公开(公告)号：US20150228498A1

公开(公告)日：2015-08-13

申请号：US14696535

申请日：2015-04-27

Applicant: FUJIFILM CORPORATION

Inventor： Akiko HATTORI ,  Tadashi OOMATSU ,  Hirotaka KITAGAWA ,  Yuichiro ENOMOTO

IPC: H01L21/308 ,  C09J133/14 ,  C09J7/02

CPC classification number: H01L21/3086 ,  C08F8/10 ,  C09J4/06 ,  C09J7/20 ,  C09J133/14 ,  C09J2433/00 ,  G03F7/0002 ,  G03F7/09 ,  H01L21/3081 ,  H01L21/3085 ,  H01L21/3088 ,  Y10T428/24355 ,  C08F220/14 ,  C08F220/06

Abstract: To obtain a good pattern having a good profile of etched pattern. A method for manufacturing an adhesive film for imprints, the method comprising applying an adhesive composition for imprints in a base, and then rinsing the adhesive composition for imprints.

Abstract translation: 以获得具有蚀刻图案的良好轮廓的良好图案。 一种压印用粘合膜的制造方法，其特征在于，将印刷用粘合剂组合物涂布在基材中，然后冲洗粘合剂组合物进行印刷。

公开(公告)号：US20240099181A1

公开(公告)日：2024-03-28

申请号：US18531702

申请日：2023-12-07

Applicant: FUJIFILM CORPORATION

Inventor： Akiko HATTORI ,  Takafumi HOSOKAWA

IPC: A01C1/02

CPC classification number: A01C1/02

Abstract: A method of cultivating a plant including a step of seeding a seed of the plant on a transparent medium and germinating and a step of evaluating and sorting the seed of the plant after a start of the germinating according to a germinating state, and a plant cultivation apparatus that can be used for the method of cultivating a plant.

公开(公告)号：US20150079804A1

公开(公告)日：2015-03-19

申请号：US14549068

申请日：2014-11-20

Applicant: FUJIFILM Corporation

Inventor： Hirotaka KITAGAWA ,  Akiko HATTORI ,  Yuichiro ENOMOTO

IPC: C08F220/32 ,  H01L21/02 ,  B29C59/00 ,  C08F220/28 ,  C08F220/18

CPC classification number: C08F220/32 ,  B29C59/005 ,  B29K2033/12 ,  C08F220/18 ,  C08F220/28 ,  C08F2220/281 ,  C08F2220/325 ,  G03F7/0002 ,  H01L21/02356

Abstract: An under layer film having excellent surface planarity is provided. In one aspect, the under layer film-forming composition for imprints includes a (meth)acrylic resin (A) containing an ethylenic unsaturated group (P) and a nonionic hydrophilic group (Q), and having a weight average molecular weight of 1,000 or larger; and a solvent (B), the resin (A) having an acid value of smaller than 1.0 mmol/g. In another aspect, the under layer film-forming composition for imprints includes a (meth)acrylic resin (A2) containing an ethylenic unsaturated group (P), and containing, as a nonionic hydrophilic group (Q), a cyclic substituent (Q2) having a carbonyl group in the cyclic structure thereof, with a weight average molecular weight of 1,000 or larger; and a solvent (B).

Abstract translation: 提供了具有优异的表面平面度的底层膜。 一方面，用于印记的底层成膜组合物包括含有乙烯性不饱和基团（P）和非离子亲水基团（Q）的（甲基）丙烯酸树脂（A），其重均分子量为1,000或 较大 和溶剂（B），所述树脂（A）的酸值小于1.0mmol / g。 另一方面，用于印记的底层成膜组合物包含含有烯属不饱和基团（P）的（甲基）丙烯酸树脂（A2），并且含有作为非离子亲水基团（Q）的环状取代基（Q2） 在其环状结构中具有羰基，重均分子量为1,000以上; 和溶剂（B）。

公开(公告)号：US20140210134A1

公开(公告)日：2014-07-31

申请号：US14227527

申请日：2014-03-27

Applicant: FUJIFILM Corporation

Inventor： Satoshi WAKAMATSU ,  Akiko HATTORI

IPC: B29C59/02

CPC classification number: B29C59/02 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: A nanoimprinting apparatus is equipped with: a distortion imparting device that applies external force onto an imprinting member, which is one of a mold and a substrate, to maintain the imprinting member in a predetermined flexed state, thereby imparting permanent distortion to the imprinting member; and an imprinting unit that utilizes the imprinting member having the permanent distortion imparted thereto by the distortion imparting device to execute imprinting. A pattern of protrusions and recesses of the mold can be caused to contact resist from the central portion thereof utilizing any imprinting member, regardless of the rigidity of the imprinting member.

Abstract translation: 纳米压印装置配备有：将压力施加到作为模具和基板之一的压印构件上的变形赋予装置，以将压印构件保持在预定的弯曲状态，从而对压印构件施加永久变形; 以及压印单元，利用由变形赋予装置赋予的永久变形的压印构件执行压印。 不管压印构件的刚性如何，可以利用任何压印构件使模具的突起和凹陷的图案从其中心部分接触抗蚀剂。

公开(公告)号：US20140069889A1

公开(公告)日：2014-03-13

申请号：US14040914

申请日：2013-09-30

Applicant: FUJIFILM Corporation

Inventor： Akihiko OHTSU ,  Akiko HATTORI ,  Katsuhiro NISHIMAKI

IPC: B29C33/38

CPC classification number: B29C33/3842 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: In production of a mold having a deposited film on the surface thereof as a mold release layer, a quartz substrate plasma etched employing an etching gas that includes a sedimentary gas to form a pattern of protrusions and recesses having a desired shape in a structure constituted by the quartz substrate and a mask layer, while a deposited film constituted by sediment of the sedimentary gas is formed along the pattern of protrusions and recesses. The deposited film becomes the mold release layer. Thereby, throughput of mold production is improved in the production of molds having deposited films as mold release layers on the surfaces thereof.

Abstract translation: 在制造其表面具有沉积膜的模具作为脱模层时，使用包括沉积气体的蚀刻气体蚀刻的石英基板等离子体，以形成具有期望形状的突起和凹部的图案，其结构由 石英基板和掩模层，而由沉积气体的沉积物构成的沉积膜沿着突起和凹陷的图案形成。 沉积膜变成脱模层。 因此，在其表面上具有作为脱模层的沉积膜的模具的生产中提高了模具生产的生产量。