公开(公告)号：US20080098833A1

公开(公告)日：2008-05-01

申请号：US11925158

申请日：2007-10-26

申请人： Yasuharu Sasaki ,  Takehiro Ueda ,  Taketoshi Okajo ,  Kaoru Oohashi

发明人： Yasuharu Sasaki ,  Takehiro Ueda ,  Taketoshi Okajo ,  Kaoru Oohashi

IPC分类号： G01R31/02 ,  H01L21/683

CPC分类号： H01L21/67248 ,  H01L21/6831 ,  H01L21/68757

摘要： An apparatus evaluates a substrate mounting device adapted to hold a target substrate placed on a mounting surface and to control a temperature of the target substrate. The apparatus includes an evacuatable airtightly sealed chamber accommodating therein the substrate mounting device, a heat source, arranged in a facing relationship with the mounting surface, for irradiating infrared light. The apparatus further includes an evaluation-purpose substrate adapted to be mounted on the mounting surface in place of the target substrate, the evaluation-purpose substrate being made of an infrared light absorbing material, and having a unit for measuring temperatures at plural sites on a surface and/or inside of the substrate.

摘要翻译： 一种装置评价适于保持放置在安装表面上的目标基板并控制目标基板的温度的基板安装装置。 该装置包括可抽出的气密密封室，其容纳基板安装装置，以与安装表面相对的关系布置的用于照射红外光的热源。 该装置还包括适于安装在安装表面上以代替目标基板的评估用基板，评估用基板由红外光吸收材料制成，并且具有用于测量在多个位置上的温度的单元 表面和/或内部。

公开(公告)号：US4591185A

公开(公告)日：1986-05-27

申请号：US665066

申请日：1984-10-26

申请人： Kazuyuki Natsume ,  Kaoru Oohashi

发明人： Kazuyuki Natsume ,  Kaoru Oohashi

IPC分类号： B60G17/00 ,  B60G17/015 ,  B60G17/016

CPC分类号： B60G17/016 ,  B60G2204/80 ,  B60G2400/252 ,  B60G2400/50 ,  B60G2401/14 ,  B60G2500/30 ,  B60G2600/02 ,  B60G2600/26

摘要： A vehicle height control system includes a plurality of vehicle height adjusters actuated by a hydropneumatic actuating system and controlled respectively by control signals from a control unit. The control unit calculates, for each of the vehicle height adjusters, a target difference between a target adjustment position and an actual position detected by a vehicle height sensor associated with the adjuster. A maximum target difference is selected from the target differences respectively for the adjusters, and the selected maximum target difference is divided by a predetermined adjusting unit to determine a number of steps for adjustment of the target difference a little amount at a time. Then, tentative- or pseudo-target adjustment positions ranging between the actual position and the target adjustment position are obtained for each adjuster, and the adjustment control of each adjuster is carried out to achieve the pseudo target adjustment positions step by step.

摘要翻译： 车辆高度控制系统包括由液压气动致动系统致动并由控制单元的控制信号分别控制的多个车高调节器。 对于每个车高调节器，控制单元计算目标调整位置与由调节器相关联的车辆高度传感器检测到的实际位置之间的目标差。 从调节器的目标差异中选择最大目标差，并且将所选择的最大目标差除以预定的调整单元，以确定用于一次调整目标差的步数。 然后，针对每个调节器获得实际位置和目标调整位置之间的临时或伪目标调整位置，并且执行每个调节器的调整控制以逐步实现伪目标调整位置。

公开(公告)号：US08056503B2

公开(公告)日：2011-11-15

申请号：US10483251

申请日：2002-07-02

申请人： Akihiro Kikuchi ,  Satoshi Kayamori ,  Shinya Shima ,  Yuichiro Sakamoto ,  Kimihiro Higuchi ,  Kaoru Oohashi ,  Takehiro Ueda ,  Munehiro Shibuya ,  Tadashi Gondai

发明人： Akihiro Kikuchi ,  Satoshi Kayamori ,  Shinya Shima ,  Yuichiro Sakamoto ,  Kimihiro Higuchi ,  Kaoru Oohashi ,  Takehiro Ueda ,  Munehiro Shibuya ,  Tadashi Gondai

IPC分类号： C23C16/50 ,  C23C16/52 ,  C23F1/00 ,  H01L21/306 ,  C23C16/06 ,  C23C16/22

CPC分类号： H01J37/32724 ,  C23C16/45565 ,  C23C16/509 ,  C23C16/5096 ,  H01J37/32082 ,  H01J37/32174 ,  H01J37/3244 ,  H01J37/32532 ,  H01J37/32623 ,  H01J37/32642 ,  H01J37/32715 ,  H01J37/3411 ,  H01J2237/002 ,  H01J2237/0206 ,  H01J2237/334 ,  H01L21/67069

摘要： An etching chamber 1 incorporates a focus ring 9 so as to surround a semiconductor wafer W provided on a lower electrode 4. The plasma processor is provided with an electric potential control DC power supply 33 to control the electric potential of this focus ring 9, and so constituted that the lower electrode 4 is supplied with a DC voltage of, e.g., −400 to −600 V to control the electric potential of the focus ring 9. This constitution prevents surface arcing from developing along the surface of a substrate to be processed.

摘要翻译： 蚀刻室1包括聚焦环9，以围绕设置在下电极4上的半导体晶片W.等离子体处理器设置有电位控制DC电源33以控制该聚焦环9的电位，以及 这样构成为向下电极4提供例如-400至-600V的DC电压以控制聚焦环9的电位。这种结构防止表面电弧沿着待处理基板的表面发展 。

公开(公告)号：US07815740B2

公开(公告)日：2010-10-19

申请号：US11376161

申请日：2006-03-16

申请人： Kaoru Oohashi ,  Toshihiro Hayami

发明人： Kaoru Oohashi ,  Toshihiro Hayami

IPC分类号： H01L21/00 ,  C23C14/00 ,  C23C16/00

CPC分类号： H01L21/67248 ,  H01J37/32724 ,  H01L21/67109 ,  H01L21/68785

摘要： A substrate mounting table includes a plurality of passageways independently provided therein, a temperature control medium flowing through the passageways, and a gap formed between at least two of the passageways. In a substrate processing method for processing a substrate mounted on the substrate mounting table in a substrate processing apparatus while controlling a temperature thereof, a process is performed on the substrate while controlling the temperature of the substrate by flowing the temperature control medium through each of the passageways. The passageways are respectively provided in a central area of the substrate mounting table and a peripheral area located outside the central area, and the central area and the peripheral area are thermally isolated from each other by evacuating the gap so as to set the gap to a vacuum state.

摘要翻译： 基板安装台包括独立地设置在其中的多个通道，流过通道的温度控制介质和形成在至少两个通道之间的间隙。 在基板处理方法中，在控制基板处理装置的基板处理装置的基板安装台上进行处理的基板处理方法中，对基板进行处理，同时通过使温度控制介质 通道。 通道分别设置在基板安装台的中心区域和位于中心区域外部的周边区域，并且通过抽空间隙将中心区域和周边区域彼此热隔离，从而将间隙设置为 真空状态。

公开(公告)号：US07718007B2

公开(公告)日：2010-05-18

申请号：US11370145

申请日：2006-03-08

申请人： Kaoru Oohashi ,  Toshihiro Hayami

发明人： Kaoru Oohashi ,  Toshihiro Hayami

IPC分类号： C23C16/00 ,  C23F1/00 ,  H01L21/306

CPC分类号： H01L21/67109 ,  H01J37/32724 ,  H01L21/6875 ,  H01L21/68785

摘要： A substrate supporting member, and a substrate processing apparatus including the substrate supporting member are provided. The substrate supporting member for mounting and supporting a substrate on a substrate supporting surface thereof, and controlling a temperature of the substrate by thermal transfer between the substrate and the substrate supporting surface, wherein the substrate supporting surface is smaller than the substrate, and includes a central region, an intermediate region, and a peripheral region. A thermal conductivity between the substrate and the peripheral region is greater than that between the substrate and the central region which is greater than that between the substrate and the intermediate region located between the central region and the peripheral region.

摘要翻译： 提供了基板支撑构件，以及包括基板支撑构件的基板处理装置。 一种用于在其基板支撑表面上安装和支撑基板的基板支撑构件，并且通过基板和基板支撑表面之间的热转移来控制基板的温度，其中基板支撑表面小于基板，并且包括 中央区域，中间区域和周边区域。 衬底和外围区域之间的导热性大于衬底和中心区域之间的热导率，其大于衬底与位于中心区域和外围区域之间的中间区域之间的热导率。

公开(公告)号：US20080145556A1

公开(公告)日：2008-06-19

申请号：US11954826

申请日：2007-12-12

申请人： Nobuyuki NAGAYAMA ,  Takehiro Ueda ,  Yoshiyuki Kobayashi ,  Kaoru Oohashi

发明人： Nobuyuki NAGAYAMA ,  Takehiro Ueda ,  Yoshiyuki Kobayashi ,  Kaoru Oohashi

IPC分类号： B05D1/08

CPC分类号： C23C16/4581 ,  C23C4/01 ,  C23C4/02 ,  C23C16/4404 ,  C23C16/46 ,  C23C16/466

摘要： A method for manufacturing a substrate mounting table having a mounting surface for mounting a substrate thereon; a plurality of gas injection openings opened on the mounting surface to supply a gas toward the mounting surface; a gas supply channel for supplying a gas to the gas injection openings; and a thermally sprayed ceramic layer covering the mounting surface is provided. The method includes forming a removable film at least on inner wall portions of the gas supply channel facing the gas injection openings; forming the thermally sprayed ceramic layer on the mounting surface; and removing the film.

摘要翻译： 一种用于制造具有用于在其上安装基板的安装表面的基板安装台的方法; 多个气体注入口，其在所述安装面上开口，向所述安装面供给气体; 用于向气体注入口供给气体的气体供给通道; 并且提供覆盖安装表面的热喷涂陶瓷层。 该方法包括至少在面向气体注入开口的气体供应通道的内壁部分上形成可移除膜; 在所述安装表面上形成所述热喷涂陶瓷层; 并去除胶片。

公开(公告)号：US4593920A

公开(公告)日：1986-06-10

申请号：US665065

申请日：1984-10-26

申请人： Kazuyuki Natsume ,  Yoshihiro Sasage ,  Naoto Ooka ,  Kaoru Oohashi

发明人： Kazuyuki Natsume ,  Yoshihiro Sasage ,  Naoto Ooka ,  Kaoru Oohashi

IPC分类号： B60G17/00 ,  B60G17/015 ,  B60G17/016

CPC分类号： B60G17/016 ,  B60G2204/80 ,  B60G2400/252 ,  B60G2400/50 ,  B60G2401/14 ,  B60G2500/30 ,  B60G2600/02 ,  B60G2600/26

摘要： A vehicle height control system includes a plurality of vehicle height adjusters actuated by a hydropneumatic actuating system and controlled by control signals from a control unit. The control unit calculates, for each of the vehicle height adjusters, a target difference between a target adjustment position set by a setting device and an actual position detected by a vehicle height sensor associated with the adjuster, and the control unit generates the control signals in accordance with the respective target differences. The control unit further selects a maximum target difference, and calculates deviations of the target differences from the maximum target difference. When any of the deviations exceeds a predetermined value, the adjustment operation of the vehicle height adjuster associated with this deviation is temporarily stopped thereby correcting the nonuniformity of the adjustments in the vehicle height adjusters.

摘要翻译： 车辆高度控制系统包括由液压气动致动系统致动并由来自控制单元的控制信号控制的多个车高调节器。 控制单元针对每个车高调节器计算由设定装置设定的目标调整位置与由调整器相关联的车高传感器检测到的实际位置之间的目标差，并且控制单元生成控制信号 根据各自的目标差异。 控制单元还选择最大目标差，并且计算目标差异与最大目标差的偏差。 当任何偏差超过预定值时，与该偏差相关联的车辆高度调节器的调节操作暂时停止，从而校正车辆高度调节器中的调整的不均匀性。