公开(公告)号：US20090297299A1

公开(公告)日：2009-12-03

申请号：US12537649

申请日：2009-08-07

Applicant: Philip L. Campbell ,  David J. Pinckney ,  Edward Sherwood ,  Uldis A. Ziemins

Inventor： Philip L. Campbell ,  David J. Pinckney ,  Edward Sherwood ,  Uldis A. Ziemins

IPC: H01L21/677

CPC classification number: H01L21/67769 ,  H01L21/67276 ,  H01L21/67359 ,  H01L21/67379 ,  H01L21/68707 ,  Y10S414/14

Abstract: A combination of a FOUP (front opening unified pod) system and a reticle system utilized for the transport of wafers and a reticle system, the latter of which are used for transporting reticles from a first fabrication site to a further site at another location, and which provides for a unified system enabling the automated and trackable delivery of the reticles between these sites. Provided is a modified FOUP base structure, which is adapted to retain a reticle and to be able to employ existing equipment in a fabrication site which only necessitates a minimal modification of the equipment in order to render the latter universally adaptable to the combination of the systems.

Abstract translation: FOUP（前开口统一舱）系统和用于运输晶片的掩模版系统和掩模版系统的组合，后者用于将掩模版从第一制造位置传送到另一位置的另一位置，以及 其提供统一的系统，使得能够在这些站点之间自动和可跟踪地传送标线。 提供了一种改进的FOUP基础结构，其适于保持掩模版并且能够在制造场地中使用现有设备，其仅需要对设备进行最小的修改，以使后者普遍适用于系统的组合 。

公开(公告)号：US06908255B2

公开(公告)日：2005-06-21

申请号：US10604078

申请日：2003-06-25

Applicant: Rodney A. Kendall ,  Lonn E. Moore ,  David J. Pinckney ,  Richard A. Rieland

Inventor： Rodney A. Kendall ,  Lonn E. Moore ,  David J. Pinckney ,  Richard A. Rieland

IPC: F16B5/06 ,  H01J37/20 ,  H01J37/317 ,  F16B7/04 ,  A61N5/00

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  F16B5/0642 ,  H01J37/20 ,  H01J37/3174 ,  Y10S403/09 ,  Y10T403/7062 ,  Y10T403/7066 ,  Y10T403/7071

Abstract: A clamping flexure for use in a vacuum employs a spring-loaded shaft that pulls an object being supported against a support piece, including a mechanism, passing through the vacuum vessel, for releasing the spring tension during adjustment, the shaft being sufficiently compliant that restoring force after adjustment is less than a threshold value so that displacement of the shaft does not impress a force on the object being supported that returns it toward its position before adjustment.

Abstract translation: 在真空中使用的夹紧挠曲件采用弹簧加载的轴，其将被支撑的物体拉到支撑件，包括通过真空容器的机构，用于在调节期间释放弹簧张力，所述轴足够柔顺以恢复 调整后的力小于阈值，使得轴的位移不会对被支撑的物体施加力，使其向调节前的位置返回。

公开(公告)号：US06724001B1

公开(公告)日：2004-04-20

申请号：US10338922

申请日：2003-01-08

Applicant: David J. Pinckney ,  Rodney A. Kendall

Inventor： David J. Pinckney ,  Rodney A. Kendall

IPC: H01J3700

CPC classification number: H01J37/185 ,  H01J2237/186 ,  H01J2237/3175

Abstract: An electron beam lithography apparatus has a first chamber for holding a workpiece with the first chamber having an outer wall with an opening therein. A second chamber has an electron beam column mounted therein, with the second chamber positioned adjacent the first chamber and having an outer wall having a portion in common with the portion of the outer wall of the first chamber containing the opening. An electron beam column in the second chamber includes an aperture and generates an electron beam through the aperture and the opening at the workpiece. The apparatus includes a first pump for creating a vacuum in the first chamber, a second pump for creating a vacuum in the second chamber, a first vent for permitting gas to enter the first chamber for increasing the pressure in the first chamber, and a second vent for permitting gas to enter the second chamber for increasing the pressure in the second chamber. A balancing bypass valve in the common wall between the first and second chambers (i) operates in a first mode to permit gases to flow from the first chamber to the second chamber when the pressure in said second chamber exceeds the pressure in the first chamber, (ii) operates in a second mode to permit gases to flow from the second chamber to the first chamber when the pressure in the first chamber exceeds the pressure in the second chamber, and (iii) operates in a third mode to seal the first chamber from the second chamber when the pressures in the first and second chambers are equal.

Abstract translation: 电子束光刻设备具有用于保持工件的第一室，其中第一室具有在其中具有开口的外壁。 第二室具有安装在其中的电子束柱，其中第二腔室位于第一腔室附近并且具有外壁，该外壁具有与包含开口的第一腔室的外壁部分共同的部分。 第二室中的电子束柱包括孔，并通过孔产生电子束和在工件处的开口。 该装置包括用于在第一室中产生真空的第一泵，用于在第二室中产生真空的第二泵，用于允许气体进入第一室以增加第一室中的压力的​​第一排气口，以及第二泵 排气口允许气体进入第二室以增加第二室中的压力。 在第一和第二室（i）之间的公共壁中的平衡旁通阀以第一模式操作，以便当所述第二室中的压力超过第一室中的压力时允许气体从第一室流动到第二室， （ii）以第二模式操作，以便当第一室中的压力超过第二室中的压力时，允许气体从第二室流到第一室，以及（iii）以第三模式操作以密封第一室 当第一和第二腔室中的压力相等时，从第二腔室开始。

公开(公告)号：US06246053B1

公开(公告)日：2001-06-12

申请号：US09273785

申请日：1999-03-22

Applicant: Rodney Arthur Kendall ,  Gary J. Johnson ,  David J. Pinckney

Inventor： Rodney Arthur Kendall ,  Gary J. Johnson ,  David J. Pinckney

IPC: H01J27304

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/703 ,  G03F9/7053 ,  H01J37/304 ,  H01J2237/21 ,  H01J2237/3175

Abstract: In a particle beam lithography system, focus adjustment is controlled by a measurement of the gap between the workpiece being processed and a reference surface, such as the bottom surface of the focus lens, using a pair of capacitive sensors mounted on an arm that rotates to place one sensor on the beam axis to measure the workpiece height and the other displaced from the beam aperture to measure the height of the reference surface. The sum of the two readings is constant (for a given gap dimension), so that the accuracy of the measurement is not affected by the position of the arm within the gap.

Abstract translation: 在粒子束光刻系统中，通过使用安装在臂上的一对电容传感器来测量被处理的工件之间的间隙和诸如焦点透镜的底面的参考表面之间的间隙来控制焦点调节。 将一个传感器放置在光束轴上以测量工件高度，另一个传感器从光束孔径移位，以测量参考表面的高度。 两个读数的总和是恒定的（对于给定的间隙尺寸），使得测量的精度不受臂在间隙内的位置的影响。

公开(公告)号：US07591624B2

公开(公告)日：2009-09-22

申请号：US11306708

申请日：2006-01-09

Applicant: Philip L. Campbell ,  David J. Pinckney ,  Edward Sherwood ,  Uldis A. Ziemins

Inventor： Philip L. Campbell ,  David J. Pinckney ,  Edward Sherwood ,  Uldis A. Ziemins

IPC: H01L21/677

CPC classification number: H01L21/67769 ,  H01L21/67276 ,  H01L21/67359 ,  H01L21/67379 ,  H01L21/68707 ,  Y10S414/14

Abstract: A combination of a FOUP (front opening unified pod) system and a reticle system utilized for the transport of wafers and a reticle system, the latter of which are used for transporting reticles from a first fabrication site to a further site at another location, and which provides for a unified system enabling the automated and trackable delivery of the reticles between these sites. Provided is a modified FOUP base structure, which is adapted to retain a reticle and to be able to employ existing equipment in a fabrication site which only necessitates a minimal modification of the equipment in order to render the latter universally adaptable to the combination of the systems.

Abstract translation: FOUP（前开口统一舱）系统和用于运输晶片的掩模版系统和掩模版系统的组合，后者用于将掩模版从第一制造位置传送到另一位置的另一位置，以及 其提供统一的系统，使得能够在这些站点之间自动和可跟踪地传送标线。 提供了一种改进的FOUP基础结构，其适于保持掩模版并且能够在制造场地中使用现有设备，其仅需要对设备进行最小的修改，以使后者普遍适用于系统的组合 。

公开(公告)号：US20090025598A1

公开(公告)日：2009-01-29

申请号：US11828657

申请日：2007-07-26

Applicant: Clayton D. Menser, JR. ,  David J. Pinckney ,  Uldis A. Ziemins

Inventor： Clayton D. Menser, JR. ,  David J. Pinckney ,  Uldis A. Ziemins

IPC: B61B3/00

CPC classification number: B61B3/02 ,  B66F11/04 ,  H01L21/67733

Abstract: A overhead transport service vehicle system includes a carriage frame structured and arranged to carry a user. A hoisting mechanism utilizes at least one lifting device for lifting and lowering the carriage frame and at least one moving device for causing movement of the hoisting mechanism along one of a track or rail. A control controls at least one of the at least one lifting device and the at least one moving device.

Abstract translation: 架空运输服务车辆系统包括构造和布置为承载用户的托架框架。 提升机构使用至少一个提升装置来提升和降低托架框架和至少一个运动装置，用于使提升机构沿轨道或轨道中的一个移动。 控制器控制至少一个提升装置和至少一个移动装置中的至少一个。

公开(公告)号：US06806943B2

公开(公告)日：2004-10-19

申请号：US10217360

申请日：2002-08-09

Applicant: Wayne A. Barringer ,  David J. Pinckney ,  Joseph E. Santilli ,  Maris A. Sturans

Inventor： Wayne A. Barringer ,  David J. Pinckney ,  Joseph E. Santilli ,  Maris A. Sturans

IPC: G03B2762

CPC classification number: G03F7/707

Abstract: A method and apparatus for clamping a semiconductor mask to a carrier device is taught. The apparatus is comprised of a base member to which is attached an elongated spring. Both the base and the spring have affixed to them a means for compressively contacting the mask surface when the mask is put in place. In the preferred embodiment, that contact means is made of sapphire shaped in the form of a dome. The clamp further includes an adjustment screw that can be used to adjust the height of the contact means affixed to the base member. In this manner, the surface of the mask can be adjusted so that it is planarized to the right orientation relative to an e-Beam or laser source that will be used to scribe a pattern on the mask. Finally, the clamp includes electrical contacts, and the materials out of which the clamp is made are deliberately selected, so that no electrical or magnetic forces can build up on the clamp or the wafer that might adversely affect the scribing process.

公开(公告)号：US06615481B1

公开(公告)日：2003-09-09

申请号：US09589399

申请日：2000-06-08

Applicant: Mark J. LaPlante ,  David J. Pinckney

Inventor： Mark J. LaPlante ,  David J. Pinckney

IPC: H01F706

CPC classification number: H01F41/041 ,  H01F17/0013 ,  H05K1/0306 ,  H05K1/165 ,  H05K3/027 ,  Y10T29/4902 ,  Y10T29/49073 ,  Y10T29/49078

Abstract: The present invention relates to a method of fabricating electromagnetic coil vanes. The method utilizes laser machining to provide high resolution, dense coil wire patterns on both sides of a ceramic vane substrate. A firing operation is first performed that eutectically bonds the copper to the ceramic. Laser machining is then used to produce a coil pattern in the copper. The substrate is drilled to provide a through hole which, when filled or partially filled with a conducting material, forms an electrical connection between the two coil patterns.

Abstract translation: 本发明涉及一种制造电磁线圈叶片的方法。 该方法利用激光加工在陶瓷叶片基板的两侧提供高分辨率，致密的线圈线图案。 首先进行烧结操作，其将铜共晶地结合到陶瓷上。 然后使用激光加工在铜中产生线圈图案。 钻出衬底以提供通孔，当填充或部分填充有导电材料时，在两个线圈图案之间形成电连接。

公开(公告)号：US5843623A

公开(公告)日：1998-12-01

申请号：US711748

申请日：1996-09-10

Applicant: David J. Pinckney

Inventor： David J. Pinckney

IPC: H01J37/317 ,  G03C5/00

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/004 ,  Y10S269/903

Abstract: According to the preferred embodiment, the invention is a simplified, low profile, adjustable substrate ground probe used in electron beam photolithography processing. The low profile substrate ground probe is compatible with state-of-the-art, electron beam lithographic processing tools that require minimal clearance. The ground contact base incorporates a flexure, an adjustable ground contact base, and an adjustment screw which allows the height of the ground contact relative to the surface of the workpiece to be accurately and easily set, without using shims. The flexure is a one-piece probe body with a flame sprayed tungsten carbide ground contact surface.

Abstract translation: 根据优选实施例，本发明是用于电子束光刻处理中的简化的低轮廓可调衬底接地探针。 低剖面基板接地探头与要求最小间隙的最先进的电子束光刻处理工具兼容。 接地底座包括挠性件，可调接地触点底座和调节螺钉，其允许接地触头相对于工件表面的高度被准确且容易地设定，而不使用垫片。 挠曲件是具有火焰喷涂碳化钨接地面的单件探头体。

公开(公告)号：US07887277B2

公开(公告)日：2011-02-15

申请号：US12537649

申请日：2009-08-07

Applicant: Philip L. Campbell ,  David J. Pinckney ,  Edward Sherwood ,  Uldis A. Ziemins

Inventor： Philip L. Campbell ,  David J. Pinckney ,  Edward Sherwood ,  Uldis A. Ziemins

IPC: H01L21/677

CPC classification number: H01L21/67769 ,  H01L21/67276 ,  H01L21/67359 ,  H01L21/67379 ,  H01L21/68707 ,  Y10S414/14

Abstract: A combination of a FOUP (front opening unified pod) system and a reticle system utilized for the transport of wafers and a reticle system, the latter of which are used for transporting reticles from a first fabrication site to a further site at another location, and which provides for a unified system enabling the automated and trackable delivery of the reticles between these sites. Provided is a modified FOUP base structure, which is adapted to retain a reticle and to be able to employ existing equipment in a fabrication site which only necessitates a minimal modification of the equipment in order to render the latter universally adaptable to the combination of the systems.

Abstract translation: FOUP（前开口统一舱）系统和用于运输晶片的掩模版系统和掩模版系统的组合，后者用于将掩模版从第一制造位置传送到另一位置的另一位置，以及 其提供统一的系统，使得能够在这些站点之间自动和可跟踪地传送标线。 提供了一种改进的FOUP基础结构，其适于保持掩模版并且能够在制造场地中使用现有设备，其仅需要对设备进行最小的修改，以使后者普遍适用于系统的组合 。