Procatalyst composition with multiple internal donor having silyl ester and method
    11.
    发明授权
    Procatalyst composition with multiple internal donor having silyl ester and method 有权
    具有多个内部供体的主催化剂组合物具有甲硅烷基酯和方法

    公开(公告)号:US08222357B2

    公开(公告)日:2012-07-17

    申请号:US12623514

    申请日:2009-11-23

    申请人: Linfeng Chen

    发明人: Linfeng Chen

    IPC分类号: C08F4/50

    摘要: Provided is a procatalyst composition containing a multiple internal electron donor with at least two components, one of which is a silyl ester. The other component of the mixed internal electron donor may be an electron donor component. The electron donor component may be an aromatic acid ester, a di-ether, and combinations thereof. Catalyst compositions containing the multiple internal electron donor exhibit improved hydrogen response during olefin polymerization and produce propylene-based polymers with broad molecular weight distribution, high flexural modulus, and high melt flow rate.

    摘要翻译: 提供了含有至少两种组分的多重内电子给体的主催化剂组合物,其中一种是甲硅烷基酯。 混合内电子给​​体的另一组分可以是电子给体组分。 电子给体组分可以是芳族酸酯,二醚及其组合。 含有多重内电子给体的催化剂组合物在烯烃聚合期间表现出改善的氢响应,并产生具有宽分子量分布,高挠曲模量和高熔体流动速率的基于丙烯的聚合物。

    Compositions for dissolution of low-k dielectric films, and methods of use
    13.
    发明授权
    Compositions for dissolution of low-k dielectric films, and methods of use 有权
    用于溶解低k电介质膜的组合物及其使用方法

    公开(公告)号:US08142673B2

    公开(公告)日:2012-03-27

    申请号:US10889597

    申请日:2004-07-12

    申请人: Donald L Yates

    发明人: Donald L Yates

    IPC分类号: H01L21/461

    摘要: An improved composition and method for cleaning the surface of a semiconductor wafer are provided. The composition can be used to selectively remove a low-k dielectric material such as silicon dioxide, a photoresist layer overlying a low-k dielectric layer, or both layers from the surface of a wafer. The composition is formulated according to the invention to provide a desired removal rate of the low-k dielectric and/or photoresist from the surface of the wafer. By varying the fluorine ion component, and the amounts of the fluorine ion component and acid, component, and controlling the pH, a composition can be formulated in order to achieve a desired low-k dielectric removal rate that ranges from slow and controlled at about 50 to about 1000 angstroms per minute, to a relatively rapid removal of low-k dielectric material at greater than about 1000 angstroms per minute. The composition can also be formulated to selectively remove a photoresist layer, leaving the underlying low-k dielectric layer essentially intact.

    摘要翻译: 提供了用于清洁半导体晶片的表面的改进的组合物和方法。 该组合物可用于选择性地除去低k介电材料,例如二氧化硅,覆盖低k电介质层的光致抗蚀剂层,或从晶片表面两层。 根据本发明配制组合物以从晶片的表面提供低k电介质和/或光致抗蚀剂的期望的去除速率。 通过改变氟离子成分以及氟离子成分和酸,成分和控制pH的量,可以配制组合物以实现期望的低k电介质去除速率,其范围从慢和约在约 每分钟50至约1000埃,以每分钟大约1000埃的速度相对快速地除去低k电介质材料。 组合物也可以配制成选择性地除去光致抗蚀剂层,使底层的低k电介质层基本上完整无缺。

    Crosslinkable graft polymer non-preferentially wetted by polystyrene and polyethylene oxide
    15.
    发明授权
    Crosslinkable graft polymer non-preferentially wetted by polystyrene and polyethylene oxide 有权
    不优先用聚苯乙烯和聚环氧乙烷润湿的可交联接枝聚合物

    公开(公告)号:US08080615B2

    公开(公告)日:2011-12-20

    申请号:US11765232

    申请日:2007-06-19

    申请人: Dan B. Millward

    发明人: Dan B. Millward

    IPC分类号: C08L71/02

    摘要: Methods for fabricating a random graft PS-r-PEO copolymer and its use as a neutral wetting layer in the fabrication of sublithographic, nanoscale arrays of elements including openings and linear microchannels utilizing self-assembling block copolymers, and films and devices formed from these methods are provided. In some embodiments, the films can be used as a template or mask to etch openings in an underlying material layer.

    摘要翻译: 用于制造无规接枝PS-r-PEO共聚物的方法及其在制备亚光刻纳米级元素阵列的元件中作为中性润湿层的用途,包括使用自组装嵌段共聚物的开口和线性微通道,以及由这些方法形成的膜和器件 被提供。 在一些实施例中,膜可以用作模板或掩模来蚀刻下层材料层中的开口。

    Temperature sensitive films
    17.
    发明授权
    Temperature sensitive films 有权
    感温膜

    公开(公告)号:US08066432B2

    公开(公告)日:2011-11-29

    申请号:US12363929

    申请日:2009-02-02

    IPC分类号: G01K11/12 G01K11/06

    摘要: Temperature-sensitive films that undergo an irreversible change in appearance when the films are heated to a threshold temperature are provided. Also provided are methods for indicating that an object in thermal contact with a temperature-sensitive film has reached a threshold temperature.

    摘要翻译: 提供了当膜被加热到阈值温度时经历外观不可逆变化的温度敏感膜。 还提供了用于指示与感温膜热接触的物体已达到阈值温度的方法。

    Self limiting catalyst composition and propylene polymerization process
    20.
    发明授权
    Self limiting catalyst composition and propylene polymerization process 有权
    自限催化剂组合物和丙烯聚合方法

    公开(公告)号:US07989383B2

    公开(公告)日:2011-08-02

    申请号:US12850170

    申请日:2010-08-04

    IPC分类号: C08F4/642 C08F4/649 B01J31/02

    摘要: A catalyst composition for the polymerization of propylene comprising one or more Ziegler-Natta procatalyst compositions comprising one or more transition metal compounds and one or more esters of aromatic dicarboxylic acid internal electron donors; one or more aluminum containing cocatalysts; a selectivity control agent (SCA) comprising at least one silicon containing compound containing at least one C1-10 alkoxy group bonded to a silicon atom, and one or more activity limiting agent (ALA) compounds comprising one or more aliphatic or cycloaliphatic carboxylic acids; alkyl-, cycloalkyl- or alkyl(poly)(oxyalkyl)-(poly)ester derivatives thereof; or inertly substituted derivatives of the foregoing.

    摘要翻译: 一种用于丙烯聚合的催化剂组合物,其包含一种或多种齐格勒 - 纳塔前催化剂组合物,其包含一种或多种过渡金属化合物和一种或多种芳族二羧酸内电子给体的酯; 一种或多种含铝助催化剂; 包含至少一种含有至少一个与硅原子键合的C 1-10烷氧基的含硅化合物的选择性控制剂(SCA)和一种或多种包含一种或多种脂族或脂环族羧酸的活性限制剂(ALA)化合物; 烷基 - ,环烷基 - 或烷基(聚)(烷氧基) - (聚)酯衍生物; 或惰性取代的衍生物。