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11.发明授权
公开(公告)号：US5917604A
公开(公告)日：1999-06-29
申请号：US818143
申请日：1997-03-13
IPC分类号： H01L21/68 , G02B27/18 , G03F9/00 , H01L21/027 , H01L23/544 , G01B11/00
CPC分类号： G03F9/70 , H01L23/544 , H01L2223/5442 , H01L2223/54453 , H01L2924/0002
摘要： A device is described for aligning a first object provided with a first alignment mark (P) with respect to a second object provided with a second alignment mark (M), which marks have a periodical structure and are imaged onto each other. By selecting beam portions from the radiation from the first alignment mark (P) with the aid of an order diaphragm (55'), which beam portions are deflected through larger angles, the sensitivity of the device to errors can be decreased. Such a device may be used to great advantage in a lithographic apparatus.
摘要翻译： 描述了一种装置，用于使提供有第一对准标记（P）的第一物体相对于具有第二对准标记（M）的第二物体对准，该标记具有周期性结构并彼此成像。 通过借助于定子光阑（55'）从第一对准标记（P）的辐射中选择光束部分，这些光束部分通过较大的角度被偏转，可以减小器件对误差的灵敏度。 这样的器件可以在光刻设备中被用于很大的优点。
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公开(公告)号：US09550211B2
公开(公告)日：2017-01-24
申请号：US14006972
申请日：2012-04-06
申请人： Peter Dirksen , Adriaan Leeuwestein
发明人： Peter Dirksen , Adriaan Leeuwestein
CPC分类号： B06B1/02 , B06B1/0292 , B81B3/0081 , Y10T29/49005
摘要： CMUT devices are used in many applications e.g. for ultrasound imaging and pressure measurement. These devices operate by sensing a change in capacitance caused by deflection of a membrane (32) comprising one of a pair of electrodes in the device by ultrasound exposure of or pressure applied on, the membrane. The CMUT device may be susceptible to the effects of changing temperature.
摘要翻译： CMUT设备用于许多应用，例如 用于超声成像和压力测量。 这些装置通过感测由膜上通过超声暴露或施加在膜上的一对电极中的一个电极的偏转引起的电容变化而感测到的电容变化。 CMUT设备可能会受到温度变化的影响。
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公开(公告)号：US09132693B2
公开(公告)日：2015-09-15
申请号：US13062744
申请日：2009-09-08
CPC分类号： B60B1/0292 , B06B1/0292 , H02N1/006 , H02N1/08 , Y10T29/49005
摘要： The patent application discloses a capacitive micromachined ultrasound transducer, comprising a silicon substrate; a cavity; a first electrode, which is arranged between the silicon substrate and the cavity; wherein the first electrode is arranged under the cavity; a membrane, wherein the membrane is arranged above the cavity and opposite to the first electrode; a second electrode, wherein the second electrode is arranged above the cavity and opposite to the first electrode; wherein the second electrode is arranged in or close to the membrane, wherein the first electrode and the second electrode are adapted to be supplied by a voltage; and a first isolation layer, which is arranged between the first electrode and the second electrode, wherein the first isolation layer comprises a dielectric. It is also described a system for generating or detecting ultrasound waves, wherein the system comprises a transducer according to the patent application. Further, it is disclosed a method for manufacturing a transducer according to the patent application, wherein the transducer is manufactured with the help of a CMOS manufacturing process, wherein the transducer can be manufactured as a post-processing feature during a CMOS process.
摘要翻译： 该专利申请公开了一种电容式微机械超声换能器，其包括硅衬底; 一个空腔 布置在硅衬底和腔之间的第一电极; 其中所述第一电极布置在所述空腔下方; 膜，其中所述膜布置在所述腔的上方并与所述第一电极相对; 第二电极，其中所述第二电极布置在所述空腔上方并与所述第一电极相对; 其中所述第二电极布置在所述膜中或靠近所述膜，其中所述第一电极和所述第二电极适于由电压供应; 以及布置在所述第一电极和所述第二电极之间的第一隔离层，其中所述第一隔离层包括电介质。 还描述了用于产生或检测超声波的系统，其中该系统包括根据该专利申请的换能器。 此外，公开了根据专利申请的用于制造换能器的方法，其中借助于CMOS制造工艺制造所述换能器，其中所述换能器可以在CMOS工艺期间被制造为后处理特征。
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公开(公告)号：US08890076B2
公开(公告)日：2014-11-18
申请号：US13633475
申请日：2012-10-02
申请人： Peter Dirksen , Sjoerd Hesdahl
发明人： Peter Dirksen , Sjoerd Hesdahl
CPC分类号： G01J5/28 , A61B1/05 , G01J1/42 , G01J5/0225 , G01J5/024 , G01J5/20 , Y10T29/49815
摘要： The present invention relates to a bolometer (10) comprising a substrate (12), a first membrane (16) formed by removing a first sacrificial layer (14) on the substrate (12), the first membrane (16) comprising a measuring element (18) for measuring an amount of incident electromagnetic radiation (R), a second membrane (22) formed by removing a second sacrificial layer (20) on the first membrane (16), the second membrane (22) enclosing the first membrane (16), a first cavity (24) formed between the substrate (12) and the first membrane (16), and a second cavity (26) formed between the first membrane (16) and the second membrane (22). The present invention further relates to a method of manufacturing a bolometer, as well as a thermographic image sensor and medical device.
摘要翻译： 本发明涉及一种测辐射热计（10），其包括基底（12），通过去除基底（12）上的第一牺牲层（14）形成的第一膜（16），所述第一膜（16）包括测量元件 （18），用于测量入射电磁辐射（R）的量;通过去除第一膜（16）上的第二牺牲层（20）形成的第二膜（22），封闭第一膜的第二膜（22） 16），形成在基底（12）和第一膜（16）之间的第一腔（24）和形成在第一膜（16）和第二膜（22）之间的第二腔（26）。 本发明还涉及制造测辐射热计的方法，以及热成像图像传感器和医疗装置。
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公开(公告)号：US08686376B2
公开(公告)日：2014-04-01
申请号：US12999639
申请日：2009-06-23
申请人： Reinhold Wimberger-Friedl , Peter Dirksen , Marius Iosif Boamfa , Erik Martinus Hubertus Petrus Van Dijk
发明人： Reinhold Wimberger-Friedl , Peter Dirksen , Marius Iosif Boamfa , Erik Martinus Hubertus Petrus Van Dijk
IPC分类号： F21V9/16
CPC分类号： G01N21/6452 , B01L3/5027 , G02B21/0028
摘要： A system for detecting a plurality of analytes in a sample includes an aperture array and a lens array for generating and focusing a plurality of excitation sub-beams on different sub-regions of a substrate. These sub-regions can be provided with different binding sites for binding different analytes in the sample. By detecting the different luminescent responses in a detector, the presence or amount of different analytes can be determined simultaneously. Alternatively or in addition, collection of the luminescence radiation can be performed using the lens array for directly collecting the luminescence response and for guiding the collected luminescence response to corresponding apertures. The excitation sub-beams may be focused at the side of the substrate opposite of the lens array, and an immersion fluid is provided between the lens array and the substrate to increase the collection efficiency of the luminescence radiation.
摘要翻译： 用于检测样品中多个分析物的系统包括孔径阵列和用于在衬底的不同子区域上产生和聚焦多个激发子束的透镜阵列。 这些子区域可以具有不同的结合位点，用于结合样品中的不同分析物。 通过检测检测器中的不同发光响应，可以同时测定不同分析物的存在或量。 或者或另外，可以使用透镜阵列来执行发光辐射的收集，用于直接收集发光响应并且用于将所收集的发光响应引导到相应的孔。 激发子光束可以聚焦在与透镜阵列相对的一侧的基板处，并且在透镜阵列和基板之间提供浸没流体以增加发光辐射的收集效率。
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16.发明申请Sensor for Lithographic Apparatus and Method of Obtaining Measurements of Lithographic Apparatus 有权用于平版印刷设备的传感器和获得光刻设备测量的方法公开(公告)号：US20070273869A1
公开(公告)日：2007-11-29
申请号：US10582247
申请日：2004-12-09
申请人： Frits Van Hout , Josephus Van Bommel , Peter Dirksen , Mark Kroon , Casparus Juffermans , Renatus Maria Van Den Eijnden
发明人： Frits Van Hout , Josephus Van Bommel , Peter Dirksen , Mark Kroon , Casparus Juffermans , Renatus Maria Van Den Eijnden
IPC分类号： G01B9/00
CPC分类号： G03F7/70591 , G03F7/7085
摘要： A sensor arrangement may be used to measure properties, such as optical properties, of a device arranged to process substrates. The sensor arrangement includes a substrate having the following: a plurality of sensor elements provided as an integrated circuit in the substrate, for each one of the plurality of sensor elements associated electronic circuitry comprising a processing circuit connected to the sensor element and an input/output interface connected to the processing circuit, and a power supply unit configured to supply operating power only to the electronic circuitry associated with one or more of the plurality of sensor elements which are in use. The at least one sensor element and possibly the processing electronics, the input/output unit, and/or the power supply unit may be provided as one or more integrated circuits or other structures in the substrate.
摘要翻译： 可以使用传感器装置来测量布置成处理衬底的器件的性质，例如光学性质。 所述传感器装置包括具有以下基板：多个传感器元件，作为所述基板中的集成电路设置，所述多个传感器元件中的每一个相关联的电子电路包括连接到所述传感器元件的处理电路和输入/输出 接口连接到处理电路，以及电源单元，被配置为仅向与所使用的多个传感器元件中的一个或多个相关联的电子电路提供工作电力。 至少一个传感器元件以及可能的处理电子器件，输入/输出单元和/或电源单元可以被提供为衬底中的一个或多个集成电路或其他结构。
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公开(公告)号：US20070134560A1
公开(公告)日：2007-06-14
申请号：US10596598
申请日：2004-12-01
IPC分类号： G03F1/00
CPC分类号： G03F7/70291
摘要： A maskless lithography system is described having a programmable mask to allow performing several lithographic steps using the same mask. In every lithographic step, the corresponding pattern is obtained by providing a digital pattern to the programmable mask. The programmable mask includes an array of pixels which are based on the electro-wetting principle. According to this principle, every pixel has a transparent reservoir containing a first, non-polar, non-transparent fluid and a second, polar, transparent fluid which are immiscible. Applying a field to the reservoir allows to displace the fluids with respect to each other. This allows to make the pixel either transparent or non-transparent. This lithographic programmable mask allows high resolution and fast setting and refreshing. A corresponding method for performing maskless optical lithography also is described.
摘要翻译： 描述了具有可编程掩模的无掩模光刻系统，以允许使用相同的掩模执行几个光刻步骤。 在每个光刻步骤中，通过向可编程掩模提供数字图案来获得相应的图案。 可编程掩模包括基于电润湿原理的像素阵列。 根据这个原理，每个像素都有一个透明的容器，它含有不混溶的第一，非极性，不透明的流体和第二个极性透明的流体。 将场施加到储存器允许流体相对于彼此移位。 这允许使像素透明或不透明。 该光刻可编程掩模允许高分辨率和快速设置和刷新。 还描述了用于执行无掩模光学光刻的相应方法。
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公开(公告)号：US20060206851A1
公开(公告)日：2006-09-14
申请号：US10540068
申请日：2003-12-18
IPC分类号： G06F17/50
CPC分类号： G03F7/705 , G03F7/70625 , G03F7/70641
摘要： For determining best process variables (E, F, W) setting that provide optimum process window for a lithographic process for printing features having critical dimensions (CD) use is made of an overall performance characterizing parameter (Cpk) and of an analytical model, which describes CD data as a function of process parameters, like exposure dose (E) and focus (F). This allows calculating of the average value (μCD) and the variance (σCD) of the statistical CD distribution (CDd) and to determine the highest Cpk value and the associated values of process parameters, which values provide the optimum process window.
摘要翻译： 为了确定为光刻工艺提供最佳工艺窗口的最佳工艺变量（E，F，W）设置，用于打印具有关键尺寸（CD）的特征，使用总体性能特性参数（C＆gt; pk＆lt; ）和分析模型，其描述作为过程参数的函数的CD数据，如曝光剂量（E）和焦点（F）。 这允许计算统计CD分布（CDd）的平均值（muCD）和方差（sigmaCD），并确定最高的C max值和过程参数的相关值，这些值提供 最佳过程窗口。
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公开(公告)号：US07050146B2
公开(公告)日：2006-05-23
申请号：US10773461
申请日：2004-02-09
申请人： Paulus Cornelis Duineveld , Peter Dirksen , Aleksey Yurievich Kolesnychenko , Helmar Van Santen
发明人： Paulus Cornelis Duineveld , Peter Dirksen , Aleksey Yurievich Kolesnychenko , Helmar Van Santen
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： An immersion lithographic apparatus includes a voltage generator or power source that applies a potential difference to an object in contact with the immersion liquid such that bubbles and/or particles in the immersion liquid are either attracted or repelled from that object due to the electrokinetic potential of the surface of the bubble in the immersion liquid.
摘要翻译： 浸没式光刻设备包括电压发生器或电源，该电压发生器或电源对与浸入液体接触的物体施加电位差，使得浸没液体中的气泡和/或颗粒被吸引或排斥于该物体，这是由于电动势 浸泡液中的气泡表面。
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公开(公告)号：US20050174549A1
公开(公告)日：2005-08-11
申请号：US10773461
申请日：2004-02-09
IPC分类号： H01L21/027 , G03F7/20 , G03B27/52
CPC分类号： G03F7/70341
摘要： An immersion lithographic apparatus includes a voltage generator or power source that applies a potential difference to an object in contact with the immersion liquid such that bubbles and/or particles in the immersion liquid are either attracted or repelled from that object due to the electrokinetic potential of the surface of the bubble in the immersion liquid.
摘要翻译： 浸没式光刻设备包括电压发生器或电源，该电压发生器或电源对与浸入液体接触的物体施加电位差，使得浸没液体中的气泡和/或颗粒被吸引或排斥于该物体，这是由于电动势 浸泡液中的气泡表面。
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