公开(公告)号：US20160035744A1

公开(公告)日：2016-02-04

申请号：US14421315

申请日：2014-07-03

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Heecheol KIM ,  Youngsuk SONG ,  Seongyeol YOO ,  Seungjin CHOI

IPC: H01L27/12

CPC classification number: H01L27/124 ,  G02F1/1345 ,  G02F1/1362 ,  G02F2001/136254

Abstract: An array substrate and a display device, the array substrate comprises a fan-out area (91), an edge area (93) and a display area (92) for performing display, the fan-out area (91) and the edge area (93) are connected with the display area (92) and located on two non-adjacent sides of the display area (92) respectively; a plurality of wirings (1) are arranged on the array substrate, and the wirings (1) are routed through the display area (92) and extend into the edge area (93), the input end of each wiring (1) is located in the fan-out area (91); pads (2) are configured for the wirings (1) respectively are located on the side far away from the input end of each wiring, and the pads (2) are located in the edge area (93).

Abstract translation: 阵列基板和显示装置，阵列基板包括用于进行显示的扇出区域（91），边缘区域（93）和显示区域（92），扇出区域（91）和边缘区域 （93）分别与显示区域（92）连接并分别位于显示区域（92）的两个非相邻侧面上; 多个布线（1）布置在阵列基板上，并且布线（1）穿过显示区域（92）并延伸到边缘区域（93）中，每个布线（1）的输入端位于 在扇出区域（91）中; 导线（2）分别配置在位于远离每个布线的输入端的一侧的布线（1）上，并且焊盘（2）位于边缘区域（93）中。

公开(公告)号：US20140042540A1

公开(公告)日：2014-02-13

申请号：US13964610

申请日：2013-08-12

Applicant: Boe Technology Group Co., Ltd.

Inventor： Seungjin CHOI ,  Seongyeol YOO ,  Youngsuk SONG

IPC: H01L27/12

CPC classification number: H01L27/1214 ,  H01L27/1262 ,  H01L27/1288 ,  H01L29/41733 ,  H01L29/42384 ,  H01L29/78603

Abstract: Disclosed are an array substrate, a method for fabricating the same and a display device. The array substrate comprises: a substrate, a gate electrode, a gate insulating layer as well as an active layer, and a source/drain metal layer formed on the substrate, the source/drain metal layer is configured for forming a source electrode, a drain electrode and a channel region, wherein a region of the S/D metal layer for forming the channel region is at a lower height than other region of the S/D metal layer for forming the source electrode and the drain electrode.

Abstract translation: 公开了阵列基板，其制造方法和显示装置。 阵列基板包括：基板，栅极电极，栅极绝缘层以及有源层，以及形成在基板上的源极/漏极金属层，源极/漏极金属层被构造成用于形成源极， 漏电极和沟道区，其中用于形成沟道区的S / D金属层的区域处于与用于形成源电极和漏电极的S / D金属层的其它区域相比较低的高度。

公开(公告)号：US20160027817A1

公开(公告)日：2016-01-28

申请号：US14421947

申请日：2014-04-21

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Seongyeol YOO ,  Seungjin CHOI ,  Heecheol KIM ,  Youngsuk SONG

IPC: H01L27/12

CPC classification number: H01L27/1288 ,  H01L27/1225 ,  H01L27/124 ,  H01L27/127

Abstract: Disclosed is an array substrate, a method of manufacturing the same, and a display device. The method of manufacturing an array substrate includes: forming a pattern comprising an active layer, a source, a drain, a data line and a pixel electrode on a base substrate through a single patterning process; forming a pattern of an insulating layer; forming a pattern comprising a gate and a gate line through a single patterning process. In the array substrate, the method of manufacturing the same, and the display device of the present invention, only two patterning processes are required to achieve the fabrication of the array substrate, which has less and simple process steps, thereby reduces the manufacturing complexity and manufacturing cost, and increasing the production efficiency and the economic benefit.

Abstract translation: 公开了一种阵列基板及其制造方法以及显示装置。 制造阵列基板的方法包括：通过单个图案化工艺在基底基板上形成包括有源层，源极，漏极，数据线和像素电极的图案; 形成绝缘层的图案; 通过单个图案化工艺形成包括栅极和栅极线的图案。 在阵列基板中，其制造方法和本发明的显示装置仅需要两个图案化工艺来实现阵列基板的制造，其具有较少且简单的工艺步骤，从而降低了制造复杂度， 制造成本，提高生产效率和经济效益。

公开(公告)号：US20160027812A1

公开(公告)日：2016-01-28

申请号：US14429501

申请日：2014-05-29

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： HeecheoI KIM ,  Youngsuk SONG ,  Seongyeol YOO ,  Seungjin CHOI

IPC: H01L27/12 ,  H01L23/31 ,  H01L23/00 ,  H01L29/66 ,  H01L23/528 ,  H01L21/56 ,  H01L21/441 ,  H01L29/24 ,  H01L23/522 ,  H01L29/786 ,  H01L21/768

CPC classification number: H01L27/1248 ,  H01L21/441 ,  H01L21/56 ,  H01L21/76831 ,  H01L23/3171 ,  H01L23/5226 ,  H01L23/528 ,  H01L24/03 ,  H01L24/05 ,  H01L27/1225 ,  H01L27/124 ,  H01L27/1259 ,  H01L27/1262 ,  H01L29/24 ,  H01L29/41733 ,  H01L29/42384 ,  H01L29/66969 ,  H01L29/78603 ,  H01L29/78636 ,  H01L29/7869 ,  H01L29/78696 ,  H01L2224/08052 ,  H01L2924/13069

Abstract: An array substrate, a method for fabricating the same and a display device are disclosed. The array substrate includes: a gate electrode of a TFT and a gate insulation layer sequentially formed on a base substrate; a semiconductor active layer, an etch stop layer and a source electrode and a drain electrode of the TFT sequentially formed on a part of the gate insulation layer that corresponds to the gate electrode of the TFT, the source and drain electrodes of the TFT are respectively in contact with the semiconductor active layer by way of via holes. The array substrate further includes: a first insulation layer formed between the gate electrode of the TFT and the gate insulation layer and the gate electrode is in contact with the gate insulation layer at a channel region of the TFT between the source electrode and the drain electrode of the TFT.

Abstract translation: 公开了阵列基板，其制造方法和显示装置。 阵列基板包括：TFT的栅极电极和依次形成在基底基板上的栅极绝缘层; TFT的栅极绝缘层的一部分依次形成半导体有源层，蚀刻停止层以及源电极和漏电极，TFT的栅极电极和漏电极分别对应于TFT的栅电极 通过通孔与半导体活性层接触。 阵列基板还包括：形成在TFT的栅电极和栅极绝缘层之间的第一绝缘层和栅极电极在源极电极和漏电极之间的TFT的沟道区域处与栅极绝缘层接触 的TFT。

公开(公告)号：US20160013216A1

公开(公告)日：2016-01-14

申请号：US14852810

申请日：2015-09-14

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Seongyeol YOO ,  Youngsuk SONG ,  Heecheol KIM ,  Seungjin CHOI

IPC: H01L27/12 ,  G02F1/1368 ,  H01L23/31 ,  H01L29/786 ,  H01L29/24 ,  H01L23/522 ,  G02F1/1362 ,  G02F1/1343

CPC classification number: H01L27/1225 ,  G02F1/13439 ,  G02F1/136227 ,  G02F1/136286 ,  G02F1/1368 ,  G02F2001/134372 ,  H01L21/77 ,  H01L23/3171 ,  H01L23/5226 ,  H01L27/124 ,  H01L27/1259 ,  H01L27/127 ,  H01L27/1288 ,  H01L29/24 ,  H01L29/7869 ,  H01L2224/24 ,  H01L2224/73267 ,  H01L2224/82 ,  H01L2224/92244

Abstract: An array substrate, a method of fabricating the same, and a liquid crystal display device are disclosed. The method comprises: sequentially forming a first transparent conductive material layer, an insulation material layer, a semiconductor material layer and a photoresist layer on a substrate base and forming patterns including a gate line, a gate, a gate insulation layer, a semiconductor layer and a first transparent electrode by patterning process; forming a passivation layer and forming a source via and a drain via connected to the semiconductor layer in the passivation layer; sequentially forming a second transparent conductive material layer and a source-drain metal layer and forming patterns including a source, a drain and a second transparent electrode by patterning process, the gate insulation layer is formed only on the gate and the gate line, the source and the drain include stacked second transparent conductive material layer and source-drain metal layer.

Abstract translation: 公开了阵列基板，其制造方法和液晶显示装置。 该方法包括：在衬底上依次形成第一透明导电材料层，绝缘材料层，半导体材料层和光致抗蚀剂层，并形成包括栅极线，栅极，栅绝缘层，半导体层和 通过图案化工艺的第一透明电极; 形成钝化层，并形成连接到钝化层中的半导体层的源极通孔和漏极通孔; 顺序地形成第二透明导电材料层和源极 - 漏极金属层，并且通过图案化工艺形成包括源极，漏极和第二透明电极的图案，栅极绝缘层仅形成在栅极和栅极线上，源极 并且漏极包括层叠的第二透明导电材料层和源极 - 漏极金属层。

公开(公告)号：US20170062238A1

公开(公告)日：2017-03-02

申请号：US15022283

申请日：2015-09-18

Applicant: Boe Technology Group Co., Ltd.

Inventor： Seongyeol YOO ,  Seungjin CHOI ,  Youngsuk SONG

IPC: H01L21/44 ,  H01L27/12 ,  H01L29/786 ,  H01L29/66 ,  H01L29/45

CPC classification number: H01L21/44 ,  H01L27/1225 ,  H01L29/45 ,  H01L29/458 ,  H01L29/66969 ,  H01L29/78681 ,  H01L29/7869 ,  H01L29/78696

Abstract: The invention relates to a method for fabricating an array substrate, an array substrate and a display device. The method for fabricating an array substrate may comprise: forming a pattern including a source electrode, a drain electrode and a data line; forming a non-crystalline semiconductor thin film layer; and performing annealing, so as to convert only the non-crystalline semiconductor thin film layer on the source electrode, drain electrode and data line to a metal semiconductor compound. By converting only the non-crystalline semiconductor thin film layer on the source electrode, drain electrode and data line into a metal semiconductor compound, the resulting metal semiconductor compound may prevent oxidative-corrosion of the metal thin film layer, such as a low-resistance metal (e.g., Cu or Ti) layer, in the subsequent procedures, which is favorable for the fabrication of a metal oxide thin film transistor using Cu or Ti.

Abstract translation: 本发明涉及阵列基板，阵列基板和显示装置的制造方法。 制造阵列基板的方法可以包括：形成包括源电极，漏电极和数据线的图案; 形成非晶半导体薄膜层; 进行退火，仅将源电极，漏电极和数据线上的非晶半导体薄膜层转换为金属半导体化合物。 通过仅将源电极，漏电极和数据线上的非晶半导体薄膜层转化为金属半导体化合物，所得到的金属半导体化合物可以防止金属薄膜层的氧化腐蚀，例如低电阻 金属（例如Cu或Ti）层，在随后的程序中，这有利于使用Cu或Ti制造金属氧化物薄膜晶体管。

公开(公告)号：US20160049425A1

公开(公告)日：2016-02-18

申请号：US14424717

申请日：2014-05-23

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Heecheol KIM ,  Youngsuk SONG ,  Seongyeol YOO ,  Seungjin CHOI

IPC: H01L27/12 ,  G02F1/1343 ,  H01L29/66 ,  G02F1/1368 ,  H01L29/786 ,  G02F1/1362 ,  G02F1/1333

CPC classification number: H01L27/124 ,  G02F1/133345 ,  G02F1/13439 ,  G02F1/136227 ,  G02F1/136286 ,  G02F1/1368 ,  G02F2001/136295 ,  H01L27/1222 ,  H01L27/1259 ,  H01L29/66765 ,  H01L29/66969 ,  H01L29/78669 ,  H01L29/78678 ,  H01L29/7869

Abstract: An array substrate and a fabrication method thereof, and a display device are provided. The array substrate comprises a gate line and a data line intersecting with each other. The data line and the gate line are formed in a same layer on a substrate, the data line is disconnected in a region of the gate line. A connection pattern is formed in the region of the gate line, the connection pattern is insulated from the gate line, and ends of the data line located on both sides of the gate line are electrically connected by the connection pattern.

Abstract translation: 提供阵列基板及其制造方法以及显示装置。 阵列基板包括彼此相交的栅极线和数据线。 数据线和栅极线形成在基板上的同一层中，数据线在栅极线的区域中断开。 连接图案形成在栅极线的区域中，连接图案与栅极线绝缘，位于栅极线两侧的数据线的端部通过连接图案电连接。

公开(公告)号：US20150380441A1

公开(公告)日：2015-12-31

申请号：US14500007

申请日：2014-09-29

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Seungjin CHOI ,  Heecheol KIM ,  Youngsuk SONG ,  Seongyeol YOO

IPC: H01L27/12 ,  H01L29/786

CPC classification number: H01L27/1222 ,  H01L27/1225 ,  H01L27/127 ,  H01L29/7869

Abstract: An array substrate and a manufacturing method thereof, a liquid crystal display panel and a display device are provided, the array substrate comprises a base substrate, and thin film transistors and pixel electrodes provided on the base substrate, the pixel electrode and the active layer in the thin film transistor are provided in the same layer. The active layer is formed of transparent oxide semiconductor material, and the concentration of carriers in the oxide semiconductor material may be increased by performing a plasma process on the oxide semiconductor material, thus the pixel electrode may be manufactured by using the oxide semiconductor material used for manufacturing the active layer, thereby the pixel electrode and the active layer can be provided in the same layer, the number of the masks can be reduced, the manufacturing process is simplified, production cost is saved, the productivity is increased, and the manufacturing time is shortened.

Abstract translation: 提供阵列基板及其制造方法，液晶显示面板和显示装置，阵列基板包括基底基板，薄膜晶体管和设置在基底基板上的像素电极，像素电极和有源层 薄膜晶体管设置在同一层中。 有源层由透明氧化物半导体材料形成，并且可以通过对氧化物半导体材料执行等离子体处理来增加氧化物半导体材料中的载流子的浓度，因此可以通过使用用于 制造有源层，由此可以将像素电极和有源层设置在相同的层中，可以减少掩模的数量，简化制造工序，节省生产成本，提高生产率，制造时间 缩短了

公开(公告)号：US20150325630A1

公开(公告)日：2015-11-12

申请号：US14418007

申请日：2014-03-31

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Seongyeol YOO ,  Seungjin CHOI ,  Heecheol KIM ,  Youngsuk SONG

IPC: H01L27/32 ,  H01L29/786 ,  H01L51/56 ,  H01L51/52

CPC classification number: H01L51/56 ,  H01L21/77 ,  H01L27/3248 ,  H01L27/3251 ,  H01L27/3253 ,  H01L27/326 ,  H01L29/41733 ,  H01L29/78606 ,  H01L51/5206 ,  H01L51/5234 ,  H01L2227/323 ,  H01L2251/5323

Abstract: An array substrate, a manufacturing method thereof and a display device are provided. The array substrate comprises a base substrate (1), an organic light-emitting diode (OLED) device and a thin-film transistor (TFT) structure, the OLED device disposed on one side of the base substrate (1); the TFT structure disposed on the other side of the base substrate (1); a through hole formed on the base substrate and provided with a conductive bridge (2); and the OLED device connected with the TFT structure through the conductive bridge (2). The array substrate can avoid electrical interference of the TFT structure on the OLED device, and hence accurate drive for the OLED device can be achieved; as the OLED device can be directly formed on a surface of the base substrate, surface treatment of a pixel electrode is saved with respect to conventional OLED display device, and hence manufacturing process can be accelerated and manufacturing cost can be reduced; and as both an anode and a cathode of the OLED device are made from transparent materials, double-sided light emission can be achieved in the array substrate, and hence double-sided display can be achieved in the array substrate.

Abstract translation: 提供阵列基板，其制造方法和显示装置。 阵列基板包括基底（1），有机发光二极管（OLED）器件和薄膜晶体管（TFT）结构，所述OLED器件设置在所述基底衬底的一侧上; 所述TFT结构设置在所述基底基板（1）的另一侧上; 形成在所述基底基板上并设置有导电桥（2）的通孔; 以及通过导电桥（2）与TFT结构连接的OLED器件。 阵列基板可以避免TFT结构在OLED器件上的电气干扰，因此可以实现对OLED器件的精确驱动; 由于OLED器件可以直接形成在基底基板的表面上，相对于传统的OLED显示器件，可以节省像素电极的表面处理，因此可以加速制造工艺并降低制造成本; 并且由于OLED器件的阳极和阴极都由透明材料制成，所以可以在阵列衬底中实现双面发光，因此可以在阵列衬底中实现双面显示。

公开(公告)号：US20160322396A1

公开(公告)日：2016-11-03

申请号：US15138971

申请日：2016-04-26

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Jianguo WANG ,  Seongyeol YOO

IPC: H01L27/12 ,  H01L29/45 ,  H01L21/4763 ,  H01L29/66 ,  H01L21/027 ,  H01L29/786 ,  H01L29/423

CPC classification number: H01L27/1225 ,  G02F1/1362 ,  G02F1/136227 ,  G02F1/136286 ,  G02F2001/136295 ,  G02F2201/501 ,  G02F2202/103 ,  H01L27/124 ,  H01L27/1288 ,  H01L29/45 ,  H01L29/66969 ,  H01L29/78606 ,  H01L29/7869

Abstract: The present disclosure provides an array substrate, its manufacturing method, a display panel and a display device. A conductive metal pattern of the array substrate is covered with an oxygen barrier film.

Abstract translation: 本公开提供了阵列基板，其制造方法，显示面板和显示装置。 阵列基板的导电金属图案被氧阻隔膜覆盖。