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11.
公开(公告)号:US12144101B2
公开(公告)日:2024-11-12
申请号:US18373128
申请日:2023-09-26
Applicant: Applied Materials, Inc.
Inventor: Costel Biloiu , David T. Blahnik , Wai-Ming Tam , Charles T. Carlson , Frank Sinclair
Abstract: An exciter for a high frequency resonator. The exciter may include an exciter coil inner portion, extending along an exciter axis, an exciter coil loop, disposed at a distal end of the exciter coil inner portion. The exciter may also include a drive mechanism, including at least a rotation component to rotate the exciter coil loop around the exciter axis.
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公开(公告)号:US11982359B2
公开(公告)日:2024-05-14
申请号:US16936012
申请日:2020-07-22
Applicant: Applied Materials, Inc.
Inventor: Benjamin Riordon , Anantha K. Subramani , Charles T. Carlson
CPC classification number: F16K1/2042 , F16K1/2007 , F16K49/005 , H01L21/67017
Abstract: Described are isolation valves, and chamber systems incorporating and methods of using the isolation valves. In some embodiments, an isolation valve may include a valve body and a flapper assembly. The valve body may define a first fluid volume, a second fluid volume, and a seating surface. The flapper assembly may include a flapper disposed inside the valve body having a flapper surface complimentary to the seating surface. The flapper may be pivotable within the valve body to a first position such that the flapper surface may be away from the seating surface to allow fluid flow between the first fluid volume and the second fluid volume. The flapper may be pivotable within the valve body to a second position such that the flapper surface may be proximate the seating surface to form a non-contact seal to restrict fluid flow between the first fluid volume and the second fluid volume.
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公开(公告)号:US11953097B2
公开(公告)日:2024-04-09
申请号:US16936012
申请日:2020-07-22
Applicant: Applied Materials, Inc.
Inventor: Benjamin Riordon , Anantha K. Subramani , Charles T. Carlson
CPC classification number: F16K1/2042 , F16K1/2007 , F16K49/005 , H01L21/67017
Abstract: Described are isolation valves, and chamber systems incorporating and methods of using the isolation valves. In some embodiments, an isolation valve may include a valve body and a flapper assembly. The valve body may define a first fluid volume, a second fluid volume, and a seating surface. The flapper assembly may include a flapper disposed inside the valve body having a flapper surface complimentary to the seating surface. The flapper may be pivotable within the valve body to a first position such that the flapper surface may be away from the seating surface to allow fluid flow between the first fluid volume and the second fluid volume. The flapper may be pivotable within the valve body to a second position such that the flapper surface may be proximate the seating surface to form a non-contact seal to restrict fluid flow between the first fluid volume and the second fluid volume.
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公开(公告)号:US11710617B2
公开(公告)日:2023-07-25
申请号:US17378327
申请日:2021-07-16
Applicant: APPLIED Materials, Inc.
Inventor: Costel Biloiu , Michael Honan , Robert B. Vopat , David Blahnik , Charles T. Carlson , Frank Sinclair , Paul Murphy
IPC: H01J23/18 , H01J37/30 , H01J37/317
CPC classification number: H01J37/3007 , H01J23/18 , H01J37/3171 , H01J2237/0473
Abstract: Embodiments herein are directed to a resonator for an ion implanter. In some embodiments, a resonator may include a housing, and a first coil and a second coil partially disposed within the housing. Each of the first and second coils may include a first end including an opening for receiving an ion beam, and a central section extending helically about a central axis, wherein the central axis is parallel to a beamline of the ion beam, and wherein an inner side of the central section has a flattened surface.
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公开(公告)号:US11665810B2
公开(公告)日:2023-05-30
申请号:US17112576
申请日:2020-12-04
Applicant: Applied Materials, Inc.
Inventor: Frank Sinclair , Paul J. Murphy , Michael Honan , Charles T. Carlson
IPC: H05H7/18 , H01J37/317
CPC classification number: H05H7/18 , H01J37/3171
Abstract: Embodiments herein are directed to a linear accelerator assembly for an ion implanter. In some embodiments, the linear accelerator assembly may include a central support within a chamber, and a plurality of modules coupled to the central support, at least one module of the plurality of modules including an electrode having an aperture for receiving and delivering an ion beam along a beamline axis.
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公开(公告)号:US20230120769A1
公开(公告)日:2023-04-20
申请号:US17502279
申请日:2021-10-15
Applicant: Applied Materials, Inc.
Inventor: David T. Blahnik , Charles T. Carlson , Robert B. Vopat , Frank Sinclair , Paul J. Murphy , Krag R. Senior
IPC: H05H7/22
Abstract: Embodiments herein are directed to a linear accelerator assembly for an ion implanter. In some embodiments, a LINAC may include a coil resonator and a plurality of drift tubes coupled to the coil resonator by a set of flexible leads.
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公开(公告)号:US11574826B2
公开(公告)日:2023-02-07
申请号:US16922874
申请日:2020-07-07
Applicant: Applied Materials, Inc.
Inventor: Jason M. Schaller , Steve Hongkham , Charles T. Carlson , Tuan A. Nguyen , Swaminathan T. Srinivasan , Khokan Chandra Paul
IPC: H01L21/67 , H01L21/687
Abstract: Exemplary substrate processing systems may include a factory interface and a load lock coupled with the factory interface. The systems may include a transfer chamber coupled with the load lock. The transfer chamber may include a robot configured to retrieve substrates from the load lock. The systems may include a chamber system positioned adjacent and coupled with the transfer chamber. The chamber system may include a transfer region laterally accessible to the robot. The transfer region may include a plurality of substrate supports disposed about the transfer region. Each substrate support of the plurality of substrate supports may be vertically translatable. The transfer region may also include a transfer apparatus rotatable about a central axis and configured to engage substrates and transfer substrates among the plurality of substrate supports. The chamber system may also include a plurality of processing regions vertically offset and axially aligned with an associated substrate support.
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公开(公告)号:US20230005783A1
公开(公告)日:2023-01-05
申请号:US17940369
申请日:2022-09-08
Applicant: Applied Materials, Inc.
Inventor: Jason M. Schaller , Luke Bonecutter , Charles T. Carlson , Rajkumar Thanu , Karuppasamy Muthukamatchi , Jeff Hudgens , Benjamin Riordon
IPC: H01L21/687 , B65G47/90 , H01L21/67
Abstract: Exemplary substrate processing systems may include a transfer region housing defining a transfer region fluidly coupled with a plurality of processing regions. A sidewall of the transfer region housing may define a sealable access for providing and receiving substrates. The systems may include a plurality of substrate supports disposed within the transfer region. The systems may also include a transfer apparatus having a central hub including a first shaft and a second shaft counter-rotatable with the first shaft. The transfer apparatus may include an eccentric hub extending at least partially through the central hub, and which is radially offset from a central axis of the central hub. The transfer apparatus may also include an end effector coupled with the eccentric hub. The end effector may include a plurality of arms having a number of arms equal to the number of substrate supports of the plurality of substrate supports.
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公开(公告)号:US20220183137A1
公开(公告)日:2022-06-09
申请号:US17112576
申请日:2020-12-04
Applicant: Applied Materials, Inc.
Inventor: Frank Sinclair , Paul J. Murphy , Michael Honan , Charles T. Carlson
IPC: H05H7/18 , H01J37/317
Abstract: Embodiments herein are directed to a linear accelerator assembly for an ion implanter. In some embodiments, the linear accelerator assembly may include a central support within a chamber, and a plurality of modules coupled to the central support, at least one module of the plurality of modules including an electrode having an aperture for receiving and delivering an ion beam along a beamline axis.
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20.
公开(公告)号:US20220174810A1
公开(公告)日:2022-06-02
申请号:US17108747
申请日:2020-12-01
Applicant: Applied Materials, Inc.
Inventor: Costel Biloiu , Charles T. Carlson , Frank Sinclair , Paul J. Murphy , David T. Blahnik
IPC: H05H7/22 , H01J37/317
Abstract: An apparatus may include a drift tube assembly, arranged to transmit an ion beam. The drift tube assembly may include a first ground electrode; an RF drift tube assembly, disposed downstream of the first ground electrode; and a second ground electrode, disposed downstream of the RF drift tube assembly. The RF drift tube assembly may define a triple gap configuration. The apparatus may include a resonator, where the resonator comprises a toroidal coil, having a first end, connected to a first RF drift tube of the RF drift tube assembly, and a second end, connected to a second RF drift tube of the RF drift tube assembly.
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