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公开(公告)号：US20180239240A1
公开(公告)日：2018-08-23
申请号：US15752302
申请日：2016-08-26
Applicant: ASML NETHERLANDS B.V.
Inventor： Zomer Silvester HOUWELING , Eric Willem Felix CASIMIRI , Tamara DRUZHININA , JANSSEN Paul , Michael Alfred Josephus KUIJKEN , Martinus Hendrikus Antonius LEENDERS , Sicco OOSTERHOFF , Mária PÉTER , Willem Joan VAN DER ZANDE , Pieter-Jan VAN ZWOL , Beatrijs Louise Marie-Joseph Katrie VERBRUGGE , Johannes Petrus Martinus Bernardus VERMEULEN , David Ferdinand VLES , Willem-Pieter VOORTHUIJZEN
CPC classification number: G03F1/62 , G03F7/70983
Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; positioning the stack on a support such that the inner region of the planar substrate is exposed; and selectively removing the inner region of the planar substrate using a non-liquid etchant, such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate.
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公开(公告)号：US20240004283A1
公开(公告)日：2024-01-04
申请号：US18227833
申请日：2023-07-28
Applicant: ASML NETHERLANDS B.V.
Inventor： Maxim Aleksandrovich Nasalevich , Erik Achilles ABEGG , Nirupam BANERJEE , Michiel Alexander BLAUW , Derk Servatius Gertruda BROUNS , Paul JANSSEN , Matthias KRUIZINGA , Egbert LENDERINK , Nicolae MAXIM , Andrey NIKIPELOV , Arnoud Willem NOTENBOOM , Claudia PILIEGO , Mária PÉTER , Gijsbert RISPENS , Nadja SCHUH , Marcus Adrianus VAN DE KERKHOF , Willem Joan VAN DER ZANDE , Pieter-Jan VAN ZWOL , Antonius Willem VERBURG , Johannes Petrus Martinus Bernardus VERMEULEN , David Ferdinand VLES , Willem-Pieter VOORTHUIJZEN , Aleksandar Nikolov ZDRAVKOV
CPC classification number: G03F1/62 , G03F7/70191 , G03F7/70983 , G03F1/82 , G03F7/70916 , G03F7/70958 , G03F7/70575 , G02B5/208 , G02B5/283
Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.
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Patent Agency Ranking
公开(公告)号：US20220252974A1
公开(公告)日：2022-08-11
申请号：US17728608
申请日：2022-04-25
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： David Ferdinand VLES , Erik Achilles ABEGG , Aage BENDIKSEN , Derk Servatius Gertruda BROUNS , Pradeep K. GOVIL , Paul JANSSEN , Maxim Aleksandrovich NASALEVICH , Arnoud Willem NOTENBOOM , Mária PÉTER , Marcus Adrianus VAN DE KERKHOF , Willem Joan VAN DER ZANDE , Pieter-Jan VAN ZWOL , Johannes Petrus Martinus Bernardus VERMEULEN , Willlem-Pieter VOORTHUIJZEN , James Norman WILEY
Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.
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公开(公告)号：US20220121111A1
公开(公告)日：2022-04-21
申请号：US17548944
申请日：2021-12-13
Applicant: ASML NETHERLANDS B.V.
Inventor： David Ferdinand VLES , Chaitanya Krishna ANDE , Antonius Franciscus Johannes DE GROOT , Adrianus Johannes Maria GIESBERS , Johannes Joseph JANSSEN , Paul JANSSEN , Johan Hendrik KLOOTWIJK , Peter Simon Antonius KNAPEN , Evgenia KURGANOVA , Marcel Peter MEIJER , Wouter Rogier MEIJERINK , Maxim Aleksandrovich NASALEVICH , Arnoud Willem NOTENBOOM , Raymond OLSMAN , Hrishikesh PATEL , Mária PÉTER , Gerrit VAN DEN BOSCH , Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN , Willem Joan VAN DER ZANDE , Pieter-Jan VAN ZWOL , Johannes Petrus Martinus Bernardus VERMEULEN , Willem-Pieter VOORTHUIJZEN , Hendrikus Jan WONDERGEM , Aleksandar Nikolov ZDRAVKOV
IPC: G03F1/64
Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.
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公开(公告)号：US20210208500A1
公开(公告)日：2021-07-08
申请号：US17206649
申请日：2021-03-19
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： David Ferdinand VLES , Erik Achilles ABEGG , Aage BENDIKSEN , Derk Servatius Gertruda BROUNS , Pradeep K. GOVIL , Paul JANSSEN , Maxim Aleksandrovich NASALEVICH , Arnoud Willem NOTENBOOM , Mária PÉTER , Marcus Adrianus VAN DE KERKHOF , Willem Joan VAN DER ZANDE , Pieter-Jan VAN ZWOL , Johannes Petrus Martinus Bernardus VERMEULEN , Willem-Pieter VOORTHUIJZEN , James Norman WILEY
Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.
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公开(公告)号：US20190011828A1
公开(公告)日：2019-01-10
申请号：US16060635
申请日：2016-12-02
Applicant: ASML NETHERLANDS B.V
Inventor： Pieter-Jan VAN ZWOL , Dennis DE GRAAF , Paul JANSSEN , Mária PÉTER , Marcus Adrianus VAN DE KERKHOF , Willem Joan VAN DER ZANDE , David Ferdinand VLES , Willem-Pieter VOORTHUIJZEN
Abstract: A membrane for EUV lithography, the membrane having a thickness of no more than 200 nm and including a stack having: at least one silicon layer; and at least one silicon compound layer made of a compound of silicon and an element selected from the group consisting of boron, phosphorous, bromine.
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17.发明申请公开(公告)号：US20170205704A1
公开(公告)日：2017-07-20
申请号：US15320749
申请日：2015-07-02
Applicant: ASML Netherlands B.V.
Inventor： Andrey Alexandrovich NIKIPELOV , Vadim Yevgenyevich BANINE , Jozef Petrus Henricus BENSCHOP , Arjen BOOGAARD , Florian Didier Albin DHALLUIN , Alexey Sergeevich KUZNETSOV , Mária PÉTER , Luigi SCACCABAROZZI , Willem Joan VAN DER ZANDE , Pieter-Jan VAN ZWOL , Andrei Mikhailovich YAKUNIN
CPC classification number: G03F1/62 , G02B5/1838 , G02B5/208 , G03F1/24 , G03F1/38 , G03F7/70191 , G03F7/70316 , G03F7/70575 , G03F7/70891 , G03F7/70916 , G03F7/70958 , G03F7/70983
Abstract: A membrane transmissive to EUV radiation, which may be used as a pellicle or spectral filter in a lithographic apparatus. The membrane includes one or more high doped regions wherein the membrane is doped with a dopant concentration greater than 1017 cm−3, and one or more regions with low (or no) doping. The membrane may have a main substrate having low doping and one or more additional layers, wherein the high doped regions are comprised within some or all of the additional layers.
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