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    Process for fabricating micromachine
    11.
    发明申请
    Process for fabricating micromachine 有权
    微机械制造工艺

    公开(公告)号：US20060216847A1

    公开(公告)日：2006-09-28

    申请号：US10551271

    申请日：2004-04-02

    申请人： Masahiro Tada ,  Takashi Kinoshita ,  Masahiro Tanaka ,  Masanari Yamaguchi ,  Shun Mitarai ,  Koji Naniwada

    发明人： Masahiro Tada ,  Takashi Kinoshita ,  Masahiro Tanaka ,  Masanari Yamaguchi ,  Shun Mitarai ,  Koji Naniwada

    IPC分类号： H01L21/00

    CPC分类号： H03H3/0072 ,  B81B7/0012

    摘要： A method for manufacturing a micromachine is provided which can remove a sacrifice layer and can perform sealing without using a specific packaging technique. In a method for manufacturing a micromachine (1) including an oscillator (4), a step of forming a sacrifice layer around a movable portion of the oscillator (4); a step of covering a sacrifice layer with an overcoat film (8), followed by the formation of a penetrating hole (10) reaching the sacrifice layer in the overcoat layer (8); a step of performing sacrifice-layer etching for removing the sacrifice layer using the penetrating hole (10) in order to form a space around the movable portion; and a step of performing a film-formation treatment at a reduced pressure following the sacrifice-layer etching so as to seal the penetrating hole (10).

    摘要翻译： 提供了一种制造微机械的方法，其可以去除牺牲层并且可以在不使用特定包装技术的情况下进行密封。 在制造包括振荡器（4）的显微机械（1）的方法中，在振荡器（4）的可移动部分周围形成牺牲层的步骤; 用覆盖膜（8）覆盖牺牲层的步骤，然后形成到达覆盖层（8）中的牺牲层的穿透孔（10）; 使用所述贯通孔（10）进行牺牲层蚀刻去除所述牺牲层以在所述可动部分周围形成空间的步骤; 以及在牺牲层蚀刻之后在减压下进行成膜处理以密封穿透孔（10）的步骤。

    Mems element and method of producing the same, and diffraction type mems element
    12.
    发明申请
    Mems element and method of producing the same, and diffraction type mems element 审中-公开
    Mems元件及其制造方法以及衍射型mems元件

    公开(公告)号：US20060171628A1

    公开(公告)日：2006-08-03

    申请号：US10544733

    申请日：2004-02-06

    申请人： Koji Naniwada

    发明人： Koji Naniwada

    IPC分类号： G02B6/26

    CPC分类号： B81B3/0072 ,  B81B2201/045 ,  B81B2203/0109 ,  B81B2203/053 ,  G02B26/0808 ,  G02B26/0841

    摘要： The present invention provides a MEMS device in which a warp that is deformation of a beam is reduced and which aims to improve the characteristic thereof, a method for manufacturing the MEMS device and a diffraction-type MEMS device. The MEMS device of the present invention includes a substrate-side electrode and a beam driven by a static electricity generated between the substrate-side and the beam, in which the beam is formed of a plurality of thin films including a driving-side electrode and is provided with deformation prevention means for preventing the deformation of the beam due to the warp of thin films caused by film stress. The diffraction-type MEMS device of the present invention is configured such that in the above-described configuration the substrate-side electrode is made common and a plurality of beams are provided independently to each other so as to be opposed to the substrate electrode.

    摘要翻译： 本发明提供了一种MEMS器件，其中，作为光束变形的翘曲减小，其目的在于提高其特性，MEMS器件的制造方法和衍射型MEMS器件。 本发明的MEMS器件包括基板侧电极和由基板侧和光束之间产生的静电驱动的光束，其中光束由多个薄膜形成，薄膜包括驱动侧电极和 设有用于防止由薄膜应力引起的薄膜翘曲引起的光束变形的变形防止装置。 本发明的衍射型MEMS器件被构造成使得在上述配置中，将衬底侧电极制成共同的并且多个光束彼此独立地设置成与衬底电极相对。

    Waveform equalizer and method for controlling the same, as well as receiving apparatus and method for controlling the same
    13.
    发明授权
    Waveform equalizer and method for controlling the same, as well as receiving apparatus and method for controlling the same 失效
    波形均衡器及其控制方法，以及接收装置及其控制方法

    公开(公告)号：US08385396B2

    公开(公告)日：2013-02-26

    申请号：US12671228

    申请日：2008-08-06

    申请人： Kazuhisa Funamoto ,  Koji Naniwada ,  Tien Dzung Doan

    发明人： Kazuhisa Funamoto ,  Koji Naniwada ,  Tien Dzung Doan

    IPC分类号： H03H7/30 ,  H03H7/40 ,  H03K5/159

    CPC分类号： H04B3/142 ,  H04L25/03038 ,  H04L25/0305 ,  H04L2025/03509 ,  H04L2025/03579

    摘要： The present invention relates to a waveform equalizer and a method for controlling the same, as well as a receiving apparatus and a method for controlling the same whereby better receiving characteristics are provided than before.In a filter 28, registers 911 through 915 delay an input DT1; multipliers 920 through 925 multiply outputs from the registers by filter coefficients C20 through C25 respectively; and adders 931 through 935 add up outputs from the multipliers to acquire DT2. A selector 81 either outputs a timing signal at intervals of a symbol period of DT1 to drive the filter 82 as a symbol rate equalizer, or outputs the timing signal at intervals of half the symbol period to operate the filter 82 as a fractionally spaced equalizer. The present invention may be applied to waveform equalizers performing waveform equalization of the input signal.

    摘要翻译： 波形均衡器及其控制方法技术领域本发明涉及一种波形均衡器及其控制方法，以及一种接收设备及其控制方法，从而提供比以前更好的接收特性。 在滤波器28中，寄存器911至915延迟输入DT1; 乘法器920至925分别通过滤波器系数C20至C25对来自寄存器的输出进行乘法运算; 加法器931至935将来自乘法器的输出相加以获取DT2。 选择器81以DT1的符号周期的间隔输出定时信号，以驱动滤波器82作为符号速率均衡器，或以符号周期的一半的间隔输出定时信号，以将滤波器82作为分数间隔的均衡器进行操作。 本发明可以应用于执行输入信号的波形均衡的波形均衡器。

    Process for fabricating micromachine
    14.
    发明授权
    Process for fabricating micromachine 有权
    微机械制造工艺

    公开(公告)号：US08268660B2

    公开(公告)日：2012-09-18

    申请号：US10551271

    申请日：2004-04-02

    申请人： Masahiro Tada ,  Takashi Kinoshita ,  Masahiro Tanaka ,  Masanari Yamaguchi ,  Shun Mitarai ,  Koji Naniwada

    发明人： Masahiro Tada ,  Takashi Kinoshita ,  Masahiro Tanaka ,  Masanari Yamaguchi ,  Shun Mitarai ,  Koji Naniwada

    IPC分类号： H01L21/00

    CPC分类号： H03H3/0072 ,  B81B7/0012

    摘要： A method for manufacturing a micromachine is provided which can remove a sacrifice layer and can perform sealing without using a specific packaging technique. In a method for manufacturing a micromachine (1) including an oscillator (4), a step of forming a sacrifice layer around a movable portion of the oscillator (4); a step of covering a sacrifice layer with an overcoat film (8), followed by the formation of a penetrating hole (10) reaching the sacrifice layer in the overcoat layer (8); a step of performing sacrifice-layer etching for removing the sacrifice layer using the penetrating hole (10) in order to form a space around the movable portion; and a step of performing a film-formation treatment at a reduced pressure following the sacrifice-layer etching so as to seal the penetrating hole (10).

    摘要翻译： 提供了一种制造微机械的方法，其可以去除牺牲层并且可以在不使用特定包装技术的情况下进行密封。 在制造包括振荡器（4）的显微机械（1）的方法中，在振荡器（4）的可移动部分周围形成牺牲层的步骤; 用覆盖膜（8）覆盖牺牲层的步骤，然后形成到达覆盖层（8）中的牺牲层的穿透孔（10）; 使用所述贯通孔（10）进行牺牲层蚀刻去除所述牺牲层以在所述可动部分周围形成空间的步骤; 以及在牺牲层蚀刻之后在减压下进行成膜处理以密封穿透孔（10）的步骤。

    Micro electric machine system resonator, drive method thereof, manufacturing method thereof, and frequency filter
    17.
    发明申请
    Micro electric machine system resonator, drive method thereof, manufacturing method thereof, and frequency filter 审中-公开
    微电机系统谐振器，其驱动方法，其制造方法和频率滤波器

    公开(公告)号：US20070010227A1

    公开(公告)日：2007-01-11

    申请号：US10571723

    申请日：2004-09-17

    申请人： Koji Naniwada

    发明人： Koji Naniwada

    IPC分类号： H04B1/10

    CPC分类号： H03H9/462 ,  H03H3/0072 ,  H03H9/0023 ,  H03H9/02259 ,  H03H9/2463 ,  H03H2009/02511

    摘要： The phases of outputs are made different by 180° to allow unbalanced inputs to be output as balanced outputs. A MEMS resonator (101) has an input electrode (111) for inputting a signal, output electrodes (first output electrode (112), second output electrode (113)) for outputting balanced output signals from unbalanced input signals, and an oscillator facing the input electrode (111), first output electrode (112) and second output electrode (113) via a space (121), wherein the first output electrode (112) is disposed at a position having a phase different by 180° from the phase of the input electrode (111) and the second output electrode (113) is disposed at a position having the same phase as that of the input electrode (111).

    摘要翻译： 输出的相位相差180°，使不平衡输入输出为平衡输出。 MEMS谐振器（101）具有用于输入信号的输入电极（111），用于输出来自不平衡输入信号的平衡输出信号的输出电极（第一输出电极（112），第二输出电极（113））和面向 输入电极（111），第一输出电极（112）和第二输出电极（113），其中第一输出电极（112）设置在相位相差180°的位置 输入电极（111）和第二输出电极（113）设置在与输入电极（111）的相位相同的位置。

    Mems type resonator, process for fabricating the same and communication unit
    18.
    发明申请
    Mems type resonator, process for fabricating the same and communication unit 有权
    Mems型谐振器，其制造方法和通信单元

    公开(公告)号：US20060181368A1

    公开(公告)日：2006-08-17

    申请号：US10565222

    申请日：2004-07-21

    申请人： Koji Naniwada

    发明人： Koji Naniwada

    IPC分类号： H03H9/00

    CPC分类号： H03H9/02338 ,  H01G5/16 ,  H03H3/0072 ,  H03H9/2452 ,  H03H2009/02511

    摘要： A MEMS resonator and a method for manufacturing thereof are provided, in which an adsorption of a beam into a substrate in a wet process when manufacturing a MEMS is prevented and other oscillation modes, which are unnecessary, than a required oscillation mode are not mixed at the time of operation. Further, a communication apparatus including a filter that has the MEMS resonator is provided. The MEMS resonator includes a substrate in which a lower electrode is formed and a beam formed on the substrate, in which at least one support column is provided between the substrate and the beam. As a filter, the communication apparatus includes a filter of the above MEMS resonator.

    摘要翻译： 提供一种MEMS谐振器及其制造方法，其中防止在制造MEMS时在湿法中将光束吸附到衬底中，并且不需要其它不需要的振荡模式，而不是混合所需的振荡模式 操作时间。 此外，提供了包括具有MEMS谐振器的滤波器的通信装置。 MEMS谐振器包括其中形成下电极的基板和形成在基板上的梁，其中至少一个支撑柱设置在基板和梁之间。 作为滤波器，通信装置包括上述MEMS谐振器的滤波器。