公开(公告)号：US09097982B2

公开(公告)日：2015-08-04

申请号：US12994930

申请日：2009-05-05

申请人： Vadim Yevgenyevich Banine ,  Wilhelmus Petrus De Boeij ,  Antonius Johannes Josephus Van Dijsseldonk ,  Erik Roelof Loopstra ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels

发明人： Vadim Yevgenyevich Banine ,  Wilhelmus Petrus De Boeij ,  Antonius Johannes Josephus Van Dijsseldonk ,  Erik Roelof Loopstra ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels

IPC分类号： G03F7/20

CPC分类号： G03F7/70191 ,  G03F7/70116 ,  G03F7/70575

摘要： A radiation system is configured to generate a radiation beam. The radiation system comprising a chamber that includes a radiation source configured to generate radiation, a radiation beam emission aperture, and a radiation collector configured to collect radiation generated by the source, and to transmit the collected radiation to the radiation beam emission aperture. The radiation collector includes a spectral purity filter configured to enhance a spectral purity of the radiation to be emitted via the aperture.

摘要翻译： 辐射系统被配置为产生辐射束。 所述辐射系统包括腔室，所述室包括被配置为产生辐射的辐射源，辐射束发射孔和被配置为收集由所述源产生的辐射的辐射收集器，并且将所收集的辐射传输到所述辐射束发射孔。 辐射收集器包括光谱纯度滤光器，其配置成增强经由孔径发射的辐射的光谱纯度。

公开(公告)号：US09091944B2

公开(公告)日：2015-07-28

申请号：US13497741

申请日：2010-09-24

申请人： Erik Roelof Loopstra ,  Vadim Yevgenyevich Banine ,  Gerardus Hubertus Petrus Maria Swinkels ,  Sven Pekelder ,  Dzmitry Labetski ,  Uwe Bruno Heini Stamm ,  William N. Partlo

发明人： Erik Roelof Loopstra ,  Vadim Yevgenyevich Banine ,  Gerardus Hubertus Petrus Maria Swinkels ,  Sven Pekelder ,  Dzmitry Labetski ,  Uwe Bruno Heini Stamm ,  William N. Partlo

IPC分类号： G03B27/54 ,  G03F7/20 ,  H05G2/00

CPC分类号： G03F7/70933 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70808 ,  G03F7/70908 ,  G03F7/70916 ,  G03F7/70925 ,  H05G2/003 ,  H05G2/005

摘要： An EUV lithographic apparatus includes a source collector apparatus in which the extreme ultraviolet radiation is generated by exciting a fuel to provide a plasma emitting the radiation. The source collector apparatus includes a chamber in fluid communication with a guide way external to the chamber. A pump for circulating buffer gas is part of the guide way, and provides a closed loop buffer gas flow. The gas flowing through the guide way traverses a gas decomposer wherein a compound of fuel material and buffer gas material is decomposed, so that decomposed buffer gas material can be fed back into the closed loop flow path.

摘要翻译： EUV光刻设备包括源极收集器装置，其中通过激发燃料产生极紫外辐射以提供发射辐射的等离子体。 源极收集器装置包括与腔室外部的引导方式流体连通的腔室。 用于循环缓冲气体的泵是引导方式的一部分，并提供闭环缓冲气体流。 流过引导方式的气体穿过气体分解器，其中燃料和缓冲气体材料的化合物被分解，使得分解的缓冲气体材料可以反馈回闭环流动路径。

公开(公告)号：US20140085619A1

公开(公告)日：2014-03-27

申请号：US14002000

申请日：2011-12-21

申请人： Vadim Yevgenyevich Banine ,  Wilhelmus Petrus De Boeij ,  Antonius Johannes Josephus Van Dijsseldonk ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels ,  Andrei Mikhailovich Yakunin

发明人： Vadim Yevgenyevich Banine ,  Wilhelmus Petrus De Boeij ,  Antonius Johannes Josephus Van Dijsseldonk ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels ,  Andrei Mikhailovich Yakunin

IPC分类号： G03F7/20

CPC分类号： G03F7/70191 ,  B82Y10/00 ,  G02B1/11 ,  G02B5/1838 ,  G02B5/281 ,  G02B5/283 ,  G03F7/70008 ,  G03F7/702 ,  G03F7/70308 ,  G03F7/70575 ,  G21K1/062 ,  G21K1/067 ,  G21K2201/061 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.

摘要翻译： 一种光刻设备，用于将辐射束图案化并将其投影到衬底上，包括至少两个光谱纯度滤光器，其被配置为在至少一个不期望的辐射波长范围内降低辐射束中的辐射强度，其中两个光谱纯度 过滤器具有彼此不同的辐射过滤结构。

公开(公告)号：US20120182536A1

公开(公告)日：2012-07-19

申请号：US13497741

申请日：2010-09-24

申请人： Erik Roelof Loopstra ,  Vadim Yevgenyevich Banine ,  Gerardus Hubertus Petrus Maria Swinkels ,  Sven Pekelder ,  Dzmitry Labetski ,  Uwe Bruno Heini Stamm ,  William N. Partlo

发明人： Erik Roelof Loopstra ,  Vadim Yevgenyevich Banine ,  Gerardus Hubertus Petrus Maria Swinkels ,  Sven Pekelder ,  Dzmitry Labetski ,  Uwe Bruno Heini Stamm ,  William N. Partlo

IPC分类号： G03B27/54 ,  B01D46/42 ,  G03B27/32

CPC分类号： G03F7/70933 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70808 ,  G03F7/70908 ,  G03F7/70916 ,  G03F7/70925 ,  H05G2/003 ,  H05G2/005

摘要： An EUV lithographic apparatus includes a source collector apparatus in which the extreme ultraviolet radiation is generated by exciting a fuel to provide a plasma emitting the radiation. The source collector apparatus includes a chamber in fluid communication with a guide way external to the chamber. A pump for circulating buffer gas is part of the guide way, and provides a closed loop buffer gas flow. The gas flowing through the guide way traverses a gas decomposer wherein a compound of fuel material and buffer gas material is decomposed, so that decomposed buffer gas material can be fed back into the closed loop flow path.

摘要翻译： EUV光刻设备包括源极收集器装置，其中通过激发燃料产生极紫外辐射以提供发射辐射的等离子体。 源极收集器装置包括与腔室外部的引导方式流体连通的腔室。 用于循环缓冲气体的泵是引导方式的一部分，并提供闭环缓冲气体流。 流过引导方式的气体穿过气体分解器，其中燃料和缓冲气体材料的化合物被分解，使得分解的缓冲气体材料可以反馈回闭环流动路径。

公开(公告)号：US20110013166A1

公开(公告)日：2011-01-20

申请号：US12832258

申请日：2010-07-08

申请人： Erik Roelof Loopstra ,  Vladimir Vitalevich Ivanov ,  Johannes Hubertus Josephina Moors ,  Gerardus Hubertus Petrus Maria Swinkels ,  Andrei Mikhailovich Yakunin ,  Dennis De Graaf ,  Uwe Bruno Heini Stamm

发明人： Erik Roelof Loopstra ,  Vladimir Vitalevich Ivanov ,  Johannes Hubertus Josephina Moors ,  Gerardus Hubertus Petrus Maria Swinkels ,  Andrei Mikhailovich Yakunin ,  Dennis De Graaf ,  Uwe Bruno Heini Stamm

IPC分类号： G03B27/54 ,  G21K5/04

CPC分类号： H05G2/003 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/008

摘要： A radiation system includes a target material supply configured to supply droplets of target material along a trajectory, and a laser system that includes an amplifier and optics. The optics are configured to establish a first beam path which passes through the amplifier and through a first location on the trajectory, and to establish a second beam path which passes through the amplifier and through a second location on the trajectory. The laser system is configured to generate a first pulse of laser radiation when photons emitted from the amplifier are reflected along the first beam path by a droplet of target material at the first location on the trajectory. The laser system is configured to generate a second pulse of laser radiation when photons emitted from the amplifier are reflected along the second beam path by the droplet of target material at the second location on the trajectory.

摘要翻译： 辐射系统包括被配置为沿着轨迹提供目标材料的液滴的目标材料供应，以及包括放大器和光学器件的激光系统。 光学器件被配置成建立穿过放大器并通过轨迹上的第一位置的第一光束路径，并且建立穿过放大器并通过轨迹上的第二位置的第二光束路径。 激光系统被配置为当从放大器发射的光子在轨迹上的第一位置处通过目标材料的液滴沿着第一光束路径反射时，产生激光辐射的第一脉冲。 激光系统被配置为当从放大器发射的光子在轨道上的第二位置处由靶材料的液滴沿着第二光束路径反射时，产生激光辐射的第二脉冲。

公开(公告)号：US20100231130A1

公开(公告)日：2010-09-16

申请号：US12712545

申请日：2010-02-25

申请人： Dzmitry LABETSKI ,  Erik Roelof Loopstra ,  Gerardus Hubertus Petrus Maria Swinkels ,  Tom Van Zutphen

发明人： Dzmitry LABETSKI ,  Erik Roelof Loopstra ,  Gerardus Hubertus Petrus Maria Swinkels ,  Tom Van Zutphen

IPC分类号： H05H1/00 ,  H01J61/28

CPC分类号： H05G2/003 ,  G03F7/70033 ,  H05G2/005

摘要： A plasma radiation source includes a vessel configured to catch a source material transmitted along a trajectory, and a decelerator configured to reduce a speed of the source material in a section of the trajectory downstream of a plasma initiation site.

摘要翻译： 等离子体辐射源包括构造成捕获沿着轨迹传输的源材料的容器，以及减速器，其构造成在等离子体起始位置下游的轨迹的一部分中降低源材料的速度。

公开(公告)号：US09594306B2

公开(公告)日：2017-03-14

申请号：US14002000

申请日：2011-12-21

申请人： Vadim Yevgenyevich Banine ,  Wilhelmus Petrus De Boeij ,  Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels ,  Andrei Mikhailovich Yakunin

发明人： Vadim Yevgenyevich Banine ,  Wilhelmus Petrus De Boeij ,  Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels ,  Andrei Mikhailovich Yakunin

IPC分类号： G03F7/20 ,  B82Y10/00 ,  G21K1/06 ,  H05G2/00

CPC分类号： G03F7/70191 ,  B82Y10/00 ,  G02B1/11 ,  G02B5/1838 ,  G02B5/281 ,  G02B5/283 ,  G03F7/70008 ,  G03F7/702 ,  G03F7/70308 ,  G03F7/70575 ,  G21K1/062 ,  G21K1/067 ,  G21K2201/061 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.

摘要翻译： 一种光刻设备，用于将辐射束图案化并将其投影到衬底上，包括至少两个光谱纯度滤光器，其被配置为在至少一个不期望的辐射波长范围内降低辐射束中的辐射强度，其中两个光谱纯度 过滤器具有彼此不同的辐射过滤结构。

公开(公告)号：US09414477B2

公开(公告)日：2016-08-09

申请号：US12540548

申请日：2009-08-13

申请人： Erik Roelof Loopstra ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels

发明人： Erik Roelof Loopstra ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels

IPC分类号： H05G2/00 ,  G03F7/20

CPC分类号： H05G2/001 ,  G03F7/70033 ,  G03F7/7085

摘要： A radiation source includes a beam generator configured to generate a radiation beam to be used to produce a radiation output of the radiation source, and a beam monitor, configured to monitor the radiation beam. A lithographic apparatus includes the radiation source. A device manufacturing method includes generating a first type of radiation by utilizing a beam of a second type of radiation, monitoring a quality of the second type of radiation, and projecting a patterned beam of the first type of radiation onto a substrate.

摘要翻译： 辐射源包括被配置为产生用于产生辐射源的辐射输出的辐射束的光束发生器，以及被配置为监视辐射束的光束监视器。 光刻设备包括辐射源。 一种器件制造方法包括通过利用第二类型的辐射束来产生第一类型的辐射，监测第二类型的辐射的质量，以及将第一类型的辐射的图案化的束投射到衬底上。

公开(公告)号：US08507882B2

公开(公告)日：2013-08-13

申请号：US12543578

申请日：2009-08-19

申请人： Gerardus Hubertus Petrus Maria Swinkels ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors

发明人： Gerardus Hubertus Petrus Maria Swinkels ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors

IPC分类号： G03B27/42 ,  H01J19/12

CPC分类号： G03F7/70916 ,  G03F7/70033 ,  G03F7/70858 ,  G03F7/70983 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

摘要： A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a droplet generator constructed and arranged to generate fuel droplets, a heater constructed and arranged to heat the fuel droplets following generation of the fuel droplets by the droplet generator, and reduce the mass of fuel present in the fuel droplets and/or reduce the density of the fuel droplets, and a radiation emitter constructed and arranged to direct radiation onto the fuel droplets that have been heated by the heater to generate the extreme ultraviolet radiation.

摘要翻译： 辐射源被配置成产生极紫外辐射。 辐射源包括构造和布置成产生燃料液滴的液滴发生器，被构造和布置成在液滴发生器产生燃料液滴之后加热燃料液滴的加热器，并且减少燃料液滴中存在的燃料质量和/或 降低燃料液滴的密度，以及被构造和布置成将辐射引导到已被加热器加热以产生极紫外辐射的燃料液滴上的辐射发射器。

公开(公告)号：US20110223543A1

公开(公告)日：2011-09-15

申请号：US12994930

申请日：2009-05-05

申请人： Vadim Yevgenyevich Banine ,  Wilhelmus Petrus De Boeij ,  Antonius Johannes Josephus Van Dijsseldonk ,  Erik Roelof Loopstra ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels

发明人： Vadim Yevgenyevich Banine ,  Wilhelmus Petrus De Boeij ,  Antonius Johannes Josephus Van Dijsseldonk ,  Erik Roelof Loopstra ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels

IPC分类号： G03F7/20

CPC分类号： G03F7/70191 ,  G03F7/70116 ,  G03F7/70575

摘要： A radiation system is configured to generate a radiation beam. The radiation system comprising a chamber that includes a radiation source configured to generate radiation, a radiation beam emission aperture, and a radiation collector configured to collect radiation generated by the source, and to transmit the collected radiation to the radiation beam emission aperture. The radiation collector includes a spectral purity filter configured to enhance a spectral purity of the radiation to be emitted via the aperture.

摘要翻译： 辐射系统被配置为产生辐射束。 所述辐射系统包括腔室，所述室包括被配置为产生辐射的辐射源，辐射束发射孔和被配置为收集由所述源产生的辐射的辐射收集器，并且将所收集的辐射传输到所述辐射束发射孔。 辐射收集器包括光谱纯度滤光器，其配置成增强经由孔径发射的辐射的光谱纯度。