公开(公告)号：US20190355424A1

公开(公告)日：2019-11-21

申请号：US16042000

申请日：2018-07-23

Applicant: Silicon Storage Technology, Inc.

Inventor： Hsuan Liang ,  Jeng-Wei Yang ,  Man-Tang Wu ,  Nhan Do ,  Hieu Van Tran

IPC: G11C16/16 ,  G11C16/04

Abstract: A memory device with memory cells in rows and columns, word lines connecting together the control gates for the memory cell rows, bit lines electrically connecting together the drain regions for the memory cell columns, first sub source lines each electrically connecting together the source regions in one of the memory cell rows and in a first plurality of memory cell columns, second sub source lines each electrically connecting together the source regions in one of the memory cell rows and in a second plurality of memory cell columns, first and second source lines, first select transistors each connected between one of first sub source lines and the first source line, second select transistors each connected between one of second sub source lines and the second source line, and select transistor lines each connected to gates of one of the first select transistors and one of the second select transistors.

公开(公告)号：US20190326305A1

公开(公告)日：2019-10-24

申请号：US15957615

申请日：2018-04-19

Applicant: Silicon Storage Technology, Inc.

Inventor： FENG ZHOU ,  Jinho Kim ,  Xian Liu ,  Serguei Jourba ,  Catherine Decobert ,  Nhan Do

IPC: H01L27/11531 ,  H01L27/11521 ,  H01L29/10 ,  H01L29/423 ,  H01L29/78 ,  H01L29/788 ,  H01L29/66

Abstract: A semiconductor substrate having an upper surface with a plurality of upwardly extending fins. A memory cell formed on a first of the fins and including spaced apart source and drain regions in the first fin, with a channel region extending therebetween along top and side surfaces of the first fin, a floating gate that extends along a first portion of the channel region, a select gate that extends along a second portion of the channel region, a control gate that extends along and is insulated from the floating gate, and an erase gate that extends along and is insulated from the source region. A logic device formed on a second of the fins and including spaced apart logic source and logic drain regions in the second fin, with a logic channel region of the second fin extending therebetween, and a logic gate that extends along the logic channel region.

公开(公告)号：US10446246B2

公开(公告)日：2019-10-15

申请号：US15990220

申请日：2018-05-25

Applicant: Silicon Storage Technology, Inc.

Inventor： Hieu Van Tran ,  Vipin Tiwari ,  Nhan Do

IPC: G11C16/26 ,  G11C16/34 ,  G11C16/04 ,  G06N3/08 ,  G11C16/30

Abstract: Numerous embodiments of a data refresh method and apparatus for use with a vector-by-matrix multiplication (VMM) array in an artificial neural network are disclosed. Various embodiments of a data drift detector suitable for detecting data drift in flash memory cells within the VMM array are disclosed.

公开(公告)号：US20190214397A1

公开(公告)日：2019-07-11

申请号：US16208072

申请日：2018-12-03

Applicant: Silicon Storage Technology, Inc.

Inventor： Leo Xing ,  Andy Liu ,  Xian Liu ,  Chunming Wang ,  Melvin Dao ,  Nhan Do

IPC: H01L27/11521 ,  H01L29/423 ,  H01L29/08 ,  H01L29/10 ,  H01L23/532

CPC classification number: H01L27/11521 ,  H01L23/53295 ,  H01L29/0847 ,  H01L29/1037 ,  H01L29/42328 ,  H01L29/42336

Abstract: A pair of memory cells that includes first and second spaced apart trenches formed into the upper surface of a semiconductor substrate, and first and second floating gates disposed in the first and second trenches. First and second word line gates disposed over and insulated from a portion of the upper surface that is adjacent to the first and second floating gates respectively. A source region is formed in the substrate laterally between the first and second floating gates. First and second channel regions extend from the source region, under the first and second trenches respectively, along side walls of the first and second trenches respectively, and along portions of the upper surface disposed under the first and second word line gates respectively. The first and second trenches only contain the first and second floating gates and insulation material respectively.

公开(公告)号：US20190205729A1

公开(公告)日：2019-07-04

申请号：US15936983

申请日：2018-03-27

Applicant: Silicon Storage Technology, Inc.

Inventor： Hieu Van Tran ,  Stanley Hong ,  Anh Ly ,  Thuan Vu ,  Hien Pham ,  Kha Nguyen ,  Han Tran

IPC: G06N3/04 ,  G11C16/04 ,  G06F17/16 ,  G06N3/063

CPC classification number: G06N3/04 ,  G06F17/16 ,  G06N3/063 ,  G06N3/0635 ,  G06N3/08 ,  G11C16/0425 ,  H03F3/45269

Abstract: Numerous embodiments for processing the current output of a vector-by-matrix multiplication (VMM) array in an artificial neural network are disclosed. The embodiments comprise a summer circuit and an activation function circuit. The summer circuit and/or the activation function circuit comprise circuit elements that can be adjusted in response to the total possible current received from the VMM to optimize power consumption.

公开(公告)号：US10312246B2

公开(公告)日：2019-06-04

申请号：US14790540

申请日：2015-07-02

Applicant: Silicon Storage Technology, Inc.

Inventor： Jeng-Wei Yang ,  Man-Tang Wu ,  Chun-Ming Chen ,  Chien-Sheng Su ,  Nhan Do

IPC: H01L27/115 ,  H01L27/11521 ,  H01L29/66 ,  H01L29/40 ,  H01L21/8234 ,  H01L29/423 ,  H01L29/788

Abstract: A non-volatile memory cell includes a semiconductor substrate of first conductivity type, first and second spaced-apart regions in the substrate of second conductivity type, with a channel region in the substrate therebetween. A floating gate has a first portion disposed vertically over a first portion of the channel region, and a second portion disposed vertically over the first region. The floating gate includes a sloping upper surface that terminates with one or more sharp edges. An erase gate is disposed vertically over the floating gate with the one or more sharp edges facing the erase gate. A control gate has a first portion disposed laterally adjacent to the floating gate, and vertically over the first region. A select gate has a first portion disposed vertically over a second portion of the channel region, and laterally adjacent to the floating gate.

公开(公告)号：US20190164984A1

公开(公告)日：2019-05-30

申请号：US16264349

申请日：2019-01-31

Applicant: Silicon Storage Technology, Inc

Inventor： Hieu Van Tran ,  Hung Quoc Nguyen ,  Nhan Do

IPC: H01L27/11526 ,  H01L29/788 ,  H01L29/423 ,  G11C16/14 ,  G11C16/04 ,  G11C16/26 ,  H01L27/11521 ,  H01L27/11519

Abstract: A memory device with memory cell pairs each having a single continuous channel region, first and second floating gates over first and second portions of the channel region, an erase gate over a third portion of the channel region between the first and second channel region portions, and first and second control gates over the first and second floating gates. For each of the pairs of memory cells, the first region is electrically connected to the second region of an adjacent pair of memory cells in the same active region, and the second region is electrically connected to the first region of an adjacent pair of the memory cells in the same active region.

公开(公告)号：US10276696B2

公开(公告)日：2019-04-30

申请号：US15494499

申请日：2017-04-22

Applicant: Silicon Storage Technology, Inc.

Inventor： Chunming Wang ,  Leo Xing ,  Andy Liu ,  Melvin Diao ,  Xian Liu ,  Nhan Do

IPC: H01L29/66 ,  H01L27/11531 ,  H01L27/11536 ,  H01L27/115 ,  H01L21/3213 ,  H01L27/11521 ,  H01L29/423

Abstract: A method of forming a non-volatile memory cell on a substrate having memory cell and logic circuit regions by forming a pair of conductive floating gates in the memory cell region, forming a first source region in the substrate between the pair of floating gates, forming a polysilicon layer in both regions, forming an oxide layer over the polysilicon layer in the logic circuit region, performing a chemical-mechanical polish of the polysilicon layer in the memory cell area leaving a first block of the polysilicon layer between the floating gates that is separated from remaining portions of the polysilicon layer, and selectively etching portions of the polysilicon layer to result in: second and third blocks of the polysilicon layer disposed in outer regions of the memory cell area, and a fourth block of the polysilicon layer in the logic circuit region.

公开(公告)号：US10276236B2

公开(公告)日：2019-04-30

申请号：US15597709

申请日：2017-05-17

Applicant: Silicon Storage Technology, Inc. ,  Agency For Science, Technology, and Research

Inventor： Santosh Hariharan ,  Hieu Van Tran ,  Feng Zhou ,  Xian Liu ,  Steven Lemke ,  Nhan Do ,  Zhixian Chen ,  Xinpeng Wang

IPC: G11C13/00 ,  G11C11/00 ,  H01L27/24 ,  H01L45/00

Abstract: A memory device includes a metal oxide material disposed between and in electrical contact with first and second conductive electrodes, and an electrical current source configured to apply one or more electrical current pulses through the metal oxide material. For each of the one or more electrical current pulses, an amplitude of the electrical current increases over time during the electrical current pulse to form a conductive filament in metal oxide material.

公开(公告)号：US10269440B2

公开(公告)日：2019-04-23

申请号：US15374588

申请日：2016-12-09

Applicant: Silicon Storage Technology, Inc. ,  The Regents of the University of California

Inventor： Xinjie Guo ,  Farnood Merrikh Bayat ,  Dmitri Strukov ,  Nhan Do ,  Hieu Van Tran ,  Vipin Tiwari

IPC: G11C16/14 ,  G11C16/34 ,  G11C16/10 ,  G11C16/26 ,  H01L27/11521 ,  H01L27/11558 ,  G11C7/18 ,  G11C8/14 ,  G11C16/04 ,  H01L29/788 ,  H01L27/11524

Abstract: A memory device that provides individual memory cell read, write and erase. In an array of memory cells arranged in rows and columns, each column of memory cells includes a column bit line, a first column control gate line for even row cells and a second column control gate line for odd row cells. Each row of memory cells includes a row source line. In another embodiment, each column of memory cells includes a column bit line and a column source line. Each row of memory cells includes a row control gate line. In yet another embodiment, each column of memory cells includes a column bit line and a column erase gate line. Each row of memory cells includes a row source line, a row control gate line, and a row select gate line.