公开(公告)号：US07491475B2

公开(公告)日：2009-02-17

申请号：US11478612

申请日：2006-07-03

申请人： Shinya Kikugawa ,  Keigo Hino ,  Hitoshi Mishiro

发明人： Shinya Kikugawa ,  Keigo Hino ,  Hitoshi Mishiro

IPC分类号： G03F1/00

CPC分类号： G03F7/70966 ,  C03B19/1453 ,  C03C3/06 ,  Y02P40/57 ,  Y10T428/31616

摘要： It is to provide a photomask substrate which has a low birefringence and with which polarized illumination can be employed or immersion exposure can be carried out.A photomask substrate made of a synthetic quartz glass to be used for production of a semiconductor employing a light source having an exposure wavelength of at most about 200 nm, which has a birefringence of at most 1 nm/6.35 mm at the exposure wavelength, and of which the amount of decrease in light transmittance is at most 1.0% as a difference in light transmittance at a wavelength of 217 nm, between before and after irradiation with Xe excimer lamp with an illuminance of 13.2 mW/cm2 for 20 minutes.

摘要翻译： 提供一种具有低双折射率的光掩模衬底，并且可以采用偏振照明或可以进行浸没曝光。 一种由合成石英玻璃制成的光掩模基板，用于生产在曝光波长处具有至多1nm / 6.35mm的双折射的具有至多约200nm的曝光波长的光源的半导体，以及 在照射为13.2mW / cm 2的Xe准分子灯照射20分钟之前和之后，在217nm波长下的透光率差为1.0％以下。

公开(公告)号：US20060246363A1

公开(公告)日：2006-11-02

申请号：US11478612

申请日：2006-07-03

申请人： Shinya Kikugawa ,  Keigo Hino ,  Hitoshi Mishiro

发明人： Shinya Kikugawa ,  Keigo Hino ,  Hitoshi Mishiro

IPC分类号： B32B9/00 ,  B32B17/10 ,  B32B17/06 ,  G03F1/00

CPC分类号： G03F7/70966 ,  C03B19/1453 ,  C03C3/06 ,  Y02P40/57 ,  Y10T428/31616

摘要： It is to provide a photomask substrate which has a low birefringence and with which polarized illumination can be employed or immersion exposure can be carried out. A photomask substrate made of a synthetic quartz glass to be used for production of a semiconductor employing a light source having an exposure wavelength of at most about 200 nm, which has a birefringence of at most 1 nm/6.35 mm at the exposure wavelength, and of which the amount of decrease in light transmittance is at most 1.0% as a difference in light transmittance at a wavelength of 217 nm, between before and after irradiation with Xe excimer lamp with an illuminance of 13.2 mW/cm2 for 20 minutes.

摘要翻译： 提供一种具有低双折射率的光掩模衬底，并且可以采用偏振照明或可以进行浸没曝光。 一种由合成石英玻璃制成的光掩模基板，用于生产在曝光波长处具有至多1nm / 6.35mm的双折射的具有至多约200nm的曝光波长的光源的半导体，以及 在照射为13.2mW / cm 2的Xe准分子灯照射前后，透光率的降低量为217nm波长下的透光率差为1.0％以下， SUP> 20分钟。

公开(公告)号：US06795170B2

公开(公告)日：2004-09-21

申请号：US10299705

申请日：2002-11-20

申请人： Hitoshi Mishiro ,  Shinya Kikugawa ,  Kaname Okada ,  Takayuki Kawahara ,  Morio Terakado

发明人： Hitoshi Mishiro ,  Shinya Kikugawa ,  Kaname Okada ,  Takayuki Kawahara ,  Morio Terakado

IPC分类号： G03B2762

CPC分类号： G03F1/64 ,  G03F7/70983

摘要： A structure for attaching a pellicle to a photomask, the pellicle comprising a pellicle frame and a pellicle sheet attached to an opening portion formed in the pellicle frame, wherein at least a portion of the pellicle frame surface in contact with the photo-mask has a direct contact with the photo-mask without interposing an adhesive.

摘要翻译： 一种用于将防护薄膜组件附接到光掩模的结构，所述防护薄膜组件包括防护薄膜组件框架和附着到形成在所述防护薄膜框架中的开口部分的防护薄膜组件，其中所述防护薄膜组件框架表面中的与所述光掩模接触的部分具有 直接接触光罩而不插入胶粘剂。

公开(公告)号：US06713200B2

公开(公告)日：2004-03-30

申请号：US09795329

申请日：2001-03-01

申请人： Hiroshi Arishima ,  Shinya Kikugawa ,  Hitoshi Mishiro

发明人： Hiroshi Arishima ,  Shinya Kikugawa ,  Hitoshi Mishiro

IPC分类号： B32B900

CPC分类号： G03F1/62 ,  G03F1/64 ,  Y10T428/26 ,  Y10T428/265

摘要： A pellicle formed by bonding a pellicle membrane composed of synthesized glass on a pellicle frame by an adhesive wherein a light shielding member for shielding ultra-violet rays irradiated to the adhesive is provided at a portion where the pellicle membrane is bonded to the pellicle frame, whereby the adhesive for bonding the pellicle membrane to the pellicle frame is prevented from being deteriorated due to the irradiation of ultra-violet rays for cleaning.

摘要翻译： 在防护薄膜组件框架上通过将防护薄膜组件的防护薄膜组合物粘贴在防护薄膜组件框架上的部分上，通过粘合剂将用于遮蔽紫外线的遮光部件粘接在粘合剂上的粘合剂形成的防护薄膜组件， 由此防止了用于将防护薄膜组件粘贴到防护薄膜组件框架上的粘合剂由于紫外线的照射被清洁而劣化。

公开(公告)号：US06475575B1

公开(公告)日：2002-11-05

申请号：US09831360

申请日：2001-08-06

申请人： Yoshiaki Ikuta ,  Shinya Kikugawa ,  Hitoshi Mishiro ,  Hiroshi Arishima ,  Kaname Okada ,  Katsuhiro Matsumoto

发明人： Yoshiaki Ikuta ,  Shinya Kikugawa ,  Hitoshi Mishiro ,  Hiroshi Arishima ,  Kaname Okada ,  Katsuhiro Matsumoto

IPC分类号： A47G112

CPC分类号： G03F1/62 ,  C03B33/082 ,  C03B2201/04

摘要： It is characterized by having a pellicle sheet made of a synthetic quartz glass having an OH group concentration of at most 100 ppm and containing substantially no oxygen deficient defect. It is particularly preferred that the OH group concentration is at most 10 ppm, and the internal transmittance is at least 80%/cm at a wavelength of 157 nm.

摘要翻译： 其特征在于，具有由OH基浓度为100ppm以下且基本上不含缺氧缺陷的合成石英玻璃制成的防护薄片。 特别优选OH基浓度为10ppm以下，内部透射率为157nm以上至少80％/ cm 3。

公开(公告)号：US07629089B2

公开(公告)日：2009-12-08

申请号：US11519078

申请日：2006-09-12

申请人： Masabumi Ito ,  Hitoshi Mishiro

发明人： Masabumi Ito ,  Hitoshi Mishiro

IPC分类号： G03F1/00 ,  B32B9/00

CPC分类号： G03F1/24 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70958

摘要： A low-expansion glass substrate for a reflective mask, wherein the glass substrate is suited for a base material of a reflective mask employed in a lithographic process in semiconductor fabrication, comprises a lateral surface, a chamfered portion and a notched portion formed along an outer periphery thereof, at least one of the lateral surface, the chamfered portion and the notched portion being provided with a mirror-finished surface.

摘要翻译： 一种用于反射掩模的低膨胀玻璃基板，其中玻璃基板适用于在半导体制造中用于光刻工艺中的反射掩模的基底材料，包括侧面，倒角部分和沿着外部形成的切口部分 在其周边中，侧面，倒角部分和切口部分中的至少一个设置有镜面抛光表面。

公开(公告)号：US20080178685A1

公开(公告)日：2008-07-31

申请号：US12020974

申请日：2008-01-28

申请人： Hitoshi Mishiro ,  Atsushi Nakamura

发明人： Hitoshi Mishiro ,  Atsushi Nakamura

IPC分类号： G01N3/02 ,  G01N3/04 ,  G01B3/00

CPC分类号： G01B21/20 ,  H01L21/67253 ,  H01L21/67303 ,  H01L21/67309

摘要： A method for measuring the shape of a heating treatment jig to be held by a holding portion of a vertical heat treatment apparatus includes measuring the shape of the heat treatment jig in a state that the position of a supporting portion for supporting the heat treatment jig is set to be the same as the position of the holding portion for the heat treatment jig in the vertical heat treatment apparatus. The heat treatment jig can be used for placing a semiconductor wafer to be subjected to heat treatment.

摘要翻译： 用于测量由垂直热处理设备的保持部分保持的加热处理夹具的形状的方法包括：在用于支撑热处理夹具的支撑部分的位置为 设定为与立式热处理装置中的热处理夹具的保持部的位置相同。 热处理夹具可以用于放置要进行热处理的半导体晶片。

公开(公告)号：US20070066066A1

公开(公告)日：2007-03-22

申请号：US11522413

申请日：2006-09-18

申请人： Hiroshi Kojima ,  Hitoshi Mishiro ,  Masabumi Ito

发明人： Hiroshi Kojima ,  Hitoshi Mishiro ,  Masabumi Ito

IPC分类号： H01L21/302 ,  H01L21/461

CPC分类号： C09G1/02

摘要： To provide a polishing method for a glass substrate required to have extremely high surface smoothness and surface precision, like a glass substrate to be used for e.g. a reflective mask for extreme ultra violet lithography. A surface of a glass substrate containing SiO2 as the main component, is polished with a polishing slurry comprising colloidal silica having an average primary particle size of at most 50 nm, an acid and water, and having the pH adjusted to be within a range of from 0.5 to 4, so that the surface roughness Rms will be at most 0.15 nm as measured by an atomic force microscope.

摘要翻译： 为了提供具有非常高的表面平滑度和表面精度所需的玻璃基板的抛光方法，例如用于例如玻璃基板的玻璃基板。 用于极紫外光刻的反光罩。 以包含SiO 2作为主要成分的玻璃基板的表面用包含平均一次粒径为至多50nm的胶体二氧化硅，酸和水的抛光浆料抛光，并具有 pH调节在0.5〜4的范围内，使用原子力显微镜测定的表面粗糙度Rms为0.15nm以下。

公开(公告)号：US20070009812A1

公开(公告)日：2007-01-11

申请号：US11519078

申请日：2006-09-12

申请人： Masabumi Ito ,  Hitoshi Mishiro

发明人： Masabumi Ito ,  Hitoshi Mishiro

IPC分类号： G03F1/00

CPC分类号： G03F1/24 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70958

摘要： A low-expansion glass substrate for a reflective mask, wherein the glass substrate is suited for a base material of a reflective mask employed in a lithographic process in semiconductor fabrication, comprises a lateral surface, a chamfered portion and a notched portion formed along an outer periphery thereof, at least one of the lateral surface, the chamfered portion and the notched portion being provided with a mirror-finished surface.

摘要翻译： 一种用于反射掩模的低膨胀玻璃基板，其中玻璃基板适用于在半导体制造中用于光刻工艺中的反射掩模的基底材料，包括侧面，倒角部分和沿着外部形成的切口部分 在其周边中，侧面，倒角部分和切口部分中的至少一个设置有镜面抛光表面。

公开(公告)号：US20110189506A1

公开(公告)日：2011-08-04

申请号：US13017609

申请日：2011-01-31

申请人： Kazuo Mannami ,  Hitoshi Mishiro ,  Norihito Shida ,  Masabumi Ito ,  Hiroyuki Masuda ,  Toru Momose

发明人： Kazuo Mannami ,  Hitoshi Mishiro ,  Norihito Shida ,  Masabumi Ito ,  Hiroyuki Masuda ,  Toru Momose

IPC分类号： G11B5/82 ,  B24B1/00 ,  G11B5/73

CPC分类号： C10M169/04 ,  C10M133/00 ,  C10M2203/1025 ,  C10M2215/064 ,  C10M2215/065 ,  C10M2215/28 ,  C10N2230/04 ,  C10N2230/10 ,  C10N2230/42 ,  C10N2230/45 ,  C10N2240/10 ,  C10N2240/103 ,  C10N2240/104 ,  C10N2240/121 ,  C10N2260/14

摘要： The present invention relates to a glass substrate for a magnetic recording medium, which is a disk-shaped glass substrate for a magnetic recording medium having a circular hole at the center thereof, in which the glass substrate for a magnetic recording medium has an inner peripheral side surface, an outer peripheral side surface and both main surfaces, and the both main surfaces have parallelism of 3.2 μm or less in at least a recording and reproducing region thereof.

摘要翻译： 本发明涉及一种用于磁记录介质的玻璃基板，该玻璃基板是用于磁记录介质的圆盘形玻璃基板，该磁性记录介质在其中心具有圆形孔，其中用于磁记录介质的玻璃基板具有内周 侧表面，外周侧表面和两个主表面，并且两个主表面在至少其记录和再现区域中具有3.2μm或更小的平行度。