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公开(公告)号：US20240310742A1
公开(公告)日：2024-09-19
申请号：US18260878
申请日：2021-12-15
Applicant: ASML Netherlands B.V.
Inventor： Vladimir KVON , Andrei Mikhailovich YAKUNIN , Marcus Adrianus VAN DE KERKHOF , Dmitry Igorevich ASTAKHOV
IPC: G03F7/00
CPC classification number: G03F7/70916 , G03F7/70716 , G03F7/70033
Abstract: A contamination reduction system for reducing contamination of a patterning system in a plasma environment, comprising: a support arranged to hold a patterning system in a radiation beam; a shutter configured to shield a portion of the radiation beam from the patterning system; and an electrode positioned between the shutter and the support, the electrode connected to a voltage source and configured to generate an electric field between the electrode and the patterning system held by the support.
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公开(公告)号：US20240274400A1
公开(公告)日：2024-08-15
申请号：US18643379
申请日：2024-04-23
Applicant: ASML Netherlands B.V.
Inventor： Marcus Adrianus VAN DE KERKHOF , Jing ZHANG , Martijn Petrus Christianus VAN HEUMEN , Patriek Adrianus Alphonsus Maria BRUURS , Erheng WANG , Vineet SHARMA , Makfir SEFA , Shao-Wei FU , Simone Maria SCOLARI , Johannes Andreas Henricus Maria JACOBS
CPC classification number: H01J37/20 , F16L11/04 , F16L11/12 , B01D19/0068 , H01J2237/2001 , H01L21/67288
Abstract: Apparatuses, systems, and methods for transferring fluid to a stage in a charged particle beam system are disclosed. In some embodiments, a stage may be configured to secure a wafer; a chamber may be configured to house the stage; and a tube may be provided within the chamber to transfer fluid between the stage and outside of the chamber. The tube may include a first tubular layer of first material, wherein the first material is a flexible polymer; and a second tubular layer of second material, wherein the second material is configured to reduce permeation of fluid or gas through the tube. In some embodiments, a system may include a degasser system outside of the chamber, where the degasser system may be configured to remove gases from the transfer fluid before the transfer fluid enters the tube.
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公开(公告)号：US20240103386A1
公开(公告)日：2024-03-28
申请号：US18376237
申请日：2023-10-03
Applicant: ASML NETHERLANDS B.V , ASML HOLDING N.V
Inventor： Derk Servatius Gertruda BROUNS , Joshua ADAMS , Aage BENDIKSEN , Richard JACOBS , Andrew JUDGE , Veera Venkata Narasimha Narendra Phani KOTTAPALLI , Joseph Harry LYONS , Theodorus Marinus MODDERMAN , Manish RANJAN , Marcus Adrianus VAN DE KERKHOF , Xugang XIONG
CPC classification number: G03F7/7085 , G03F1/62 , G03F1/64 , G03F7/70033 , G03F7/70891 , G03F7/70983
Abstract: An apparatus for determining a condition associated with a pellicle for use in a lithographic apparatus, the apparatus including a sensor, wherein the sensor is configured to measure a property associated with the pellicle, the property being indicative of the pellicle condition.
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公开(公告)号：US20230314930A1
公开(公告)日：2023-10-05
申请号：US18022476
申请日：2021-07-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Vadim Yevgenyevich BANINE , Paul Alexander VERMEULEN , Cornelis Adrianus DE MEIJERE , Johnnes Hubertus Josephina MOORS , Andrey NIKIPELOV , Guido SALMASO , Marcus Adrianus VAN DE KERKHOF , Parham YAGHOOBI
CPC classification number: G03F1/64 , G03F7/70983
Abstract: An apparatus for reducing a partially oxidized reticle and pellicle assembly, the apparatus including: a support; a hydrogen supply; and an electron source. The support is for supporting a reticle and pellicle assembly. The hydrogen supply is operable to supply hydrogen in the vicinity of a pellicle of a reticle and pellicle assembly when supported by the support. The electron source is operable to direct electrons so as to be incident on a pellicle of a reticle and pellicle assembly when supported by the support.
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公开(公告)号：US20220008963A1
公开(公告)日：2022-01-13
申请号：US17294013
申请日：2019-11-22
Applicant: ASML NETHERLANDS B.V.
Inventor： Andrey NIKIPELOV , Dmitry KURILOVICH , Fabio SBRIZZAI , Marcus Adrianus VAN DE KERKHOF , Ties Wouter VAN DER WOORD , Willem Joan VAN DER ZANDE , Jeroen VAN DUIVENBODE , David Ferdinand VLES
Abstract: A membrane cleaning apparatus for removing particles from a membrane, the apparatus including a membrane support and an electric field generating mechanism. The membrane support is for supporting the membrane. The electric field generating mechanism is for generating an electric field in the vicinity of the membrane when supported by the membrane support. The electric field generating mechanism may include: one or more collector electrodes; and a mechanism for applying a voltage across a membrane supported by the membrane support and the or each of the one or more collector electrodes.
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Patent Agency Ranking
公开(公告)号：US20160018742A1
公开(公告)日：2016-01-21
申请号：US14867606
申请日：2015-09-28
Applicant: ASML Netherlands B.V.
IPC: G03F7/20
CPC classification number: G03F7/70633 , G03F7/705
Abstract: The overlay error of a target in a scribelane is measured. The overlay error of the required feature in the chip area may differ from this due to, for example, different responses to the exposure process. A model is used to simulate these differences and thus a more accurate measurement of the overlay error of the feature determined.
Abstract translation: 测量scribelane中目标的重叠误差。 由于例如对曝光处理的不同响应，芯片区域中所需特征的覆盖误差可能与此不同。 使用模型来模拟这些差异，从而更准确地测量所确定的特征的覆盖误差。
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7.发明申请Inspection Apparatus to Detect a Target Located Within a Pattern for Lithography 有权检测位于光刻图案内的目标检测装置公开(公告)号：US20150192858A1
公开(公告)日：2015-07-09
申请号：US14664007
申请日：2015-03-20
Applicant: ASML Netherlands B.V.
Inventor： Marcus Adrianus VAN DE KERKHOF
IPC: G03F7/20 , G01N21/956 , G01N21/21
CPC classification number: G03F7/70633 , G01N21/211 , G01N21/9501 , G01N21/956 , G01N2201/06113 , G01N2201/10 , G03F7/70616
Abstract: A system detects targets located within patterns. It operates in the pupil plane by filtering the received signal from the surrounding pattern. A method includes illuminating a target and a surrounding pattern with radiation, detecting the radiation reflected by the target and the surrounding pattern and forming a first set of data based on the detected radiation, removing portions of the first set of data which correspond to the target to form reduced data, interpolating the remaining portions of the reduced data over the removed portions to form product data, and subtracting the product data from the first set of data to form target data.
Abstract translation: 系统检测位于模式内的目标。 它通过对周围图案的接收信号进行滤波而在瞳孔平面中工作。 一种方法包括用辐射照射目标和周围模式，检测由目标和周围模式反射的辐射，并基于检测到的辐射形成第一组数据，去除对应于目标的第一组数据的部分 以形成减少的数据，通过删除的部分内插减少的数据的剩余部分以形成产品数据，以及从第一组数据中减去产品数据以形成目标数据。
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8.发明申请Inspection Method and Apparatus, Lithographic Apparatus, Lithographic Processing Cell and Device Manufacturing Method 有权检验方法和装置，平版印刷设备，平版印刷加工单元和器件制造方法公开(公告)号：US20140333922A1
公开(公告)日：2014-11-13
申请号：US14335702
申请日：2014-07-18
Applicant: ASML Netherlands B.V.
Inventor： Marcus Adrianus VAN DE KERKHOF , Maurits VAN DER SCHAAR , Andreas FUCHS , Martyn John COOGANS
CPC classification number: G03F7/7065 , G01N21/47 , G01N21/4788 , G01N21/9501 , G01N21/956 , G03F7/70633 , G03F9/7049 , G03F9/7088
Abstract: The present invention makes the use of measurement of a diffraction spectrum in or near an image plane in order to determine a property of an exposed substrate. In particular, the positive and negative first diffraction orders are separated or diverged, detected and their intensity measured to determine overlay (or other properties) of exposed layers on the substrate.
Abstract translation: 本发明使用在图像平面内或附近测量衍射光谱，以便确定曝光的基底的性质。 特别地，正和负的第一衍射级被分离或发散，被检测并且测量它们的强度以确定衬底上的暴露层的覆盖层（或其它性质）。
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公开(公告)号：US20240004283A1
公开(公告)日：2024-01-04
申请号：US18227833
申请日：2023-07-28
Applicant: ASML NETHERLANDS B.V.
Inventor： Maxim Aleksandrovich Nasalevich , Erik Achilles ABEGG , Nirupam BANERJEE , Michiel Alexander BLAUW , Derk Servatius Gertruda BROUNS , Paul JANSSEN , Matthias KRUIZINGA , Egbert LENDERINK , Nicolae MAXIM , Andrey NIKIPELOV , Arnoud Willem NOTENBOOM , Claudia PILIEGO , Mária PÉTER , Gijsbert RISPENS , Nadja SCHUH , Marcus Adrianus VAN DE KERKHOF , Willem Joan VAN DER ZANDE , Pieter-Jan VAN ZWOL , Antonius Willem VERBURG , Johannes Petrus Martinus Bernardus VERMEULEN , David Ferdinand VLES , Willem-Pieter VOORTHUIJZEN , Aleksandar Nikolov ZDRAVKOV
CPC classification number: G03F1/62 , G03F7/70191 , G03F7/70983 , G03F1/82 , G03F7/70916 , G03F7/70958 , G03F7/70575 , G02B5/208 , G02B5/283
Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.
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公开(公告)号：US20230236518A1
公开(公告)日：2023-07-27
申请号：US18008283
申请日：2021-06-09
Applicant: ASML Netherlands B.V. , ASML HOLDING N.V.
Inventor： Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN , Koos VAN BERKEL , Marcus Adrianus VAN DE KERKHOF , Roger Franciscus Mattheus Maria HAMELINCK , Shahab SHERVIN , Marinus Augustinus Christiaan VERSCHUREN , Johannes Bernardus Charles ENGELEN , Matthias KRUIZINGA , Tammo UITTERDIJK , Oleksiy Sergiyovich GALAKTIONOV , Kjeld Gertrudus Hendrikus JANSSEN , Johannes Adrianus Cornelis Maria PIJNENBURG , Peter VAN DELFT
IPC: G03F7/00
CPC classification number: G03F7/70825 , G03F7/70708
Abstract: An object holder configured to support an object, the object holder comprising: a core body comprising a plurality of burls having distal ends in a support plane for supporting the object; an electrostatic sheet between the burls, the electrostatic sheet comprising an electrode sandwiched between dielectric layers; and a circumferential barrier for reducing outflow of gas escaping from space between the object and the core body.
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