公开(公告)号：US20200171434A1

公开(公告)日：2020-06-04

申请号：US16784976

申请日：2020-02-07

Applicant: FUJIFILM Corporation

Inventor： Tetsuya KAMIMURA ,  Masahiro YOSHIDOME ,  Yukihisa KAWADA

IPC: B01D61/02 ,  B01D65/10 ,  B01D71/32

Abstract: An object of the present invention is to provide a chemical liquid purification method which makes it possible to obtain a chemical liquid having excellent defect inhibition performance. The chemical liquid purification method according to an embodiment of the present invention is a chemical liquid purification method including obtaining a chemical liquid by filtering a substance to be purified containing an organic solvent by using two or more kinds of filters having different pore sizes, in which a supply pressure P1 of the substance to be purified supplied to a filter Fmax having a maximum pore size X1 among the two or more kinds of filters and a supply pressure P2 of the substance to be purified supplied to a filter Fmin having a minimum pore size X2 among the two or more kinds of filters satisfy P1>P2.

公开(公告)号：US20170059995A1

公开(公告)日：2017-03-02

申请号：US15350913

申请日：2016-11-14

Applicant: FUJIFILM Corporation

Inventor： Hajime FURUTANI ,  Akiyoshi GOTO ,  Michihiro SHIRAKAWA ,  Masahiro YOSHIDOME ,  Masafumi KOJIMA

IPC: G03F7/32 ,  G03F7/16 ,  G03F7/039 ,  G03F7/004 ,  G03F7/20 ,  G03F7/038

CPC classification number: G03F7/322 ,  G03F7/0045 ,  G03F7/038 ,  G03F7/0397 ,  G03F7/16 ,  G03F7/2006 ,  G03F7/325

Abstract: A pattern forming method includes a pattern forming method using an actinic ray-sensitive or radiation-sensitive resin composition in which ΔDth represented by the following Formula (1) satisfies 0.8 or more (in the formula, Dth(PTI) represents the threshold deprotection rate of the acid-decomposable group with respect to the film thickness of the actinic ray-sensitive or radiation-sensitive film after development using the alkali developer, and Dth(NTI) represents the threshold deprotection rate of the acid-decomposable group with respect to the film thickness of the actinic ray-sensitive or radiation-sensitive film after development using the developer including an organic solvent). ΔDth=Dth(PTI)/Dth(NTI)  (1)

Abstract translation: 使用被配置为使得由式（1）表示的ΔDth为0.8以上的活性光敏性或辐射敏感性树脂组合物的图案形成方法。 ΔDth= Dth（PTI）/ Dth（NTI）（1）（在公式中，Dth（PTI）表示酸分解基团与显影后的有源光敏感或辐射敏感膜的膜厚度的阈值去保护率 碱性显影剂液体; Dth（NTI）表示使用含有有机溶剂的显影剂液体显影后的酸分解基团与活性的光敏感或感光性膜的膜厚度的阈值去保护比。）

公开(公告)号：US20140248562A1

公开(公告)日：2014-09-04

申请号：US14271606

申请日：2014-05-07

Applicant: FUJIFILM CORPORATION

Inventor： Akinori SHIBUYA ,  Yoko TOKUGAWA ,  Tomoki MATSUDA ,  Junichi ITO ,  Shohei KATAOKA ,  Toshiaki FUKUHARA ,  Naohiro TANGO ,  Kaoru IWATO ,  Masahiro YOSHIDOME ,  Shinichi SUGIYAMA

IPC: G03F7/038

CPC classification number: G03F7/038 ,  C07C303/32 ,  C07C309/04 ,  C07C309/12 ,  C07D295/16 ,  C07D327/06 ,  C07D339/08 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325

Abstract: According to one embodiment, there is provided an actinic ray- or radiation-sensitive resin composition including (A) a compound represented by a general formula (1) below that generates an acid when exposed to actinic rays or radiation, and (B) a resin.

Abstract translation: 根据一个实施方案，提供了一种光化射线或辐射敏感性树脂组合物，其包含（A）下述通式（1）表示的化合物，当暴露于光化射线或辐射时产生酸，和（B） 树脂。