Abstract:
The present disclosure provides an OLED display substrate, its manufacturing method and a display device. The OLED display substrate includes a base substrate, and a TFT and an OLED driven by the TFT on the base substrate and. The OLED includes, in a direction away from the base substrate, an anode, an organic layer and a cathode in turn. The OLED display substrate further includes an auxiliary electrode connected in parallel to a part of the cathode.
Abstract:
An array substrate and a manufacturing method thereof, a display device and a thin film transistor are provided. The method includes forming a pattern that includes an active layer, a pixel electrode and a data line on a base substrate; forming a pattern that includes a gate insulating layer and at least two gate via-holes therein, the at least two gate via-holes are located in regions in the gate insulating layer that correspond to outer surroundings of the active layer and do not overlap with areas where the pixel electrode and the data line are located; forming a pattern that includes a gate line and at least two gate electrodes, the at least two gate electrodes are connected to the gate line, and are provided in the at least two gate via-holes, respectively. With this method, the fabricating process and the fabricating cost are saved.
Abstract:
An array substrate and a manufacturing method thereof and a display device are provided, and the array substrate comprises: a substrate (1); a thin film transistor, a passivation layer (5) and a transparent electrode (6), sequentially formed on the substrate, wherein a groove (51) is formed in an upper surface of the passivation layer (5), and the transparent electrode (6) is provided in the groove (51).
Abstract:
There are provided a thin film transistor and a manufacturing method thereof, an array substrate and a display device. The thin film transistor is formed on a base substrate, and includes a gate electrode, an active layer, a source electrode and a drain electrode, the gate electrode includes a first section, a second section and a third section, the first section and the third section correspond to locations of the source electrode and the drain electrode, respectively; the base substrate has two recesses formed therein, and the first section and the third section are situated in the two recesses, respectively; the first section and the third section are covered with a filling layer; the filling layer and the second section are covered with a gate insulating layer, the active layer, the source electrode and the drain electrode in sequence.
Abstract:
A display substrate panel includes a substrate and multiple OLED elements disposed on the substrate, and further includes a thin film encapsulation layer disposed on the OLED elements and a light blocking layer disposed on the thin film encapsulation layer and located between two adjacent OLED elements. A display panel includes the above display substrate panel and a cover panel which is aligned and combined into a cell with the display substrate panel, wherein the cover panel includes a color film layer, and the color film layer has a red color film, a green color film and a blue color film which are disposed to correspond to the OLED elements.
Abstract:
An organic light emitting diode display panel, a manufacturing method thereof, and a display device are disclosed. The organic light emitting diode display panel includes: a base substrate; a light emitting layer on the base substrate, a spectral width at 10%-15% of a maximum spectral intensity of an emission spectrum of the light emitting layer is not less than 200 nm, and a yellow-green wave band of the emission spectrum includes at least one peak located between 550 nm-562 nm.
Abstract:
The invention relates to a method for fabricating an array substrate, an array substrate and a display device. The method for fabricating an array substrate may comprise: forming a pattern including a source electrode, a drain electrode and a data line; forming a non-crystalline semiconductor thin film layer; and performing annealing, so as to convert only the non-crystalline semiconductor thin film layer on the source electrode, drain electrode and data line to a metal semiconductor compound. By converting only the non-crystalline semiconductor thin film layer on the source electrode, drain electrode and data line into a metal semiconductor compound, the resulting metal semiconductor compound may prevent oxidative-corrosion of the metal thin film layer, such as a low-resistance metal (e.g., Cu or Ti) layer, in the subsequent procedures, which is favorable for the fabrication of a metal oxide thin film transistor using Cu or Ti.
Abstract:
An array substrate and a fabrication method thereof, and a display device are provided. The array substrate comprises a gate line and a data line intersecting with each other. The data line and the gate line are formed in a same layer on a substrate, the data line is disconnected in a region of the gate line. A connection pattern is formed in the region of the gate line, the connection pattern is insulated from the gate line, and ends of the data line located on both sides of the gate line are electrically connected by the connection pattern.
Abstract:
An array substrate and a manufacturing method thereof, a liquid crystal display panel and a display device are provided, the array substrate comprises a base substrate, and thin film transistors and pixel electrodes provided on the base substrate, the pixel electrode and the active layer in the thin film transistor are provided in the same layer. The active layer is formed of transparent oxide semiconductor material, and the concentration of carriers in the oxide semiconductor material may be increased by performing a plasma process on the oxide semiconductor material, thus the pixel electrode may be manufactured by using the oxide semiconductor material used for manufacturing the active layer, thereby the pixel electrode and the active layer can be provided in the same layer, the number of the masks can be reduced, the manufacturing process is simplified, production cost is saved, the productivity is increased, and the manufacturing time is shortened.
Abstract:
An array substrate, a manufacturing method thereof and a display device are provided. The array substrate comprises a base substrate (1), an organic light-emitting diode (OLED) device and a thin-film transistor (TFT) structure, the OLED device disposed on one side of the base substrate (1); the TFT structure disposed on the other side of the base substrate (1); a through hole formed on the base substrate and provided with a conductive bridge (2); and the OLED device connected with the TFT structure through the conductive bridge (2). The array substrate can avoid electrical interference of the TFT structure on the OLED device, and hence accurate drive for the OLED device can be achieved; as the OLED device can be directly formed on a surface of the base substrate, surface treatment of a pixel electrode is saved with respect to conventional OLED display device, and hence manufacturing process can be accelerated and manufacturing cost can be reduced; and as both an anode and a cathode of the OLED device are made from transparent materials, double-sided light emission can be achieved in the array substrate, and hence double-sided display can be achieved in the array substrate.