公开(公告)号：US11053440B2

公开(公告)日：2021-07-06

申请号：US16681449

申请日：2019-11-12

Applicant: ENTEGRIS, INC.

Inventor： Steven M. Bilodeau ,  SeongJin Hong ,  Hsing-Chen Wu ,  Min-Chieh Yang ,  Emanuel I. Cooper

IPC: C09K13/06 ,  H01L21/311

Abstract: Compositions useful for the selective removal of silicon nitride materials relative to polysilicon, silicon oxide materials and/or silicide materials from a microelectronic device having same thereon are provided. The compositions of the invention are particularly useful in the etching of 3D NAND structures.

公开(公告)号：US10290505B2

公开(公告)日：2019-05-14

申请号：US15752640

申请日：2016-08-12

Applicant: Entegris, Inc.

Inventor： Steven Bilodeau ,  Emanuel I. Cooper ,  Hsing-Chen Wu ,  Min-Chieh Yang

IPC: H01L21/02 ,  H01L21/28 ,  H01L21/762

Abstract: Compositions useful for the passivation of germanium-containing materials on a microelectronic device having same thereon.

公开(公告)号：US09765288B2

公开(公告)日：2017-09-19

申请号：US14648815

申请日：2013-12-04

Applicant: ENTEGRIS, INC. ,  ATMI TAIWAN CO., LTD

Inventor： Emanuel I. Cooper ,  Hsing-Chen Wu ,  Min-Chieh Yang ,  Sheng-Hung Tu ,  Li-Min Chen

IPC: C11D7/04 ,  C11D7/26 ,  C11D7/32 ,  C11D3/00 ,  C11D7/08 ,  C11D11/00

CPC classification number: C11D7/04 ,  C11D3/0073 ,  C11D7/08 ,  C11D7/26 ,  C11D7/265 ,  C11D7/3209 ,  C11D7/3281 ,  C11D11/0047

Abstract: Liquid compositions useful for the cleaning of residue and contaminants from a III-V microelectronic device material, such as InGaAs, without substantially removing the III-V material. The liquid compositions are improvements of the SC1 and SC2 formulations.