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公开(公告)号：US09219843B2
公开(公告)日：2015-12-22
申请号：US12870578
申请日：2010-08-27
CPC分类号： H04N1/32614 , H04N1/00214 , H04N1/32641 , H04N1/32678 , H04N1/32797 , H04N2201/0093
摘要： A communication terminal that includes a first communication unit that is coupled to an IP (Internet Protocol) network and conducts a facsimile transmission through the IP network; a second communication unit that is coupled to a public telephone network and conducts a facsimile transmission through the public telephone network; a control unit that, in a case that a communication error is detected when the first communication unit calls to the IP network and that the address information used for calling to the IP network is the address information corresponding to the destination which is converted from the telephone number received by a reception unit, controls the second communication to call to public telephone network by using the telephone number received by a reception unit.
摘要翻译： 一种通信终端，包括耦合到IP（因特网协议）网络并通过IP网络进行传真传输的第一通信单元; 第二通信单元，其耦合到公共电话网络并且通过公共电话网络进行传真传输; 控制单元，其在第一通信单元呼叫到IP网络时检测到通信错误的情况下，并且用于呼叫到IP网络的地址信息是与从电话机转换的目的地对应的地址信息 由接收单元接收的号码通过使用由接收单元接收的电话号码来控制对公共电话网络的第二通信。
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公开(公告)号：US09074031B2
公开(公告)日：2015-07-07
申请号：US13581560
申请日：2010-11-12
申请人： Satoshi Watanabe , Takahiro Kozuka
发明人： Satoshi Watanabe , Takahiro Kozuka
CPC分类号： C08F216/06 , C08F6/003 , C08F6/008 , C08F6/06 , C08F6/16 , C08F6/28 , C08F8/12 , C08J11/02 , C08L29/04 , C08F118/08
摘要： Provided is a method of producing a polyvinyl alcohol resin, wherein the impurities in the resin are removed efficiently with a small amount of a washing liquid. A polyvinyl alcohol obtained after a polymerization step (step S1) and a saponification step (step S2) is washed with a washing liquid consisting of methyl acetate: 1 to 40 parts by mass, methanol: 50 to 98.9 parts by mass and water: 0.1 to 10 parts by mass in a washing step (step S3). The solid matter concentration of the slurry containing the washing liquid then is 1 to 30 mass %.
摘要翻译： 提供一种生产聚乙烯醇树脂的方法，其中用少量洗涤液有效地除去树脂中的杂质。 在聚合步骤（步骤S1）和皂化步骤（步骤S2）后获得的聚乙烯醇用乙酸甲酯洗涤液洗涤1至40质量份，甲醇：50至98.9质量份，水：0.1 在洗涤步骤中为10质量份（步骤S3）。 含有洗涤液的浆料的固体成分浓度为1〜30质量％。
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公开(公告)号：US08858814B2
公开(公告)日：2014-10-14
申请号：US12732637
申请日：2010-03-26
申请人： Satoshi Watanabe , Hideo Kaneko , Ryuji Koitabashi , Shinichi Igarashi , Yoshio Kawai , Shozo Shirai
发明人： Satoshi Watanabe , Hideo Kaneko , Ryuji Koitabashi , Shinichi Igarashi , Yoshio Kawai , Shozo Shirai
摘要： A photomask blank is provided comprising a transparent substrate, a single or multi-layer film including an outermost layer composed of chromium base material, and an etching mask film. The etching mask film is a silicon oxide base material film formed of a composition comprising a hydrolytic condensate of a hydrolyzable silane, a crosslink promoter, and an organic solvent and having a thickness of 1-10 nm. The etching mask film has high resistance to chlorine dry etching, ensuring high-accuracy processing of the photomask blank.
摘要翻译： 提供一种光掩模坯料，其包括透明基板，包括由铬基材料构成的最外层的单层或多层膜和蚀刻掩模膜。 蚀刻掩模膜是由包含可水解硅烷，交联促进剂和有机溶剂的水解缩合物并且具有1-10nm厚度的组合物形成的氧化硅基底膜。 蚀刻掩模膜具有高耐氯干蚀刻性，确保光掩模坯料的高精度加工。
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公开(公告)号：US08797569B2
公开(公告)日：2014-08-05
申请号：US11513238
申请日：2006-08-31
申请人： Makoto Matsuda , Kiyotaka Ohara , Kazuma Aoki , Satoshi Watanabe
发明人： Makoto Matsuda , Kiyotaka Ohara , Kazuma Aoki , Satoshi Watanabe
IPC分类号： G06F3/12
摘要： A printing device includes a receiving system configured to receive printing data including first information, second information and provider-specifying information that specifies a provider of the second information, from an external apparatus; a printing system configured to perform printing based on the printing data received by the receiving system; an obtaining system configured to obtain printing information representing a predetermined parameter regarding printing of the second information performed by the printing system; a storing system configured to store the printing information obtained by the obtaining system and the provider-specifying information corresponding to the printing information; and a sending system configured to send the printing information and the provider-specifying information stored by the storing system to an aggregating server.
摘要翻译： 打印装置包括：接收系统，被配置为从外部设备接收包括指定第二信息的提供者的第一信息，第二信息和提供者指定信息的打印数据; 打印系统，被配置为基于由所述接收系统接收的打印数据执行打印; 获取系统，被配置为获得表示关于由所述打印系统执行的所述第二信息的打印的预定参数的打印信息; 存储系统，被配置为存储由获取系统获得的打印信息和与打印信息相对应的提供者指定信息; 以及发送系统，被配置为将存储系统存储的打印信息和提供者指定信息发送到聚合服务器。
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15.发明授权Polymer, chemically amplified positive resist composition and pattern forming process 有权聚合物，化学放大阳性抗蚀剂组合物和图案形成过程公开(公告)号：US08632939B2
公开(公告)日：2014-01-21
申请号：US13035066
申请日：2011-02-25
IPC分类号： G03F7/004 , G03F7/30 , C08F220/22 , G03F7/039
CPC分类号： G03F7/0045 , C08F20/22 , C08F212/14 , C08F220/18 , G03F7/0046 , G03F7/039 , G03F7/0397 , Y10S430/106 , Y10S430/111 , Y10S430/122 , Y10S430/123 , C08F2220/283 , C08F232/08 , C08F2220/382
摘要： A polymer comprising recurring units having a fluorinated carboxylic acid onium salt structure on a side chain is used to formulate a chemically amplified positive resist composition. When the composition is processed by lithography to form a positive pattern, the diffusion of acid in the resist film is uniform and slow, and the pattern is improved in LER.
摘要翻译： 使用包含在侧链上具有氟化羧酸鎓盐结构的重复单元的聚合物来配制化学放大的正性抗蚀剂组合物。 当通过光刻处理组合物以形成正图案时，抗蚀剂膜中的酸的扩散是均匀和缓慢的，并且图案在LER中得到改善。
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16.发明授权Negative resist composition, patterning process, and testing process and preparation process of negative resist composition 有权负性抗蚀剂组成，图案化工艺，负极抗蚀剂组成的测试工艺及制备工艺公开(公告)号：US08557509B2
公开(公告)日：2013-10-15
申请号：US12662435
申请日：2010-04-16
CPC分类号： G03F7/0382 , G03F7/0045 , G03F7/30 , G03F7/322
摘要： There is disclosed a negative resist composition comprising at least (A) a base resin that is alkaline-soluble and is made alkaline-insoluble by action of an acid, and/or a combination of a base resin that is alkaline-soluble and is made alkaline-insoluble by reaction with a crosslinker by action of an acid, with a crosslinker, (B) an acid generator, and (C) a compound containing a nitrogen as a basic component, and forming a resist film having the film thickness X (nm) of 50 to 100 nm, wherein, in the case that the resist film is formed from the negative resist composition under the film-forming conditions for the pattern formation, a dissolution rate of the resist film into the alkaline developer used in the development treatment for the pattern formation is 0.0333X−1.0 (nm/second) or more and 0.0667X−1.6 (nm/second) or less. There can be a negative resist composition having excellent etching resistance and resolution and giving a good pattern profile even at the substrate's interface, a patterning process using the same, and a testing process and a preparation process of this negative resist composition.
摘要翻译： 公开了一种负性抗蚀剂组合物，其至少包含（A）碱溶性碱性树脂，并且通过酸的作用而成为碱不溶性，和/或碱溶性碱性树脂的组合 通过与交联剂的反应，通过与交联剂的反应，（B）酸产生剂和（C）含有氮作为碱性成分的化合物，并且形成具有膜厚度X（ nm）为50〜100nm，其中，在用于图案形成的成膜条件下，由抗蚀剂组合物形成抗蚀剂膜的情况下，抗蚀剂膜在显影剂中使用的碱性显影剂的溶解速度 图案形成的处理为0.0333X-1.0（nm /秒）以上且0.0667X-1.6（nm /秒）以下。 可以存在耐蚀性和分辨率优异的负光刻胶组合物，即使在基板的界面也能得到良好的图案图案，使用该抗蚀剂组合物的图案化工艺，以及该负型抗蚀剂组合物的测试方法和制备方法。
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公开(公告)号：US08531769B2
公开(公告)日：2013-09-10
申请号：US12895001
申请日：2010-09-30
CPC分类号： G02B5/04 , G02B5/1895 , G02B27/0037
摘要： A dispersion element includes a prism having a first transmission surface and an oppositely disposed second transmission surface, and an optical element having a third transmission surface and an oppositely disposed diffraction optical surface on which a diffraction grating is arranged. The prism and the optical element are integrated into one body by cementing the first transmission surface to the third transmission surface. The third transmission surface and the diffraction optical surface are non-parallel to each other in a plane perpendicular to grooves of the diffraction grating.
摘要翻译： 色散元件包括具有第一透射面和相对设置的第二透射面的棱镜和具有第三透射面和相对设置的衍射光学表面的光学元件，衍射光栅布置在该衍射光学表面上。 棱镜和光学元件通过将第一透射表面固定到第三透射表面而被集成到一体内。 第三透射面和衍射光学面在与衍射光栅的凹槽垂直的平面中彼此不平行。
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公开(公告)号：US08434908B2
公开(公告)日：2013-05-07
申请号：US13597953
申请日：2012-08-29
申请人： Satoshi Watanabe , Keiichi Shimizu , Takeshi Osada , Keiichi Shimizu , Toshiya Tanaka , Shigeru Osawa , Takeshi Hisayasu , Hirokazu Otake , Hitoshi Kawano , Makoto Sakai
发明人： Satoshi Watanabe , Keiichi Shimizu , Takeshi Osada , Keiichi Shimizu , Toshiya Tanaka , Shigeru Osawa , Takeshi Hisayasu , Hirokazu Otake , Hitoshi Kawano , Makoto Sakai
IPC分类号： F21V29/00
CPC分类号： F21V29/004 , F21K9/20 , F21V19/001 , F21V19/006 , F21V29/67 , F21V29/73 , F21V29/74 , F21Y2115/10 , H01R33/9456 , Y10T29/49879
摘要： A lighting fixture capable of efficiently radiating heat of a lamp device may be configured to be attached to a socket device. In some examples, by attaching the lamp device to the socket device, a cap portion of the lamp device is brought into contact with a fixture body, and pressed against and brought into close contact with the fixture body by an elastic body. Heat generated by lighting of LEDs of the lamp device is conducted from the cap portion to the fixture body and efficiently radiated.
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公开(公告)号：US20130027924A1
公开(公告)日：2013-01-31
申请号：US13634648
申请日：2011-03-28
申请人： Keiichi Shimizu , Masao Hori , Koji Sato , Yuki Harada , Toshiyuki Hiraoka , Kenji Sugiyama , Masanao Hieda , Naoki Sugishita , Satoshi Watanabe , Masahiko Kamata , Katsusuke Uchino
发明人： Keiichi Shimizu , Masao Hori , Koji Sato , Yuki Harada , Toshiyuki Hiraoka , Kenji Sugiyama , Masanao Hieda , Naoki Sugishita , Satoshi Watanabe , Masahiko Kamata , Katsusuke Uchino
IPC分类号： F21S4/00
CPC分类号： F21V23/006 , F21K9/27 , F21S8/031 , F21V3/02 , F21V23/004 , F21V23/06 , F21V27/02 , F21V29/75 , F21V29/763 , F21V29/89 , F21Y2103/10 , F21Y2115/10
摘要： Both ends of a lamp body are mounted on sockets of an apparatus body and a feeding unit configured to feed power to LEDs is provided on the back side facing the apparatus body of the lamp body.
摘要翻译： 灯体的两端安装在设备主体的插座上，并且在面向灯体的设备主体的背面上设置有配置为向LED供电的供电单元。
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公开(公告)号：US08361692B2
公开(公告)日：2013-01-29
申请号：US12662763
申请日：2010-05-03
CPC分类号： G03F7/0382
摘要： There is disclosed a negative resist composition comprising (A) a base polymer which is soluble in alkali and which is insolubilized in alkali by an action of an acid; and/or a combination of a crosslinking agent and a base polymer which is soluble in alkali and which is reacted with the crosslinking agent by an action of an acid to thereby be insolubilized in alkali, (B) an acid generator, and (C) a nitrogen-containing compound as a basic component; wherein the polymer to be used as the base polymer is: a polymer, which is obtained by polymerizing two or more kinds of monomers represented by the following general formula (1), or which is obtained by polymerizing a monomer mixture containing one or more kinds of monomers represented by the general formula (1) and one or more kinds of styrene monomers represented by the following general formula (2).
摘要翻译： 公开了一种负型抗蚀剂组合物，其包含（A）可溶于碱的碱性聚合物，其通过酸的作用在碱中不溶解; 和/或交联剂和碱性聚合物的组合，其可溶于碱，并通过酸的作用与交联剂反应，从而不溶于碱，（B）酸产生剂，和（C） 作为碱性成分的含氮化合物; 其中用作基础聚合物的聚合物是：通过聚合由以下通式（1）表示的两种或更多种单体获得的聚合物，或通过使含有一种或多种的单体混合物 的由通式（1）表示的单体和一种或多种由以下通式（2）表示的苯乙烯单体。
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