公开(公告)号：US20220121111A1

公开(公告)日：2022-04-21

申请号：US17548944

申请日：2021-12-13

Applicant: ASML NETHERLANDS B.V.

Inventor： David Ferdinand VLES ,  Chaitanya Krishna ANDE ,  Antonius Franciscus Johannes DE GROOT ,  Adrianus Johannes Maria GIESBERS ,  Johannes Joseph JANSSEN ,  Paul JANSSEN ,  Johan Hendrik KLOOTWIJK ,  Peter Simon Antonius KNAPEN ,  Evgenia KURGANOVA ,  Marcel Peter MEIJER ,  Wouter Rogier MEIJERINK ,  Maxim Aleksandrovich NASALEVICH ,  Arnoud Willem NOTENBOOM ,  Raymond OLSMAN ,  Hrishikesh PATEL ,  Mária PÉTER ,  Gerrit VAN DEN BOSCH ,  Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN ,  Willem Joan VAN DER ZANDE ,  Pieter-Jan VAN ZWOL ,  Johannes Petrus Martinus Bernardus VERMEULEN ,  Willem-Pieter VOORTHUIJZEN ,  Hendrikus Jan WONDERGEM ,  Aleksandar Nikolov ZDRAVKOV

IPC: G03F1/64

Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.

公开(公告)号：US20210208500A1

公开(公告)日：2021-07-08

申请号：US17206649

申请日：2021-03-19

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： David Ferdinand VLES ,  Erik Achilles ABEGG ,  Aage BENDIKSEN ,  Derk Servatius Gertruda BROUNS ,  Pradeep K. GOVIL ,  Paul JANSSEN ,  Maxim Aleksandrovich NASALEVICH ,  Arnoud Willem NOTENBOOM ,  Mária PÉTER ,  Marcus Adrianus VAN DE KERKHOF ,  Willem Joan VAN DER ZANDE ,  Pieter-Jan VAN ZWOL ,  Johannes Petrus Martinus Bernardus VERMEULEN ,  Willem-Pieter VOORTHUIJZEN ,  James Norman WILEY

IPC: G03F1/64 ,  G03F1/22 ,  G03F7/20 ,  G03F1/62

Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.

公开(公告)号：US20240402621A1

公开(公告)日：2024-12-05

申请号：US18803195

申请日：2024-08-13

Applicant: ASML Netherlands B.V.

Inventor： Bas JANSEN ,  Koen Martin Willem Jan BOS ,  Johannes Petrus Martinus Bernardus VERMEULEN

IPC: G03F7/00 ,  H02N2/00 ,  H02N2/02 ,  H02N2/06

Abstract: Disclosed is a thermo-mechanical actuator comprising a piezo-electric module, the piezo-electric module comprising at least one piezo-electric element, wherein the thermo-mechanical actuator is configured to receive a thermal actuation signal for controlling a thermal behaviour of the piezo-electric module, or provide a thermal sensing signal representative of a thermal state of the piezo-electric module. The thermo-mechanical actuator is configured to receive a mechanical actuation signal for controlling a mechanical behaviour of the piezo-electric module, or provide a mechanical sensing signal representative of a mechanical state of the piezo-electric module. And wherein the thermal actuation signal is configured to create a heat flux within the piezo-electric module and wherein the mechanical actuation signal is configured to deform the piezo-electric module.

公开(公告)号：US20240402611A1

公开(公告)日：2024-12-05

申请号：US18800925

申请日：2024-08-12

Applicant: ASML Netherlands B.V.

Inventor： Sjoerd Martijn HUIBERTS ,  René Josephus Johannes VAN DER MEULEN ,  Johannes Petrus Martinus Bernardus VERMEULEN

IPC: G03F7/00 ,  G02B7/182

Abstract: Disclosed is an actuator unit for positioning an optical element including a reluctance actuator comprising a first stator part and a first mover part that are separated by a gap with respect to each other in a first direction. The first mover part is configured to move the optical element. The first stator part is configured to move the first mover part in a second direction that is different from the first direction. The first stator part comprises at least one stator pole. The first mover part comprises at least one mover pole facing the at least one stator pole. Viewed from the second direction, a width of the at least one mover pole along the second direction is smaller than a width of the at least one stator pole along the second direction.

公开(公告)号：US20240027893A1

公开(公告)日：2024-01-25

申请号：US18220799

申请日：2023-07-11

Applicant: ASML NETHERLANDS B.V.

Inventor： David Ferdinand VLES ,  Chaitanya Krishna ANDE ,  Antonius Franciscus Johannes DE GROOT ,  Adrianus Johannes Maria GIESBERS ,  Johannes Joseph JANSSEN ,  Paul JANSSEN ,  Johan Hendrik KLOOTWIJK ,  Peter Simon Antonius KNAPEN ,  Evgenia KURGANOVA ,  Marcel Peter MEIJER ,  Wouter Rogier MEIJERINK ,  Maxim Aleksandrovich NASALEVICH ,  Arnoud Willem NOTENBOOM ,  Raymond OLSMAN ,  Hrishikesh PATEL ,  Mária PÉTER ,  Gerrit VAN DEN BOSCH ,  Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN ,  Willem Joan VAN DER ZANDE ,  Pieter-Jan VAN ZWOL ,  Johannes Petrus Martinus Bernardus VERMEULEN ,  Willem-Pieter VOORTHUIJZEN ,  Hendrikus Jan WONDERGEM ,  Aleksandar Nikolov ZDRAVKOV

IPC: G03F1/64

CPC classification number: G03F1/64

Abstract: A pellicle assembly includes a pellicle frame defining a surface onto which a pellicle is, or to be, attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. A pellicle assembly for a patterning device, the pellicle assembly includes one or more actuators for moving the pellicle assembly towards and way from the patterning device.

公开(公告)号：US20210223706A1

公开(公告)日：2021-07-22

申请号：US15734882

申请日：2019-05-09

Applicant: ASML Netherlands B.V.

Inventor： Hessel Bart KOOLMEES ,  Johannes Petrus Martinus Bernardus VERMEULEN

IPC: G03F7/20 ,  H02K55/00 ,  H02K41/02 ,  H02K3/02

Abstract: The invention provides an assembly comprising a cryostat (6, 7, 8, 9) and a flat coil layer (3) of superconducting coils (2) for use with a magnetic levitation and/or acceleration motor system (1) of a lithographic apparatus. The cryostat comprises two insulation coverings (8, 9). The coil layer is arranged between the two coverings. The coverings each comprise an inner plate (10) configured to be cryocooled and an outer plate (11) parallel to the inner plate, and an insulation system with a vacuum layer (13) between the inner and outer plate. The insulation system of said covering comprises a layer of circular bodies (101), the central axes of these bodies extending perpendicular to the inner and outer plate, and is configured to provide a layer of point contacts between two layers of circular bodies or between a layer of circular bodies and the inner and/or outer plate.

公开(公告)号：US20190129299A1

公开(公告)日：2019-05-02

申请号：US16093537

申请日：2017-04-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Maxim Aleksandrovich NASALEVICH ,  Erik Achilles ABEGG ,  Nirupam BANERJEE ,  Michiel Alexander BLAUW ,  Derk Servatius Gertruda BROUNS ,  Paul JANSSEN ,  Matthias KRUIZINGA ,  Egbert LENDERINK ,  Nicolae MAXIM ,  Andrey NIKIPELOV ,  Arnoud Willem NOTENBOOM ,  Claudia PILIEGO ,  Mária PÉTER ,  Gijsber RISPENS ,  Nadja SCHUH ,  Marcus Adrianus VAN DE KERKHOF ,  Willem Joan VAN DER ZANDE ,  Pieter-Jan VAN ZWOL ,  Antonius Willem VERBURG ,  Johannes Petrus Martinus Bernardus VERMEULEN ,  David Ferdinand VLES ,  Willem-Pieter VOORTHUIJZEN ,  Aleksandar Nikolov ZDRAVICOV

IPC: G03F1/62 ,  G03F7/20 ,  G02B5/28

Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.

公开(公告)号：US20180364561A1

公开(公告)日：2018-12-20

申请号：US16062017

申请日：2016-12-02

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： David Ferdinand VLES ,  Erik Achilles ABEGG ,  Aage BENDIKSEN ,  Derk Servatius Gertruda BROUNS ,  Pradeep K. GOVIL ,  Paul JANSSEN ,  Maxim Aleksandrovich NASALEVICH ,  Arnoud Willem NOTENBOOM ,  Mária PÉTER ,  Marcus Adrianus VAN DE KERKHOF ,  Willem Joan VAN DER ZANDE ,  Pieter-Jan VAN ZWOL ,  Johannes Petrus Martinus Bernardus VERMEULEN ,  Willem-Pieter VOORTHUIJZEN ,  James Norman WILEY

IPC: G03F1/64 ,  G03F7/20 ,  G03F1/22

Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle includes at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle.

公开(公告)号：US20180308740A1

公开(公告)日：2018-10-25

申请号：US15766740

申请日：2016-09-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Satish ACHANTA ,  Tiannan GUAN ,  Raymond Wilhelmus Louis LAFARRE ,  Ilya MALAKHOVSKY ,  Bas Johannes Petrus ROSET ,  Siegfried Alexander TROMP ,  Johannes Petrus Martinus Bernardus VERMEULEN

IPC: H01L21/687 ,  G03F7/20 ,  G03F7/00

CPC classification number: H01L21/68742 ,  G03F7/0002 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70716 ,  G03F7/70725 ,  G03F7/70733 ,  G03F7/70783 ,  H01L21/683 ,  H01L21/6831 ,  H01L21/687 ,  H01L21/6875

Abstract: A substrate table to support a substrate, the substrate table including a main body, burls extending from the main body and having first upper ends that define a support surface to support the substrate, and support pins having second upper ends. The support pins are movable between a retracted position and an extended position. The support pins are arranged to support the substrate in the extended position. The support pins are arranged to be switched to a first stiffness mode and a second stiffness mode. In the first stiffness mode, the support pins have a first stiffness in a direction parallel to the support surface. In the second stiffness mode, the support pins have a second stiffness in the direction parallel to the support surface. The first stiffness is different from the second stiffness.

公开(公告)号：US20230168587A1

公开(公告)日：2023-06-01

申请号：US17920763

申请日：2021-03-19

Applicant: ASML Netherlands B.V.

Inventor： Sjoerd Martijn HUIBERTS ,  René Josephus Johannes VAN DER MEULEN ,  Johannes Petrus Martinus Bernardus VERMEULEN

IPC: G03F7/20 ,  G02B7/182

CPC classification number: G03F7/70258 ,  G03F7/70141 ,  G02B7/1828

Abstract: Disclosed is an actuator unit for positioning an optical element, comprising a first reluctance actuator comprising a first stator part and a first mover part separated by a gap in a first direction. The first mover part is constructed and arranged to be connected to the optical element and for moving the optical element. The first stator part is constructed and arranged to exert a magnetic force on the first mover part along a first line of actuation. The first mover part is movable relative to the first stator part in the first direction. The first stator part and the first mover part are constructed and arranged such that the first line of actuation is, in operational use, moving along with the first mover part in a second direction perpendicular to the first direction, for at least a predetermined movement range of the first mover part in the second direction.