METHODS OF FORMING FINE PATTERNS IN INTEGRATED CIRCUIT DEVICES
    12.
    发明申请
    METHODS OF FORMING FINE PATTERNS IN INTEGRATED CIRCUIT DEVICES 审中-公开
    在集成电路设备中形成精细图案的方法

    公开(公告)号:US20120252185A1

    公开(公告)日:2012-10-04

    申请号:US13470773

    申请日:2012-05-14

    Abstract: A method of fabricating an integrated circuit device includes forming first and second mask structures on respective first and second regions of a feature layer. Each of the first and second mask structures includes a dual mask pattern and an etch mask pattern thereon having an etch selectivity relative to the dual mask pattern. The etch mask patterns of the first and second mask structures are etched to partially remove the etch mask pattern from the second mask structure. Spacers are formed on opposing sidewalls of the first and second mask structures. The first mask structure is selectively removed from between the spacers in the first region to define a first mask pattern including the opposing sidewall spacers with a void therebetween in the first region, and a second mask pattern including the opposing sidewall spacers with the second mask structure therebetween in the second region.

    Abstract translation: 制造集成电路器件的方法包括在特征层的相应的第一和第二区域上形成第一和第二掩模结构。 第一和第二掩模结构中的每一个包括双掩模图案和其上具有相对于双掩模图案的蚀刻选择性的蚀刻掩模图案。 蚀刻第一和第二掩模结构的蚀刻掩模图案以从第二掩模结构部分去除蚀刻掩模图案。 间隔件形成在第一和第二掩模结构的相对侧壁上。 第一掩模结构被选择性地从第一区域中的间隔物之间​​移除,以限定第一掩模图案,其包括在第一区域中具有空隙的相对的侧壁间隔物,以及包括与第二掩模结构相对的侧壁间隔物的第二掩模图案 在第二区域中。

    Guide thimble of dual tube type structure nuclear fuel assembly
    13.
    发明授权
    Guide thimble of dual tube type structure nuclear fuel assembly 有权
    双管式结构核燃料组件导向套管

    公开(公告)号:US08279995B2

    公开(公告)日:2012-10-02

    申请号:US12228567

    申请日:2008-08-13

    CPC classification number: G21C3/322 G21C3/326 G21C7/103 Y02E30/38 Y02E30/39

    Abstract: Disclosed herein is a guide thimble of a nuclear fuel assembly, which is capable of improving the cooling performance and the stability of a nuclear fuel, preventing a flow split in dual-cooling nuclear fuel rod and guide thimble sub channels for obtaining high combustion degree and high power, and minimizing a neutron absorption section in a reaction degree region. Since the guide thimble having the dual tube type structure is adopted, a flow split in the fuel rod and guide thimble sub channels can be reduced, and the degradation in performance of nuclear fuel due to increase of a neutron absorption section can be prevented. In order for compatibility with an existing control rod, a typical guide tube is used as an inner guide thimble, and an outer guide thimble is provided outside the inner guide thimble. Thus, the guide thimble has the dual tube type structure as a whole, and is coupled to the upper and lower end fittings so that it can prevent a flow unbalance due to the flow split in the fuel rod and guide thimble sub channels.

    Abstract translation: 本文公开了一种核燃料组件的导向套管,其能够改善核燃料的冷却性能和稳定性,防止双冷核燃料棒和引导套管子通道中的分流以获得高燃烧度, 高功率,并使反应程度区域中的中子吸收部分最小化。 由于采用具有双管式结构的导向套管,因此可以减少燃料棒和导向套管副通道中的流动分流,并且可以防止由于中子吸收部分的增加而引起的核燃料性能的劣化。 为了与现有的控制杆的兼容性,使用典型的导管作为内导向套管,并且外导向套管设置在内引导套管的外部。 因此,导向套管作为整体具有双管式结构,并且联接到上端和下端配件,使得其可以防止由于燃料棒和引导套管子通道中的流动分流而导致的流量不平衡。

    Methods of forming fine patterns in the fabrication of semiconductor devices
    14.
    发明授权
    Methods of forming fine patterns in the fabrication of semiconductor devices 有权
    在半导体器件的制造中形成精细图案的方法

    公开(公告)号:US08057692B2

    公开(公告)日:2011-11-15

    申请号:US12290420

    申请日:2008-10-30

    Abstract: In a method of forming a semiconductor device, a feature layer is provided on a substrate and a mask layer is provided on the feature layer. A portion of the mask layer is removed in a first region of the semiconductor device where fine features of the feature layer are to be located, the mask layer remaining in a second region of the semiconductor device where broad features of the feature layer are to be located. A mold mask pattern is provided on the feature layer in the first region and on the mask layer in the second region. A spacer layer is provided on the mold mask pattern in the first region and in the second region. An etching process is performed to etch the spacer layer so that spacers remain at sidewalls of pattern features of the mold mask pattern, and to etch the mask layer in the second region to provide mask layer patterns in the second region. The feature layer is etched using the mask layer patterns as an etch mask in the second region and using the spacers as an etch mask in the first region to provide a feature layer pattern having fine features in the first region and broad features in the second region.

    Abstract translation: 在形成半导体器件的方法中,在衬底上提供特征层,并且在特征层上设置掩模层。 掩模层的一部分在半导体器件的第一区域被去除,其中特征层的精细特征将被定位,掩模层保留在半导体器件的第二区域中,其中特征层的广泛特征将是 位于。 模具掩模图案设置在第一区域中的特征层和第二区域中的掩模层上。 间隔层设置在第一区域和第二区域中的模具掩模图案上。 执行蚀刻工艺以蚀刻间隔层,使得间隔物保留在模具掩模图案的图案特征的侧壁处,并且蚀刻第二区域中的掩模层以在第二区域中提供掩模层图案。 使用掩模层图案作为第二区域中的蚀刻掩模蚀刻特征层,并且在第一区域中使用间隔物作为蚀刻掩模来提供在第一区域中具有精细特征的特征层图案,并且在第二区域中具有广泛特征 。

    Field sequential display apparatus that reduces color breakup and method thereof
    15.
    发明授权
    Field sequential display apparatus that reduces color breakup and method thereof 有权
    减少分色的场顺序显示装置及其方法

    公开(公告)号:US07952549B2

    公开(公告)日:2011-05-31

    申请号:US11441148

    申请日:2006-05-26

    Abstract: A field sequential display apparatus and an image display method thereof are provided. A field sequential display apparatus includes: a color-coordinate conversion unit which analyses image state information of a plurality of input image signals of primary colors representing one image and converts the input image signals of primary colors into image signals of primary colors and at least one image signal of specific colors by using the image state information; a display panel displaying the converted image signals; and a light source driving unit which sequentially drives light sources corresponding to colors of the converted image signals. Accordingly, color breakup can be prevented, and image quality can be improved.

    Abstract translation: 提供场顺序显示装置及其图像显示方法。 场顺序显示装置包括:颜色坐标转换单元,分析表示一个图像的原色的多个输入图像信号的图像状态信息,并将原色的输入图像信号转换为原色的图像信号和至少一个 通过使用图像状态信息的特定颜色的图像信号; 显示转换后的图像信号的显示面板; 以及光源驱动单元,其顺序地驱动与转换的图像信号的颜色对应的光源。 因此,可以防止颜色分解,并且可以提高图像质量。

    DUAL-COOLED NUCLEAR FUEL ROD HAVING ANNULAR PLUGS AND METHOD OF MANUFACTURING THE SAME
    16.
    发明申请
    DUAL-COOLED NUCLEAR FUEL ROD HAVING ANNULAR PLUGS AND METHOD OF MANUFACTURING THE SAME 有权
    具有环形管的双冷却核燃料棒及其制造方法

    公开(公告)号:US20100266094A1

    公开(公告)日:2010-10-21

    申请号:US12559059

    申请日:2009-09-14

    CPC classification number: G21C3/02 G21C3/10 G21C21/02 Y02E30/40

    Abstract: A dual-cooled nuclear fuel rod and a method of manufacturing the same are provided. The nuclear fuel rod includes an outer cladding tube having a circular cross section, an inner cladding tube having an outer diameter smaller than an inner diameter of the outer cladding tube, and a length longer than the outer cladding tube, and located in parallel in the outer cladding tube, a pellet charged in a space between the outer and inner cladding tubes and generating energy by nuclear fission, and first and second end plugs coupling opposite ends of the outer cladding tube to stepped outer joints formed on outer circumferences of first ends thereof and coupling opposite ends of the inner cladding tube to stepped inner joints formed on inner circumferences of the first ends thereof.

    Abstract translation: 提供了双冷核燃料棒及其制造方法。 核燃料棒包括具有圆形横截面的外包层管,外包层的外径小于外包层管的内径,长度比外包层管长,并且平行于 外包层管,填充在外包层管和内包壳管之间的空间中并通过核裂变产生能量的颗粒,以及将外包层管的相对端连接到形成在其第一端的外周上的阶梯式外接头的第一和第二端塞 并且将内包层管的相对端连接到形成在其第一端的内周上的阶梯式内接头。

    Method of forming patterns for semiconductor device
    17.
    发明申请
    Method of forming patterns for semiconductor device 有权
    形成半导体器件图案的方法

    公开(公告)号:US20100221919A1

    公开(公告)日:2010-09-02

    申请号:US12653588

    申请日:2009-12-16

    Abstract: Provided is a method of forming patterns for a semiconductor device in which fine patterns and large-width patterns are formed simultaneously and adjacent to each other. In the method, a first layer is formed on a substrate so as to cover a first region and a second region which are included in the substrate. Both a blocking pattern covering a portion of the first layer in the first region and a low-density large-width pattern covering a portion of the first layer in the second region are simultaneously formed. A plurality of sacrificial mask patterns are formed on the first layer and the blocking pattern in the first region. A plurality of spacers covering exposed sidewalls of the plurality of sacrificial mask patterns are formed. The plurality of sacrificial mask patterns are removed. The first layer in the first and second regions are simultaneously etched by using the plurality of spacers and the blocking pattern as etch masks in the first region and using the low-density large-width pattern as an etch mask in the second region.

    Abstract translation: 提供一种形成半导体器件的图案的方法,其中精细图案和大幅图案同时并且彼此相邻地形成。 在该方法中,在衬底上形成第一层以覆盖包括在衬底中的第一区域和第二区域。 同时形成覆盖第一区域中的第一层的一部分的阻挡图案和覆盖第二区域中的第一层的一部分的低密度大图案。 在第一层上形成多个牺牲掩模图案,并在第一区域中形成阻挡图案。 形成覆盖多个牺牲掩模图案的暴露侧壁的多个间隔物。 去除多个牺牲掩模图案。 通过使用多个间隔物和阻挡图案作为第一区域中的蚀刻掩模并且在第二区域中使用低密度大宽度图案作为蚀刻掩模,同时蚀刻第一和第二区域中的第一层。

    Lens assembly of camera module
    18.
    发明授权
    Lens assembly of camera module 有权
    镜头组合相机模组

    公开(公告)号:US07755859B2

    公开(公告)日:2010-07-13

    申请号:US12314268

    申请日:2008-12-05

    CPC classification number: G02B7/023 G02B7/022

    Abstract: A lens assembly of a camera module mounted in a small portable device includes a body receiving at least one lens and having a hole at one side, a screw member inserted in the hole in a direction substantially parallel to an optical axis, a support boss provided at the other side of the body and including a coupling hole formed in a direction substantially parallel to the optical axis, and a guide groove formed at one side of a side surface of the support boss, a shaft coupled with the coupling hole of the support boss and guiding a movement of the body, and a guide member having one side elastically and tightly attached to the screw member and moved by rotation of the screw member, and the other side coupled with the shaft to be movable along the guide groove and moving the body along the optical axis.

    Abstract translation: 安装在小型便携式装置中的相机模块的透镜组件包括容纳至少一个透镜并在一侧具有孔的主体,沿基本上平行于光轴的方向插入孔中的螺钉构件,提供的支撑凸起 在所述主体的另一侧并且包括在基本上平行于光轴的方向上形成的联接孔,以及形成在所述支撑凸台的侧表面的一侧的引导槽,与所述支撑件的联接孔联接的轴 引导主体的运动,以及引导构件,其一侧弹性且紧密地附接到螺钉构件并通过螺杆构件的旋转而移动,另一侧与轴联接以沿着导槽移动并移动 身体沿着光轴。

    PERFORATED PLATE SUPPORT FOR DUAL-COOLED SEGMENTED FUEL ROD
    19.
    发明申请
    PERFORATED PLATE SUPPORT FOR DUAL-COOLED SEGMENTED FUEL ROD 有权
    双冷却分段燃油柱的执行板支撑

    公开(公告)号:US20100172460A1

    公开(公告)日:2010-07-08

    申请号:US12421829

    申请日:2009-04-10

    CPC classification number: G21C3/322 G21C3/3305 G21C3/3315 Y02E30/38

    Abstract: A perforated plate support supports dual-cooled fuel rods, each of which has concentric outer and inner tubes and is coupled with upper and lower end plugs at upper and lower ends thereof, and guide thimbles, each of which is used as a passage for a control rod. The perforated plate support is formed as a support plate having the shape of a flat plate, which includes internal channel holes, each of which has a diameter corresponding to an outer diameter of the inner tube, guide thimble holes, each of which has a diameter corresponding to an outer diameter of the guide thimble, and sub-channel holes around each internal channel hole. The upper or lower end of the dual-cooled fuel rod is coupled to the support plate such that the outer diameter of the inner tube is matched with the diameter of the internal channel hole.

    Abstract translation: 多孔板支撑件支撑双重冷却的燃料棒,每个燃料棒具有同心的外管和内管,并且在其上端和下端与上端和下端塞连接,导向套管每一个用作通道 控制棒。 多孔板支撑件形成为具有平板形状的支撑板,该支撑板包括内部通道孔,每个内部通道孔的直径对应于内部管的外径,导向套管孔各自具有直径 对应于导向套管的外径,以及在每个内部通道孔周围的子通道孔。 双冷却燃料棒的上端或下端与支撑板相连,使得内管的外径与内通道孔的直径相匹配。

    SEMICONDUCTOR DEVICE AND METHOD OF FORMING PATTERNS FOR THE SEMICONDUCTOR DEVICE
    20.
    发明申请
    SEMICONDUCTOR DEVICE AND METHOD OF FORMING PATTERNS FOR THE SEMICONDUCTOR DEVICE 有权
    半导体器件和形成半导体器件的图案的方法

    公开(公告)号:US20100155906A1

    公开(公告)日:2010-06-24

    申请号:US12573535

    申请日:2009-10-05

    Abstract: Provided are a method of forming patterns for a semiconductor device in which a pattern density is doubled by performing double patterning in a part of a device region while patterns having different widths are being simultaneously formed, and a semiconductor device having a structure to which the method is easily applicable. The semiconductor device includes a plurality of line patterns extending parallel to each other in a first direction. A plurality of first line patterns are alternately selected in a second direction from among the plurality of line patterns and each have a first end existing near the first side. A plurality of second line patterns are alternately selected in the second direction from among the plurality of line patterns and each having a second end existing near the first side. The first line patterns alternate with the second line patterns and the first end of each first line pattern is farther from the first side than the second end of each second line pattern.

    Abstract translation: 提供了一种通过在同时形成具有不同宽度的图案的同时在器件区域的一部分中进行双重图案化来形成图案密度加倍的半导体器件的图案的方法,以及具有该方法的结构的半导体器件 很容易适用。 半导体器件包括在第一方向上彼此平行延伸的多条线图案。 多个第一线图案在多个线条图案之间沿第二方向交替选择,并且每个第一线图案具有靠近第一侧的第一端。 在多个线图案之间沿第二方向交替地选择多个第二线图案,并且每个具有在第一侧附近存在的第二端。 第一线图案与第二线图案交替,并且每个第一线图案的第一端距离每第二线图案的第二端更远离第一侧。

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