Self-cleaning suction device
    132.
    发明授权
    Self-cleaning suction device 有权
    自清抽吸装置

    公开(公告)号:US08518017B2

    公开(公告)日:2013-08-27

    申请号:US12945349

    申请日:2010-11-12

    申请人: Michael Caluori

    发明人: Michael Caluori

    IPC分类号: A61M1/00

    摘要: A self-cleaning suction device has a user's suction end that self-sanitizes externally and internally before and after use, as well as self-sanitizes internally during use. A cover opens to reveal the user's suction end within a containment unit. As the cover opens, the suction end travels from a lower chamber, proceeds through a middle chamber of a sanitizing agent, and is presented for use. After suction is complete, the suction end retracts through an upper chamber with, a scraping feature that removes debris from the outer surface of the mouthpiece, and proceeds down through the middle chamber of a sanitizing agent and a scraping feature that removes debris and the sanitizing agent from the outer surface of the user's suction end. Upon the sealing closure of the cover, the upper and middle chambers are flushed with a sanitizing agent, which is suctioned away along with any collected debris. The user's suction end resides within a lower chamber and can be decontaminated by a UV-C light entering into the lower chamber and/or corresponding chambers. The suction device can also include a liquid-hydration delivery system.

    摘要翻译: 自清洁抽吸装置具有用户吸入端,在使用前后在外部和内部自行消毒,以及在使用过程中内部自我消毒。 盖子打开,以揭示使用者的吸入端在容纳单元内。 当盖打开时,抽吸端从下腔传播,通过消毒剂的中间室进行供给,以供使用。 抽吸完成后,抽吸端通过上部腔室缩回,该刮擦特征从头部的外表面去除碎屑,并且向下通过消毒剂的中间室和去除碎屑和消毒的刮擦特征 代理人从用户吸力端的外表面。 在密封封盖时,上部和中部室用消毒剂冲洗,消毒剂与任何收集的碎屑一起被抽吸掉。 用户的吸入端位于下腔室内,并可通过进入下室和/或相应腔室的UV-C光进行净化。 抽吸装置还可以包括液体水合输送系统。

    Slurry system for semiconductor fabrication
    133.
    发明授权
    Slurry system for semiconductor fabrication 有权
    用于半导体制造的浆料系统

    公开(公告)号:US08517802B2

    公开(公告)日:2013-08-27

    申请号:US13628134

    申请日:2012-09-27

    IPC分类号: B01F3/12

    摘要: A slurry feed system suitable for chemical mechanical planarization (CMP) processes in a semiconductor fabrication facility and related method. The slurry feed system includes a valve manifold box having a discharge piping header fluidly connected to at least one CMP station and a first slurry supply train. The first slurry supply train may include a slurry mixing tank, day tank, and at least two slurry feed pumps arranged in series pumping relationship. The first slurry supply train defines a first slurry piping loop. In one embodiment, a second slurry supply train defining a second slurry piping loop is provided. The valve manifold box is operable to supply slurry from either or both of the first and second slurry piping loops to the CMP station.

    摘要翻译: 一种适用于半导体制造设备中化学机械平面化(CMP)工艺的浆料进料系统及相关方法。 浆料进料系统包括具有流体连接到至少一个CMP站和第一浆料供应列的排放管道集管的阀歧管箱。 第一浆料供应系统可以包括浆料混合罐,日间罐和串联泵送关系中布置的至少两个浆料进料泵。 第一浆料供应列车定义了第一浆料管道回路。 在一个实施例中,提供了限定第二浆料管道回路的第二浆料供给列。 阀歧管箱可操作以从第一和第二浆料管道回路中的一个或两个供应浆料到CMP站。

    Rainwater regulating system
    134.
    发明授权
    Rainwater regulating system 失效
    雨水调节系统

    公开(公告)号:US08517047B2

    公开(公告)日:2013-08-27

    申请号:US12791110

    申请日:2010-06-01

    申请人: Soo Teoh

    发明人: Soo Teoh

    IPC分类号: E04D13/08

    摘要: A rainwater regulating system is described. An object of this invention to provide an attachment for rain gutters that allows for easy collections of rainwater into a rain barrel. It is another object of the invention to provide a gutter attachment that does not need to be removed in cold weather. It is yet another object of this invention to provide a gutter attachment that screens out debris from water prior to allowing water to enter the water barrel; said debris can be easily cleaned without removing the attachment or disturbing the barrel. It is another objective of the invention to provide a gutter attachment that allows overflow to easily flow through the gutter without causing structural damage to either the barrel or the gutter.

    摘要翻译: 描述了雨水调节系统。 本发明的目的是提供一种用于雨水沟的附件,其允许将雨水容易地收集到雨水桶中。 本发明的另一个目的是提供一种在寒冷的天气不需要去除的沟槽附件。 本发明的另一个目的是提供一种在允许水进入水桶之前筛除来自水的碎屑的沟槽附件; 所述碎屑可以容易地清洁而不去除附件或干扰桶。 本发明的另一个目的是提供一种沟槽附件,其允许溢流容易地流过沟槽而不会对桶或沟槽造成结构损坏。

    Tamper-resistant water flow restriction system
    136.
    发明授权
    Tamper-resistant water flow restriction system 有权
    防篡改水流量限制系统

    公开(公告)号:US08511347B2

    公开(公告)日:2013-08-20

    申请号:US13302695

    申请日:2011-11-22

    申请人: David Schwartz

    发明人: David Schwartz

    IPC分类号: F16D1/04

    摘要: A system and method for installing and removing a flow restrictor assembly in a shower, while prevents tampering with the flow restriction system thus installed. Tampering is prevented by concealing the flow restrictor assembly behind a shower wall, attached directly to a water supply line. The system further prevents tampering by concealing the tool-hole necessary for its removal behind a flow restrictor disk, so that there are no visible means of removing the flow restrictor assembly. The flow restrictor assembly threads onto a showerhead arm and the flow restrictor assembly with the attached showerhead arm threads directly into the water line. When the showerhead arm is unthreaded, the flow restrictor assembly remains connected to the water line by an external screw thread. The flow restrictor must be removed to reveal the tool-hole which may only then be engaged by a tool for removal.

    摘要翻译: 一种用于在淋浴器中安装和拆卸限流器组件的系统和方法,同时防止对如此安装的流动限制系统的篡改。 通过将节流器组件隐藏在淋浴壁后面,直接连接到供水管线来防止篡改。 该系统进一步通过隐藏在流量限制器盘的后面所需的工具孔来防止篡改,使得没有可见的除去限流器组件的手段。 流量限制器组件螺纹连接到喷头臂上,并且限流器组件具有附接的喷头臂直接进入水管线。 当喷头臂无螺纹时,限流器组件通过外部螺纹保持连接到水管线。 必须拆卸限流器以露出工具孔,该工具孔只能由用于拆卸的工具接合。

    DEVICE AND METHOD FOR PRODUCING TARGETED FLOW AND CURRENT DENSITY PATTERNS IN A CHEMICAL AND/OR ELECTROLYTIC SURFACE TREATMENT
    137.
    发明申请
    DEVICE AND METHOD FOR PRODUCING TARGETED FLOW AND CURRENT DENSITY PATTERNS IN A CHEMICAL AND/OR ELECTROLYTIC SURFACE TREATMENT 有权
    在化学和/或电泳表面处理中生产目标流动和电流密度模式的装置和方法

    公开(公告)号:US20130186852A1

    公开(公告)日:2013-07-25

    申请号:US13812975

    申请日:2011-07-29

    IPC分类号: F17D3/00 H01L21/02

    摘要: The invention relates to a device and method for producing targeted flow and current density patterns in a chemical and/or electrolytic surface treatment. The device comprises a flow distributor body which is disposed, with the front face thereof, plane-parallel to a substrate to be processed, and which has outlet openings on the front face, through which process solution flows onto the substrate surface. The process solution flowing back from the substrate is led off through connecting passages onto the rear face of the flow distributor body. At the same time a targeted distribution of an electrical field on a conductive substrate surface is effected by a specific arrangement of said connecting passages.

    摘要翻译: 本发明涉及用于在化学和/或电解表面处理中产生目标流动和电流密度模式的装置和方法。 该装置包括流动分配器主体,其前表面平行于待处理的基板,并且在前表面上具有出口,流程溶解在基板表面上。 从基板流回的处理液通过连接通道引导到流量分配器本体的后表面。 同时,通过所述连接通道的特定布置来实现导电基板表面上的电场的目标分布。

    ADAPTER FOR COUPLING A DIFFUSION FURNACE SYSTEM
    138.
    发明申请
    ADAPTER FOR COUPLING A DIFFUSION FURNACE SYSTEM 审中-公开
    用于连接扩散炉系统的适配器

    公开(公告)号:US20130168377A1

    公开(公告)日:2013-07-04

    申请号:US13339757

    申请日:2011-12-29

    IPC分类号: F27D11/00 B23P11/00 F03B11/02

    摘要: An adapter is provided for fluidly coupling a process chamber, such as a diffusion furnace or a process tube, and a fluid source, such as a torch chamber or combustion chamber, of a system for processing semiconductor material. The process tube and the torch chamber include joint segments that can engage directly together to fluidly couple the torch chamber to the process tube for introducing a fluid, such as an oxidizing gas or vapor, into the process tube. The process chamber and the torch chamber are formed of materials having different rates of thermal expansion. The adapter is configured to couple the joint segments of the torch chamber and the process tube while accommodating the differences in thermal expansion between the materials. The adapter may be formed of quartz to couple a quartz torch chamber with a silicon carbide process tube.

    摘要翻译: 提供了用于流体耦合诸如扩散炉或处理管的处理室和用于处理半导体材料的系统的流体源(例如割炬室或燃烧室)的适配器。 处理管和割炬室包括可以直接接合在一起以将炬室流体连接到处理管的接合段,用于将诸如氧化气体或蒸气的流体引入到处理管中。 处理室和割炬室由具有不同热膨胀率的材料形成。 适配器被配置成耦合炬室和处理管的接合部分,同时容纳材料之间的热膨胀差异。 适配器可以由石英形成,以将石英炬室与碳化硅工艺管连接。

    METHODS AND APPARATUSES FOR WATER AND WASTEWATER TREATMENT
    140.
    发明申请
    METHODS AND APPARATUSES FOR WATER AND WASTEWATER TREATMENT 审中-公开
    用于水和废水处理的方法和装置

    公开(公告)号:US20130153494A1

    公开(公告)日:2013-06-20

    申请号:US13567850

    申请日:2012-08-06

    IPC分类号: C02F3/02 F17D1/00

    摘要: Described herein are methods and devices for biologically treating water and/or wastewater. The methods and devices for treating waste water may be enhanced using an air-lift device which moves water and/or solids using volumes of air. This device can provide occasional surges of water using large bubbles which are able to move great volume of liquid while minimizing dissolved oxygen transfer to the surrounding liquid. Use of the devices and processes herein provides a simple, eloquent approach to waste water treatment with less operation and maintenance costs than conventional devices and/or processes.

    摘要翻译: 本文描述了用于生物处理水和/或废水的方法和装置。 用于处理废水的方法和装置可以使用使用大量空气移动水和/或固体的空气提升装置来增强。 该装置可以使用能够移动大量液体同时最小化溶解氧转移到周围液体的大气泡来提供偶然的水浪涌。 使用这些装置和方法提供了一种简单而有力的废水处理方法,其操作和维护成本比常规装置和/或方法更少。