Abstract:
The present disclosure can provide a transparent display panel, a preparation method thereof and a display device. The transparent display panel includes a bearing layer disposed between a base substrate and a liquid crystal layer and including a plurality of concave structures, and a plurality of reflecting structures located between the bearing layer and the liquid crystal layer, where an orthographic projection of the concave structure on the base substrate covers an orthographic projection of one or more reflecting structures on the base substrate.
Abstract:
A photosensitive sensor, a preparation method thereof, and an electronic device, wherein the photosensitive sensor includes a substrate, the substrate having a sensing area, a plurality of regularly arranged sensing units being provided in the sensing area, a shielding layer being provided on a side of the sensing units away from the substrate, the shielding layer covering the sensing area, a material of the shielding layer being a transparent conductive material, and the shielding layer being connected with a constant voltage signal terminal.
Abstract:
The disclosure provides a display substrate, a fabrication method thereof and a display device. The display substrate includes a base, and has a display area and a frame area. The method includes: forming an active region of a thin film transistor in the display area; forming a first lead in the frame area; forming a buffer layer directly covering the first lead; forming a connection via hole communicating with the active region; forming a protective layer directly covering the buffer layer in the frame area; cleaning the active region exposed by the connection via hole after forming the protective layer; removing the protective layer in the frame area after cleaning; and forming a second lead in the frame area after removing the protective layer, an orthographic projection of the second lead on the base and an orthographic projection of the first lead on the base at least partially overlap.
Abstract:
A patterning method of a quantum dot layer, a quantum dot layer pattern, a quantum dot device, a manufacturing method of the quantum dot device, and a display apparatus are provided, The patterning method of the quantum dot layer includes: forming a quantum dot layer, in which the quantum dot layer includes quantum dots and a photoinitiator; irradiating a preset portion of the quantum dot layer by light having a preset wavelength to quench the quantum dots in the preset portion and form a patterned quantum dot layer.
Abstract:
A thin film transistor, a manufacturing method thereof, an array substrate, a display panel, and a display device are disclosed. The present disclosure is directed to the field of display technologies. The thin film transistor comprises a drain electrode and a source electrode. At least one of the drain electrode and the source electrode are an yttrium-doped first metal film, and a surface of the first metal film is yttrium-copper complex oxide formed by annealing.
Abstract:
The present disclosure provides a method of manufacturing an array substrate and a method of manufacturing a display device. The method of manufacturing an array substrate includes steps of: forming a planarization layer above a base substrate; forming an electrode layer above the planarization layer; forming a metal functional layer above the electrode layer; patterning the metal functional layer by using a multi-greyscale mask layer as a mask; forming an insulating protection layer on a portion of the electrode layer not being covered by the patterned metal functional layer; performing an ashing process on the multi-greyscale mask layer; patterning the electrode layer by using the metal functional layer as a mask; further patterning the metal functional layer by using the multi-greyscale mask layer subjected to the ashing process as a mask.
Abstract:
A display panel includes a first substrate and a second substrate which are arranged opposed to each other. The space between the first substrate and the second substrate is separated into a plurality of sub-pixel regions. Within each sub pixel region, a first electrode, a first fluid layer, a second fluid layer, a hydrophobic dielectric layer and a second electrode are arranged in this order. The first fluid layer is made of hydrophilic liquid. The second fluid layer is made of ink. When no electric field is applied between the first electrode and the second electrode, the ink spreads over the surface of the hydrophobic dielectric layer. When an electric field is applied between the first electrode and the second electrode, the ink aggregates to expose the hydrophobic dielectric layer.
Abstract:
The present disclosure discloses a fluorescent material and a manufacturing method and use thereof. The fluorescent material comprises SnO2 doped with Ag, wherein the molar ratio of Ag to SnO2 is 0.0014-0.007:1. The fluorescent material can emit fluorescent lights of two different colors which are complementary colors of each other, and the fluorescent material has a long service life. The fluorescent material is synthesized via a hydrothermal method under air atmosphere by using SnCl4.5H2O as a raw material. The method for manufacturing the fluorescent material is easy and simple, and significant economic and social benefits can be obtained when it is popularized and applied in the fields of illumination and display. The fluorescent material can be employed for manufacturing white-light fluorescent powder used in a white-light LED excitable by an ultraviolet-near ultraviolet LED diode chip.
Abstract:
The invention belongs to the field of display technology, and particularly provides an array substrate and a method for manufacturing the same, and a display device. The array substrate includes a base substrate, and a thin film transistor and at least one driving electrode provided on the base substrate, and the thin film transistor includes a gate, and a source and a drain provided in the same layer, wherein the gate, the source or the drain is formed with the same material as the at least one driving electrode, and thickness thereof is larger than that of the at least one driving electrode. Regarding the array substrate, the manufacturing procedure of the array substrate is effectively simplified, cost for mask plate and material is reduced, equipment investment is reduced, production cost is saved, productivity is improved, and competitiveness of the display device is increased, while the transmittance requirement is met.
Abstract:
The present application relates to the technical field of display, and discloses an OLED display panel and a display device. The OLED display panel includes a drive backplane; and an OLED device, an encapsulation structure and a color resistor structure which are arranged on the drive backplane; the encapsulation structure and the color resistor structure are located on a side, facing away from the drive backplane, of the OLED device, and the color resistor structure includes a chromatic color resistor layer, a first BM and a second BM; and the first BM is located on a side, facing away from the drive backplane, of the chromatic color resistor layer, and the second BM is located on a side, facing the drive backplane, of the chromatic color resistor layer.