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42 条记录 (耗时 0.015 秒)

    Silica glass containing TiO2 and process for its production
    12.
    发明授权
    Silica glass containing TiO2 and process for its production 有权
    含二氧化硅的硅玻璃及其生产工艺

    公开(公告)号：US07419924B2

    公开(公告)日：2008-09-02

    申请号：US11589875

    申请日：2006-10-31

    申请人： Akio Koike ,  Yasutomi Iwahashi ,  Yasuyuki Takimoto ,  Shinya Kikugawa

    发明人： Akio Koike ,  Yasutomi Iwahashi ,  Yasuyuki Takimoto ,  Shinya Kikugawa

    IPC分类号： C03C3/06 ,  C03C3/076 ,  C03C3/112 ,  C03B20/00

    CPC分类号： C03C3/06 ,  C03B19/1453 ,  C03B2201/12 ,  C03B2201/23 ,  C03B2201/42 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/42

    摘要： It is to provide a silica glass containing TiO2, having a wide temperature range wherein the coefficient of thermal expansion is substantially zero.A silica glass containing TiO2, which has a TiO2 concentration of from 3 to 10 mass %, a OH group concentration of at most 600 mass ppm and a Ti3+ concentration of at most 70 mass ppm, characterized by having a fictive temperature of at most 1,200° C., a coefficient of thermal expansion from 0 to 100° C. of 0±150 ppb/° C., and an internal transmittance T400-700 per 1 mm thickness in a wavelength range of from 400 to 700 nm of at least 80%. A process for producing a silica glass containing TiO2, which comprises porous glass body formation step, F-doping step, oxygen treatment step, densification step and vitrification step.

    摘要翻译： 提供含有TiO 2的二氧化硅玻璃，其具有宽的温度范围，其中热膨胀系数基本上为零。 含有TiO 2浓度为3〜10质量％，OH基浓度为600质量ppm以下且Ti 3 +浓度为70质量ppm以下，其特征在于具有至多1200℃的假想温度，0〜100℃的热膨胀系数为0±150ppb /℃。 并且在400至700nm的波长范围内每1mm厚度的内部透射率T 400-700 至少为80％。 一种制备含有TiO 2的二氧化硅玻璃的方法，其包括多孔玻璃体形成步骤，F掺杂步骤，氧处理步骤，致密化步骤和玻璃化步骤。

    Quartz glass substrate and process for its production
    16.
    发明授权
    Quartz glass substrate and process for its production 失效
    石英玻璃基板及其生产工艺

    公开(公告)号：US07592063B2

    公开(公告)日：2009-09-22

    申请号：US11514997

    申请日：2006-09-05

    申请人： Yoshiaki Ikuta ,  Shinya Kikugawa

    发明人： Yoshiaki Ikuta ,  Shinya Kikugawa

    IPC分类号： B32B3/00 ,  B32B17/06 ,  B32B18/00 ,  B32B3/16 ,  C03C3/112 ,  C03C3/06 ,  C03C10/16 ,  G01N23/00

    CPC分类号： C03B19/1453 ,  C03B2201/03 ,  C03B2201/12 ,  C03C3/06 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/23 ,  Y10T428/166 ,  Y10T428/249969 ,  Y10T428/252

    摘要： For a substrate having fine convexoconcave patterns on its surface, the dimensions of the convexoconcave patterns in a vertical direction of a quartz glass substrate are controlled to be uniform with extreme accuracy and over the entire substrate surface. The quartz glass substrate is made to have a fictive temperature distribution of at most 40° C. and a halogen concentration of less than 400 ppm, and the etching rate of the surface of the quartz glass substrate is made uniform, whereby the dimensions of the convexoconcave patterns in a vertical direction of the quartz glass substrate are controlled to be uniform with good accuracy and over the entire substrate surface.

    摘要翻译： 对于在其表面上具有细凹凸图案的基板，石英玻璃基板的垂直方向上的凸凹图案的尺寸被控制为以极高的精度和整个基板表面均匀。 使石英玻璃基板具有至多40℃的假想温度分布和小于400ppm的卤素浓度，并且使石英玻璃基板的表面的蚀刻速率均匀，由此， 在石英玻璃基板的垂直方向上的凸凹图案被控制为具有良好的精度和整个基板表面的均匀。

    Optical member made of synthetic quartz glass, and process for its production
    18.
    发明授权
    Optical member made of synthetic quartz glass, and process for its production 失效
    由合成石英玻璃制成的光学元件及其生产工艺

    公开(公告)号：US07784307B2

    公开(公告)日：2010-08-31

    申请号：US11540760

    申请日：2006-10-02

    申请人： Tomonori Ogawa ,  Yoshiaki Ikuta ,  Shinya Kikugawa

    发明人： Tomonori Ogawa ,  Yoshiaki Ikuta ,  Shinya Kikugawa

    IPC分类号： C03B19/00 ,  C03B19/06 ,  C03C3/04 ,  C03C3/06

    CPC分类号： C03C3/06 ,  C03C4/0071 ,  C03C4/0085 ,  C03C2201/23 ,  C03C2203/44 ,  C03C2203/54

    摘要： To reduce the change in the refractive index of an irradiated portion of synthetic quartz glass, caused by the irradiation with a high energy light emitted from a light source such as a KrF excimer laser or an ArF excimer laser. A process for producing an optical member made of synthetic quartz glass, wherein the OH group concentration of the optical member is set depending upon the energy density of the laser beam employed, to adjust the ratio R (KJ/cm.sup.2-ppb).sup.-1 of the change in the refractive index of the optical member to the cumulative irradiation energy (KJ/cm.sup.2) by the laser, to be 0.Itoreq.R.Itoreq.0.2, thereby to control the change in the refractive index of the optical member made of synthetic quartz glass by the irradiation with a laser beam to be within a predetermined range.

    摘要翻译： 为了减少由诸如KrF准分子激光器或ArF准分子激光器的光源发射的高能量光的照射引起的合成石英玻璃的照射部分的折射率的变化。 一种制造由合成石英玻璃制成的光学构件的方法，其中根据所使用的激光束的能量密度设置光学构件的OH基浓度，以调节比率R（KJ / cm 2 -Pbb ）为1，光学部件的折射率与激光的累积照射能量（KJ / cm 2）的变化为0.Itoreq.R.Itore.0.0，由此控制 通过用激光束照射由合成石英玻璃制成的光学构件的折射率的变化在预定范围内。

    Photomask substrate made of synthetic quartz glass and photomask
    19.
    发明授权
    Photomask substrate made of synthetic quartz glass and photomask 有权
    由合成石英玻璃和光掩模制成的光掩模基板

    公开(公告)号：US07491475B2

    公开(公告)日：2009-02-17

    申请号：US11478612

    申请日：2006-07-03

    申请人： Shinya Kikugawa ,  Keigo Hino ,  Hitoshi Mishiro

    发明人： Shinya Kikugawa ,  Keigo Hino ,  Hitoshi Mishiro

    IPC分类号： G03F1/00

    CPC分类号： G03F7/70966 ,  C03B19/1453 ,  C03C3/06 ,  Y02P40/57 ,  Y10T428/31616

    摘要： It is to provide a photomask substrate which has a low birefringence and with which polarized illumination can be employed or immersion exposure can be carried out.A photomask substrate made of a synthetic quartz glass to be used for production of a semiconductor employing a light source having an exposure wavelength of at most about 200 nm, which has a birefringence of at most 1 nm/6.35 mm at the exposure wavelength, and of which the amount of decrease in light transmittance is at most 1.0% as a difference in light transmittance at a wavelength of 217 nm, between before and after irradiation with Xe excimer lamp with an illuminance of 13.2 mW/cm2 for 20 minutes.

    摘要翻译： 提供一种具有低双折射率的光掩模衬底，并且可以采用偏振照明或可以进行浸没曝光。 一种由合成石英玻璃制成的光掩模基板，用于生产在曝光波长处具有至多1nm / 6.35mm的双折射的具有至多约200nm的曝光波长的光源的半导体，以及 在照射为13.2mW / cm 2的Xe准分子灯照射20分钟之前和之后，在217nm波长下的透光率差为1.0％以下。

    Optical member made of synthetic quartz glass, and process for its production
    20.
    发明申请
    Optical member made of synthetic quartz glass, and process for its production 失效
    由合成石英玻璃制成的光学元件及其生产工艺

    公开(公告)号：US20070027018A1

    公开(公告)日：2007-02-01

    申请号：US11540760

    申请日：2006-10-02

    申请人： Tomonori Ogawa ,  Yoshiaki Ikuta ,  Shinya Kikugawa

    发明人： Tomonori Ogawa ,  Yoshiaki Ikuta ,  Shinya Kikugawa

    IPC分类号： C03C3/04 ,  C03B5/26 ,  C03C15/00

    CPC分类号： C03C3/06 ,  C03C4/0071 ,  C03C4/0085 ,  C03C2201/23 ,  C03C2203/44 ,  C03C2203/54

    摘要： To reduce the change in the refractive index of an irradiated portion of synthetic quartz glass, caused by the irradiation with a high energy light emitted from a light source such as a KrF excimer laser or an ArF excimer laser. A process for producing an optical member made of synthetic quartz glass, wherein the OH group concentration of the optical member is set depending upon the energy density of the laser beam employed, to adjust the ratio R (KJ/cm2-ppb)−1 of the change in the refractive index of the optical member to the cumulative irradiation energy (KJ/cm2) by the laser, to be 0≦R≦0.2, thereby to control the change in the refractive index of the optical member made of synthetic quartz glass by the irradiation with a laser beam to be within a predetermined range.

    摘要翻译： 为了减少由诸如KrF准分子激光器或ArF准分子激光器的光源发射的高能量光的照射引起的合成石英玻璃的照射部分的折射率的变化。 一种制造由合成石英玻璃制成的光学构件的方法，其中根据所用激光束的能量密度设置光学构件的OH基浓度，以调节比例R（KJ / cm 2）/ 光学构件的折射率与激光的累积照射能量（KJ / cm 2）之间的变化的值为0以上的SUP〜-ppb）为0 <= R <= 0.2，从而通过激光束的照射来控制由合成石英玻璃制成的光学构件的折射率的变化，使其在预定范围内。