公开(公告)号：US09824862B2

公开(公告)日：2017-11-21

申请号：US14548692

申请日：2014-11-20

Applicant: APPLIED MATERIALS, INC.

Inventor： Kartik Ramaswamy ,  Igor Markovsky ,  Zhigang Chen ,  James D. Carducci ,  Kenneth S. Collins ,  Shahid Rauf ,  Nipun Misra ,  Leonid Dorf ,  Zheng John Ye

IPC: H01L21/00 ,  C23C16/00 ,  H01J37/32

CPC classification number: H01J37/32091 ,  H01J37/32018 ,  H01J37/32082 ,  H01J37/32183 ,  H01J37/32541 ,  H01J37/32568 ,  H01J37/32577 ,  H01J37/32587 ,  H01J37/32596 ,  H01J37/3266 ,  H01J37/32715 ,  H01J37/32834

Abstract: The disclosure pertains to a capacitively coupled plasma source in which VHF power is applied through an impedance-matching coaxial resonator having a symmetrical power distribution.

公开(公告)号：US09443700B2

公开(公告)日：2016-09-13

申请号：US14176365

申请日：2014-02-10

Applicant: APPLIED MATERIALS, INC.

Inventor： Leonid Dorf ,  Shahid Rauf ,  Kenneth S. Collins ,  Nipun Misra ,  Kartik Ramaswamy ,  James D. Carducci ,  Steven Lane

IPC: H01J37/32

CPC classification number: H01J37/3233

Abstract: A plasma reactor that generates plasma in a workpiece processing chamber by an electron beam, has an electron beam source and segmented suppression electrode with individually biased segments to control electron beam density distribution.

Abstract translation: 通过电子束在工件处理室中产生等离子体的等离子体反应器具有电子束源和分段抑制电极，其具有单独偏置的段以控制电子束密度分布。

公开(公告)号：US20140035458A1

公开(公告)日：2014-02-06

申请号：US13945200

申请日：2013-07-18

Applicant: Applied Materials, Inc.

Inventor： Ming-Feng Wu ,  Ajit Balakrishna ,  Leonid Dorf ,  Shahid Rauf ,  Kenneth S. Collins ,  Nipun Misra

IPC: H01J37/32

CPC classification number: H01J37/32669 ,  H01J37/3233

Abstract: Electron beam-confining electromagnets of an electron beam generator are aligned with an electron beam axis, each of the electromagnets being folded to define a main section and a pair of angled wing sections disposed at respective angles relative to said main section, and a conductor wound around the edge.

Abstract translation: 电子束发生器的电子束约束电磁体与电子束轴线对准，每个电磁体被折叠以限定相对于所述主要部分以相应角度设置的主部分和一对成角度的翼部分，并且导体缠绕 围绕边缘。

公开(公告)号：US20230197406A1

公开(公告)日：2023-06-22

申请号：US18168421

申请日：2023-02-13

Applicant: Applied Materials, Inc.

Inventor： Kartik Ramaswamy ,  Igor Markovsky ,  Zhigang Chen ,  James D. Carducci ,  Kenneth S. Collins ,  Shahid Rauf ,  Nipun Misra ,  Leonid Dorf ,  Zheng John Ye

IPC: H01J37/32

CPC classification number: H01J37/32091 ,  H01J37/32541 ,  H01J37/3266 ,  H01J37/32018 ,  H01J37/32082 ,  H01J37/32183 ,  H01J37/32568 ,  H01J37/32577 ,  H01J37/32587 ,  H01J37/32596 ,  H01J37/32715 ,  H01J37/32834

Abstract: The disclosure pertains to a capacitively coupled plasma source in which VHF power is applied through an impedance-matching coaxial resonator having a symmetrical power distribution.

公开(公告)号：US20180053630A1

公开(公告)日：2018-02-22

申请号：US15793802

申请日：2017-10-25

Applicant: Applied Materials, Inc.

Inventor： Kartik Ramaswamy ,  Igor Markovsky ,  Zhijang Chen ,  James D. Carducci ,  Kenneth S. Collins ,  Shahid Rauf ,  Nipun Misra ,  Leonid Dorf ,  Zheng John Ye

IPC: H01J37/32

CPC classification number: H01J37/32091 ,  H01J37/32018 ,  H01J37/32082 ,  H01J37/32183 ,  H01J37/32541 ,  H01J37/32568 ,  H01J37/32577 ,  H01J37/32587 ,  H01J37/32596 ,  H01J37/3266 ,  H01J37/32715 ,  H01J37/32834

Abstract: The disclosure pertains to a capacitively coupled plasma source in which VHF power is applied through an impedance-matching coaxial resonator having a symmetrical power distribution.

公开(公告)号：US09721760B2

公开(公告)日：2017-08-01

申请号：US13912488

申请日：2013-06-07

Applicant: APPLIED MATERIALS, INC.

Inventor： Leonid Dorf ,  Shahid Rauf ,  Kenneth S. Collins ,  Kartik Ramaswamy ,  Nipun Misra ,  Gonzalo Antonio Monroy ,  James D. Carducci ,  Steven Lane

IPC: H05H1/02 ,  H01J37/32 ,  H05H1/50

CPC classification number: H01J37/3233 ,  H01J37/3266 ,  H05H1/50

Abstract: In a plasma reactor for processing a workpiece, an electron beam is employed as the plasma source, and sputtered metal atoms are removed from the electron beam to reduce contamination.

公开(公告)号：US09269546B2

公开(公告)日：2016-02-23

申请号：US13945200

申请日：2013-07-18

Applicant: APPLIED MATERIALS, INC.

Inventor： Ming-Feng Wu ,  Ajit Balakrishna ,  Leonid Dorf ,  Shahid Rauf ,  Kenneth S. Collins ,  Nipun Misra

IPC: H01J37/32

CPC classification number: H01J37/32669 ,  H01J37/3233

Abstract: Electron beam-confining electromagnets of an electron beam generator are aligned with an electron beam axis, each of the electromagnets being folded to define a main section and a pair of angled wing sections disposed at respective angles relative to said main section, and a conductor wound around the edge.

Abstract translation: 电子束发生器的电子束约束电磁体与电子束轴线对准，每个电磁体被折叠以限定相对于所述主要部分以相应角度设置的主部分和一对成角度的翼部分，并且导体缠绕 围绕边缘。

公开(公告)号：US20140338835A1

公开(公告)日：2014-11-20

申请号：US13912488

申请日：2013-06-07

Applicant: APPLIED MATERIALS, INC.

Inventor： Leonid Dorf ,  Shahid Rauf ,  Kenneth S. Collins ,  Kartik Ramaswamy ,  Nipun Misra ,  Gonzalo Antonio Monroy ,  James D. Carducci ,  Steven Lane

IPC: H05H1/02

CPC classification number: H01J37/3233 ,  H01J37/3266 ,  H05H1/50

Abstract: In a plasma reactor for processing a workpiece, an electron beam is employed as the plasma source, and sputtered metal atoms are removed from the electron beam to reduce contamination.

Abstract translation: 在用于处理工件的等离子体反应器中，使用电子束作为等离子体源，并且从电子束中去除溅射的金属原子以减少污染。

公开(公告)号：US20140265855A1

公开(公告)日：2014-09-18

申请号：US14176365

申请日：2014-02-10

Applicant: APPLIED MATERIALS, INC.

Inventor： Leonid Dorf ,  Shahid Rauf ,  Kenneth S. Collins ,  Nipun Misra ,  Kartik Ramaswamy ,  James D. Carducci ,  Steven Lane

IPC: H01J37/32

CPC classification number: H01J37/3233

Abstract: A plasma reactor that generates plasma in a workpiece processing chamber by an electron beam, has an electron beam source and segmented suppression electrode with individually biased segments to control electron beam density distribution.

Abstract translation: 通过电子束在工件处理室中产生等离子体的等离子体反应器具有电子束源和分段抑制电极，其具有单独偏置的段以控制电子束密度分布。