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    MULTIPLE BEAM CHARGED PARTICLE OPTICAL SYSTEM
    171.
    发明申请
    MULTIPLE BEAM CHARGED PARTICLE OPTICAL SYSTEM 有权
    多束光束粒子光学系统

    公开(公告)号：US20110163244A1

    公开(公告)日：2011-07-07

    申请号：US13050875

    申请日：2011-03-17

    Applicant: Pieter Kruit ,  Yanxia Zhang ,  Martijn J. Van Bruggen ,  Stijn Willem Herman Karel Steenbrink

    Inventor： Pieter Kruit ,  Yanxia Zhang ,  Martijn J. Van Bruggen ,  Stijn Willem Herman Karel Steenbrink

    IPC: H01J3/14

    CPC classification number: H01J37/12 ,  H01J37/153 ,  H01J2237/04924 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/317

    Abstract: The invention relates to a multiple be charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. En further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.

    Abstract translation: 本发明涉及一种多带电粒子光学系统，其包括具有至少一个具有孔的电极的静电透镜结构，其中由所述孔处的所述电极实现的透镜场的有效尺寸最小化。 该系统可以包括发散的带电粒子束部分，其中包括透镜结构。 透镜的物理尺寸最终变小，特别是小于1mm，更特别地小于几十微米。 进一步阐述，透镜与限流孔结合，相对于所述结构的透镜对准，使得由所述透镜中的所述电流限制孔影响的虚拟孔位于最小化像差总数的最佳位置。

    Electron Column Using A Magnetic Lens Layer Having Permanent Magnets
    173.
    发明申请
    Electron Column Using A Magnetic Lens Layer Having Permanent Magnets 审中-公开
    使用具有永磁体的磁性透镜层的电子柱

    公开(公告)号：US20100084566A1

    公开(公告)日：2010-04-08

    申请号：US12445257

    申请日：2007-10-09

    Applicant: Ho Seob Kim

    Inventor： Ho Seob Kim

    IPC: H01J37/14

    CPC classification number: H01J37/145 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/143 ,  H01J37/3174 ,  H01J2237/1205 ,  H01J2237/1405 ,  H01J2237/26 ,  H01J2237/3175

    Abstract: Disclosed herein is an electron column using a magnetic lens layer. The electron column includes a magnetic lens layer for condensing an electron beam using permanent magnets. The magnetic lens layer includes a support plate, an aperture formed through the support plate, and permanent magnets arranged around the aperture and disposed on or inserted into the support plate.

    Abstract translation: 本文公开了使用磁性透镜层的电子柱。 电子柱包括用于使用永久磁体冷凝电子束的磁透镜层。 磁性透镜层包括支撑板，通过支撑板形成的孔和围绕孔布置并设置在支撑板上或插入到支撑板中的永磁体。

    Apparatus for generating a plurality of beamlets
    175.
    发明授权
    Apparatus for generating a plurality of beamlets 有权
    用于产生多个子束的装置

    公开(公告)号：US07348567B1

    公开(公告)日：2008-03-25

    申请号：US11545975

    申请日：2006-10-10

    Applicant: Pieter Kruit

    Inventor： Pieter Kruit

    IPC: H01J37/04

    CPC classification number: H01J3/07 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/063 ,  H01J37/12 ,  H01J37/153 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/151 ,  H01J2237/1536 ,  H01J2237/26 ,  H01J2237/31774

    Abstract: The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens array comprising a plurality of lenses, wherein said lens array is located between said charged particle source and said converging means.In this way, it is possible to reduce aberrations of the converging means.

    Abstract translation: 本发明涉及一种用于产生多个带电粒子束的装置，包括用于产生发散带电粒子束的带电粒子源，用于折射所述发散带电粒子束的会聚装置和包括多个透镜的透镜阵列，其中所述 透镜阵列位于所述带电粒子源和所述会聚装置之间。 以这种方式，可以减小会聚装置的像差。

    Method for manufacturing a lens assembly of microcolumn and lens assembly of microcolumn manufactured by the same
    176.
    发明授权
    Method for manufacturing a lens assembly of microcolumn and lens assembly of microcolumn manufactured by the same 有权
    用于制造由其制造的微柱的透镜组件和微柱的透镜组件的方法

    公开(公告)号：US07329878B2

    公开(公告)日：2008-02-12

    申请号：US10565373

    申请日：2004-07-24

    Applicant: Ho Seob Kim

    Inventor： Ho Seob Kim

    IPC: H01J37/26 ,  G02B7/02 ,  G01N23/00 ,  G21K7/00

    CPC classification number: H01J37/12 ,  H01J9/18 ,  H01J37/28 ,  H01J2237/1205 ,  H01J2237/31774

    Abstract: The present invention provides a method for manufacturing a lens assembly of a microcolumn having a plurality of microlenses and a plurality of insulating layers alternately interposed between the microlenses. The method includes forming at least one first microlens assembly set (set—1) by anodic-bonding an insulating layer (101) and a microlens (102) together; layering a second microlens assembly set (set—2) on the first microlens assembly set (set—1); and scanning a laser beam, thus welding the first microlens assembly set (set—1) to the microlens of the second microlens assembly set (set—2). The method of the present invention further includes anodic-bonding the microlens assembly sets together.

    Abstract translation: 本发明提供了一种用于制造具有交替置于微透镜之间的多个微透镜和多个绝缘层的微柱的透镜组件的方法。 该方法包括：通过将绝缘层（101）和微透镜（102）阳极结合在一起来形成至少一个第一微透镜组件组（组合<！ - SIPO 2）。 并扫描激光束，从而将第一微透镜组件组（组合 - 1）焊接到第二微透镜组件组（组合 - 2）的微透镜。 本发明的方法还包括将微透镜组件组件阳极接合在一起。

    Apparatus for generating a plurality of beamlets
    178.
    发明申请
    Apparatus for generating a plurality of beamlets 有权
    用于产生多个子束的装置

    公开(公告)号：US20070029509A1

    公开(公告)日：2007-02-08

    申请号：US11545976

    申请日：2006-10-10

    Applicant: Pieter Kruit

    Inventor： Pieter Kruit

    IPC: G21K5/10

    CPC classification number: H01J3/07 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/063 ,  H01J37/12 ,  H01J37/153 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/151 ,  H01J2237/1536 ,  H01J2237/26 ,  H01J2237/31774

    Abstract: The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens array comprising a plurality of lenses, wherein said lens array is located between said charged particle source and said converging means. In this way, it is possible to reduce aberrations of the converging means.

    Abstract translation: 本发明涉及一种用于产生多个带电粒子束的装置，包括用于产生发散带电粒子束的带电粒子源，用于折射所述发散带电粒子束的会聚装置和包括多个透镜的透镜阵列，其中所述 透镜阵列位于所述带电粒子源和所述会聚装置之间。 以这种方式，可以减小会聚装置的像差。

    Micro-column electron beam apparatus
    180.
    发明申请
    Micro-column electron beam apparatus 失效
    微柱电子束装置

    公开(公告)号：US20060151716A1

    公开(公告)日：2006-07-13

    申请号：US11257244

    申请日：2005-10-24

    Applicant: Sang Choi ,  Dae Kim ,  Jin Jeong ,  Dae Kim

    Inventor： Sang Choi ,  Dae Kim ,  Jin Jeong ,  Dae Kim

    IPC: G21G5/00

    CPC classification number: H01J37/067 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/1502 ,  H01J2237/2818

    Abstract: Provided is a micro-column electron beam apparatus including: a base; an electron lens bracket on which an electron lens modulate can be fixed, mounted in a central portion of the base; an electron beam source tip module vertically disposed on the electron lens module; a pan spring plate stage module that is mounted over the base, supports the electron beam source tip module at a central portion thereof, and includes a three-coupling pan spring plate portion including first through third spring units that are coupled to the electron beam source tip module in three directions on a plane perpendicular to the vertical axis, which vertically passes the center of the electron beam source tip module, to elastically support the electron beam source tip module in three directions; a first piezoelectric actuator coupled to the pan spring plate stage module to move the electron beam source tip module along a first axis perpendicular to the vertical axis; and a second piezoelectric actuator coupled to the pan spring plate stage module to move the electron beam source tip module along a second axis perpendicular to the vertical axis and the first axis.

    Abstract translation: 本发明提供一种微柱电子束装置，包括：基底; 可以固定电子透镜调制的电子透镜支架，安装在基座的中心部分; 垂直设置在电子透镜模块上的电子束源头模块; 安装在基座上方的平板弹簧板台模块在其中心部分处支撑电子束源头模块，并且包括三联盘盘弹簧板部分，其包括耦合到电子束源的第一至第三弹簧单元 尖端模块在垂直于垂直轴线的平面上垂直通过电子束源头模块的中心，在三个方向弹性支撑电子束源头模块; 第一压电致动器，其联接到所述盘簧板模块以沿着垂直于所述垂直轴线的第一轴线移动所述电子束源尖端模块; 以及耦合到盘簧级模块的第二压电致动器，用于沿垂直于垂直轴线和第一轴线的第二轴线移动电子束源尖端模块。

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