公开(公告)号：US20060199784A1

公开(公告)日：2006-09-07

申请号：US11363174

申请日：2006-02-28

Applicant: Naoyuki Yoshida ,  Kazushi Ishida ,  Shuji Sasaki ,  Takuo Ikeda ,  Jun Hiraki ,  Shigeyuki Aoyama

Inventor： Naoyuki Yoshida ,  Kazushi Ishida ,  Shuji Sasaki ,  Takuo Ikeda ,  Jun Hiraki ,  Shigeyuki Aoyama

IPC: A61K31/717 ,  C08B7/00

CPC classification number: C08B5/14 ,  A61K8/731 ,  A61Q19/00 ,  Y10S514/861 ,  Y10S514/863

Abstract: The present invention provides a compound selected from sulfated cellulose and salts thereof which can be used as an active ingredient for a cutaneous external preparation produced intending to prevent, soften, improve or cure atopic cutaneous symptoms and the like and which are excellent in a hydrolytic resistance, and dermatitis therapeutic agents and cosmetics using the same.

Abstract translation: 本发明提供一种选自硫酸纤维素及其盐的化合物，其可用作预防，软化，改善或治愈特应性皮肤症状等的皮肤外用制剂的活性成分，并且其耐水解性优异 ，以及使用其的皮炎治疗剂和化妆品。

公开(公告)号：US06565419B1

公开(公告)日：2003-05-20

申请号：US09497819

申请日：2000-02-03

Applicant: Naoki Nishio ,  Kazushi Ishida ,  Yukio Takigawa ,  Ei Yano

Inventor： Naoki Nishio ,  Kazushi Ishida ,  Yukio Takigawa ,  Ei Yano

IPC: B24B100

CPC classification number: H01L21/6835 ,  B08B7/0028 ,  G03F7/70691 ,  G03F7/70925 ,  H01L21/67028 ,  H01L21/67132 ,  H01L21/6833

Abstract: Disclosed is a method of readily removing particles from a stage, that is, a stage particle removing method for removing particles from a stage that holds a planar workpiece. A resin film is placed on the stage, and collected from the stage. The resin film is coated over at least one surface of the planar workpiece such as a semiconductor wafer or glass substrate. The resin film is brought into contact with the stage. The resin film may not be coated over the planar workpiece itself but may be coated over a dedicated planar piece shaped similarly to the planar workpiece, for example, a thin metallic plate that is very smooth. The used resin film is peeled off from the planar workpiece or dedicated planar piece, and the resin film is coated again. Thus, the planar workpiece or dedicated planar piece can be reused.

Abstract translation: 公开了一种容易从载物台去除颗粒的方法，即从保持平面工件的载体中除去颗粒的载片颗粒去除方法。 将树脂膜放置在舞台上，并从舞台收集。 树脂膜涂覆在诸如半导体晶片或玻璃基板的平面工件的至少一个表面上。 树脂膜与载物台接触。 树脂膜可以不涂覆在平面工件本身上，而是可以涂覆在与平面工件类似的专用平面件上，例如非常光滑的薄金属板。 将所使用的树脂膜从平面工件或专用平面片剥离，并且再次涂覆树脂膜。 因此，可以重复使用平面工件或专用平面件。

公开(公告)号：US5981118A

公开(公告)日：1999-11-09

申请号：US42747

申请日：1998-03-17

Applicant: Nobuyuki Yasutake ,  Yoshihisa Ooae ,  Kazushi Ishida ,  Hiroshi Yasuda ,  Akiyoshi Tsuda ,  Hitoshi Tanaka

Inventor： Nobuyuki Yasutake ,  Yoshihisa Ooae ,  Kazushi Ishida ,  Hiroshi Yasuda ,  Akiyoshi Tsuda ,  Hitoshi Tanaka

IPC: G03F7/20 ,  H01J37/317 ,  G03F9/00

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G03F7/2037 ,  G03F7/2065 ,  H01J37/3174 ,  H01J2237/31774

Abstract: With using one scanning stage 19 where a plurality of wafers 16A to 16E is mounted through wafer holders 20A to 20E and balancing stage 21 disposed below scanning stage 19, scanning stage 19 is scanned based on exposure data common to a plurality of charged particle beam exposure apparatus 10A to 10E, and balancing stage 21 is scanned so that barycenter G of scanning stage 19 and balancing stage 21 becomes a fixed point. The positions of reflecting mirrors 70L and 70R secured to stage 19 are measured and based on their values, the expansion/contraction ratio of stage 19 and the positions of samples 16A to 16E are calculated to obtain deviation of the positions from target positions. Stage 19 is modeled such that rigid areas 19A to 19E are loosely connected, and for each area, the positions of three points are measured to calculate deviation of the exposure target position due to rotation of each ridged area. These deviations are corrected by deflectors 18A to 18D.

Abstract translation: 通过使用一个扫描台19，其中通过设置在扫描台19下方的晶片保持器20A至20E和平衡台21安装多个晶片16A至16E，基于多个带电粒子束曝光共同的曝光数据扫描扫描台19 扫描装置10A至10E以及平衡级21，使得扫描级19和平衡级21的重心G成为固定点。 测量固定在工作台19上的反射镜70L和70R的位置，并且基于它们的值，计算级19的伸缩比和样品16A至16E的位置以获得位置与目标位置的偏差。 阶段19被建模为刚性区域19A至19E松散地连接，并且对于每个区域，测量三个点的位置以计算由于每个脊状区域的旋转引起的曝光目标位置的偏差。 这些偏差由偏转器18A至18D校正。

公开(公告)号：US5561299A

公开(公告)日：1996-10-01

申请号：US506641

申请日：1995-07-25

Applicant: Kazushi Ishida ,  Kouji Takahata ,  Tooru Ikeda

Inventor： Kazushi Ishida ,  Kouji Takahata ,  Tooru Ikeda

IPC: B23Q1/00 ,  B23Q1/26 ,  B23Q1/62 ,  G12B5/00 ,  H01J37/20 ,  H01L21/027 ,  H01L21/68

CPC classification number: H01J37/20 ,  H01J2237/20221 ,  H01J2237/3175

Abstract: An X-Y stage includes a base having a first guide rail extending in a first direction, a stage having a second guide rail extending in a second direction perpendicular to the first direction, where the stage is movable with respect to the base in mutually perpendicular directions X and Y, and a slider arranged between the base and the stage and having a plurality of first wheels provided with respect to the first guide rail and rotatable under guidance of the first guide rail and a plurality of second wheels provided with respect to the second guide rail and rotatable under guidance of the second guide rail. The first wheels block a movement of the slider in the second direction by engaging the first guide rail when the stage moves in the second direction, and the second wheels block a movement of the slider in the first direction by engaging the second guide rail when the stage moves in the first direction. In addition, the slider is arranged in at least three locations.

Abstract translation: XY台包括具有沿第一方向延伸的第一导轨的底座，具有沿垂直于第一方向的第二方向延伸的第二导轨的平台，所述平台可相对于基座沿相互垂直的方向X移动 和Y，以及布置在所述基座和所述台架之间的滑块，并且具有相对于所述第一导轨设置并在所述第一导轨的引导下可转动的多个第一轮和相对于所述第二导轨设置的多个第二轮 导轨，并可在第二导轨的引导下旋转。 当台架沿第二方向移动时，第一轮通过接合第一导轨而阻止滑块在第二方向上的移动，并且当第二方向通过接合第二导轨时，第二轮通过接合第二导轨而阻止滑块沿第一方向的移动 舞台在第一个方向移动。 此外，滑块布置在至少三个位置。

公开(公告)号：US08779119B2

公开(公告)日：2014-07-15

申请号：US12521524

申请日：2007-12-26

Applicant: Naoyuki Yoshida ,  Kazushi Ishida ,  Shuji Sasaki ,  Ippei Yamaoka

Inventor： Naoyuki Yoshida ,  Kazushi Ishida ,  Shuji Sasaki ,  Ippei Yamaoka

IPC: C08B5/14 ,  C08B11/10 ,  C08B11/12

CPC classification number: A61K31/717 ,  C08B5/00 ,  C08B11/12 ,  C08B15/005

Abstract: The invention provides a metal salt of a crosslinked cellulose derivative represented by the following formula (I), wherein the degree of substitution of the hydroxyl group of glucose unit of the crosslinked cellulose derivative by a functional group a is 1 or more. R—O—A  (I) {In the formula (I), R represents a crosslinked cellulose residue and A represents a functional group a having cation-exchange ability.}

Abstract translation: 本发明提供由下式（I）表示的交联纤维素衍生物的金属盐，其中交联的纤维素衍生物的官能团a的葡萄糖单元的羟基的取代度为1以上。 R-O-A（I）{式（I）中，R表示交联纤维素残基，A表示具有阳离子交换能力的官能团。

公开(公告)号：US20100055060A1

公开(公告)日：2010-03-04

申请号：US12516347

申请日：2007-11-27

Applicant: Naoyuki Yoshida ,  Yuichi Yamamoto ,  Kazushi Ishida ,  Akiko Yoda ,  Syuji Sasaki

Inventor： Naoyuki Yoshida ,  Yuichi Yamamoto ,  Kazushi Ishida ,  Akiko Yoda ,  Syuji Sasaki

IPC: A61K8/73 ,  A61Q19/00 ,  A61Q5/12 ,  A61Q1/06 ,  A61Q1/02 ,  A61Q1/10 ,  A61Q5/06 ,  A61Q5/10 ,  A61Q19/10

CPC classification number: A61K8/731 ,  A61K8/345 ,  A61K2800/782 ,  A61Q19/00

Abstract: The problem of the present invention is to provide a cosmetic composition, which has a moisturizing effect, and whose ability to inhibit hyaluronidase activity is high. According to the present invention, by using one or more substances selected from sulfated cellulose and a salt thereof in combination with polyhydric alcohol, the moisturizing effect of sulfated cellulose and the ability to inhibit hyaluronidase activity can be further improved, and thereby the above-described problem can be solved. In addition, the present invention can provide a cosmetic composition having excellent stability through inclusion of an electrolyte having pH buffering ability.

Abstract translation: 本发明的问题在于提供具有保湿作用，抑制透明质酸酶活性的能力高的化妆品组合物。 根据本发明，通过使用一种或多种选自硫酸化纤维素及其盐与多元醇组合的物质，可以进一步提高硫酸纤维素的保湿作用和抑制透明质酸酶活性的能力，由此上述 问题可以解决。 此外，本发明可以提供通过包含具有pH缓冲能力的电解质而具有优异的稳定性的化妆品组合物。

公开(公告)号：US5966200A

公开(公告)日：1999-10-12

申请号：US948478

申请日：1997-10-10

Applicant: Kenichi Kawakami ,  Tatsuro Ohkawa ,  Kazushi Ishida ,  Akiyoshi Tsuda

Inventor： Kenichi Kawakami ,  Tatsuro Ohkawa ,  Kazushi Ishida ,  Akiyoshi Tsuda

IPC: H01L21/027 ,  G03F7/20 ,  H01J37/304 ,  H01L21/68 ,  G03B27/42 ,  G01B11/00 ,  G01N21/00

CPC classification number: G03F7/70716 ,  H01J37/3045 ,  H01L21/681 ,  H01J2237/3175

Abstract: The present invention is a charged particle beam exposure apparatus comprising: a column portion in which an optical system for a charged particle beam is disposed; a chamber to be coupled with the column portion; a movable sample stage located in the chamber for mounting a sample thereon; and a stage position measurement device, having an optical path for measurement, along which a laser beam having a predetermined frequency is projected and is reflected by reflection means provided on the sample stage, and an optical path for reference, which in length almost equals a distance between a starting point of the optical path for measurement and the origin of the optical system in the column portion and for which the length is increased at a rate substantially consistent with a thermal expansion coefficient as material of the chamber is expanded, for measuring a change in position of the sample stage by employing a laser optical signal for measurement, which passes along the optical path for measurement, and a reference laser signal, which passes along the optical path for reference.

Abstract translation: 本发明是一种带电粒子束曝光装置，包括：列部分，其中设置带电粒子束的光学系统; 与柱部分联接的室; 位于所述室中的可移动的样品台，用于在其上安装样品; 以及台架位置测量装置，具有用于测量的光路，具有预定频率的激光束沿着该光路投射并被设置在样品台上的反射装置反射，以及用于参考的光路，其长度几乎等于 用于测量的光路的起始点和柱部分中的光学系统的原点之间的距离和长度以与作为材料的材料的热膨胀系数基本一致的速率增加的距离被扩大，用于测量 通过采用通过用于测量的光路的测量用的激光光信号和沿光路通过的参考激光信号来改变样品台的位置。