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    X-ray imaging in cross-section using un-cut lamella with background material
    11.
    发明授权
    X-ray imaging in cross-section using un-cut lamella with background material 有权

    公开(公告)号：US11501951B1

    公开(公告)日：2022-11-15

    申请号：US17320526

    申请日：2021-05-14

    Applicant: Applied Materials Israel Ltd.

    Inventor： Yehuda Zur ,  Alon Litman

    IPC: H01J37/244 ,  H01J37/22 ,  G01N23/2252 ,  G01N23/2202

    Abstract: A method of performing x-ray spectroscopy material analysis of a region of interest within a cross-section of a sample using an evaluation system that includes a focused ion beam (FIB) column, a scanning electron microscope (SEM) column, and an x-ray detector, including: forming a lamella having first and second opposing side surfaces in the sample by milling, with the FIB column, first and second trenches in the sample to expose the first and second sides surface of the lamella, respectively; depositing background material in the second trench, wherein the background material is selected such that the background material does not include any chemical elements that are expected to be within the region of interest of the sample; generating a charged particle beam with the SEM column and scanning the charged particle beam across a region of interest on the first side surface of the lamella such that the charged particle beam collides with the first side surface of the lamella at a non-vertical angle; and detecting x-rays generated while the region of interest is scanned by the charged particle beam.

    Filling empty structures with deposition under high-energy SEM for uniform DE layering
    13.
    发明授权
    Filling empty structures with deposition under high-energy SEM for uniform DE layering 有权

    公开(公告)号：US10903044B1

    公开(公告)日：2021-01-26

    申请号：US16789348

    申请日：2020-02-12

    Applicant: APPLIED MATERIALS ISRAEL LTD.

    Inventor： Alon Litman ,  Konstantin Chirko ,  Yehuda Zur

    IPC: H01J37/28 ,  H01L27/108 ,  H01L27/11556 ,  H01L27/11582

    Abstract: A method of evaluating a region of a sample that includes an array of holes separated by solid portions. The method includes positioning the sample within in a vacuum chamber of an evaluation tool that includes a scanning electron microscope (SEM) column and a focused ion beam (FIB); injecting a deposition gas onto the sample; scanning, with a first charged particle beam, a portion of the sample that includes a plurality of holes in the array of holes to locally deposit material within the plurality of holes in the scanned portion from the deposition gas; and milling, with the FIB column, the portion of the sample that includes the plurality of holes in which the material was locally deposited.

    Imaging bottom of high aspect ratio holes
    15.
    发明授权
    Imaging bottom of high aspect ratio holes 有权

    公开(公告)号：US09632044B1

    公开(公告)日：2017-04-25

    申请号：US15059063

    申请日：2016-03-02

    Applicant: APPLIED MATERIALS ISRAEL LTD.

    Inventor： Alon Litman ,  Konstantin Chirko

    IPC: G01N23/225 ,  H01L21/67 ,  H01L21/66

    CPC classification number: G01N23/2251 ,  G01N2223/6116 ,  H01L22/12

    Abstract: A method that includes performing multiple test iterations to provide multiple test results; and processing the multiple test results to provide estimates of a conductivity of each of the multiple bottoms segments. The multiple test iterations includes repeating, for each bottom segment of the multiple bottom segments, the steps of: (a) illuminating the bottom segment by a charging electron beam; wherein electrons emitted from the bottom segment due to the illuminating are prevented from exiting the hole; (b) irradiating, by a probing electron beam, an area of an upper surface of the dielectric medium; (c) collecting electrons emitted from the area of the upper surface as a result of the irradiation of the area by the probing electron beam to provide collected electrons; and (d) determining an energy of at least one of the collected electrons to provide a test result.

    SYSTEM AND METHOD FOR SCANNING AN OBJECT WITH AN ELECTRON BEAM
    16.
    发明申请
    SYSTEM AND METHOD FOR SCANNING AN OBJECT WITH AN ELECTRON BEAM 审中-公开
    用电子束扫描对象的系统和方法

    公开(公告)号：US20170011883A1

    公开(公告)日：2017-01-12

    申请号：US14795793

    申请日：2015-07-09

    Applicant: Applied Materials Israel, Ltd.

    Inventor： Uri Lev ,  Alon Litman ,  Zvi Nir ,  Arnon Mizrahy

    IPC: H01J37/28 ,  H01J37/20

    Abstract: A method and a charged particle beam system that includes charged particle beam optics and a movable stage; wherein the movable stage is configured to introduce a movement between the object and charged particle beam optics; wherein the movement is of a constant velocity and along a first direction; wherein the charged particle beam optics is configured to scan, by the charged particle beam, multiple areas of the object so that each point of the multiple areas is scanned multiple times; wherein the multiple areas partially overlap; wherein the scanning is executed by the charged particle beam optics; wherein the scanning comprises performing counter-movement deflections of the charged particle beam for at least partially compensating for the movement; and wherein each area of the multiple areas is scanned by following an area scan scheme that defines multiple scan lines that differ from each other.

    Abstract translation: 一种包括带电粒子束光学器件和可动载物台的方法和带电粒子束系统; 其中所述可移动台被配置为引入所述物体和带电粒子束光学器件之间的运动; 其中所述运动具有恒定的速度并沿着第一方向; 其中所述带电粒子束光学器件被配置为通过所述带电粒子束来扫描所述物体的多个区域，使得所述多个区域中的每个点被多次扫描; 其中所述多个区域部分重叠; 其中扫描由带电粒子束光学器件执行; 其中所述扫描包括执行所述带电粒子束的反向偏移以至少部分补偿所述运动; 并且其中通过遵循定义多个彼此不同的扫描线的区域扫描方案来扫描多个区域中的每个区域。

    SYSTEM AND METHOD FOR INSPECTING A SAMPLE USING LANDING LENS
    17.
    发明申请
    SYSTEM AND METHOD FOR INSPECTING A SAMPLE USING LANDING LENS 有权
    使用着陆镜检查样品的系统和方法

    公开(公告)号：US20140231632A1

    公开(公告)日：2014-08-21

    申请号：US13772287

    申请日：2013-02-20

    Applicant: APPLIED MATERIALS ISRAEL, LTD.

    Inventor： Yoram Uziel ,  Alon Litman ,  Ofer Adan ,  Ron Naftali ,  Juergen Frosien

    IPC: G01J1/04

    CPC classification number: G01J1/0266 ,  G01J1/0422 ,  G01N21/8806 ,  G01N21/9501 ,  G01N21/956 ,  G02B13/001 ,  G02B21/0016 ,  G02B21/24

    Abstract: An evaluation system that includes a miniature module that comprises a miniature objective lens and a miniature supporting module; wherein the miniature supporting module is arranged, when placed on a sample, to position the miniature objective lens at working distance from the sample; wherein the miniature objective lens is arranged to gather radiation from an area of the sample when positioned at the working distance from the sample; a sensor arranged to detect radiation that is gathered by the miniature objective lens to provide detection signals indicative of the area of the sample.

    Abstract translation: 一种包括微型模块的评估系统，包括微型物镜和微型支撑模块; 其中所述微型支撑模块布置在放置在样本上以使所述微型物镜定位在距离所述样品的工作距离处; 其中所述微型物镜被布置成在距所述样品的工作距离处定位时收集来自所述样品的区域的辐射; 传感器，被布置成检测由微型物镜聚集的辐射，以提供指示样品面积的检测信号。

    X-RAY IMAGING IN CROSS-SECTION USING UN-CUT LAMELLA WITH BACKGROUND MATERIAL
    18.
    发明申请
    X-RAY IMAGING IN CROSS-SECTION USING UN-CUT LAMELLA WITH BACKGROUND MATERIAL 有权

    公开(公告)号：US20220367146A1

    公开(公告)日：2022-11-17

    申请号：US17320526

    申请日：2021-05-14

    Applicant: Applied Materials Israel Ltd.

    Inventor： Yehuda Zur ,  Alon Litman

    IPC: H01J37/244 ,  H01J37/22 ,  G01N23/2252 ,  G01N23/2202

    Abstract: A method of performing x-ray spectroscopy material analysis of a region of interest within a cross-section of a sample using an evaluation system that includes a focused ion beam (FIB) column, a scanning electron microscope (SEM) column, and an x-ray detector, including: forming a lamella having first and second opposing side surfaces in the sample by milling, with the FIB column, first and second trenches in the sample to expose the first and second sides surface of the lamella, respectively; depositing background material in the second trench, wherein the background material is selected such that the background material does not include any chemical elements that are expected to be within the region of interest of the sample; generating a charged particle beam with the SEM column and scanning the charged particle beam across a region of interest on the first side surface of the lamella such that the charged particle beam collides with the first side surface of the lamella at a non-vertical angle; and detecting x-rays generated while the region of interest is scanned by the charged particle beam.

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