公开(公告)号：US20100179340A1

公开(公告)日：2010-07-15

申请号：US12376633

申请日：2007-07-09

Applicant: Juergen Erwin Lang ,  Georg Markowz ,  Dietmar Wewers ,  Harald Metz ,  Norbert Schladerbeck

Inventor： Juergen Erwin Lang ,  Georg Markowz ,  Dietmar Wewers ,  Harald Metz ,  Norbert Schladerbeck

IPC: C07F7/08 ,  B01J8/04 ,  B01J8/06

CPC classification number: B01J19/0093 ,  B01J2219/00788 ,  B01J2219/00822 ,  B01J2219/00831 ,  B01J2219/00835 ,  B01J2219/00837 ,  B01J2219/0086 ,  B01J2219/00867 ,  B01J2219/00869 ,  B01J2219/00873 ,  B01J2219/00889 ,  C07F7/1876

Abstract: The present invention relates to a system, to a reactor and to a process for continuous industrial performance of a reaction wherein allyl methacrylate A is reacted with an HSi compound B in the presence of a catalyst C and optionally of further assistants, and the system is based at least on the combination of reactants (3) for components A (1) and B (2), at least one multielement reactor (5) which, in turn, comprises at least two reactor units in the form of exchangeable pre-reactors (5.1) and at least one further reactor unit (5.3) connected downstream of the pre-reactors, and on a product workup (8).

Abstract translation: 本发明涉及一种系统，一种反应器和一种用于连续工业化反应的方法，其中甲基丙烯酸烯丙酯A在催化剂C和另外的助剂存在下与HSi化合物B反应，系统为 至少基于组分A（1）和B（2）的反应物（3）的组合，至少一个多元素反应器（5），其又包含至少两个可交换的预反应器形式的反应器单元 （5.1）和连接在预反应器下游的至少一个另外的反应器单元（5.3），以及产品处理（8）。

公开(公告)号：US09975103B2

公开(公告)日：2018-05-22

申请号：US14782099

申请日：2014-02-28

Applicant: Juergen Erwin Lang ,  Hartwig Rauleder ,  Ekkehard Mueh

Inventor： Juergen Erwin Lang ,  Hartwig Rauleder ,  Ekkehard Mueh

IPC: B01J19/08 ,  C01B33/04 ,  C07F7/08

CPC classification number: B01J19/088 ,  B01J2219/00038 ,  B01J2219/0805 ,  B01J2219/0847 ,  B01J2219/0849 ,  B01J2219/0883 ,  C01B33/04 ,  C07F7/0801 ,  C07F7/0805 ,  Y02P20/582

Abstract: The invention relates to a process for preparing polysilanes by converting monosilane in the presence of hydrogen in a plasma, and to a plant for performing the process.

公开(公告)号：US20170210631A1

公开(公告)日：2017-07-27

申请号：US15482410

申请日：2017-04-07

Applicant: Juergen Erwin LANG ,  Hartwig Rauleder ,  Ekkehard Mueh

Inventor： Juergen Erwin LANG ,  Hartwig Rauleder ,  Ekkehard Mueh

IPC: C01B33/04 ,  B01J19/08 ,  B01J19/24

CPC classification number: C01B33/04 ,  B01J12/00 ,  B01J19/088 ,  B01J19/2475 ,  B01J2219/00164 ,  B01J2219/0875 ,  B01J2219/0896 ,  B01J2219/24 ,  C01B33/046 ,  C07F7/02

Abstract: The invention relates to a process for preparing dimeric and/or trimeric silanes by conversion of monosilane in a plasma and to a plant for performance of the process.

公开(公告)号：US09550163B2

公开(公告)日：2017-01-24

申请号：US14725131

申请日：2015-05-29

Applicant: Juergen Erwin Lang ,  Hartwig Rauleder ,  Ekkehard Mueh

Inventor： Juergen Erwin Lang ,  Hartwig Rauleder ,  Ekkehard Mueh

IPC: B01J19/08 ,  C01B21/068 ,  C01B21/082 ,  C01B31/30 ,  C01B33/04 ,  C01B33/107 ,  C01B33/12 ,  C01B33/36 ,  C01G17/00 ,  C07F7/08 ,  C07F7/30

CPC classification number: B01J19/088 ,  B01J2219/0803 ,  B01J2219/0894 ,  C01B21/068 ,  C01B21/0823 ,  C01B32/907 ,  C01B33/04 ,  C01B33/107 ,  C01B33/12 ,  C01B33/36 ,  C01G17/00 ,  C01P2002/86 ,  C07F7/083 ,  C07F7/30

Abstract: An apparatus for preparing dimeric and trimeric silicon compounds is provided. The apparatus includes a reactor for generating a nonthermal plasma; a collecting vessel in product flow communication with the nonthermal plasma reactor; and a series of at least three rectification columns in flow communication with the collecting vessel.

Abstract translation: 提供了制备二聚和三聚硅化合物的装置。 该装置包括用于产生非热等离子体的反应器; 与非热等离子体反应器产品流通的收集容器; 以及与收集容器流动连通的一系列至少三个整流柱。

公开(公告)号：US20140252406A1

公开(公告)日：2014-09-11

申请号：US14129997

申请日：2012-06-20

Applicant: Richard Baisl ,  Dirk Becker ,  Thomas Dobbertin ,  Doreen Heppner ,  Benjamin Krummacher ,  Erwin Lang ,  Tilman Schlenker ,  Christian Schmid

Inventor： Richard Baisl ,  Dirk Becker ,  Thomas Dobbertin ,  Doreen Heppner ,  Benjamin Krummacher ,  Erwin Lang ,  Tilman Schlenker ,  Christian Schmid

IPC: H01L51/52

CPC classification number: H01L51/5253 ,  H01L51/448 ,  H01L51/5237 ,  H01L51/524 ,  H01L51/5256

Abstract: An encapsulation structure for an optoelectronic component, may include: a thin-film encapsulation for protecting the optoelectronic component against chemical impurities; an adhesive layer formed on the thin-film encapsulation; and a cover layer formed on the adhesive layer and serving for protecting the thin-film encapsulation and/or the optoelectronic component against mechanical damage, wherein the adhesive layer is formed such that particle impurities situated at the surface of the thin-film encapsulation are at least partly enclosed by the adhesive layer.

Abstract translation: 用于光电子部件的封装结构可以包括：用于保护光电子部件免受化学杂质的薄膜封装; 形成在薄膜封装上的粘合剂层; 以及形成在所述粘合剂层上并用于保护所述薄膜封装和/或所述光电部件免受机械损伤的覆盖层，其中所述粘合剂层形成为使得位于所述薄膜封装表面处的颗粒杂质处于 最少部分地被粘合剂层包围。

公开(公告)号：US20140225086A1

公开(公告)日：2014-08-14

申请号：US14131685

申请日：2012-06-20

Applicant: Thomas Dobbertin ,  Erwin Lang ,  Thilo Reusch ,  Daniel Steffen Setz

Inventor： Thomas Dobbertin ,  Erwin Lang ,  Thilo Reusch ,  Daniel Steffen Setz

IPC: H01L51/52 ,  H01L51/56

CPC classification number: H01L51/5268 ,  H01L51/5265 ,  H01L51/5271 ,  H01L51/5275 ,  H01L51/56 ,  H01L2251/53 ,  H01L2251/56

Abstract: An organic light-emitting component, may include: a first electrode; an organic light-generating layer structure on or above the first electrode; a second translucent electrode on or above the organic light-generating layer structure; an optically translucent layer structure on or above the second electrode; and a mirror layer structure on or above the optically translucent layer structure, wherein the mirror layer structure has a light-scattering structure on that side of the mirror layer structure which lies toward the optically translucent layer structure.

Abstract translation: 有机发光部件可以包括：第一电极; 在第一电极上或上方的有机发光层结构; 在有机发光层结构上方或上方的第二透光性电极; 在第二电极上或上方的光学半透明层结构; 以及在所述光学半透明层结构上或上方的镜层结构，其中所述镜层结构在所述镜层结构的朝向所述光学半透明层结构的所述侧上具有光散射结构。

公开(公告)号：US08574505B2

公开(公告)日：2013-11-05

申请号：US13447703

申请日：2012-04-16

Applicant: Juergen Erwin Lang ,  Rainer Nicolai ,  Hartwig Rauleder

Inventor： Juergen Erwin Lang ,  Rainer Nicolai ,  Hartwig Rauleder

IPC: B01J19/08

CPC classification number: C01B33/10778 ,  B01J19/0093 ,  B01J19/088 ,  B01J2219/0002 ,  B01J2219/00033 ,  B01J2219/00788 ,  B01J2219/00822 ,  B01J2219/00853 ,  B01J2219/00867 ,  B01J2219/00869 ,  B01J2219/00871 ,  B01J2219/00873 ,  B01J2219/0093 ,  B01J2219/0807 ,  B01J2219/0828 ,  B01J2219/083 ,  B01J2219/0841 ,  B01J2219/0871 ,  B01J2219/0875 ,  B01J2219/0896 ,  C01G17/04 ,  C01P2006/80

Abstract: A reactor and a plant containing the reactor for conducting a continuous, industrial process for preparing high-purity silicon tetrachloride or high-purity germanium tetrachloride is provided. The plant contains a plasma reactor having a dielectric, a high voltage electrode and an earthed, metallic heat exchanger, in which the longitudinal axes of the dielectric, of the high-voltage electrode and of the earthed, metallic heat exchanger are oriented parallel to one another and at the same time parallel to the force vector of gravity.

Abstract translation: 提供了一种反应器和含有反应器的反应器，用于进行用于制备高纯度四氯化硅或高纯度四氯化锗的连续工业方法。 该装置包含具有电介质，高压电极和接地金属热交换器的等离子体反应器，其中高压电极和接地金属热交换器的电介质的纵向轴线平行于一个 另一个并且同时平行于重力的力矢量。

公开(公告)号：US20120318661A1

公开(公告)日：2012-12-20

申请号：US13526482

申请日：2012-06-18

Applicant: Georg Markowz ,  Jürgen Erwin Lang ,  Rüdiger Schütte

Inventor： Georg Markowz ,  Jürgen Erwin Lang ,  Rüdiger Schütte

IPC: B01J19/08

CPC classification number: C10L3/10 ,  C01B3/24 ,  C01B2203/0266 ,  C01B2203/04 ,  C01B2203/0861 ,  C01B2203/1241 ,  C10G15/12 ,  Y02P20/133

Abstract: A method for modification of a methane-containing gas stream, comprising the steps of: i) withdrawal of at least one substream from a methane-containing gas stream; ii) treatment of the substream with an electrically generated plasma, generating a modified gas composition which comprises a lower fraction of methane than the methane-containing gas stream used and iii) return of modified gas composition into the methane-containing gas stream. This method makes possible the storage of excess power in a natural gas line grid.

Abstract translation: 一种用于改变含甲烷气流的方法，包括以下步骤：i）从含甲烷的气流中取出至少一个子流; ii）用电产生的等离子体处理子流，产生改性气体组合物，其包含甲烷的比例低于使用的含甲烷气流，并且iii）将改性气体组合物返回到含甲烷气流中。 这种方法可以在天然气线路网格中存储多余的电力。

公开(公告)号：US20120230905A1

公开(公告)日：2012-09-13

申请号：US13509839

申请日：2010-11-04

Applicant: Alfons Karl ,  Jürgen Erwin Lang ,  Hartwig Rauleder ,  Bodo Frings

Inventor： Alfons Karl ,  Jürgen Erwin Lang ,  Hartwig Rauleder ,  Bodo Frings

IPC: C01B33/025 ,  C09K3/00

CPC classification number: C01B33/025 ,  C01B32/30 ,  C01B32/324

Abstract: The present invention relates to processes for industrial pyrolysis of a carbohydrate or carbohydrate mixture with addition of amorphous carbon, to a pyrolysis product thus obtainable and to the use thereof, especially as a reducing agent in the production of silicon from silica and carbon at high temperature.

Abstract translation: 本发明涉及通过添加无定形碳的碳水化合物或碳水化合物混合物的工业热解方法，由此获得的热解产物及其用途，特别是作为在高温下从二氧化硅和碳生产硅中的还原剂的方法 。

公开(公告)号：US20120175668A1

公开(公告)日：2012-07-12

申请号：US13387690

申请日：2010-07-15

Applicant: Dirk Becker ,  Thomas Dobbertin ,  Thilo Reusch ,  Erwin Lang

Inventor： Dirk Becker ,  Thomas Dobbertin ,  Thilo Reusch ,  Erwin Lang

IPC: H01L33/42 ,  H01L29/41

CPC classification number: H01L51/5203 ,  H01L2251/558

Abstract: An electronic component (100), which comprises a substrate (1), at least one first electrode (3) arranged on the substrate (3) and a growth layer (7) on the side of the electrode (3) remote from the substrate (7), wherein the electrode (7) arranged on the growth layer (3) comprises a metal layer (9) with a thickness of less than or equal to 30 nm and the growth layer (7) has a thickness which is less than or equal to 10 nm. An electrical contact is also disclosed.

Abstract translation: 一种电子部件（100），其包括基板（1），布置在所述基板（3）上的至少一个第一电极（3）和远离所述基板的所述电极（3）侧的生长层（7） （7），其中布置在生长层（3）上的电极（7）包括厚度小于或等于30nm的金属层（9），并且生长层（7）的厚度小于 或等于10nm。 还公开了电接触。