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公开(公告)号：US06912043B2
公开(公告)日：2005-06-28
申请号：US10692822
申请日：2003-10-27
申请人： Daniel N. Galburt
发明人： Daniel N. Galburt
CPC分类号： G03F1/64 , G03F7/70983
摘要： An apparatus for maintaining an optical gap between a pellicle and a reticle in a photolithography system includes a frame defining first and second opposing surfaces, a reticle mated to the first opposing surface using magnetic coupling; and a pellicle mated to the second opposing surface using magnetic coupling.
摘要翻译： 用于在光刻系统中保持防护薄膜组件和掩模版之间的光学间隙的装置包括限定第一和第二相对表面的框架，使用磁耦合与第一相对表面配合的掩模版; 以及使用磁耦合与第二相对表面配合的防护薄膜。
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公开(公告)号：US6013401A
公开(公告)日：2000-01-11
申请号：US232758
申请日：1999-01-15
IPC分类号： G02B26/02 , G03F7/20 , G03F7/23 , H01L21/027 , G03F9/00
CPC分类号： G03F7/70066 , G03F7/70358 , G03F7/70558
摘要： Blades pivotally attached together linked to push rods and inserted into an illumination field, energy or flux. The blades extend longitudinally along the length of a rectangular illumination field or slit used to image a reticle onto a photosensitive substrate. The blades controllably adjust the width of the rectangular illumination field to modify the illumination intensity or energy provided to a photosensitive substrate. The illumination field is scanned across the photosensitive substrate to expose it with the image of a reticle. The blades are dynamically controlled during the scanning exposure to adjust the illumination intensity or energy in a predetermined way. The resulting selective change in exposure dose corrects local area of line width variance. Various errors in pattern reproduction using a photolithographic system are relatively easily corrected. This is particularly advantageous in a scanning lithography system used in the manufacture of semiconductors.
摘要翻译： 叶片可枢转地连接在一起，连接到推杆上并插入照明场，能量或通量。 刀片沿着用于将掩模版成像到感光基底上的矩形照明场或狭缝的长度纵向延伸。 叶片可控制地调整矩形照明场的宽度以改变提供给感光基底的照明强度或能量。 照射场被扫描在感光基片上，以将其与掩模版的图像一起曝光。 在扫描曝光期间动态地控制叶片以预定的方式调节照明强度或能量。 所得到的曝光剂量的选择性变化校正了线宽方差的局部区域。 使用光刻系统的图案再现中的各种错误相对容易地被校正。 这在用于制造半导体的扫描光刻系统中是特别有利的。
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13.再颁专利Fluid gauge proximity sensor and method of operating same using a modulated fluid flow 有权液位计接近传感器和使用调制流体流动操作相同方法公开(公告)号：USRE42650E1
公开(公告)日：2011-08-30
申请号：US11831558
申请日：2007-07-31
IPC分类号： G01B13/08
CPC分类号： G01B13/04
摘要： A system and method that use a fluid gauge proximity sensor. A source of modulated unidirectional or alternating fluid flow travels along at least one path having a nozzle and a flow or pressure sensor. The fluid exists at a gap between the nozzle and a target. The sensor outputs an amplitude modulated signal that varies according to a size of the gap. The amplitude modulated signal is processed either digitally or in analog devices, which can include being filtered (e.g., band pass, band limited, high pass, etc. filter) to include the modulated frequency and sufficient bandwidth on either side of that frequency and/or being demodulated using a demodulator operating at the acoustical driver modulation frequency. Using this system and method can result in only ambient acoustical energy in a desired frequency range of the device actually having the opportunity to interfere with the device operation. This can lower the devices overall sensitivity to external acoustical noise and sensor offset.
摘要翻译： 使用流量计接近传感器的系统和方法。 调制的单向或交替流体流的源沿着具有喷嘴和流量或压力传感器的至少一个路径行进。 流体存在于喷嘴和靶之间的间隙处。 传感器输出根据间隙大小而变化的幅度调制信号。 幅度调制信号以数字方式或在模拟设备中进行处理，其可以包括被滤波（例如，带通，频带限制，高通等等滤波器）以包括在该频率的任一侧上的调制频率和足够的带宽， 或者使用以声驱动器调制频率工作的解调器进行解调。 使用该系统和方法可以仅使设备的期望频率范围内的环境声能实际上具有干扰设备操作的机会。 这可以降低设备对外部声学噪声和传感器偏移的总体灵敏度。
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公开(公告)号：US07164463B2
公开(公告)日：2007-01-16
申请号：US10369569
申请日：2003-02-21
CPC分类号： G03F7/70833 , G03F7/709
摘要： An apparatus, system, and method for configuring a dual isolation system lithography tool is described. An isolated base frame is supported by a non-isolated tool structure. A wafer stage component is supported by the isolated base frame. The wafer stage component provides a mount for a semiconductor wafer. A reticle stage component is supported by the isolated base frame. The reticle stage component provides a mount for a reticle. An isolated bridge provides a mount for a projection optics. The isolated bridge is supported by the isolated base frame. Alternatively, an isolated bridge is supported by a non-isolated base frame. A wafer stage component is supported by the non-isolated base frame. A reticle stage component is supported by the non-isolated base frame. An isolated optical relay is supported by the non-isolated base frame. The isolated optical relay includes one or more individually servo controlled framing blades.
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公开(公告)号：US07124624B2
公开(公告)日：2006-10-24
申请号：US11198278
申请日：2005-08-08
申请人： Boguslaw F. Gajdeczko , Kenneth M. Bogursky , Daniel N. Galburt , Willy M. Sander , Kevin J. Violette
发明人： Boguslaw F. Gajdeczko , Kenneth M. Bogursky , Daniel N. Galburt , Willy M. Sander , Kevin J. Violette
CPC分类号： G03F7/709 , G01B13/12 , G03F7/70341 , G03F7/7085 , G05D7/0186
摘要： An apparatus and method for precisely detecting very small distances between a measurement probe and a surface, and more particularly to a proximity sensor using a constant gas flow and sensing a mass flow rate within a pneumatic bridge to detect very small distances. Within the apparatus the use of a flow restrictor and/or snubber made of porous material and/or a mass flow rate controller enables detection of very small distances in the nanometer to sub-nanometer range. A further embodiment wherein a measurement channel of a proximity sensor is connected to multiple measurement branches.
摘要翻译： 一种用于精确检测测量探头和表面之间非常小距离的装置和方法，更具体地涉及使用恒定气流并感测气动桥中的质量流量以检测非常小的距离的接近传感器。 在该装置内，使用由多孔材料制成的限流器和/或缓冲器和/或质量流量控制器使得能够在纳米至亚纳米范围内检测非常小的距离。 另一实施例，其中接近传感器的测量通道连接到多个测量分支。
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16.发明授权公开(公告)号：US07105836B2
公开(公告)日：2006-09-12
申请号：US10273405
申请日：2002-10-18
申请人： Santiago del Puerto , Daniel N. Galburt , Andrew W. McCullough , Stephen Roux , Joost Jeroen Ottens
发明人： Santiago del Puerto , Daniel N. Galburt , Andrew W. McCullough , Stephen Roux , Joost Jeroen Ottens
CPC分类号： G03F7/70716 , F28F3/048 , G03F7/70875
摘要： Systems and methods eliminate vibrations produced by coolant fluid flowing through a short stroke stage and prevent change in thermally-induced distortion of the short stroke stage by maintaining the temperature and temperature distribution within the short stroke stage constant regardless of actinic heat load incident on a reticle. This is done by: (1) conducting heat through the reticle and short stroke stage components, (2) radiatively transferring heat from the short stroke stage to a long stroke stage, and (3) using convection and a cooling system to dissipate heat from the long stroke stage. The short stroke stage can be magnetically levitated from the long stroke stage. This way there is no physical contact, but the long stroke stage's movements can still control the short stroke stage's movements. By not physically contacting the long stroke stage, the short stroke stage is not affected by vibrations in the long stroke stage caused by the flowing coolant.
摘要翻译： 系统和方法消除了通过短行程级流动的冷却剂流体产生的振动，并且通过将短程序段内的温度和温度分布保持恒定，并且防止入射到光罩上的光化热负荷而保持短行程级的热诱导变形的变化。 。 这通过以下方式完成：（1）通过标线和短行程部件进行热量，（2）将热量从短行程级辐射传递到长行程级，以及（3）使用对流和冷却系统来散发热量 长时间的阶段。 短行程阶段可以从长行程阶段磁悬浮。 这样就没有身体接触，但长时间运动的运动仍然可以控制短路阶段的动作。 通过不与长行程阶段物理接触，短行程级不受流动的冷却剂引起的长行程阶段的振动的影响。
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17.发明授权Magnetically levitated and driven reticle-masking blade stage mechanism having six degrees freedom of motion 有权具有六度自由度的磁悬浮和驱动的掩模版掩模刀片机构公开(公告)号：US06906789B2
公开(公告)日：2005-06-14
申请号：US10449663
申请日：2003-06-02
IPC分类号： G03F7/20 , H01L21/027 , G03B27/62 , G03B27/72
CPC分类号： G03F7/70066 , G03F7/70758 , G03F7/70816 , G03F7/70825 , H02K41/03 , H02K2201/18
摘要： A method, apparatus, and system for controlling a reticle-masking blade in a photolithography system. A reticle-masking blade is supported with a reticle-masking blade carriage assembly. The reticle-masking blade carriage assembly is levitated at a position with respect to a reference frame and at an orientation with respect to the reference frame. Preferably, the reticle-masking blade carriage assembly is electromagnetically levitated. At least one of the position and the orientation of the reticle-masking blade carriage assembly is measured. At least one of the position and the orientation of the reticle-masking blade carriage assembly is controlled. Optionally, the reticle-masking blade carriage assembly is moved within a dimension within a range defined by the reference frame. The dimension can be two dimensions. The movement of the reticle-masking blade carriage assembly can be controlled.
摘要翻译： 一种用于在光刻系统中控制掩模掩模刀片的方法，装置和系统。 掩模版掩模刀片由掩模版掩模刀片托架组件支撑。 掩模版掩模刀片托架组件相对于参考框架在相对于参考框架的取向处悬浮。 优选地，掩模版掩模片滑架组件是电磁悬浮的。 测量掩模版掩模片滑架组件的位置和取向中的至少一个。 掩模版掩模刀片支架组件的位置和取向中的至少一个被控制。 可选地，掩模版掩模刮板滑架组件在由参考框限定的范围内的尺寸内移动。 尺寸可以是两个维度。 可以控制掩模掩模刮板托架组件的运动。
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公开(公告)号：US06885435B2
公开(公告)日：2005-04-26
申请号：US10842513
申请日：2004-05-11
申请人： Daniel N. Galburt
发明人： Daniel N. Galburt
IPC分类号： H01L21/027 , G03F7/20 , G03B27/58 , G03B27/42 , G03B27/62
CPC分类号： G03F7/70758 , G03F7/70833 , G03F7/709
摘要： A method, system, and apparatus for management of reaction loads in a lithography system is described. An isolated structure is supported by a non-isolated structure. The isolated structure supports a moveable stage. A linear motor includes a first linear motor element and a second linear motor element. The first linear motor element is coupled to the moveable stage. A plurality of parallel flexure plates mount the second linear motor element on the isolated structure. A flexure rod is coupled between the non-isolated structure and the second linear motor element.
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19.发明授权Apparatus, system, and method for precision positioning and alignment of a lens in an optical system 有权用于光学系统中的透镜的精确定位和对准的装置，系统和方法公开(公告)号：US06556364B2
公开(公告)日：2003-04-29
申请号：US09841108
申请日：2001-04-25
IPC分类号： G02B702
摘要： An apparatus, system, and method for precision positioning and alignment of a lens in an optical system, wherein a first support for coupling to the peripheral edge of the lens is connected to a concentric second support using a plurality of positioning devices. At least one positioning device is configured to move the first support in an axial direction relative to the second support. Each positioning device comprises a lever, an actuator, and a flexure. The lever has a pivot point and is mounted on the second support. The actuator is connected to the lever and used to operate the lever about its pivot point. The flexure has a first end connected to the lever between the actuator and the pivot point. A second end of the flexure is connected to the first support. A second positioning device is used to move the first support relative to the second support in a direction substantially perpendicular to the axial direction. Additional positioning devices can be used to provide for other types of motion such as, for example, rotation and tilt. In a preferred embodiment, the actuators are pneumatic bellows. A compressible gas supply module is fluidly connected to the bellows, and a control module in communication with the compressible gas supply module is used to operate the bellows. An optional sensor module is used to provide data to the control module for positioning the first support relative to the second support.
摘要翻译： 一种用于光学系统中的透镜的精确定位和对准的装置，系统和方法，其中用于联接到透镜的周缘的第一支撑件使用多个定位装置连接到同心的第二支撑件。 至少一个定位装置构造成相对于第二支撑件在轴向上移动第一支撑件。 每个定位装置包括杠杆，致动器和挠曲件。 杠杆具有枢轴点并且安装在第二支撑件上。 执行器连接到杠杆并用于围绕其枢转点操作杠杆。 挠曲件具有连接到致动器和枢转点之间的杠杆的第一端。 挠曲件的第二端连接到第一支撑件。 第二定位装置用于沿着基本上垂直于轴向方向的方向相对于第二支撑件移动第一支撑件。 可以使用附加的定位装置来提供其它类型的运动，例如旋转和倾斜。 在优选实施例中，致动器是气动波纹管。 可压缩气体供应模块流体地连接到波纹管，并且与可压缩气体供应模块连通的控制模块用于操作波纹管。 可选的传感器模块用于向控制模块提供相对于第二支撑件定位第一支撑件的数据。
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公开(公告)号：US4933714A
公开(公告)日：1990-06-12
申请号：US368978
申请日：1989-06-20
IPC分类号： G03F7/20
CPC分类号： G03F7/70075 , G03F7/70233 , G03F7/70366
摘要： A master disk is positioned such that a radial portion thereof is within a restricted field having good imagery of an optical projection system. A second blank disk is positioned such that the image location extends along a radial portion thereof. As the two disks are rotated synchronously a pattern in an annular area is formed on the blank disk replicating the master. Good imagery of the pattern is obtained with a simple system having an image field less than the size of the object being reproduced.
摘要翻译： 主盘被定位成使得其径向部分在具有良好的光学投影系统的图像的受限场中。 第二空白盘定位成使得图像位置沿其径向部分延伸。 当两个盘同步旋转时，在复制主机的空白盘上形成环形区域中的图案。 通过具有小于被再现对象的尺寸的图像场的简单系统来获得图案的良好图像。
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