器具有管状部分，其外径小于坩埚的内径 并且沿着载气向下流动的方向基本上垂直地延伸，所述收缩直径部分从所述管状部分的底端直径收缩并与所述拉制的单晶形成底部间隙;以及接合部分， 在管状部分的顶部并且在f的管状部分的外圆周处形成顶部间隙 低控制器通过部分地在牵引室中支撑流量控制器。 结果，载体气体朝向所述底部间隙流动的第一流动路径被限定在管状部分和拉出的单晶体的内部之间，第二流动路径被限定为穿过载体气体的载气的流动路径 顶部间隙和从第一流动通过底部间隙的载气的流动路径，然后在硅熔体的表面和流量控制器之间通过。 氧化硅与载气一起通过第二流动路径排出到拉动室的外部。

公开(公告)号：US5476065A

公开(公告)日：1995-12-19

申请号：US187551

申请日：1994-01-28

申请人： Kazuhiro Ikezawa ,  Hiroshi Yasuda ,  Akira Tanikawa ,  Hiroyuki Kojima ,  Koji Hosoda ,  Yoshifumi Kobayashi

发明人： Kazuhiro Ikezawa ,  Hiroshi Yasuda ,  Akira Tanikawa ,  Hiroyuki Kojima ,  Koji Hosoda ,  Yoshifumi Kobayashi

IPC分类号： C30B15/00 ,  C30B29/06 ,  H01L21/208 ,  C30B35/00

CPC分类号： C30B29/06 ,  C30B15/00 ,  Y10T117/1068 ,  Y10T117/1072

摘要： A monocrystal pulling apparatus according to the Czochralski technique, provided with a flow controller which guides a carrier gas supplied from the top of a pulling chamber to the surface of a melt of a material forming the monocrystal and exhausts the silicon oxide vaporizing from the surface of the melt to the outside of the pulling chamber and which surrounds the pulled monocrystal near the surface of the melt and is provided partially inside a crucible, wherein the flow controller has a tubular portion which has an outer diameter smaller than the inner diameter of the crucible and extends substantially perpendicularly along the direction of downward flow of the carrier gas, a constricted diameter portion which constricts in diameter from the bottom end of the tubular portion and forms a bottom gap with the pulled monocrystal, and an engagement portion which projects out from the top of the tubular portion and forms a top gap at the outer circumference of the tubular portion of the flow controller by supporting the flow controller partially in the pulling chamber. As a result, a first flow path through which the carrier gas flows toward said bottom gap is defined between the inside of the tubular portion and the pulled monocrystal, a second flow path is defined comprised of a flow path of the carrier gas passing through the top gap and a flow path of the carrier gas passing from the first flow path through the bottom gap and then passing between the surface of the silicon melt and flow controller. The silicon oxide is exhausted together with the carrier gas through the second flow path to the outside of the pulling chamber.

摘要翻译： 根据切克劳斯基技术的单晶拉制装置，其具有流量控制器，该流量控制器将从拉动室的顶部供给的载气引导到形成单晶的材料的熔体的表面，并从形成单晶的表面蒸发氧化硅 熔化到拉动室的外部并且围绕熔融物表面附近的被拉取的单晶体并且部分地设置在坩埚内部，其中流量控制器具有管状部分，其外径小于坩埚的内径 并且沿着载气向下流动的方向基本上垂直地延伸，所述收缩直径部分从所述管状部分的底端直径收缩并与所述拉制的单晶形成底部间隙;以及接合部分， 在管状部分的顶部，并且在管状部分的外圆周处形成顶部间隙 流量控制器通过部分地在牵引室中支撑流量控制器。 结果，载体气体朝向所述底部间隙流动的第一流动路径被限定在管状部分和拉出的单晶体的内部之间，第二流动路径被限定为穿过载体气体的载气的流动路径 顶部间隙和从第一流动通过底部间隙的载气的流动路径，然后在硅熔体的表面和流量控制器之间通过。 氧化硅与载气一起通过第二流动路径排出到拉动室的外部。

公开(公告)号：US5401974A

公开(公告)日：1995-03-28

申请号：US191458

申请日：1994-02-03

申请人： Yoshihisa Oae ,  Takamasa Satoh ,  Yasushi Takahashi ,  Kiichi Sakamoto ,  Hiroshi Yasuda ,  Soichiro Arai ,  Moritaka Nakamura

发明人： Yoshihisa Oae ,  Takamasa Satoh ,  Yasushi Takahashi ,  Kiichi Sakamoto ,  Hiroshi Yasuda ,  Soichiro Arai ,  Moritaka Nakamura

IPC分类号： H01J37/30 ,  H05H1/00

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3002 ,  H01J37/32082 ,  H01J37/32862 ,  H01J2237/022 ,  H01J2237/3175

摘要： In a charged particle beam exposure apparatus in which a charged particle beam is projected onto a member to be exposed to thereby form a pattern thereon, there are provided a plurality of electrodes disposed around an optical axis of the charged particle beam, a first unit for introducing a gas containing oxygen as a main component into an inside of the charged particle beam exposure apparatus including the plurality of electrodes and for holding the inside of the apparatus at a degree of vacuum between 0.1 Torr and 4 Torr, and a second unit for selectively applying either a high-frequency signal having a frequency between 100 kHz and 800 kHz or a reference signal to each of the plurality of electrodes. A plasma radical state of the gas is generated in the inside of the apparatus so that a deposition present in the apparatus can be eliminated.

摘要翻译： 在带电粒子束曝光装置中，带电粒子束投射到待暴露的构件上，从而在其上形成图案，设置有围绕带电粒子束的光轴设置的多个电极，第一单元， 将含有氧的气体作为主要成分引入到包括多个电极的带电粒子束曝光设备的内部，并将设备内部保持在0.1托和4托之间的真空度，以及用于选择性地将第二单元 将频率在100kHz和800kHz之间的高频信号或参考信号施加到多个电极中的每一个。 在装置的内部产生气体的等离子体自由基状态，从而可以消除装置中存在的沉积物。

公开(公告)号：US5349197A

公开(公告)日：1994-09-20

申请号：US953073

申请日：1992-09-29

申请人： Kiichi Sakamoto ,  Hiroshi Yasuda

发明人： Kiichi Sakamoto ,  Hiroshi Yasuda

IPC分类号： H01J37/302

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3026 ,  H01J2237/31776

摘要： A method for exposing a pattern of a semiconductor device on an object comprises the steps of extracting block exposure data from design data the semiconductor device, extracting variable exposure data from the design data, extracting fine exposure data from the variable exposure data such that the fine exposure data comprises exposure data for fine elemental patterns that have a size smaller than a predetermined threshold size below which exposure by a variable shaped beam is difficult, extracting mask data indicative of a construction of a beam shaping mask used for shaping the beam based upon the block exposure data, variable exposure data and the fine exposure data, such that the mask data includes information about location, size and shape of apertures formed on the beam shaping mask for shaping the beam, fabricating the beam shaping mask based upon the mask data, and exposing the device pattern by selectively passing the beam through one of the block apertures, the variable exposure aperture and the fine aperture based upon block exposure data, the variable exposure data and the fine exposure data.

摘要翻译： 一种用于在对象上露出半导体器件的图案的方法包括以下步骤：从设计数据中提取块曝光数据，半导体器件，从设计数据中提取可变曝光数据，从可变曝光数据中提取精细曝光数据，使得精细 曝光数据包括具有小于预定阈值尺寸的细小元素图案的曝光数据，在预定阈值尺寸以下，由可变形波束进行曝光是困难的，提取表示基于用于成形光束的光束成形掩模的结构的掩模数据 块曝光数据，可变曝光数据和精细曝光数据，使得掩模数据包括关于形成在用于成形光束的光束整形掩模上的孔的位置，尺寸和形状的信息，基于掩模数据制造光束整形掩模， 并且通过选择性地将光束通过块孔之一，可变曝光来暴露设备图案 基于块曝光数据，可变曝光数据和精细曝光数据的光圈和精细光圈。

公开(公告)号：US5338939A

公开(公告)日：1994-08-16

申请号：US67108

申请日：1993-05-26

申请人： Hisayasu Nishino ,  Akio Yamada ,  Yoshihisa Oae ,  Hiroshi Yasuda

发明人： Hisayasu Nishino ,  Akio Yamada ,  Yoshihisa Oae ,  Hiroshi Yasuda

IPC分类号： H01J37/147 ,  H01J3/32

CPC分类号： H01J37/1472 ,  H01J2237/002 ,  H01J2237/14 ,  H01J2237/152 ,  H01J2237/3175

摘要： A charged particle beam exposure method deflects a charged particle beam in a deflection system which includes electromagnetic deflection coils and an electromagnetic lens. The charged particle beam exposure method includes controlling the deflection system based on deflection data, and blocking heat radiation from at least the electromagnetic deflection coils by a partition so as to prevent the heat radiation from reaching the electromagnetic lens and to prevent heat conduction to the electromagnetic lens by the partition.

摘要翻译： 带电粒子束曝光方法使带电粒子束偏转在包括电磁偏转线圈和电磁透镜的偏转系统中。 带电粒子束曝光方法包括基于偏转数据控制偏转系统，并且通过隔板阻挡来自至少电磁偏转线圈的热辐射，以防止热辐射到达电磁透镜并防止对电磁体的热传导 镜头由分区。

公开(公告)号：US5262341A

公开(公告)日：1993-11-16

申请号：US991718

申请日：1992-12-16

申请人： Shunsuke Fueki ,  Hiroshi Yasuda ,  Kiichi Sakamoto ,  Yasushi Takahashi

发明人： Shunsuke Fueki ,  Hiroshi Yasuda ,  Kiichi Sakamoto ,  Yasushi Takahashi

IPC分类号： H01J37/04 ,  H01J37/302 ,  H01L21/268

CPC分类号： H01J37/045 ,  H01J37/3026

摘要： A blanking aperture array for use in a charged particle beam exposure has a substrate, at least m rows by n columns of apertures arranged two-dimensionally in the substrate, where each of the apertures have a pair of blanking electrodes and m and n are integers greater than one, and n m-bit shift registers provided on the substrate for applying voltages dependent on pattern data to m pairs of the blanking electrodes of the apertures in the ith column, where i=1, 2, . . . , n. The pattern data is related to a pattern which is to be exposed using the blanking aperture array.

摘要翻译： 用于带电粒子束曝光的消隐孔径阵列具有衬底，至少m行×n列的孔在衬底中二维布置，其中每个孔具有一对消隐电极，m和n是整数 大于1和n个m位移位寄存器，其设置在基板上，用于将第n列中的孔的m对对的图案数据施加电压，其中i = 1,2。 。 。 ，n。 图案数据与使用消隐孔径阵列曝光的图案有关。

公开(公告)号：US5223719A

公开(公告)日：1993-06-29

申请号：US724338

申请日：1991-07-05

申请人： Yasushi Takahashi ,  Kiichi Sakamoto ,  Yoshihisa Oae ,  Hiroshi Yasuda ,  Nobuyuki Yasutake

发明人： Yasushi Takahashi ,  Kiichi Sakamoto ,  Yoshihisa Oae ,  Hiroshi Yasuda ,  Nobuyuki Yasutake

IPC分类号： H01J37/317

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/31761 ,  H01J2237/31776

摘要： A charged particle beam mask and apparatus and method of using the same employing a mask that includes a substrate and a plurality of substantially rectangular beam passing sections arranged in parallel and to have a trapezoidal shape. In addition, the masks having a matrix of irradiation areas formed thereon where each irradiation area has a matrix of block patterns, are aligned and selectively irradiated to form a desired pattern on an object.

摘要翻译： 一种带电粒子束掩模及其采用掩模的装置及方法，该掩模包括基板和平行排列并具有梯形形状的多个大致矩形的光束通过部分。 此外，在其上形成有照射区域具有块图案的矩阵的照射区域的矩阵的掩模被对准并选择性地照射以在物体上形成期望的图案。

公开(公告)号：US5204043A

公开(公告)日：1993-04-20

申请号：US831667

申请日：1992-02-06

申请人： Toru Abiko ,  Katunobu Sakane ,  Mitsuru Harata ,  Hiroshi Yasuda

发明人： Toru Abiko ,  Katunobu Sakane ,  Mitsuru Harata ,  Hiroshi Yasuda

IPC分类号： B29C45/14

CPC分类号： B29C45/14631 ,  B29C45/14 ,  B29L2031/3047

摘要： A method of manufacturing a steering wheel, in which a coating layer is molded of a synthetic resin, by using a molding die unit, on at least the annular portion of a steering wheel core including a boss. The annular portion is located around the boss and has a groove extending in the circumferential direction thereof. Spokes couple the boss and the annular portion to each other. The method includes a die opening step in which an upper molding die and a lower molding die, which have a gate formed at the separation surfaces of the dies and communicating with the molding cavity of the die unit, are opened from each other. The second step is a core setting step in which the core is set in the cavity so that the outermost part of the groove of the annular portion having walls defining the groove between them is located as the top of the groove, one of the walls, which faces the gate and has a notched part notched to be smaller in height than the other of the walls, faces the gate at the notched part, and the top of the notched part is located below the separation surfaces. Third, a coating layer molding step is carried out in which the dies are closed on each other and the resin is injected into the cavity through the gate so that the coating layer is molded of the resin on the core. Last and a steering wheel takeout step in which the dies are opened from each other and the wheel is taken out from the dies is accomplished.

摘要翻译： 至少在包括凸台的方向盘芯的环形部分上通过使用成型模具单元来制造其中通过合成树脂模制涂层的方向盘的方法。 环形部分位于凸台周围，并且具有沿其圆周方向延伸的凹槽。 轮辐将轮毂和环形部分相互连接。 该方法包括：模具打开步骤，其中在模具的分离表面处形成有浇口并与模具单元的模腔连通的上模塑模具和下模塑模具彼此打开。 第二步是芯设置步骤，其中芯体设置在空腔中，使得具有限定它们之间的凹槽的壁的环形部分的凹槽的最外部位于凹槽的顶部，其中一个壁， 其面向门并且具有切口小于其他壁的高度的切口部分，在切口部分处面对门，并且切口部分的顶部位于分离表面下方。 第三，进行涂层成型步骤，其中模具彼此封闭，并且树脂通过浇口注入空腔，使得涂层由芯上的树脂模制而成。 最后和方向盘取出步骤，其中模具彼此打开并且车轮从模具中取出。