Optical filtering device, defect inspection method and apparatus therefor
    11.
    发明授权
    Optical filtering device, defect inspection method and apparatus therefor 有权
    光学滤波装置,缺陷检查方法及其装置

    公开(公告)号:US09182592B2

    公开(公告)日:2015-11-10

    申请号:US13983310

    申请日:2012-02-03

    摘要: An optical filtering device and an optical inspection apparatus for detecting a defect in a high sensitivity using an optical filtering device which includes a shutter array formed in a two-dimensionally on an optically opaque thin film produced on a SOI wafer and the SOI wafer is removed at portions thereof on the lower side of the shutter patterns to form perforation portions while working electrodes are formed at the remaining portion of the SOI wafer, a glass substrate having electrode patterns formed on the surface thereof and having the shutter array mounted thereon, and a power supply section for supplying electric power to the electrode patterns formed on the glass substrate and the working electrodes of the SOI wafer. And the working electrodes is controlled to cause the shutter patterns to carry out opening and closing movements with respect to the perforation portions to carry out optical filtering.

    摘要翻译: 使用光学滤波装置来检测高灵敏度的缺陷的光学滤波装置和光学检查装置,该光学滤波装置包括在SOI晶片和SOI晶片上制造的光学不透明薄膜上二维地形成的快门阵列 在闸板图案的下侧的部分处形成穿孔部分,同时在SOI晶片的剩余部分处形成工作电极,在其表面上形成有安装有快门阵列的电极图案的玻璃基板,以及 电源部分,用于向形成在玻璃基板上的电极图案和SOI晶片的工作电极提供电力。 并且控制工作电极以使快门图案相对于穿孔部分进行打开和关闭运动以进行光学过滤。

    Defect inspection method and apparatus therefor
    12.
    发明授权
    Defect inspection method and apparatus therefor 有权
    缺陷检查方法及其设备

    公开(公告)号:US08885037B2

    公开(公告)日:2014-11-11

    申请号:US13375239

    申请日:2010-07-01

    CPC分类号: G01N21/956 G01N21/9501

    摘要: To effectively utilize the polarization property of an inspection subject for obtaining higher inspection sensitivity, for the polarization of lighting, it is necessary to observe differences in the reflection, diffraction, and scattered light from the inspection subject because of polarization by applying light having the same elevation angle and wavelength in the same direction but different polarization. According to conventional techniques, a plurality of measurements by changing polarizations is required to cause a prolonged inspection time period that is an important specification of inspection apparatuses. In this invention, a plurality of polarization states are modulated in micro areas in the lighting beam cross section, images under a plurality of polarized lighting conditions are collectively acquired by separately and simultaneously forming the scattered light from the individual micro areas in the individual pixels of a sensor, whereby inspection sensitivity and sorting and sizing accuracy are improved without reducing throughput.

    摘要翻译: 为了有效地利用检查对象的偏振特性以获得更高的检测灵敏度,对于照明的偏振,需要观察来自检查对象的反射,衍射和散射光的差异,因为通过施加具有相同的光的偏振 仰角和波长相同但偏振不同。 根据常规技术,需要通过改变极化的多个测量来引起作为检查设备的重要规格的延长的检查时间段。 在本发明中,在照明光束横截面的微小区域中调制多个偏振状态,通过分别并且同时形成来自各个像素中的各个微区域的散射光,共同地获得多个偏振光照条件下的图像 传感器,从而在不降低生产能力的情况下提高检测灵敏度和分选和尺寸精度。

    Method of defect inspection and device of defect inspection
    13.
    发明授权
    Method of defect inspection and device of defect inspection 有权
    缺陷检查方法和缺陷检查装置

    公开(公告)号:US08804112B2

    公开(公告)日:2014-08-12

    申请号:US13265935

    申请日:2010-04-22

    IPC分类号: G01N21/00

    摘要: A method of inspecting defects and a device inspecting defects of detecting defects at high sensitivity and high capture efficiency even on various patterns existing on a wafer. In the device of inspecting defects, an illumination optical system is formed of two systems of a coherent illumination of a laser 5 and an incoherent illumination of LEDs 6a, 6b, 6c and 6d, and light paths are divided in a detecting system corresponding to respective illumination light, spatial modulation elements 55a and 55b are arranged to detecting light paths, respectively, scattered light inhibiting sensitivity is shielded by the spatial modulating elements 55a and 55b, scattered light transmitted through the spatial modulation elements 55a and 55b is detected by image sensors 90a and 90b arranged to respective light paths, and images detected by these two image sensors 90a and 90b are subjected to a comparison processing, thereby determining a defect candidate.

    摘要翻译: 一种检测缺陷的方法,以及即使在晶片上存在的各种图案,也可以检测高灵敏度和高捕获效率的缺陷检测缺陷。 在检查缺陷的装置中,照明光学系统由激光器5的相干照明和LED 6a,6b,6c和6d的非相干照明的两个系统形成,并且光路被分成对应于相应的 照明光,空间调制元件55a和55b分别被布置成检测光路,散射光抑制灵敏度被空间调制元件55a和55b屏蔽,传播通过空间调制元件55a和55b的散射光被图像传感器90a检测 和90b,并且由这两个图像传感器90a和90b检测到的图像进行比较处理,从而确定缺陷候选。

    Dark-field defect inspecting method, dark-field defect inspecting apparatus, aberration analyzing method, and aberration analyzing apparatus
    14.
    发明授权
    Dark-field defect inspecting method, dark-field defect inspecting apparatus, aberration analyzing method, and aberration analyzing apparatus 有权
    暗场缺陷检查方法,暗场缺陷检查装置,像差分析方法和像差分析装置

    公开(公告)号:US08681328B2

    公开(公告)日:2014-03-25

    申请号:US13142328

    申请日:2010-01-20

    IPC分类号: G01N21/00

    摘要: By including an illumination system and a detection system, an information collecting function of monitoring an environment, such as temperature and atmospheric pressure, and an apparatus state managing function having a feedback function of comparing the monitoring result and a design value, a theoretical calculation value or an ideal value derived from simulation results and calibrating an apparatus so that the monitoring result is brought close to the ideal value, a unit for keeping the apparatus state and apparatus sensitivity constant is provided. A control unit 800 is configured to include a recording unit 801, a comparing unit 802, a sensitivity predicting unit 803, and a feedback control unit 804. In the comparing unit 802, the monitoring result transmitted from the recording unit 801 and an ideal value stored in a database 805 are compared with each other. When a difference between the ideal value and the monitoring result exceeds a predetermined threshold, the feedback control unit 804 corrects the illumination system and the detection system.

    摘要翻译: 通过包括照明系统和检测系统,监视诸如温度和大气压力之类的环境的信息收集功能,以及具有比较监视结果和设计值的反馈功能的设备状态管理功能,理论计算值 或者从模拟结果导出的理想值,并且对设备进行校准,使得监视结果接近理想值,提供用于保持设备状态和设备灵敏度恒定的单元。 控制单元800被配置为包括记录单元801,比较单元802,灵敏度预测单元803和反馈控制单元804.在比较单元802中,从记录单元801发送的监视结果和理想值 存储在数据库805中进行比较。 当理想值与监视结果之间的差异超过预定阈值时,反馈控制单元804校正照明系统和检测系统。

    Electromagnetic noise suppressor, article with electromagnetic noise suppressing function and their manufacturing methods
    15.
    发明授权
    Electromagnetic noise suppressor, article with electromagnetic noise suppressing function and their manufacturing methods 有权
    电磁噪声抑制器,具有电磁噪声抑制功能的制品及其制造方法

    公开(公告)号:US07887911B2

    公开(公告)日:2011-02-15

    申请号:US12551156

    申请日:2009-08-31

    IPC分类号: B32B5/16

    摘要: An electromagnetic noise suppressor of the present invention includes a base material containing a binding agent and a composite layer formed by integrating the binding agent that is a part of the base material and the magnetic material. This electromagnetic noise suppressor has high electromagnetic noise suppressing effect in the sub-microwave band, and enables it to reduce the space requirement and weight. The electromagnetic noise suppressor can be manufactured by forming the composite layer on the surface of the base material by physical vapor deposition of the magnetic material onto the surface of the base material. The article with an electromagnetic noise suppressing function of the present invention is an electronic component, a printed wiring board, a semiconductor integrated circuit or other article of which at least a part of the surface is covered by the electromagnetic noise suppressor of the present invention.

    摘要翻译: 本发明的电磁噪声抑制器包括含有粘合剂的基材和通过将作为基材的一部分的粘合剂与磁性材料整合而形成的复合层。 该电磁噪声抑制器在亚微波带中具有高电磁噪声抑制效果,能够减小空间要求和重量。 可以通过将磁性材料物理气相沉积到基材的表面上,在基材的表面上形成复合层来制造电磁噪声抑制器。 具有本发明的电磁噪声抑制功能的物品是电子部件,印刷电路板,半导体集成电路或其中至少一部分表面被本发明的电磁噪声抑制器覆盖的其它物品。

    Measuring Apparatus, Measuring Method, and Characteristic Measurement Unit
    17.
    发明申请
    Measuring Apparatus, Measuring Method, and Characteristic Measurement Unit 有权
    测量装置,测量方法和特性测量单元

    公开(公告)号:US20090051916A1

    公开(公告)日:2009-02-26

    申请号:US12087663

    申请日:2006-12-27

    IPC分类号: G01J4/00

    CPC分类号: G01N21/21 G01J4/04

    摘要: A measuring apparatus includes a light intensity information acquisition section 40 that acquires light intensity information relating to a measurement light containing a given band component, the measurement light having been modulated by optical elements included in an optical system 10 and a measurement target (or a sample 100), and a calculation section 50 that calculates at least one matrix element of a Mueller matrix that indicates the optical characteristics of the measurement target based on the light intensity information relating to the measurement light and a theoretical expression for the light intensity of the measurement light. The light intensity information acquisition section 40 acquires the light intensity information relating to a plurality of the measurement lights obtained from the optical system 10 by changing setting of a principal axis direction of at least one of the optical elements. The calculation section 50 performs a carrier amplitude coefficient calculation process, and a matrix element calculation process that calculates the at least one matrix element based on a carrier amplitude coefficient and the theoretical expression for the carrier amplitude coefficient including the at least one matrix element.

    摘要翻译: 测量装置包括光强度信息获取部分40,其获取与包含给定频带分量的测量光有关的光强度信息,测量光已被包括在光学系统10中的光学元件和测量对象(或样品 100),以及计算部50,其基于与测量光有关的光强度信息和测量光强度的理论表达式,计算指示测量对象的光学特性的Mueller矩阵的至少一个矩阵元素 光。 光强度信息获取部40通过改变至少一个光学元件的主轴方向的设定来获取与从光学系统10获得的多个测量光有关的光强度信息。 计算部分50执行载波幅度系数计算处理和基于载波幅度系数和包括至少一个矩阵元素的载波幅度系数的理论表达式来计算至少一个矩阵元素的矩阵元素计算处理。

    Production method of decorative film
    18.
    发明申请
    Production method of decorative film 有权
    装饰膜的生产方法

    公开(公告)号:US20070051467A1

    公开(公告)日:2007-03-08

    申请号:US11525544

    申请日:2006-09-22

    IPC分类号: B32B37/06 B65C9/25 B32B38/00

    摘要: A production method of a decorative film comprising a step of, in a state in which a transparent resin film is laid on a surface of a laminate sheet in which a pattern layer is placed on one surface of a base film of a thermoplastic resin, inserting the laminate sheet and the transparent resin film into between a pair of endless belts placed opposite each other, thereby obtaining a decorative film, wherein the transparent resin film is preheated by contact with a peripheral surface of a preheat roll urged toward the endless belt, and the transparent resin film is run so as to constantly contact a peripheral surface of at least one guide roll during a period between departure from the peripheral surface of the preheat roll and contact with the laminate sheet.

    摘要翻译: 一种装饰膜的制造方法,其特征在于,在将热塑性树脂的基膜的一个面上配置有图案层的层压片的表面上放置透明树脂膜的状态下,插入 层叠片和透明树脂膜形成在彼此相对放置的一对环形带之间,从而获得装饰膜,其中透明树脂膜通过与向环形带施力的预热辊的周面接触而预热,以及 运行透明树脂膜,以便在从预热辊的周面离开之间的期间和与层叠片接触的期间中,与至少一个导辊的周面不断接触。

    Spectroscopic polarimetry
    19.
    发明申请
    Spectroscopic polarimetry 有权
    光谱极化法

    公开(公告)号:US20060170921A1

    公开(公告)日:2006-08-03

    申请号:US11329389

    申请日:2006-01-11

    IPC分类号: G01J4/00

    CPC分类号: G01J4/04

    摘要: To effectively reduce a measurement error in a parameter indicating a state of spectroscopic polarization generated by variations in retardation of a retarder due to a temperature change or other factors, while holding a variety of properties of a channeled spectroscopic polarimeter. By noting that reference phase functions φ1(σ) and φ2(σ) are obtained by solving an equation from each vibration component contained in a channeled spectrum P(σ), the reference phase functions φ1(σ) and φ2(σ) are calibrated concurrently with measurement of spectrometric Stokes parameters S0(σ), S1(σ), S2(σ), and S3(σ).

    摘要翻译: 为了有效地降低由于温度变化引起的延迟器的延迟的变化而产生的光谱极化的状态的参数的测量误差,或其他因素,同时保持通道的分光偏振计的各种特性。 通过注意到通过从通道谱P(sigma)中包含的每个振动分量求解方程来获得参考相位函数phi1(sigma)和φi2(sigma) ,参考相位函数phi1(sigma)和phi2(sigma)与光谱测量斯托克斯参数S 0(sigma)的测量同时校准 ),S 1(sigma),S 2(sigma)和S 3(sigma)。

    Defect inspection device and defect inspection method
    20.
    发明授权
    Defect inspection device and defect inspection method 有权
    缺陷检查装置和缺陷检查方法

    公开(公告)号:US09019492B2

    公开(公告)日:2015-04-28

    申请号:US13989835

    申请日:2011-11-10

    摘要: To prevent overlooking of a defect due to reduction in a defect signal, a defect inspection device is configured such that: light is irradiated onto an object to be inspected on which a pattern is formed; reflected, diffracted, and scattered light generated from the object by the irradiation of the light is collected, such that a first optical image resulting from the light passed through a first spatial filter having a first shading pattern is received by a first detector, whereby a first image is obtained; the reflected, diffracted, and scattered light generated from the object is collected, such that a second optical image resulting from the light passed through a second spatial filter having a second shading pattern is received by a second detector, whereby a second image is obtained; and the first and second images thus obtained are processed integrally to detect a defect candidate(s).

    摘要翻译: 为了防止由于缺陷信号的减少而忽视缺陷,缺陷检查装置被配置为使得光被照射到形成有图案的待检查对象上; 收集通过照射光从物体产生的反射,衍射和散射光,使得由通过具有第一阴影图案的第一空间滤光器的光产生的第一光学图像由第一检测器接收,由此 获得第一幅图像; 从物体产生的反射,衍射和散射光被收集,使得由通过具有第二阴影图案的第二空间滤光器的光产生的第二光学图像由第二检测器接收,由此获得第二图像; 并且由此获得的第一和第二图像被整体地处理以检测缺陷候选。