公开(公告)号：US09753382B2

公开(公告)日：2017-09-05

申请号：US14397126

申请日：2013-03-19

Applicant: ASML Netherlands B.V.

Inventor： Thibault Simon Mathieu Laurent ,  Johannes Henricus Wilhelmus Jacobs ,  Haico Victor Kok ,  Yuri Johannes Gabriël Van De Vijver ,  Johannes Antonius Maria Van De Wal ,  Bastiaan Andreas Wilhelmus Hubertus Knarren ,  Robbert Jan Voogd ,  Jan Steven Christiaan Westerlaken ,  Johannes Hubertus Antonius Van De Rijdt ,  Allard Eelco Kooiker ,  Wilhelmina Margareta Jozef Hurkens-Mertens ,  Yohann Bruno Yvon Teillet

IPC: G03B27/58 ,  G03B27/74 ,  G03F7/20

CPC classification number: G03F7/7085 ,  G03F7/70341 ,  G03F7/70666 ,  G03F7/70858 ,  G03F7/70891

Abstract: A sensor for use in lithographic apparatus of an immersion type and which, in use, comes into contact with the immersion liquid is arranged so that the thermal resistance of a first heat path from a transducer of the sensor to a temperature conditioning device is less than the thermal resistance of a second heat flow path from the transducer to the immersion liquid. Thus, heat flow is preferentially towards the temperature conditioning device and not the immersion liquid so that temperature-induced disturbance in the immersion liquid is reduced or minimized.

公开(公告)号：US09170498B2

公开(公告)日：2015-10-27

申请号：US13786400

申请日：2013-03-05

Applicant: ASML Netherlands B.V.

Inventor： Marcus Adrianus Van De Kerkhof ,  Wilhelmus Petrus De Boeij ,  Hendrikus Robertus Marie Van Greevenbroek ,  Michel François Hubert Klaassen ,  Martijn Gerard Dominique Wehrens ,  Haico Victor Kok ,  Wilhelmus Jacobus Maria Rooijakkers ,  Tammo Uitterdijk

IPC: G03F7/20

CPC classification number: G03F7/70133 ,  G03F7/70566 ,  G03F7/70591 ,  G03F7/7085

Abstract: A lithographic apparatus includes an illumination system, support constructed to support patterning device, a projection system, an interferometric sensor and a detector. The interferometric sensor is designed to measure one or more wavefronts of a radiation beam projected by the projection system from an adjustable polarizer. The interferometric sensor includes a diffractive element disposed at a level of a substrate in the lithographic apparatus and a detector spaced apart from the diffractive element, the diffractive element being arranged to provide shearing interferometry between at least two wavefronts mutually displaced in a direction of shear. The detector is designed to determine, from the wavefront measurements, information on polarization affecting properties of the projection system.

Abstract translation: 光刻设备包括照明系统，构造成支撑图案形成装置的支撑，投影系统，干涉测量传感器和检测器。 干涉测量传感器被设计成测量由可调偏振器投射的投影系统投影的辐射束的一个或多个波前。 所述干涉测量传感器包括设置在所述光刻设备中的基底水平处的衍射元件和与所述衍射元件间隔开的检测器，所述衍射元件被布置成在剪切方向上相互移位的至少两个波前之间提供剪切干涉测量。 该检测器设计用于从波前测量中确定投影系统对偏振影响特性的信息。

公开(公告)号：US20150077728A1

公开(公告)日：2015-03-19

申请号：US14397126

申请日：2013-03-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Thibault Simon Mathieu Laurent ,  Johannes Henricus Wilhelmus Jacobs ,  Haico Victor Kok ,  Yuri Johannes Gabriël Van De Vijver ,  Johannes Antonius Maria Van De Wal ,  Bastiaan Andreas Wilhelmus Hubertus Knarren ,  Robbert Jan Voogd ,  Jan Steven Christiaan Westerlaken ,  Johannes Hubertus Antonius Van De Rijdt ,  Allard Eelco Kooiker ,  Wilhelmina Margareta Jozef Hurkens-Mertens ,  Yohann Bruno Yvon Teillet

IPC: G03F7/20

CPC classification number: G03F7/7085 ,  G03F7/70341 ,  G03F7/70666 ,  G03F7/70858 ,  G03F7/70891

Abstract: A sensor for use in lithographic apparatus of an immersion type and which, in use, comes into contact with the immersion liquid is arranged so that the thermal resistance of a first heat path from a transducer of the sensor to a temperature conditioning device is less than the thermal resistance of a second heat flow path from the transducer to the immersion liquid. Thus, heat flow is preferentially towards the temperature conditioning device and not the immersion liquid so that temperature-induced disturbance in the immersion liquid is reduced or minimized.

Abstract translation: 用于浸没式光刻设备的传感器，并且在使用中与浸入液体接触的布置使得从传感器的换能器到温度调节装置的第一热路的热阻小于 从换能器到浸液的第二热流路的热阻。 因此，热流优先朝向温度调节装置，而不是浸没液体，使得浸没液体中的温度引起的干扰减小或最小化。

公开(公告)号：US09891532B2

公开(公告)日：2018-02-13

申请号：US15240357

申请日：2016-08-18

Applicant: ASML Netherlands B.V.

Inventor： Haico Victor Kok

IPC: G03B27/68 ,  G03B27/52 ,  G03F7/20 ,  G03F7/00

CPC classification number: G03F7/70141 ,  G03F7/0002 ,  G03F7/70258 ,  G03F7/70308 ,  G03F7/70358 ,  G03F7/70783

Abstract: A slit shaped area of a patterning device is illuminated to impart a radiation beam with a pattern in its cross-section. A projection system projects the patterned radiation beam onto a target portion of a substrate. As the radiation beam is scanned across the target portion of the substrate, a configuration of the projection system is adjusted and applies a pattern to the target portion. The adjusting may affect a magnitude of an image magnification component of the projection system, along the length of the slit shaped area, or an image distortion in a scan direction. The adjusting is arranged to compensate an effect on pattern overlay accuracy of a distortion of the patterning device.

公开(公告)号：US20150294998A1

公开(公告)日：2015-10-15

申请号：US14439481

申请日：2013-10-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Stoyan Nihtianov ,  Haico Victor Kok ,  Martijn Gerard Dominique Wehrens

IPC: H01L27/146 ,  H01L31/0352 ,  H01L31/18 ,  H01L31/028

CPC classification number: H01L27/1464 ,  G03F7/70558 ,  G03F7/7085 ,  H01L27/14609 ,  H01L27/14643 ,  H01L27/14689 ,  H01L31/028 ,  H01L31/035281 ,  H01L31/1804

Abstract: A backside illuminated sensor comprising a supporting substrate, a semiconductor layer which comprises a photodiode comprising a region of n-doped semiconductor provided at a first surface of the semiconductor layer, and a region of p-doped semiconductor, wherein a depletion region is formed between the region of n-doped semiconductor and the region of p-doped semiconductor, and a layer of p-doping protective material provided on a second surface of the semiconductor layer, wherein the first surface of the semiconductor layer is fixed to a surface of the supporting substrate.

Abstract translation: 一种背面照明传感器，包括支撑衬底，半导体层，其包括光电二极管，所述光电二极管包括设置在所述半导体层的第一表面处的n掺杂半导体的区域，以及p掺杂半导体的区域， n掺杂半导体的区域和p掺杂半导体的区域，以及设置在半导体层的第二表面上的p掺杂保护材料层，其中半导体层的第一表面固定到 支撑衬底。