公开(公告)号：US10788763B2

公开(公告)日：2020-09-29

申请号：US15354821

申请日：2016-11-17

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Jan Steven Christiaan Westerlaken ,  Ruud Hendrikus Martinus Johannes Bloks ,  Peter A. Delmastro ,  Thibault Simon Mathieu Laurent ,  Martinus Hendrikus Antonius Leenders ,  Mark Josef Schuster ,  Christopher Charles Ward ,  Frank Johannes Jacobus Van Boxtel ,  Justin Matthew Verdirame ,  Samir A. Nayfeh

IPC: G03B27/52 ,  G03F7/20

Abstract: A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.

公开(公告)号：US09977351B2

公开(公告)日：2018-05-22

申请号：US15649161

申请日：2017-07-13

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Earl William Ebert ,  Johannes Onvlee ,  Samir A. Nayfeh ,  Mark Josef Schuster ,  Peter A. Delmastro ,  Christopher Charles Ward ,  Frank Johannes Jacobus Van Boxtel ,  Abdullah Alikhan ,  Daniel Nathan Burbank ,  Daniel Nicholas Galburt ,  Justin Matthew Verdirame

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70808 ,  G03F7/70858 ,  G03F7/70866

Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.

公开(公告)号：US09766557B2

公开(公告)日：2017-09-19

申请号：US15438376

申请日：2017-02-21

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Earl William Ebert ,  Johannes Onvlee ,  Samir A. Nayfeh ,  Mark Josef Schuster ,  Peter A. Delmastro ,  Christopher Charles Ward ,  Frank Johannes Jacobus Van Boxtel ,  Abdullah Alikhan ,  Daniel Nathan Burbank ,  Daniel Nicholas Galburt ,  Justin Matthew Verdirame

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70808 ,  G03F7/70858 ,  G03F7/70866

Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.

公开(公告)号：US09513568B2

公开(公告)日：2016-12-06

申请号：US14411870

申请日：2013-06-05

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Jan Steven Christiaan Westerlaken ,  Ruud Hendrikus Martinus Johannes Bloks ,  Peter A. Delmastro ,  Thibault Simon Mathieu Laurent ,  Martinus Hendrikus Antonius Leenders ,  Mark Josef Schuster ,  Christopher Charles Ward ,  Frank Johannes Jacobus Van Boxtel ,  Justin Matthew Verdirame ,  Samir A. Nayfeh

IPC: G03B27/52 ,  G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70916 ,  G03F7/70933

Abstract: A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.

Abstract translation: 光刻设备具有构造成支撑图案形成装置的支撑结构，所述图案形成装置用于根据期望的图案对辐射束进行图案化，并具有辐射束通过的平面主表面; 出口开口，其构造成将气体流引导到图案形成装置上; 以及入口开口，被配置为提取已经离开出口的气体，其中出口开口和入口开口面向面向图案形成装置的平面主表面的面对表面。

公开(公告)号：US20150220005A1

公开(公告)日：2015-08-06

申请号：US14423082

申请日：2013-08-01

Applicant: ASML Holding N.V. ,  ASML Netherlands N.V.

Inventor： Christopher Charles Ward ,  Martinus Hendrikus Antonius Leenders ,  Mark Josef Schuster ,  Christiaan Louis Valentin

IPC: G03F7/20

CPC classification number: G03F7/70616 ,  G03F1/14 ,  G03F7/24 ,  G03F7/703 ,  G03F7/70783 ,  G03F7/7085 ,  G03F9/7026

Abstract: A system and method that bends a reticle and senses a curvature of a bent reticle in real-time. The system includes movable reticle stage, reticle vacuum clamps, sensor systems, and reticle bender. The reticle bender comprises piezo actuators. The sensor systems comprises measurement targets and corresponding sensors. The sensors are attached to the movable reticle stage and the measurement targets are attached to the reticle clamps, the reticle bender, or on reticle surfaces. The system is configured to determine a width of the reticle or distance between measurement targets at opposing ends of the reticle, measure a first rotational angle at a first end of the reticle, and measure a second local rotational angle at a second end of the reticle that is opposite to the first end. Based on the width or distance and the first and second angles, a field curvature of the reticle is determined.

Abstract translation: 弯曲掩模版并实时感测弯曲掩模版的曲率的系统和方法。 该系统包括可动标线台，光罩真空夹，传感器系统和光罩弯曲机。 光罩弯曲机包括压电致动器。 传感器系统包括测量目标和相应的传感器。 传感器连接到可动标线片台上，并且测量目标附着到标线夹，标线弯曲器或掩模版表面上。 该系统被配置为确定掩模版的宽度或掩模版的相对端处的测量目标之间的距离，测量在光罩的第一端处的第一旋转角度，并且在光罩的第二端处测量第二局部旋转角度 这与第一端相反。 基于宽度或距离以及第一和第二角度，确定掩模版的场曲率。

公开(公告)号：US09632429B2

公开(公告)日：2017-04-25

申请号：US14423082

申请日：2013-08-01

Applicant: ASML Holding N.V. ,  ASML Netherlands N.V.

Inventor： Christopher Charles Ward ,  Martinus Hendrikus Antonius Leenders ,  Mark Josef Schuster ,  Christiaan Louis Valentin

IPC: G03B27/32 ,  G03B27/62 ,  G03B27/74 ,  G03F7/20 ,  G03F1/00 ,  G03F9/00 ,  G03F7/24

CPC classification number: G03F7/70616 ,  G03F1/14 ,  G03F7/24 ,  G03F7/703 ,  G03F7/70783 ,  G03F7/7085 ,  G03F9/7026

Abstract: A system and method that bends a reticle and senses a curvature of a bent reticle in real-time. The system includes movable reticle stage, reticle vacuum clamps, sensor systems, and reticle bender. The reticle bender comprises piezo actuators. The sensor systems comprises measurement targets and corresponding sensors. The sensors are attached to the movable reticle stage and the measurement targets are attached to the reticle clamps, the reticle bender, or on reticle surfaces. The system is configured to determine a width of the reticle or distance between measurement targets at opposing ends of the reticle, measure a first rotational angle at a first end of the reticle, and measure a second local rotational angle at a second end of the reticle that is opposite to the first end. Based on the width or distance and the first and second angles, a field curvature of the reticle is determined.