公开(公告)号：US4558225A

公开(公告)日：1985-12-10

申请号：US527486

申请日：1983-08-29

Applicant: Mineo Gotou ,  Ryoichi Yoshikawa ,  Toru Tojo ,  Hirotsugu Wada

Inventor： Mineo Gotou ,  Ryoichi Yoshikawa ,  Toru Tojo ,  Hirotsugu Wada

IPC: G01B15/00 ,  H01J37/304 ,  H01L21/027 ,  H01L21/30 ,  G03F9/00

CPC classification number: H01J37/3045 ,  H01L21/30

Abstract: Disclosed is a method for measuring the position of a silicon wafer as a workpiece to be exposed. The method is suitably used in an electron beam exposure system. A wafer has a plurality of chip alignment marks which respectively designate a plurality of chip field areas, included in a dicing line area. When the wafer is contained ion a holder and is fixed in the exposure system, edge portions of the wafer are partially scanned with the electron beam to roughly measure the position of the wafer. In accordance with this wafer position data, a wafer surface portion required for detecting only the marks is defined within the dicing line area. In the mark detection with the electron beam, the electron beam irradiates only the defined wafer surface portion of the wafer surface, thereby providing highly precise measurement of the wafer position and avoiding undesirable irritation of the circuit formation area.

Abstract translation: 公开了一种用于测量作为待曝光的工件的硅晶片的位置的方法。 该方法适用于电子束曝光系统。 晶片具有分别指定在切割线区域中的多个芯片场区域的多个芯片对准标记。 当晶片被包含在保持器上并固定在曝光系统中时，晶片的边缘部分被电子束部分地扫描以粗略地测量晶片的位置。 根据该晶片位置数据，在切割线区域内限定仅检测标记所需的晶片表面部分。 在用电子束进行的标记检测中，电子束仅照射晶片表面的限定的晶片表面部分，从而提供对晶片位置的高精度测量，并避免对电路形成区域的不期望的刺激。

公开(公告)号：US07372560B2

公开(公告)日：2008-05-13

申请号：US10809409

申请日：2004-03-26

Applicant: Toru Tojo ,  Toshiyuki Watanabe ,  Ikunao Isomura ,  Akihiko Sekine

Inventor： Toru Tojo ,  Toshiyuki Watanabe ,  Ikunao Isomura ,  Akihiko Sekine

IPC: G01N21/00

CPC classification number: G01N21/956

Abstract: A pattern inspection apparatus comprises an illumination optics applying a first inspection light on a predetermined wavelength to a surface opposite to a pattern formed surface of the substrate, and a second inspection light whose wavelength is equal to the wavelength of the first inspection light to the pattern formed surface, a detector independently detecting a transmitted light from the substrate by irradiation of the first inspection light and a reflected light from the substrate by irradiation of the second inspection light, and a space separation mechanism provided in the vicinity of an optical focal plane toward the pattern formed surface, and spatially separates an irradiation area of the first and second inspection lights such that the transmitted and reflected lights from the substrate are imaged in two discrete areas separated on the optical focal plane.

Abstract translation: 图案检查装置包括将预定波长的第一检查光施加到与基板的图案形成表面相对的表面的照明光学器件以及其波长等于第一检查光的波长与图案的第二检查光 形成表面，检测器，通过照射第一检查光和通过照射第二检查光的来自基板的反射光独立地检测来自基板的透射光;以及空间分离机构，设置在光学焦平面附近，朝向 图案形成表面，并且在空间上分离第一和第二检查光的照射区域，使得来自基板的透射和反射光成像在在光学焦平面上分离的两个离散区域中。

公开(公告)号：US20070127806A1

公开(公告)日：2007-06-07

申请号：US11674025

申请日：2007-02-12

Applicant: Hideo Tsuchiya ,  Kyoji Yamashita ,  Toshiuki Watanabe ,  Ikunao Isomura ,  Toru Tojo ,  Yasushi Sanada

Inventor： Hideo Tsuchiya ,  Kyoji Yamashita ,  Toshiuki Watanabe ,  Ikunao Isomura ,  Toru Tojo ,  Yasushi Sanada

IPC: G06K9/00

CPC classification number: G06T7/0004 ,  G06T2207/30148

Abstract: A pattern inspection apparatus uses a die-to-database comparison method which compares detected pattern data obtained from an optical image of a pattern of a plate to be inspected with first reference pattern data obtained from designed pattern data in combination with a die-to-die comparison method which compares the detected pattern data with second reference pattern data obtained by detecting an area to be a basis for repetition. A computer detects presence of a plurality of repeated pattern areas from layout information contained in the designed pattern data, reads the arrangement, the number, the dimension and the repeated pitch of the repeated pattern areas, and automatically fetches an inspection area of the die-to-die comparison method.

Abstract translation: 图案检查装置使用芯片对数据库比较方法，将从被检查板的图案的光学图像获得的检测图案数据与从设计图案数据获得的第一参考图案数据结合， 芯片比较方法，其将检测到的图案数据与通过检测作为重复基础的区域获得的第二参考图案数据进行比较。 计算机从包含在设计图案数据中的布局信息中检测多个重复图案区域的存在，读取重复图案区域的布置，数量，尺寸和重复间距，并且自动取出模具数据的检查区域， 对比方法。

公开(公告)号：US07075621B2

公开(公告)日：2006-07-11

申请号：US11012257

申请日：2004-12-16

Applicant: Soichiro Mitsui ,  Toru Tojo ,  Kiminobu Akeno

Inventor： Soichiro Mitsui ,  Toru Tojo ,  Kiminobu Akeno

IPC: G03B27/42 ,  G03B27/32

CPC classification number: H01L21/681

Abstract: An alignment method for substrates includes preparing an alignment apparatus having a movement mechanism to move a target substrate in horizontal and vertical directions, a rotation mechanism to rotate the substrate in a horizontal plane, an illumination tool to irradiate the substrate, an image sensor to pick up an substrate image, an edge position sensor to sense the substrate edge positions, and a control computer, transferring the substrate from a previous stage using the moving mechanism, measuring the substrate position using the image sensor which picks up the image on a back surface of the substrate, while irradiating the substrate with the illumination tool from a sidewise direction, calculating positional shifts regarding X, Y, and θ of the mask, using the edge position sensor and control computer, correcting the positional shifts of the mask by the moving and rotation mechanisms, and transferring the substrate to a next stage.

Abstract translation: 基板的对准方法包括准备具有移动机构的移动机构以使水平和垂直方向移动目标基板的对准装置，使水平面上的基板旋转的旋转机构，照射基板的照明工具，图像传感器 衬底图像的边缘位置传感器，用于感测衬底边缘位置的边缘位置传感器，以及控制计算机，使用移动机构从前一级传送衬底，使用在后表面上拾取图像的图像传感器来测量衬底位置 在使用边缘位置传感器和控制计算机的情况下，使用边缘位置传感器和控制计算机计算关于掩模的X，Y和θ的位置偏移，通过移动来校正掩模的位置偏移，同时利用照明工具从侧向照射基板 和旋转机构，并将衬底转移到下一阶段。

公开(公告)号：US06901314B2

公开(公告)日：2005-05-31

申请号：US10397288

申请日：2003-03-27

Applicant: Soichiro Mitsui ,  Toru Tojo ,  Kiminobu Akeno

Inventor： Soichiro Mitsui ,  Toru Tojo ,  Kiminobu Akeno

IPC: G01B11/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/68 ,  G05B19/00

CPC classification number: H01L21/681

Abstract: An alignment apparatus for substrates comprises a first movement mechanism moving a substrate to be treated in a horizontal direction, a second movement mechanism moving the substrate in a vertical direction, a rotation mechanism rotating the substrate in a substrate plane, an illumination tool irradiating the substrate from a sidewise direction in a state where the substrate is held in a desired height position by the second movement mechanism, an image sensor picking up an image on a back surface of the substrate in an irradiated state, an edge position sensor sensing plural edge positions of the substrate from an image obtained by the image sensor, and a control computer obtaining a positional shift of the substrate based on the edge positions sensed by the edge position sensor and correcting a positional shift of the horizontal and rotation directions by the first movement and rotation mechanisms.

Abstract translation: 基板对准装置包括：沿水平方向移动待处理基板的第一移动机构，沿垂直方向移动基板的第二移动机构，在基板平面内旋转基板的旋转机构，照射基板的照明工具 在通过第二移动机构将基板保持在期望的高度位置的状态下的侧面方向上，以照射状态在基板的背面拾取图像的图像传感器，感测多个边缘位置的边缘位置传感器 根据由图像传感器获得的图像获得基板的位置偏移;以及控制计算机，基于由边缘位置传感器感测的边缘位置获得基板的位置偏移，并且通过第一移动来校正水平和旋转方向的位置偏移，以及 旋转机制。

公开(公告)号：US06411023B1

公开(公告)日：2002-06-25

申请号：US09496643

申请日：2000-02-03

Applicant: Katsuhito Ogura ,  Ryoichi Hirano ,  Toru Tojo

Inventor： Katsuhito Ogura ,  Ryoichi Hirano ,  Toru Tojo

IPC: H05H1900

CPC classification number: H01J37/18 ,  H01J2237/022

Abstract: A vacuum processing apparatus performs processing such-as a pattern depiction with a charged beam within a process chamber evacuated to a high vacuum by an ion pump. The vacuum processing apparatus, which makes it possible to prevent the accuracy of the charged beam pattern depiction from being deteriorated by ions and electrons leaking from the ion pump, has a conductor and a voltage applying unit. The conductor is arranged in the vicinity of the suction port of the process chamber communicating with the ion pump such that the conductor is electrically insulated from the process chamber. The voltage applying unit imparts a potential differing from that of the process chamber to the conductor. Because of the potential difference between the conductor and the process chamber, the ions and electrons leaking from the ion pump are reflected or adsorbed by the conductor so as to suppress leakage of the ions and electrons into the process chamber.

Abstract translation: 真空处理装置通过离子泵在被抽成高真空的处理室内进行诸如利用带电束的图案描绘的处理。 能够防止带电波束图形的精度被从离子泵泄漏的离子和电子劣化的真空处理装置具有导体和电压施加单元。 导体布置在与离子泵连通的处理室的吸入口附近，使得导体与处理室电绝缘。 电压施加单元将不同于处理室的电位赋予导体。 由于导体和处理室之间的潜在差异，离子泵泄漏的离子和电子被导体反射或吸收，以便抑制离子和电子向处理室的泄漏。

公开(公告)号：US06239443B1

公开(公告)日：2001-05-29

申请号：US09040286

申请日：1998-03-18

Applicant: Toru Tojo ,  Ryoichi Hirano ,  Susumu Saito ,  Hitoshi Suzuki ,  Kazuo Abe ,  Shinya Watanabe

Inventor： Toru Tojo ,  Ryoichi Hirano ,  Susumu Saito ,  Hitoshi Suzuki ,  Kazuo Abe ,  Shinya Watanabe

IPC: G01N2186

CPC classification number: G03F9/7049

Abstract: An apparatus for emitting a beam to a sample used for manufacturing a semiconductor device in order to process the sample, includes a chamber having an opening, a moving mechanism provided in the chamber, for moving the sample in X-, Y- and Z-axis directions, and a beam emitting system associated with the opening of the chamber, for emitting a beam to the sample in the chamber. The apparatus further includes an optical position detector for guiding a coherent light beam into the chamber and detecting a light beam output from the chamber. The optical position detector has light beam generating unit for generating a coherent light beam to be emitted to the sample, light-receiving unit for receiving a light beam from a surface of the sample, and converting unit for converting a signal output from the light-receiving unit into signals in the X-, Y- and Z-axis directions.

Abstract translation: 用于向用于制造半导体器件的样品发射光束以便处理样品的装置包括具有开口的腔室，设置在腔室中的移动机构，用于将样品移动到X，Y和Z轴中， 以及与室的开口相关联的光束发射系统，用于将光束发射到室中的样品。 该装置还包括光学位置检测器，用于将相干光束引导到腔室中并检测从腔室输出的光束。 光学位置检测器具有用于产生要发射到样品的相干光束的光束产生单元，用于接收来自样品表面的光束的光接收单元，以及用于转换从发光元件输出的信号的转换单元， 接收单元进入X，Y和Z轴方向的信号。

公开(公告)号：US6080990A

公开(公告)日：2000-06-27

申请号：US40391

申请日：1998-03-18

Applicant: Shinya Watanabe ,  Hitoshi Suzuki ,  Kazuo Abe ,  Susumu Saito ,  Toru Tojo ,  Ryoichi Hirano

Inventor： Shinya Watanabe ,  Hitoshi Suzuki ,  Kazuo Abe ,  Susumu Saito ,  Toru Tojo ,  Ryoichi Hirano

IPC: G01D5/38 ,  G01B11/00 ,  G01B11/03 ,  G03F9/00 ,  H01L21/027 ,  G01B11/14

CPC classification number: G03F9/7026 ,  G03F9/7049 ,  G03F9/7065 ,  G03F9/7088

Abstract: A position measuring apparatus includes a light source 1, an illumination optical system 100, a light-reception optical system 400 and a light-receiving unit 500. Illuminating beam emitted from the light source 1 is diffracted by a two-dimensional pattern on an object 10, and then enters the light-reception optical system 400. The light-receiving unit 500 receives diffracted lights consisting of a combination of a higher-order diffracted light appearing on the object side for the zero-order diffracted light in the receive diffracted lights with a zero-order diffracted light different in frequency from the higher-order diffracted light and another combination of higher-order diffracted lights different in frequency from one another and appearing on the object side for the zero-order diffracted light, thereby forming a position measuring interference measurement signal within the plane including the object. A signal processing unit is adapted to measure the position of the object 10 based on the phase of the position measuring interference measurement signal.

Abstract translation: 位置测量装置包括光源1，照明光学系统100，光接收光学系统400和光接收单元500.从光源1发射的照明光束被物体上的二维图案衍射 光接收单元500接收由接收衍射光中的零级衍射光在物体侧出现的高阶衍射光的组合构成的衍射光 具有与高次衍射光不同的零级衍射光和频率彼此不同的高阶衍射光的另一组合，并且在物体侧出现零级衍射光，从而形成位置 在包括物体的平面内测量干涉测量信号。 信号处理单元适于基于位置测量干涉测量信号的相位来测量对象10的位置。

公开(公告)号：US5912468A

公开(公告)日：1999-06-15

申请号：US841762

申请日：1997-04-28

Applicant: Ryoichi Hirano ,  Souji Koikari ,  Kazuto Matsuki ,  Shusuke Yoshitake ,  Toru Tojo

Inventor： Ryoichi Hirano ,  Souji Koikari ,  Kazuto Matsuki ,  Shusuke Yoshitake ,  Toru Tojo

IPC: G21K5/04 ,  G01Q30/00 ,  G01Q70/02 ,  G03F7/20 ,  H01J37/317 ,  H01L21/027 ,  H01J37/30

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/30455

Abstract: An object of the present invention is to provide a charged particle exposure system which can prevent the shift of an orbit of an electron beam in the vicinity of a periphery of a substrate when drawing a pattern onto the substrate, thereby making it possible to draw the pattern with high accuracy. According to the present invention, there is provided a charged particle beam exposure system comprising a holder for holding a substrate, a beam source for emitting a charged particle beam onto a surface of the substrate, beam scanning means for scanning the charged particle beam to draw a pattern on the surface of the substrate, a first electrical conductive block coming in electrical contact with a surface of a peripheral portion of the substrate, a first DC power supply unit for supplying an arbitrary voltage to the first electrical conductive block, a second electrical conductive block arranged to cover upside of the first electrical conductive block and upside of a peripheral portion along the periphery of the substrate, and to be electrically insulated from the substrate, and a second DC power supply unit for supplying the other arbitrary voltage to the second electrical conductive block.

Abstract translation: 本发明的目的是提供一种带电粒子曝光系统，其可以在将图案画到基板上时防止电子束在基板周围附近的轨道偏移，从而可以将 图案精度高。 根据本发明，提供了一种带电粒子束曝光系统，包括用于保持基板的保持器，用于将带电粒子束发射到基板的表面上的光束源;用于扫描带电粒子束以绘制的束扫描装置 衬底表面上的图案，与衬底的周边部分的表面电接触的第一导电块，用于向第一导电块提供任意电压的第一直流电源单元，第二电导体块 导电块，其布置成覆盖所述第一导电块的上侧和沿着所述衬底的周边的周边部分的上侧，并且与所述衬底电绝缘;以及第二DC电源单元，用于将所述另一任意电压提供给所述第二导电块 导电块。

公开(公告)号：US5828457A

公开(公告)日：1998-10-27

申请号：US854750

申请日：1997-05-12

Applicant: Mitsuo Tabata ,  Toru Tojo ,  Hisakazu Yoshino

Inventor： Mitsuo Tabata ,  Toru Tojo ,  Hisakazu Yoshino

IPC: G01N21/88 ,  G01N21/93 ,  G01N21/956 ,  G06T1/00 ,  G06T7/00 ,  H01L21/66 ,  G01B11/00 ,  H01L21/00

CPC classification number: G01N21/95607

Abstract: A sample detection apparatus includes a light radiation unit, having an illumination lens and an objective lens, for radiating light on a sample on which a pattern relating to fabrication of a semiconductor device is formed. A light receiving unit detects a light transmission image of the pattern on the sample on which the light has been radiated by the light radiation unit. A determination unit determines a presence/absence of a defect of the pattern obtained by the light receiving unit with reference data relating to the pattern, and a control unit controls a ratio .sigma. of a numerical aperture of the objective lens, in accordance with a type of the pattern.

Abstract translation: 样品检测装置包括具有照明透镜和物镜的光辐射单元，用于在形成有与半导体器件的制造相关的图案的样品上照射光。 光接收单元检测由光辐射单元辐射光的样品上的图案的透光图像。 确定单元使用与该图案相关的参考数据来确定由光接收单元获得的图案的缺陷的存在/不存在，并且控制单元根据类型来控制物镜的数值孔径的比率σ 的模式。