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公开(公告)号：US11815470B2
公开(公告)日：2023-11-14
申请号：US17010746
申请日：2020-09-02
Applicant: Applied Materials Israel, Ltd.
Inventor： Haim Feldman , Eyal Neistein , Harel Ilan , Shahar Arad , Ido Almog , Ori Golani
CPC classification number: G01N21/9505 , G06T7/001 , G06T7/0008 , G06T2207/30148
Abstract: Disclosed herein is a method for detecting defects on a sample. The method includes obtaining scan data of a region of a sample in a multiplicity of perspectives, and performing an integrated analysis of the obtained scan data. The integrated analysis includes computing, based on the obtained scan data, and/or estimating cross-perspective covariances, and determining presence of defects in the region, taking into account the cross-perspective covariances.
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公开(公告)号：US10481101B2
公开(公告)日：2019-11-19
申请号：US15412879
申请日：2017-01-23
Applicant: APPLIED MATERIALS ISRAEL LTD.
Inventor： Haim Feldman , Boris Golberg , Ido Dolev
Abstract: An illumination module that includes a pair of anamorphic prisms that comprises a first anamorphic prism and a second anamorphic prism; wherein the pair of anamorphic prisms is configured to (a) receive a first radiation beam that propagates along a first optical axis, and (b) asymmetrically magnify the first radiation beam to provide a second radiation beam that propagates along a second optical axis that is parallel to the first optical axis; and a rectangular prism that is configured to receive the second radiation beam and perform a lateral shift of the second radiation beam to provide a third radiation beam; and a rotating mechanism that is configured to change an asymmetrical magnification of the pair of anamorphic prisms by rotating at least one of the first anamorphic prism and the second anamorphic prism.
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公开(公告)号：US09835563B2
公开(公告)日：2017-12-05
申请号：US14946693
申请日：2015-11-19
Applicant: APPLIED MATERIALS ISRAEL LTD.
Inventor： Yoram Uziel , Ron Naftali , Ofer Adan , Haim Feldman , Ofer Shneyour , Ron Bar-Or , Doron Korngut
Abstract: There may be provided an evaluation system that may include spatial sensors that include atomic force microscopes (AFMs) and a solid immersion lens. The AFMs are arranged to generate spatial relationship information that is indicative of a spatial relationship between the solid immersion lens and a substrate. The controller is arranged to receive the spatial relationship information and to send correction signals to the at least one location correction element for introducing a desired spatial relationship between the solid immersion lens and the substrate.
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Patent Agency Ranking
公开(公告)号：US09810643B1
公开(公告)日：2017-11-07
申请号：US14037304
申请日：2013-09-25
Applicant: Applied Materials Israel, Ltd.
Inventor： Amir Shoham , Yoav Berlatzky , Haim Feldman
IPC: G01N21/956
CPC classification number: G01N21/95607 , G01N21/95623
Abstract: A system that may include a radiation source to generate a beam of coherent radiation; traveling lens optics to focus the beam so as to generate multiple spots on a surface of a sample and to scan the spots together over the surface; collection optics to collect the radiation scattered from the multiple spots and to focus the collected radiation so as to generate a pattern of interference fringes; and a detection unit to detect changes in the pattern of interference fringes.
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公开(公告)号：US11270432B1
公开(公告)日：2022-03-08
申请号：US17001194
申请日：2020-08-24
Applicant: Applied Materials Israel Ltd.
Inventor： Haim Feldman , Yoav Shechtman
Abstract: A method for inspecting a three dimensional structure of a microscopic scale of a sample, the method may include obtaining an image of the three dimensional structure; obtaining a reference image of a reference three dimensional structure, the reference three dimensional structure and the three dimensional structure are ideally identical to each other; wherein each one of the image and the reference image was generated using optics that includes a phase mask, wherein the phase mask virtually expands a depth of field of the optics by encoding depth information over a depth range that exceeds the depth of field; generating a difference image that represents a difference between the image and the reference image; determining, based on the difference image, whether there is at least one defect in the three dimensional structure; wherein when determining that there is the at least one defect then providing a depth of the at least one defect.
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公开(公告)号：US10060736B1
公开(公告)日：2018-08-28
申请号：US15134771
申请日：2016-04-21
Applicant: APPLIED MATERIALS ISRAEL LTD.
Inventor： Amir Moshe Sagiv , Yoram Uziel , Haim Feldman , Ron Naftali
IPC: G01B15/00
CPC classification number: G01B15/00
Abstract: A method for determining a distance between a near field sensor and a substrate, the method may include creating a diffraction pattern by illuminating, with a beam of coherent radiation having a wavelength that does not exceed twenty nanometers, a slit that is formed between the substrate and an opaque element; detecting, by a detector, multiple portions of the diffraction pattern and generating detection signals indicative of the multiple portions of the diffraction pattern; processing the detection signals to determine a height of the slit; and determining the distance between the near field sensor and the substrate based upon (a) the height of the slit, and (b) a relationship between the height of the slit and a location of the near field sensor.
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公开(公告)号：US09395266B2
公开(公告)日：2016-07-19
申请号：US14560932
申请日：2014-12-04
Applicant: APPLIED MATERIALS ISRAEL LTD.
Inventor： Boris Golberg , Amir Moshe Sagiv , Haim Feldman , Uriel Malul , Adam Baer
CPC classification number: G01M11/00 , G01N21/8806 , G01N21/9501 , G01N2021/95676 , G02B21/125
Abstract: An on-tool measurement system and a method for measuring optical system's wavefront (WF) aberrations are disclosed. The on-tool measurement system includes an optical setup comprising a moveable deflection element further comprising a highly transparent region. The deflection element includes a first surface configured to project a first image of at least one object onto a sensor and the highly transparent region includes a second surface configured to project a second image of the at least one object onto the sensor. The on-tool measurement system includes a sensor configured to capture the first and second images and a controller configured to measure differential displacements between the first and second images at each deflection element position and to calculate the optical setup local WF gradients that depend on the measured differential displacements.
Abstract translation: 公开了一种工具测量系统和用于测量光学系统的波前（WF）像差的方法。 工具测量系统包括光学装置，其包括还包括高度透明区域的可移动偏转元件。 偏转元件包括被配置为将至少一个物体的第一图像突出到传感器上的第一表面，并且高透明区域包括配置成将至少一个物体的第二图像投影到传感器上的第二表面。 工具测量系统包括被配置为捕获第一和第二图像的传感器和被配置为测量在每个偏转元件位置处的第一和第二图像之间的差分位移的控制器，并且计算取决于被测量的光学设置局部WF梯度 差分位移。
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公开(公告)号：US08659754B2
公开(公告)日：2014-02-25
申请号：US13923086
申请日：2013-06-20
Applicant: Applied Materials Israel, Ltd.
Inventor： Haim Feldman , Boris Morgenstein , Roman Naidis , Adam Baer
IPC: G01N21/00
CPC classification number: G02F1/29 , G01N21/8806 , G01N21/9501 , G02F1/11 , G02F2001/294
Abstract: An inspection system includes a first focusing unit configured to perform fast focus changes to a first focusing function applied to an incident light beam. A traveling lens acousto-optic device is arranged to receive the light beam focused by the first focusing function and produce focused spots using a plurality of traveling lenses generated in response to radio frequency signals. The traveling lenses apply a second focusing function and the traveling lens acousto-optic device is arranged to alter the second focusing function at a fast rate. The inspection system also includes optics arranged to direct the focused spots onto an inspected object and to direct radiation from the inspected object to a sensor.
Abstract translation: 检查系统包括被配置为对应用于入射光束的第一聚焦功能执行快速聚焦改变的第一聚焦单元。 移动透镜声光装置被布置成接收由第一聚焦功能聚焦的光束，并且使用响应于射频信号产生的多个行进透镜产生聚焦点。 行进透镜应用第二聚焦功能，并且行进透镜声光装置被布置成以快速的速度改变第二聚焦功能。 检查系统还包括被布置成将聚焦点引导到被检查对象并将来自被检查对象的辐射引导到传感器的光学系统。
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