公开(公告)号：US20230015767A1

公开(公告)日：2023-01-19

申请号：US17895309

申请日：2022-08-25

Applicant: FUJIFILM Corporation

Inventor： Ryosuke KATO ,  Yushi KANEKO ,  Junichi ITO

IPC: G03F7/004 ,  G03F7/00 ,  G03F7/028

Abstract: Provided are a photosensitive coloring composition including a pigment and a diketopyrrolopyrrole compound A represented by Formula 1, in which, in a case where molar contents of the diketopyrrolopyrrole compound A and a diketopyrrolopyrrole compound B represented by Formula 1 are each denoted by mA and mB, a value of mA/(mA+mB) is 10 mol % to 100 mol %, and a content of the pigment is 35% by mass or more with respect to a total solid content of the photosensitive coloring composition; a cured substance of the photosensitive coloring composition, a color filter including the cured substance, a solid-state imaging element or an image display device, and a novel asymmetric diketopyrrolopyrrole compound.
Diketopyrrolopyrrole compound A: A1 represents a monovalent organic group having an acidic or a basic functional group, and B1 represents a monovalent organic group not having an acidic or a basic functional group.
Diketopyrrolopyrrole compound B: A1 and B1 represent monovalent organic groups having an acidic or a basic functional group.

公开(公告)号：US20220213296A1

公开(公告)日：2022-07-07

申请号：US17700427

申请日：2022-03-21

Applicant: FUJIFILM Corporation

Inventor： Yushi KANEKO ,  Ryosuke KATO ,  Takahiro OYA ,  Junichi ITO ,  Yoshinori TAGUCHI

IPC: C08K9/06 ,  C08K3/36 ,  C08G77/04 ,  C08G77/20 ,  C08G77/26 ,  C08G77/24 ,  C08G77/28 ,  G03F7/075 ,  G03F7/00 ,  G02B5/22

Abstract: A dispersion liquid contains an inorganic oxide particle surface-treated with at least one of a compound represented by Formula Si(RA1)(XA1)3 or a compound represented by Formula Si(RA2)(RA20)(XA2)2, polysiloxane having at least one of a T unit represented by Formula [RB1SiO3/2] or a D unit represented by Formula [RB2RB20SiO], and an organic solvent, where a content of the polysiloxane is 0.5% to 39% by mass with respect to a total amount of the inorganic oxide particle and the polysiloxane, in which in the formula, RA1, RA2, RB1, and RB2 represent a functional group, XA1 and XA2 represent a hydroxyl group or a hydrolyzable group, and RA20 and RB20 represent an alkyl group or an aryl group.

公开(公告)号：US20160122547A1

公开(公告)日：2016-05-05

申请号：US14994837

申请日：2016-01-13

Applicant: FUJIFILM Corporation

Inventor： Suguru SAMEJIMA ,  Tetsuya WATANABE ,  Yuushi KANEKO ,  Junichi ITO ,  Naotsugu MURO ,  Yoshinori TAGUCHI ,  Kazuya OOTA

IPC: C09B69/10 ,  G02B5/22

CPC classification number: C09B69/109 ,  C09B11/12 ,  C09B11/24 ,  C09B23/04 ,  C09B23/06 ,  C09B47/00 ,  C09B69/00 ,  C09B69/103 ,  C09B69/105 ,  G02B5/223 ,  G03F7/0007 ,  G03F7/027 ,  G03F7/105

Abstract: Provided are a method for producing a dye multimer having excellent heat resistance, and a coloring composition including a dye multimer obtained by the production method.The method for producing a dye multimer includes reacting a compound having a dye structure with a polymer.

Abstract translation: 提供一种制备耐热性优异的染料多聚体的方法，以及包含通过该制备方法获得的染料多聚体的着色组合物。 制备染料多聚体的方法包括使具有染料结构的化合物与聚合物反应。

公开(公告)号：US20160004157A1

公开(公告)日：2016-01-07

申请号：US14853574

申请日：2015-09-14

Applicant: FUJIFILM CORPORATION

Inventor： Junichi ITO ,  Akinori SHIBUYA ,  Akiyoshi GOTO ,  Michihiro SHIRAKAWA ,  Kei YAMAMOTO ,  Fumihiro YOSHINO

IPC: G03F7/038 ,  G03F7/32 ,  G03F7/004 ,  G03F7/20

CPC classification number: G03F7/038 ,  C07C381/12 ,  C08F220/14 ,  C08F220/18 ,  C08F220/26 ,  C08F220/28 ,  C08F220/30 ,  C08F220/36 ,  C08F232/08 ,  G03F7/0045 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/325 ,  H01L21/0274

Abstract: A method of forming a pattern includes (a) forming a film of an actinic-ray- or radiation-sensitive resin composition, (b) exposing the film to light, and (c) developing the exposed film with a developer comprising an organic solvent to thereby form a negative pattern. The actinic-ray- or radiation-sensitive resin composition includes (A) a resin whose solubility in the developer comprising an organic solvent is lowered when acted on by an acid, which resin contains a repeating unit with any of lactone structures of general formula (1) below, and (B) a compound that when exposed to actinic rays or radiation, generates an acid.

Abstract translation: 形成图案的方法包括（a）形成光化射线或辐射敏感性树脂组合物的膜，（b）将膜曝光，和（c）用包含有机溶剂的显影剂显影曝光的膜 从而形成负模式。 光化射线或辐射敏感性树脂组合物包括（A）当在含有有机溶剂的显影剂中的溶解度降低的树脂（A）作用于酸时，树脂含有具有通式（III）的内酯结构的重复单元 1）和（B）当暴露于光化射线或辐射时产生酸的化合物。

公开(公告)号：US20150079508A1

公开(公告)日：2015-03-19

申请号：US14550181

申请日：2014-11-21

Applicant: FUJIFILM Corporation

Inventor： Junichi ITO ,  Shuhei YAMAGUCHI ,  Hidenori TAKAHASHI ,  Kei YAMAMOTO

IPC: G03F7/038 ,  G03F7/30

CPC classification number: G03F7/0046 ,  C08F220/18 ,  C08F220/22 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/091 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/32 ,  G03F7/325 ,  G03F7/40 ,  H01L21/027 ,  H01L21/0273

Abstract: There is provided a pattern forming method comprising (i) a step of forming a film by an actinic ray-sensitive or radiation-sensitive resin composition; (ii) a step of exposing the film; and (iii) a step of performing development by using a developer containing an organic solvent to form a negative pattern, wherein the actinic ray-sensitive or radiation-sensitive resin composition contains (A) a resin capable of increasing the polarity by an action of an acid to decrease the solubility in a developer containing an organic solvent, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (C) a solvent, and (D) a resin having a repeating unit having a fluorine atom and not having a CF3 partial structure.

Abstract translation: 提供了一种图案形成方法，其包括（i）通过光化射线敏感或辐射敏感树脂组合物形成膜的步骤; （ii）曝光胶片的步骤; （iii）通过使用含有有机溶剂的显影剂形成负型图案进行显影的工序，其中，所述光化射线敏感性或辐射敏感性树脂组合物含有（A）能够通过 降低在含有有机溶剂的显影剂中的溶解性的酸，（B）在用光化射线或辐射照射时能够产生酸的化合物，（C）溶剂，（D）具有重复单元的树脂， 不具有CF 3部分结构的氟原子。

公开(公告)号：US20140248562A1

公开(公告)日：2014-09-04

申请号：US14271606

申请日：2014-05-07

Applicant: FUJIFILM CORPORATION

Inventor： Akinori SHIBUYA ,  Yoko TOKUGAWA ,  Tomoki MATSUDA ,  Junichi ITO ,  Shohei KATAOKA ,  Toshiaki FUKUHARA ,  Naohiro TANGO ,  Kaoru IWATO ,  Masahiro YOSHIDOME ,  Shinichi SUGIYAMA

IPC: G03F7/038

CPC classification number: G03F7/038 ,  C07C303/32 ,  C07C309/04 ,  C07C309/12 ,  C07D295/16 ,  C07D327/06 ,  C07D339/08 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325

Abstract: According to one embodiment, there is provided an actinic ray- or radiation-sensitive resin composition including (A) a compound represented by a general formula (1) below that generates an acid when exposed to actinic rays or radiation, and (B) a resin.

Abstract translation: 根据一个实施方案，提供了一种光化射线或辐射敏感性树脂组合物，其包含（A）下述通式（1）表示的化合物，当暴露于光化射线或辐射时产生酸，和（B） 树脂。

公开(公告)号：US20170010530A1

公开(公告)日：2017-01-12

申请号：US15274360

申请日：2016-09-23

Applicant: FUJIFILM Corporation

Inventor： Hiroaki IDEI ,  Kazuya OOTA ,  Suguru SAMEJIMA ,  Masayuki HARADA ,  Akihiro HARA ,  Junichi ITO

IPC: G03F7/00 ,  C08F2/38 ,  C08F2/44 ,  C08F2/50 ,  G02B5/22 ,  G03F7/16 ,  G03F7/20 ,  G03F7/26 ,  G03F7/40 ,  G03F7/09 ,  C09B69/10 ,  C09B67/46

CPC classification number: G03F7/0007 ,  C08F2/38 ,  C08F2/44 ,  C08F2/50 ,  C08F222/1006 ,  C08F2220/325 ,  C08F2220/343 ,  C08F2222/1013 ,  C08F2222/1026 ,  C08F2222/104 ,  C09B5/14 ,  C09B11/12 ,  C09B11/24 ,  C09B25/00 ,  C09B49/12 ,  C09B49/122 ,  C09B49/126 ,  C09B67/0033 ,  C09B67/0034 ,  C09B69/101 ,  C09B69/103 ,  C09B69/105 ,  C09B69/106 ,  C09B69/108 ,  C09B69/109 ,  G02B5/223 ,  G03F7/029 ,  G03F7/031 ,  G03F7/033 ,  G03F7/0388 ,  G03F7/105 ,  C08F2220/185 ,  C08F220/06 ,  C08F220/20

Abstract: A coloring composition having excellent light fastness, color migration properties, and flatness, a colorant, and a method for producing a colorant are provided. Further, a cured film, a color filter, a method for manufacturing a color filter, a solid-state imaging device, an image display device, and an organic electroluminescent element, each using such the coloring composition, are also provided. The coloring composition contains a colorant represented by General Formula (1) and a curable compound, and has a specific absorbance of 5 or more at a maximum absorption wavelength of 400 nm to 800 nm. R1 represents an (m+n)-valent linking group, P represents a monovalent substituent having a repeating units derived from a vinyl compound, D represents a colorant structure, and R2 and L1 each independently represent a single bond or a divalent linking group. (D-R2)n—R1-(L1-P)m  (1)

Abstract translation: 要解决的问题：提供一种着色组合物，颜料和耐光色性，耐平移性优异的颜料的制造方法，提供固化膜，滤色器，滤色器的制造方法 ，固体摄像装置，图像显示装置和有机电致发光装置。溶液：着色组合物含有由通式（1）表示的颜料和可固化化合物，并且具有特定的 在最大吸收波长为400至800nm时吸光度为5或更高。 R表示（m + n）价连接基团，P表示具有衍生自乙烯基化合物的重复单元的一价取代基，D表示颜料结构，而Rand Leach独立地表示单键或二价连接基团。 通式（1）是：（D-R）-R-（L-P）。选择的图：无

公开(公告)号：US20160327858A1

公开(公告)日：2016-11-10

申请号：US15212377

申请日：2016-07-18

Applicant: FUJIFILM Corporation

Inventor： Daisuke SASAKI ,  Junichi ITO ,  Yuushi KANEKO

IPC: G03F7/00 ,  G03F7/20 ,  C09B69/10 ,  G02B5/20 ,  C09B11/24 ,  G03F7/16 ,  G03F7/32

CPC classification number: G03F7/0007 ,  C09B11/24 ,  C09B11/28 ,  C09B69/10 ,  G02B5/201 ,  G02B5/223 ,  G03F7/027 ,  G03F7/105 ,  G03F7/16 ,  G03F7/2002 ,  G03F7/32

Abstract: Provided are a coloring composition which makes it possible to providing a color filter having surface unevenness relieved; and a cured film, a color filter, a method for manufacturing the color filter, a solid-state imaging device, and an image display device, each of which uses the coloring composition. The coloring composition includes a colorant compound represented by General Formula (1), a curable compound, and a solvent, in which one of Ar1 and Ar2 is a group represented by General Formula (2), and the other of Ar1 and Ar2 is a hydrogen atom, a group represented by the following General Formula (2), or the like, R5 and R6 each independently represent a hydrogen atom or the like, R7 represents a monovalent substituent, R8 represents a halogen atom or the like, and p represents an integer of 0 to 4, R1 and R2 each independently represent an alkyl group having 3 or more carbon atoms, or the like, and X1 to X3 each independently represent a hydrogen atom or the like. The colorant compound represented by General Formula (1) has a counter anion inside and/or outside the molecule.

Abstract translation: 提供了一种可以提供没有平面不规则的滤色器的着色组合物。 还提供了：固化膜，滤色器，彩色滤光片的制造方法，固态成像元件和使用着色组合物的图像显示装置。 含有可固化化合物和由通式（1）表示的颜料化合物的着色组合物和溶剂; 其中Ar1和Ar2中的一个是由通式（2）表示的基团，Ar1和Ar2中的另一个是氢原子或下述通式（2）表示的基团，R5和R6独立地表示氢原子等 R 7表示一价取代基，R 8表示卤素原子等，p表示0〜4的整数。 R 1和R 2独立地表示具有3个以上碳原子的烷基等，X 1〜X 3独立地表示氢原子等。 由通式（1）表示的颜料化合物在分子的内部和/或外部具有抗衡阴离子。

公开(公告)号：US20140356771A1

公开(公告)日：2014-12-04

申请号：US14446599

申请日：2014-07-30

Applicant: FUJIFILM Corporation

Inventor： Shuhei YAMAGUCHI ,  Hidenori TAKAHASHI ,  Junichi ITO ,  Kei YAMAMOTO

IPC: G03F7/038 ,  G03F7/20

CPC classification number: G03F7/0388 ,  C08F220/18 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/325

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition, having: (A) a resin having a repeating unit represented by formula (I); (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) a resin having at least one repeating unit (x) out of a repeating unit represented by formula (II) and a repeating unit represented by formula (III) and containing substantially neither fluorine atom nor silicon atom, wherein the content of the repeating unit (x) is 90% or more by mole based on all repeating units in the resin (C).

Abstract translation: 提供了一种光化射线敏感或辐射敏感性树脂组合物，其具有：（A）具有由式（I）表示的重复单元的树脂; （B）能够在用光化射线或辐射照射时能产生酸的化合物; 和（C）具有由式（II）表示的重复单元中的至少一个重复单元（x）和基本上不包含氟原子或硅原子的式（III）表示的重复单元的树脂，其中， 重复单元（x）相对于树脂（C）中的所有重复单元为90％以上。

公开(公告)号：US20140234759A1

公开(公告)日：2014-08-21

申请号：US14229240

申请日：2014-03-28

Applicant: FUJIFILM Corporation

Inventor： Shohei KATAOKA ,  Akinori SHIBUYA ,  Junichi ITO ,  Tomoki MATSUDA ,  Toshiaki FUKUHARA ,  Naohiro TANGO ,  Kaoru IWATO ,  Masahiro YOSHIDOME ,  Shinichi SUGIYAMA ,  Yoko TOKUGAWA

IPC: G03F7/038

CPC classification number: G03F7/038 ,  C08F220/28 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041

Abstract: According to one embodiment, there is provided an actinic ray- or radiation-sensitive resin composition containing (A) a resin containing a repeating unit represented by general formula (1) below and a repeating unit that is decomposed by an action of an acid to generate an alkali-soluble group, and (B) a compound that generates the acid when exposed to actinic rays or radiation, where L represents a bivalent connecting group, R1 represents a hydrogen atom or an alkyl group, and Z represents a cyclic acid anhydride structure.

Abstract translation: 根据一个实施方案，提供了一种光化射线或辐射敏感性树脂组合物，其含有（A）含有下述通式（1）表示的重复单元的树脂和通过酸作用分解的重复单元 产生碱溶性基团，（B）当暴露于光化学射线或辐射时产生酸的化合物，其中L表示二价连接基团，R 1表示氢原子或烷基，Z表示环状酸酐 结构体。