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公开(公告)号：US07352440B2
公开(公告)日：2008-04-01
申请号：US11008576
申请日：2004-12-10
申请人： Christiaan Alexander Hoogendam , Gerrit Johannes Nijmeijer , Minne Cuperus , Petrus Anton Willem Cornelia Maria Van Eijck
发明人： Christiaan Alexander Hoogendam , Gerrit Johannes Nijmeijer , Minne Cuperus , Petrus Anton Willem Cornelia Maria Van Eijck
CPC分类号： G03F7/70341 , G01B11/14 , G01B11/26 , G01B11/272 , G03F7/707 , G03F7/70716 , G03F7/70775 , G03F9/7011
摘要： A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.
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公开(公告)号：US20120050740A1
公开(公告)日：2012-03-01
申请号：US13288714
申请日：2011-11-03
申请人： CHRISTIAAN ALEXANDER HOOGENDAM , Gerrit Johannes Nijmeijer , Minne Cuperus , Petrus Anton Willem Cornelia Maria Van Eijck
发明人： CHRISTIAAN ALEXANDER HOOGENDAM , Gerrit Johannes Nijmeijer , Minne Cuperus , Petrus Anton Willem Cornelia Maria Van Eijck
IPC分类号： G01B11/00
CPC分类号： G03F7/70341 , G01B11/14 , G01B11/26 , G01B11/272 , G03F7/707 , G03F7/70716 , G03F7/70775 , G03F9/7011
摘要： A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.
摘要翻译： 用于确定衬底的中心和卡盘中的凹陷的中心之间的偏移的方法包括向所述凹陷提供测试衬底，所述测试衬底具有小于所述凹陷的尺寸的尺寸，测量对准的位置 在凹陷期间测试基板的标记，并且从对准标记的位置确定基板的中心与凹陷的中心之间的偏移。
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公开(公告)号：US08077291B2
公开(公告)日：2011-12-13
申请号：US11907045
申请日：2007-10-09
申请人： Christiaan Alexander Hoogendam , Gerrit Johannes Nijmeijer , Minne Cuperus , Petrus Anton Willern Cornelia Maria Van Eijck
发明人： Christiaan Alexander Hoogendam , Gerrit Johannes Nijmeijer , Minne Cuperus , Petrus Anton Willern Cornelia Maria Van Eijck
CPC分类号： G03F7/70341 , G01B11/14 , G01B11/26 , G01B11/272 , G03F7/707 , G03F7/70716 , G03F7/70775 , G03F9/7011
摘要： A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.
摘要翻译： 用于确定衬底的中心和卡盘中的凹陷的中心之间的偏移的方法包括向所述凹陷提供测试衬底，所述测试衬底具有小于所述凹陷的尺寸的尺寸，测量对准的位置 在凹陷期间测试基板的标记，并且从对准标记的位置确定基板的中心与凹陷的中心之间的偏移。
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公开(公告)号：US08441617B2
公开(公告)日：2013-05-14
申请号：US13288714
申请日：2011-11-03
申请人： Christiaan Alexander Hoogendam , Gerrit Johannes Nijmeijer , Minne Cuperus , Petrus Anton Willem Cornelia Maria Van Eijck
发明人： Christiaan Alexander Hoogendam , Gerrit Johannes Nijmeijer , Minne Cuperus , Petrus Anton Willem Cornelia Maria Van Eijck
CPC分类号： G03F7/70341 , G01B11/14 , G01B11/26 , G01B11/272 , G03F7/707 , G03F7/70716 , G03F7/70775 , G03F9/7011
摘要： A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.
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公开(公告)号：US20130182231A1
公开(公告)日：2013-07-18
申请号：US13672539
申请日：2012-11-08
申请人： Christiaan Alexander Hoogendam , Gerrit Johannes Nijmeijer , Minne Cuperus , Petrus Anton Willem Cornelia Maria Van Eijck
发明人： Christiaan Alexander Hoogendam , Gerrit Johannes Nijmeijer , Minne Cuperus , Petrus Anton Willem Cornelia Maria Van Eijck
CPC分类号： G03F7/70341 , G01B11/14 , G01B11/26 , G01B11/272 , G03F7/707 , G03F7/70716 , G03F7/70775 , G03F9/7011
摘要： A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.
摘要翻译： 用于确定衬底的中心和卡盘中的凹陷的中心之间的偏移的方法包括向所述凹陷提供测试衬底，所述测试衬底具有小于所述凹陷的尺寸的尺寸，测量对准的位置 在凹陷期间测试基板的标记，并且从对准标记的位置确定基板的中心与凹陷的中心之间的偏移。
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公开(公告)号：US20050259233A1
公开(公告)日：2005-11-24
申请号：US10850451
申请日：2004-05-21
申请人： Bob Streefkerk , Henrikus Herman Cox , Christiaan Hoogendam , Jeroen Johannes Sophia Mertens , Koen Jacobus Johannes Zaal , Minne Cuperus
发明人： Bob Streefkerk , Henrikus Herman Cox , Christiaan Hoogendam , Jeroen Johannes Sophia Mertens , Koen Jacobus Johannes Zaal , Minne Cuperus
IPC分类号： G03F7/20 , H01L21/027 , G03B27/42
CPC分类号： G03F7/70341 , G03F7/70641 , G03F7/70783
摘要： An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.
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公开(公告)号：US20080231826A1
公开(公告)日：2008-09-25
申请号：US11689926
申请日：2007-03-22
IPC分类号： G03F7/20
CPC分类号： G03F7/70475 , G03F7/70283 , G03F7/70291
摘要： A device manufacturing method comprising applying patterns to a plurality of arrays of individually controllable elements, such that they modulate a beam of radiation, and projecting the modulated beam of radiation onto a substrate. The patterns applied to the arrays of individually controllable elements are arranged such that pre-determined amounts of background radiation are included in the modulated beam of radiation. The pre-determined amounts of background radiation being different for different locations on the arrays.
摘要翻译： 一种器件制造方法，包括将图案应用于独立可控元件的多个阵列，使得它们调制辐射束，并将经调制的辐射束投影到衬底上。 应用于独立可控元件的阵列的图案被布置成使得预定数量的背景辐射被包括在调制的辐射束中。 背景辐射的预定量对于阵列上的不同位置是不同的。
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公开(公告)号：US20080224251A1
公开(公告)日：2008-09-18
申请号：US11686136
申请日：2007-03-14
申请人： Kars Zeger Troost , Jason Douglas Hintersteiner , Minne Cuperus , Kamen Hristov Chilov , Richard Carl Zimmerman , Ronnie Florentius Van T. Westeinde
发明人： Kars Zeger Troost , Jason Douglas Hintersteiner , Minne Cuperus , Kamen Hristov Chilov , Richard Carl Zimmerman , Ronnie Florentius Van T. Westeinde
CPC分类号： G03F7/70791 , G03F7/70291 , G03F7/70358 , G03F7/70475 , G03F7/70508
摘要： A lithographic system is provided in which an extent of overlap between pattern sections is adjusted in order to match a size of a pattern section to a size of a repeating portion of the pattern to be formed.
摘要翻译： 提供了一种光刻系统，其中调整图案部分之间的重叠程度，以便将图案部分的尺寸与要形成的图案的重复部分的尺寸相匹配。
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公开(公告)号：US20080304034A1
公开(公告)日：2008-12-11
申请号：US11759587
申请日：2007-06-07
CPC分类号： G03F7/70291 , G03F7/70558 , G03F7/70608
摘要： A lithographic apparatus comprises a patterning device, a projection system, and a controller. The patterning device is configured to pattern a beam of radiation. The radiation beam comprises a plurality of pulses of radiation. The projection system is configured to project the patterned beam of radiation onto a substrate coated with a layer of radiation sensitive material. The controller is arranged to control a total energy of a respective pulse of the plurality of pulses of the radiation beam. The controller is configured to take into account information indicative of properties of the layer of radiation sensitive material on a part of the substrate onto which the radiation beam is to be projected.
摘要翻译： 光刻设备包括图案形成装置，投影系统和控制器。 图案形成装置被配置成对辐射束进行图案化。 辐射束包括多个辐射脉冲。 投影系统被配置为将图案化的辐射束投影到涂覆有一层辐射敏感材料的基底上。 控制器被布置成控制辐射束的多个脉冲中的相应脉冲的总能量。 控制器被配置为考虑在辐射束将被投影到的衬底的一部分上的辐射敏感材料层的特性的信息。
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20.发明申请Lithographic apparatus, immersion projection apparatus and device manufacturing method 有权平版印刷装置，浸没投影装置及装置的制造方法公开(公告)号：US20060215131A1
公开(公告)日：2006-09-28
申请号：US11090699
申请日：2005-03-28
申请人： Jan-Gerard Van Der Toorn , Hans Butler , Henrikus Cox , Evert Draaijer , Nicolaas Ten Kate , Frits Van Der Meulen , Mark Johannes Frencken , Martijn Houkes , Antonius Arends , Minne Cuperus
发明人： Jan-Gerard Van Der Toorn , Hans Butler , Henrikus Cox , Evert Draaijer , Nicolaas Ten Kate , Frits Van Der Meulen , Mark Johannes Frencken , Martijn Houkes , Antonius Arends , Minne Cuperus
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A lithographic apparatus comprises a substrate table to hold a substrate and a projection system to project a patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further comprises a fluid supply system to supply a fluid between the substrate and a final lens element of the projection system as well as a position controller to control a position of the fluid supply system. The position controller is configured to, being provided with a position quantity of the substrate, determine a desired position of the liquid supply system by adding a position offset to the position quantity of the substrate, and position the liquid supply system according to the desired position. The position quantity may comprise a position and/or rotational position of the substrate table and/or a height function of a substrate height.
摘要翻译： 光刻设备包括用于保持基板的基板台和将图案化的辐射束投影到基板的目标部分上的投影系统。 光刻设备还包括一个流体供应系统，用于在基板和投影系统的最终透镜元件之间提供流体，以及位置控制器，用于控制流体供应系统的位置。 位置控制器被配置为具有基板的位置量，通过向基板的位置量添加位置偏移来确定液体供应系统的期望位置，并且根据期望位置定位液体供应系统 。 位置量可以包括衬底台的位置和/或旋转位置和/或衬底高度的高度函数。
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