公开(公告)号：US10060736B1

公开(公告)日：2018-08-28

申请号：US15134771

申请日：2016-04-21

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Amir Moshe Sagiv ,  Yoram Uziel ,  Haim Feldman ,  Ron Naftali

IPC: G01B15/00

CPC classification number: G01B15/00

Abstract: A method for determining a distance between a near field sensor and a substrate, the method may include creating a diffraction pattern by illuminating, with a beam of coherent radiation having a wavelength that does not exceed twenty nanometers, a slit that is formed between the substrate and an opaque element; detecting, by a detector, multiple portions of the diffraction pattern and generating detection signals indicative of the multiple portions of the diffraction pattern; processing the detection signals to determine a height of the slit; and determining the distance between the near field sensor and the substrate based upon (a) the height of the slit, and (b) a relationship between the height of the slit and a location of the near field sensor.

公开(公告)号：US09784689B2

公开(公告)日：2017-10-10

申请号：US14797040

申请日：2015-07-10

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Ido Almog ,  Ron Naftali

IPC: G01N21/00 ,  G01N21/88 ,  G01N21/95

CPC classification number: G01N21/8806 ,  G01N21/9501 ,  G01N2201/0638

Abstract: According to an embodiment of the invention there may be provided a system for inspecting an object, the system may include a traveling lens acousto-optic device that is configured to generate a sequence of traveling lenses that propagate through an active region of the traveling lens acousto-optic device; an illumination unit that that is configured to illuminate the sequence of traveling lenses to provide a sequence of input beams; a first beam splitter that is configured to split the sequence of input beams to an intermediate array of intermediate beams, the intermediate array comprises multiple sequences of intermediate beams, the sequences of intermediate beams are spaced apart from each other; a masking unit that is configured to mask first beams of the intermediate array and unmask output beams of the intermediate array in an alternating manner; multiple detectors; and an objective lens that is configured to receive the output beams, direct the output beams towards multiple areas of the object, receive collected beams from the multiple areas of the object, and direct the collected beams towards the multiple detectors; and wherein each detector is associated with an area of the multiple areas.

公开(公告)号：US20170010219A1

公开(公告)日：2017-01-12

申请号：US14797040

申请日：2015-07-10

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Ido Almog ,  Ron Naftali

IPC: G01N21/88 ,  G01N21/95

CPC classification number: G01N21/8806 ,  G01N21/9501 ,  G01N2201/0638

Abstract: According to an embodiment of the invention there may be provided a system for inspecting an object, the system may include a traveling lens acousto-optic device that is configured to generate a sequence of traveling lenses that propagate through an active region of the traveling lens acousto-optic device; an illumination unit that that is configured to illuminate the sequence of traveling lenses to provide a sequence of input beams; a first beam splitter that is configured to split the sequence of input beams to an intermediate array of intermediate beams, the intermediate array comprises multiple sequences of intermediate beams, the sequences of intermediate beams are spaced apart from each other; a masking unit that is configured to mask first beams of the intermediate array and unmask output beams of the intermediate array in an alternating manner; multiple detectors; and an objective lens that is configured to receive the output beams, direct the output beams towards multiple areas of the object, receive collected beams from the multiple areas of the object, and direct the collected beams towards the multiple detectors; and wherein each detector is associated with an area of the multiple areas.

Abstract translation: 根据本发明的实施例，可以提供一种用于检查物体的系统，该系统可以包括行进透镜声光装置，其被配置为产生传播通过移动透镜声音的有源区域的行进透镜序列 光设备 照明单元，被配置为照亮所述行进透镜的顺序以提供输入光束的序列; 第一分束器，其被配置为将输入光束序列分割成中间光束的中间阵列，所述中间阵列包括多个中间光束序列，所述中间光束的序列彼此间隔开; 掩模单元，被配置为屏蔽所述中间阵列的第一光束，并且以交替方式解除所述中间阵列的输出光束的屏蔽; 多个探测器; 以及物镜，被配置为接收输出光束，将输出光束导向物体的多个区域，从物体的多个区域接收收集的光束，并将收集的光束引向多个检测器; 并且其中每个检测器与所述多个区域的区域相关联。

公开(公告)号：US10811219B2

公开(公告)日：2020-10-20

申请号：US16057762

申请日：2018-08-07

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Ofer Shneyour ,  Ron Naftali ,  Ronnie Porat

IPC: H01J37/28 ,  H01J37/22 ,  H01J37/305

Abstract: A method for evaluating a region of an object, the method may include repeating, for each sub-region out of a first sub-region of the region till a penultimate sub-region of the region, the steps of: (a) acquiring, by a charged particle imager, a charged particle image of the sub-region; and (b) milling, by a charged particle miller, the sub-region to expose another sub-region of region; acquiring, by the charged particle imager, a charged particle image of a last sub-region of the region; and generating three-dimensional information about a content of the region based on charge particle images of the first sub-region till last sub-region of the region.

公开(公告)号：US10054551B2

公开(公告)日：2018-08-21

申请号：US15134278

申请日：2016-04-20

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Boris Golberg ,  Ron Naftali

IPC: G01N21/88

CPC classification number: G01N21/8851 ,  G01N2201/063 ,  G01N2201/105

Abstract: An inspection system that may include an illumination module that may be configured to scan a sample during multiple scan iterations; wherein during each scan iteration the illumination module scans each beam of a plurality of spaced apart beams along a scan line; a mechanical stage that may be configured to move the sample during the multiple scan iterations; a detection module; and a processor; wherein when the inspection system operates in an interlaced mode, the mechanical stage may be configured to move at a first speed thereby preventing a substantial overlap between scan lines obtained during the multiple scan iterations; wherein when the inspection system operates in a non-interlaced mode: the mechanical stage may be configured to move at a second speed that differs from the first speed thereby introducing an overlap between scan lines of different beams that may be obtained during different scan iterations; the detection module may be configured to generate detection signals in response to a detection of radiation emitted from the sample as a result of each scan line; and wherein the processor may be configured to independently process detection signals relating to different scan lines.

公开(公告)号：US20170309511A1

公开(公告)日：2017-10-26

申请号：US15134306

申请日：2016-04-20

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Doron Korngut ,  Yuri Belenky ,  Yoram Uziel ,  Ron Naftali ,  Ron Bar-or ,  Yuval Gronau

IPC: H01L21/687

CPC classification number: H01L21/68785 ,  B23B31/08 ,  B25B1/2484 ,  B25B11/02 ,  B32B37/0046 ,  B32B38/1833 ,  H01L21/67092 ,  H01L21/67288 ,  H01L21/68735 ,  H01L21/68742 ,  H01L21/68764

Abstract: According to an embodiment, a support module is provided for supporting a substrate. The support module may include a chuck and a vertical stage. The chuck may include multiple chuck segments that are independently movable. When the substrate is positioned on the chuck, different chuck segments are positioned under different areas of the substrate. The vertical stage may include multiple piezoelectric motors. Each piezoelectric motor may be configured to perform nanometric scale elevation and lowering movements. The multiple piezoelectric motors may be configured to independently move the multiple chuck segments.

公开(公告)号：US20170307539A1

公开(公告)日：2017-10-26

申请号：US15134278

申请日：2016-04-20

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Boris Golberg ,  Ron Naftali

IPC: G01N21/88

CPC classification number: G01N21/8851 ,  G01N2201/063 ,  G01N2201/105

Abstract: An inspection system that may include an illumination module that may be configured to scan a sample during multiple scan iterations; wherein during each scan iteration the illumination module scans each beam of a plurality of spaced apart beams along a scan line; a mechanical stage that may be configured to move the sample during the multiple scan iterations; a detection module; and a processor; wherein when the inspection system operates in an interlaced mode, the mechanical stage may be configured to move at a first speed thereby preventing a substantial overlap between scan lines obtained during the multiple scan iterations; wherein when the inspection system operates in a non-interlaced mode: the mechanical stage may be configured to move at a second speed that differs from the first speed thereby introducing an overlap between scan lines of different beams that may be obtained during different scan iterations; the detection module may be configured to generate detection signals in response to a detection of radiation emitted from the sample as a result of each scan line; and wherein the processor may be configured to independently process detection signals relating to different scan lines.

公开(公告)号：US20220392735A1

公开(公告)日：2022-12-08

申请号：US17770576

申请日：2019-10-21

Applicant: Applied Materials, Israel Ltd. ,  TECHNISCHE UNIVERSITEIT DELFT

Inventor： Pieter Kruit ,  Ron Naftali ,  Jürgen Frosien ,  Ralf Schmid ,  Benjamin John Cook ,  Roman Barday ,  Dieter Winkler

IPC: H01J37/147 ,  H01J37/05 ,  H01J37/20 ,  H01J37/12 ,  H01J37/28

Abstract: A charged particle beam device for irradiating or inspecting a specimen is described. The charged particle beam device includes a charged particle beam source for generating a primary charged particle beam and a multi-aperture lens plate having a plurality of apertures for forming four or more primary. Two or more electrodes having one opening, e.g. having one opening each, for the primary charged particle beam or the four or more primary beamlets are provided. The charged particle beam device further includes a collimator for deflecting a first primary beamlet, a second primary beamlet, a third primary beamlet, and a fourth primary beamlet of the four or more primary beamlets with respect to each other. The charged particle beam device further includes an objective lens unit having three or more electrodes, each electrode having openings for the four or more primary beamlets.

公开(公告)号：US11177048B2

公开(公告)日：2021-11-16

申请号：US16689567

申请日：2019-11-20

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Igor Krivts (Krayvitz) ,  Efim Vinnitsky ,  Yoram Uziel ,  Benzion Sender ,  Ron Naftali

IPC: G21K1/087 ,  G06K9/32 ,  G06K9/00 ,  G21K1/10

Abstract: A method and a system. The system may include (a) evaluation units, (b) an object distribution system for receiving the objects and distributing the objects between the evaluation units, and (c) at least one controller. Each evaluation unit may include (i) a chamber housing that has an inner space, (ii) a chuck, (iii) a movement system that is configured to move the chuck, and (iv) a charged particle module that is configured to irradiate the object with a charged particle beam, and to detect particles emitted from the object. In each evaluation unit a length of the inner space is smaller than twice a length of the object, and a width of the inner space is smaller than twice a width of the object.

公开(公告)号：US10395887B1

公开(公告)日：2019-08-27

申请号：US15900415

申请日：2018-02-20

Applicant: Technische Universiteit Delft ,  Applied Materials Israel, Ltd.

Inventor： Pieter Kruit ,  Ron Naftali

IPC: H01J37/28 ,  H01J37/10 ,  H01J37/22 ,  H01J37/147

Abstract: Apparatus and method for inspecting a surface of a sample. The apparatus includes a multi-beam charged particle column comprising a source for creating multiple primary beams directed towards the sample, an objective lens for focusing the primary beams on the sample, an electron-photon converter unit having an array of electron to photon converter sections, each section is located next to a primary beam within a distance equal to a pitch of the primary beams at the electro-photon converter unit, a photon transport unit for transporting light from the electron to photon converter sections to a photo detector, and an electron collection unit for guiding secondary electrons created in the sample, towards the electron-photon converter unit. The electron collection unit is arranged to project secondary electrons created in the sample by one of said primary beams to at least one of the electron to photon converter sections.