Abstract:
An component of a processing chamber comprises an aerosol deposited coating on the component, the aerosol deposited coating comprising a first type of metal oxide nanoparticle and a second type of metal oxide nanoparticle.
Abstract:
An article includes a body that is coated with a ceramic coating. The ceramic coating may include Y2O3 in a range between about 45 mol % to about 99 mol %, ZrO2 in a range between about 1 mol % to about 55 mol %, and Al2O3 in a range between about 1 mol % to about 10 mol %. The ceramic coating may alternatively include Y2O3 in a range between about 45 mol % to about 99 mol % and Al2O3 in a range between about 1 mol % to about 10 mol %. The ceramic coating may alternatively include Y2O3 in a range between about 45 mol % to about 99 mol % and ZrO2 in a range between about 1 mol % to about 55 mol %.
Abstract translation:一种制品包括涂有陶瓷涂层的主体。 陶瓷涂层可以包括约45mol%至约99mol%范围内的Y 2 O 3,约1mol%至约55mol%范围内的ZrO 2和约1mol%至约10mol%范围内的Al 2 O 3, 。 陶瓷涂层可以可选地包括在约45mol%至约99mol%范围内的Y 2 O 3和约1mol%至约10mol%范围内的Al 2 O 3。 陶瓷涂层可以包括约45mol%至约99mol%范围内的Y 2 O 3和约1mol%至约55mol%范围内的ZrO 2。
Abstract:
An article includes a body that is coated with a ceramic coating. The ceramic coating may include Y2O3 in a range between about 45 mol % to about 99 mol %, ZrO2 in a range between about 0 mol % to about 55 mol %, and Al2O3 in a range between about 0 mol % to about 10 mol %. The ceramic coating may alternatively include Y2O3 in a range between about 30 mol % to about 60 mol %, ZrO2 in a range between about 0 mol % to about 20 mol %, and Al2O3 in a range between about 30 mol % to about 60 mol %.
Abstract translation:一种制品包括涂有陶瓷涂层的主体。 陶瓷涂层可以包括约45mol%至约99mol%范围内的Y 2 O 3,约0mol%至约55mol%范围内的ZrO 2和约0mol%至约10mol%范围内的Al 2 O 3, 。 陶瓷涂层可以替代地包括约30mol%至约60mol%范围内的Y 2 O 3,约0mol%至约20mol%范围内的ZrO 2和约30mol%至约60mol之间的Al 2 O 3 %。
Abstract:
A chamber component for a process chamber comprises a ceramic body and one or more protective layer on at least one surface of the ceramic body, wherein the one or more protective layer comprises Y3Al5O12 having a dielectric constant of 9.76+/−up to 30% and a hermiticity of 4.4E-10 cm3/s+/−up to 30%.
Abstract:
An article includes a body that is coated with a ceramic coating. The ceramic coating may include Y2O3 in a range between about 45 mol % to about 99 mol %, ZrO2 in a range between about 1 mol % to about 55 mol %, and Al2O3 in a range between about 1 mol % to about 10 mol %. The ceramic coating may alternatively include Y2O3 in a range between about 45 mol % to about 99 mol % and Al2O3 in a range between about 1 mol % to about 10 mol %. The ceramic coating may alternatively include Y2O3 in a range between about 45 mol % to about 99 mol % and ZrO2 in a range between about 1 mol % to about 55 mol %.
Abstract:
An article comprises a body and at least one protective layer on at least one surface of the body. The at least one protective layer is a thin film having a thickness of less than approximately 20 microns that comprises a ceramic selected from a group consisting of Y3Al5O12, Er2O3, Er3Al5O12, and a ceramic compound comprising Y4Al2O9 and a solid-solution of Y2O3—ZrO2.
Abstract:
An component of a processing chamber comprises an aerosol deposited coating on the component, the aerosol deposited coating comprising a first type of metal oxide nanoparticle and a second type of metal oxide nanoparticle.
Abstract:
An article comprises a body and at least one protective layer on at least one surface of the body. The at least one protective layer is a thin film having a thickness of less than approximately 20 microns that comprises a ceramic selected from a group consisting of Y3Al5O12, Y4Al2O9, Er2O3, Gd2O3, Er3Al5O12, Gd3Al5O12 and a ceramic compound comprising Y4Al2O9 and a solid-solution of Y2O3—ZrO2.
Abstract:
A method for coating a component for use in a semiconductor chamber for plasma etching includes providing the component and loading the component in a deposition chamber. A pressure in the deposition chamber is reduced to below atmospheric pressure. A coating is deposited on the component by spraying an aerosol comprising a suspension of a first type of metal oxide nanoparticle and a second type of metal oxide nanoparticle onto the component at approximately room temperature.