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公开(公告)号：US09721821B2
公开(公告)日：2017-08-01
申请号：US14439464
申请日：2013-10-29
Applicant: Entegris, Inc.
Inventor： I-Kuan Lin , Richard A. Cooke , Jakub Rybczynski
IPC: H01T23/00 , H01L21/683 , H02N13/00 , C23C16/458 , H01L21/687
CPC classification number: H01L21/6831 , C23C16/4581 , H01L21/6875 , H01L21/68757 , H02N13/00
Abstract: In accordance with an embodiment of the invention, there is provided a soft protrusion structure for an electrostatic chuck, which offers a non-abrasive contact surface for wafers, workpieces or other substrates, while also having improved manufacturability and compatibility with grounded surface platen designs. The soft protrusion structure comprises a photo-patternable polymer.
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12.发明授权公开(公告)号：US12018382B2
公开(公告)日：2024-06-25
申请号：US16123149
申请日：2018-09-06
Applicant: Entegris, Inc.
Inventor： Bryan C. Hendrix , David W. Peters , Weimin Li , Carlo Waldfried , Richard A. Cooke , Nilesh Gunda , I-Kuan Lin
IPC: C23C16/44 , B01D39/20 , B01D67/00 , C23C14/24 , C23C14/50 , C23C16/04 , C23C16/40 , C23C16/455 , C23C16/56 , C23C28/04
CPC classification number: C23C28/044 , B01D39/2027 , B01D67/00 , C23C14/243 , C23C14/50 , C23C16/042 , C23C16/403 , C23C16/404 , C23C16/405 , C23C16/4404 , C23C16/4412 , C23C16/45525 , C23C16/45555 , C23C16/56 , C23C28/042 , B01D2239/0478 , B01D2239/1216
Abstract: Coatings applicable to a variety of substrate articles, structures, materials, and equipment are described. In various applications, the substrate includes metal surface susceptible to formation of oxide, nitride, fluoride, or chloride of such metal thereon, wherein the metal surface is configured to be contacted in use with gas, solid, or liquid that is reactive therewith to form a reaction product that deleterious to the substrate article, structure material, or equipment. The metal surface is coated with a protective coating preventing reaction of the coated surface with the reactive gas, and/or otherwise improving the electrical, chemical, thermal, or structural properties of the substrate article or equipment. Various methods of coating the metal surface are described, and for selecting the coating material that is utilized.
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13.发明申请公开(公告)号：US20200378011A1
公开(公告)日：2020-12-03
申请号：US16898149
申请日：2020-06-10
Applicant: Entegris, Inc.
Inventor： Bryan C. Hendrix , David W. Peters , Weimin Li , Carlo Waldfried , Richard A. Cooke , Nilesh Gunda , I-Kuan Lin
Abstract: Coatings applicable to a variety of substrate articles, structures, materials, and equipment are described. In various applications, the substrate includes metal surface susceptible to formation of oxide, nitride, fluoride, or chloride of such metal thereon, wherein the metal surface is configured to be contacted in use with gas, solid, or liquid that is reactive therewith to form a reaction product that is deleterious to the substrate article, structure, material, or equipment. The metal surface is coated with a protective coating preventing reaction of the coated surface with the reactive gas, and/or otherwise improving the electrical, chemical, thermal, or structural properties of the substrate article or equipment. Various methods of coating the metal surface are described, and for selecting the coating material that is utilized.
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14.发明申请公开(公告)号：US20190100842A1
公开(公告)日：2019-04-04
申请号：US16123149
申请日：2018-09-06
Applicant: Entegris, Inc.
Inventor： Bryan C. Hendrix , David W. Peters , Weimin Li , Carlo Waldfried , Richard A. Cooke , Nilesh Gunda , I-Kuan Lin
Abstract: Coatings applicable to a variety of substrate articles, structures, materials, and equipment are described. In various applications, the substrate includes metal surface susceptible to formation of oxide, nitride, fluoride, or chloride of such metal thereon, wherein the metal surface is configured to be contacted in use with gas, solid, or liquid that is reactive therewith to form a reaction product that deleterious to the substrate article, structure material, or equipment. The metal surface is coated with a protective coating preventing reaction of the coated surface with the reactive gas, and/or otherwise improving the electrical, chemical, thermal, or structural properties of the substrate article or equipment. Various methods of coating the metal surface are described, and for selecting the coating material that is utilized.
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公开(公告)号：US20180202047A1
公开(公告)日：2018-07-19
申请号：US15871425
申请日：2018-01-15
Applicant: Entegris, Inc.
Inventor： I-Kuan Lin , Carlo Waldfried , Jianan Hou
CPC classification number: C23C16/56 , C23C16/405 , C23C16/4404 , C23C16/45525
Abstract: Articles and methods relating to coatings having superior chemical resistance and structural integrity, can be prepared via atomic layer deposition and fluoro-annealing at low process temperatures of between about 150° C. and less than 300° C. The film comprises a fluorinated metal oxide containing yttrium.
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Patent Agency Ranking
公开(公告)号：US20160273095A1
公开(公告)日：2016-09-22
申请号：US14870981
申请日：2015-09-30
Applicant: Entegris, Inc.
Inventor： I-Kuan Lin , Nilesh Gunda , Dennis Radgowski , Chandra Venkatraman
CPC classification number: C23C14/48 , C23C14/08 , C23C14/083 , C23C14/58 , C23C14/5806 , C23C14/5846 , H01J37/32467 , H01J37/32495
Abstract: Articles and methods relating to coatings having superior plasma etch-resistance and which can prolong the life of RIE components are provided. An article has a vacuum compatible substrate and a protective film overlying at least a portion of the substrate. The film comprises a fluorinated metal oxide containing yttrium.
Abstract translation: 提供了具有优异的等离子体耐蚀刻性并且可以延长RIE部件寿命的涂层的制品和方法。 一种制品具有真空兼容的衬底和覆盖至少一部分衬底的保护膜。 膜包含含有钇的氟化金属氧化物。
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公开(公告)号：US20220316056A1
公开(公告)日：2022-10-06
申请号：US17840367
申请日：2022-06-14
Applicant: ENTEGRIS, INC.
Inventor： I-Kuan Lin , Carlo Waldfried , Chandra Venkatraman
IPC: C23C16/40 , C23C16/455 , C23C16/44
Abstract: Described are multi-layer coatings, substrates (i.e., articles) coated with a multi-layer coating, and methods of preparing a multi-layer coating by atomic layer deposition, wherein the coating includes layers alumina and yttria.
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公开(公告)号：US10385454B2
公开(公告)日：2019-08-20
申请号：US15448838
申请日：2017-03-03
Inventor： Dale K. Stone , Richard Cooke , I-Kuan Lin , Julian G. Blake , Lyudmila Stone
IPC: C23C16/50 , H01L21/683 , H02N13/00 , C23C28/04
Abstract: In one embodiment, a method of fabricating an electrostatic clamp includes forming an insulator body, forming an electrode on the insulator body, and depositing a layer stack on the electrode, the layer stack comprising an aluminum oxide layer that is deposited using atomic layer deposition (ALD).
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19.发明授权公开(公告)号：US08861170B2
公开(公告)日：2014-10-14
申请号：US13667516
申请日：2012-11-02
Applicant: Entegris, Inc.
Inventor： I-Kuan Lin , Richard A. Cooke , Jakub Rybczynski
IPC: H02N13/00 , C23C16/458 , H01L21/683 , H01L21/687
CPC classification number: H01L21/6831 , C23C16/4581 , H01L21/6875 , H01L21/68757 , H02N13/00
Abstract: In accordance with an embodiment of the invention, there is provided a soft protrusion structure for an electrostatic chuck, which offers a non-abrasive contact surface for wafers, workpieces or other substrates, while also having improved manufacturability and compatibility with grounded surface platen designs. The soft protrusion structure comprises a photo-patternable polymer.
Abstract translation: 根据本发明的实施例，提供了一种用于静电卡盘的软突起结构，其提供用于晶片，工件或其它基板的非研磨接触表面，同时具有改进的可制造性和与接地的平台台板设计的兼容性。 软突起结构包括可光致图案的聚合物。
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20.发明申请公开(公告)号：US20130120897A1
公开(公告)日：2013-05-16
申请号：US13667516
申请日：2012-11-02
Applicant: Entegris, Inc.
Inventor： I-Kuan Lin , Richard A. Cooke , Jakub Rybczynski
IPC: H02N13/00
CPC classification number: H01L21/6831 , C23C16/4581 , H01L21/6875 , H01L21/68757 , H02N13/00
Abstract: In accordance with an embodiment of the invention, there is provided a soft protrusion structure for an electrostatic chuck, which offers a non-abrasive contact surface for wafers, workpieces or other substrates, while also having improved manufacturability and compatibility with grounded surface platen designs. The soft protrusion structure comprises a photo-patternable polymer.
Abstract translation: 根据本发明的实施例，提供了一种用于静电卡盘的软突起结构，其提供用于晶片，工件或其它基板的非研磨接触表面，同时具有改进的可制造性和与接地的平台台板设计的兼容性。 软突起结构包括可光致图案的聚合物。
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