公开(公告)号：US20140212814A1

公开(公告)日：2014-07-31

申请号：US14229190

申请日：2014-03-28

Applicant: FUJIFILM Corporation

Inventor： Junichi ITO ,  Akinori SHIBUYA ,  Tomoki MATSUDA ,  Yoko TOKUGAWA ,  Toshiaki FUKUHARA ,  Naohiro TANGO ,  Kaoru IWATO ,  Masahiro YOSHIDOME ,  Shinichi SUGIYAMA ,  Shohei KATAOKA

IPC: G03F7/027

CPC classification number: G03F7/027 ,  C07C309/06 ,  C07C309/12 ,  C07C309/17 ,  C07C311/48 ,  C07C381/12 ,  C07C2601/08 ,  C07C2601/14 ,  C07C2603/74 ,  C07D279/30 ,  C07D307/33 ,  C07D327/08 ,  C07D333/76 ,  C07D335/16 ,  C07D339/08 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041

Abstract: Provided is an actinic-ray- or radiation-sensitive resin composition, including any of compounds of general formula (1) below that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and a resin that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer.

Abstract translation: 本发明提供了一种光化学射线或辐射敏感性树脂组合物，其包括以下通式（1）的任何化合物：当暴露于光化射线或辐射时，其被分解，从而产生酸和树脂，当被 酸分解，从而增加其在碱性显影剂中的溶解度。

公开(公告)号：US20140234759A1

公开(公告)日：2014-08-21

申请号：US14229240

申请日：2014-03-28

Applicant: FUJIFILM Corporation

Inventor： Shohei KATAOKA ,  Akinori SHIBUYA ,  Junichi ITO ,  Tomoki MATSUDA ,  Toshiaki FUKUHARA ,  Naohiro TANGO ,  Kaoru IWATO ,  Masahiro YOSHIDOME ,  Shinichi SUGIYAMA ,  Yoko TOKUGAWA

IPC: G03F7/038

CPC classification number: G03F7/038 ,  C08F220/28 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041

Abstract: According to one embodiment, there is provided an actinic ray- or radiation-sensitive resin composition containing (A) a resin containing a repeating unit represented by general formula (1) below and a repeating unit that is decomposed by an action of an acid to generate an alkali-soluble group, and (B) a compound that generates the acid when exposed to actinic rays or radiation, where L represents a bivalent connecting group, R1 represents a hydrogen atom or an alkyl group, and Z represents a cyclic acid anhydride structure.

Abstract translation: 根据一个实施方案，提供了一种光化射线或辐射敏感性树脂组合物，其含有（A）含有下述通式（1）表示的重复单元的树脂和通过酸作用分解的重复单元 产生碱溶性基团，（B）当暴露于光化学射线或辐射时产生酸的化合物，其中L表示二价连接基团，R 1表示氢原子或烷基，Z表示环状酸酐 结构体。

公开(公告)号：US20220326613A1

公开(公告)日：2022-10-13

申请号：US17841143

申请日：2022-06-15

Applicant: FUJIFILM Corporation

Inventor： Keigo UEKI ,  Yuichi FUKUSHIGE ,  Kentaro TOYOOKA ,  Tomoki MATSUDA ,  Satoru YAMADA

IPC: G03F7/033 ,  G03F7/11 ,  G03F7/038

Abstract: A photosensitive transfer material including a temporary support, and a photosensitive layer that contains a binder polymer and a compound A containing at least one group selected from the group consisting of a metal reducing group and a metal coordinating group and a method of producing the same, a method of producing a patterned metal conductive material using the photosensitive transfer material, a film including a metal and a resin layer that contains the compound A, a touch panel including the film, and a method of suppressing deterioration in which in a film including a metal and a resin layer, the resin layer contains the compound A.

公开(公告)号：US20150111135A1

公开(公告)日：2015-04-23

申请号：US14580686

申请日：2014-12-23

Applicant: FUJIFILM Corporation

Inventor： Shohei KATAOKA ,  Akinori SHIBUYA ,  Akiyoshi GOTO ,  Tomoki MATSUDA ,  Toshiaki FUKUHARA

IPC: G03F7/038 ,  G03F7/30

CPC classification number: G03F7/038 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/325

Abstract: The pattern forming method of the present invention includes: (i) forming a film including an actinic ray-sensitive or radiation-sensitive resin composition containing a compound (A) represented by General Formula (I) shown below; a resin (P) capable of decreasing solubility with respect to a developer including organic solvent by the action of an acid; and a compound (B) capable of generating an acid by irradiation of actinic rays or radiation; (ii) irradiating the film with actinic rays or radiation; (iii) developing the film irradiated with the actinic rays or radiation using a developer including an organic solvent. [Chem. 1] RN-A−X+  (I)

Abstract translation: 本发明的图案形成方法包括：（i）形成含有由下述通式（I）表示的化合物（A）的光化射线敏感性或辐射敏感性树脂组合物的膜; 能够通过酸的作用降低对包含有机溶剂的显影剂的溶解度的树脂（P）; 和能够通过光化射线或辐射的照射产生酸的化合物（B）; （ii）用光化射线或辐射照射薄膜; （iii）使用包含有机溶剂的显影剂显影用光化射线或辐射照射的薄膜。 [Chem。 1] RN-A-X +（I）

公开(公告)号：US20150160559A1

公开(公告)日：2015-06-11

申请号：US14625782

申请日：2015-02-19

Applicant: FUJIFILM Corporation

Inventor： Akinori SHIBUYA ,  Shohei KATAOKA ,  Tomoki MATSUDA ,  Toshiaki FUKUHARA ,  Akiyoshi GOTO

IPC: G03F7/30 ,  G03F7/038

CPC classification number: G03F7/30 ,  C07C381/12 ,  C08F220/18 ,  C08F220/24 ,  C08F220/26 ,  C08F220/38 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0388 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325 ,  H01L21/0274

Abstract: There is provided a pattern forming method containing: forming a film by using a radiation-sensitive or actinic ray-sensitive resin composition containing: (A) a onium salt compound containing a nitrogen atom in a cationic moiety; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) a resin capable of increasing the polarity by the action of an acid to decrease solubility in a developer containing an organic solvent, exposing the film; and developing the exposed film by using a developer containing an organic solvent to form a negative pattern.

Abstract translation: 提供了一种图案形成方法，其包括：通过使用辐射敏感或光化射线敏感性树脂组合物形成膜，其包含：（A）阳离子部分中含有氮原子的鎓盐化合物; （B）能够在用光化射线或辐射照射时能产生酸的化合物; 和（C）能够通过酸的作用增加极性以降低在含有有机溶剂的显影剂中的溶解性的树脂，使该膜曝光; 并通过使用含有有机溶剂的显影剂显影曝光的薄膜以形成负图案。

公开(公告)号：US20150111157A1

公开(公告)日：2015-04-23

申请号：US14581416

申请日：2014-12-23

Applicant: FUJIFILM CORPORATION

Inventor： Keita KATO ,  Michihiro SHIRAKAWA ,  Akinori SHIBUYA ,  Akiyoshi GOTO ,  Shohei KATAOKA ,  Tomoki MATSUDA

IPC: G03F7/004 ,  G03F7/20

CPC classification number: G03F7/004 ,  C08F220/26 ,  C08F220/38 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/325

Abstract: Provided is a method of forming a pattern, including forming a film comprising an actinic-ray- or radiation-sensitive resin composition comprising, resin (A) comprising any of repeating units of general formula (I) below, which resin when acted on by an acid, decreases its solubility in a developer comprising an organic solvent, and a compound (B) expressed by any of general formulae (B-1) to (B-3) below, which compound when exposed to actinic rays or radiation, generates an acid, exposing the film to actinic rays or radiation, and developing the exposed film with a developer comprising an organic solvent to thereby obtain a negative pattern.

Abstract translation: 提供了形成图案的方法，包括形成包含光化射线或辐射敏感性树脂组合物的膜，所述树脂组合物包含下列通式（I）的任何重复单元的树脂（A） 降低其在包含有机溶剂的显影剂中的溶解度，以及当暴露于光化射线或辐射时该化合物暴露于光化射线或辐射时由下述通式（B-1）至（B-3）表示的化合物（B） 酸，将膜暴露于光化射线或辐射，以及用包含有机溶剂的显影剂显影曝光的膜，从而获得负图案。

公开(公告)号：US20150168830A1

公开(公告)日：2015-06-18

申请号：US14633721

申请日：2015-02-27

Applicant: FUJIFILM CORPORATION

Inventor： Akiyoshi GOTO ,  Akinori SHIBUYA ,  Shohei KATAOKA ,  Shuhei YAMAGUCHI ,  Tomoki MATSUDA ,  Keita KATO

IPC: G03F7/027 ,  G03F7/20 ,  C07D327/06 ,  C07D279/12 ,  G03F7/038 ,  C07D217/08 ,  C07D335/02 ,  C07D333/46 ,  C07C323/21 ,  G03F7/30 ,  C07D411/04

CPC classification number: G03F7/027 ,  C07C309/12 ,  C07C309/19 ,  C07C311/09 ,  C07C323/21 ,  C07C2601/14 ,  C07C2602/42 ,  C07C2603/74 ,  C07D217/02 ,  C07D217/08 ,  C07D279/12 ,  C07D285/15 ,  C07D295/067 ,  C07D295/26 ,  C07D319/14 ,  C07D327/02 ,  C07D327/06 ,  C07D333/46 ,  C07D335/02 ,  C07D339/08 ,  C07D411/04 ,  C07D413/04 ,  C07D417/04 ,  C07D493/18 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/30

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a compound represented by Formula (1): wherein R1 represents a polycyclic aromatic group or a polycyclic heterocyclic aromatic group, R2 represents a (n+2)-valent saturated hydrocarbon group. R3 represents a (m+2)-valent saturated hydrocarbon group, R4 and R5 each independently represent a substituent, Q represents a linking group containing a heteroatom, m and n each independently represent an integer of 0 to 12, when n is 2 or more, R4's may be the same or different, R4's may be linked to each other to form a non-aromatic ring together with R2, when m is 2 or more, R5's may be the same or different, and R5's may be linked to each other to form a non-aromatic ring together with R3, and X− represents a non-nucleophilic anion.

Abstract translation: 提供了含有由式（1）表示的化合物的光化射线敏感或辐射敏感性树脂组合物：其中R1表示多环芳基或多环杂环芳基，R2表示（n + 2）价饱和烃 组。 R3表示（m + 2）价饱和烃基，R4和R5各自独立地表示取代基，Q表示含有杂原子的连接基，m和n各自独立地表示0〜12的整数，n为2或 更多的是，R4可以相同或不同，R4可以彼此连接，与R2一起形成非芳香环，当m为2以上时，R5可以相同或不同，R5可以相互连接 另外与R3一起形成非芳香环，X-表示非亲核阴离子。

公开(公告)号：US20140248562A1

公开(公告)日：2014-09-04

申请号：US14271606

申请日：2014-05-07

Applicant: FUJIFILM CORPORATION

Inventor： Akinori SHIBUYA ,  Yoko TOKUGAWA ,  Tomoki MATSUDA ,  Junichi ITO ,  Shohei KATAOKA ,  Toshiaki FUKUHARA ,  Naohiro TANGO ,  Kaoru IWATO ,  Masahiro YOSHIDOME ,  Shinichi SUGIYAMA

IPC: G03F7/038

CPC classification number: G03F7/038 ,  C07C303/32 ,  C07C309/04 ,  C07C309/12 ,  C07D295/16 ,  C07D327/06 ,  C07D339/08 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325

Abstract: According to one embodiment, there is provided an actinic ray- or radiation-sensitive resin composition including (A) a compound represented by a general formula (1) below that generates an acid when exposed to actinic rays or radiation, and (B) a resin.

Abstract translation: 根据一个实施方案，提供了一种光化射线或辐射敏感性树脂组合物，其包含（A）下述通式（1）表示的化合物，当暴露于光化射线或辐射时产生酸，和（B） 树脂。

公开(公告)号：US20140170564A1

公开(公告)日：2014-06-19

申请号：US14184854

申请日：2014-02-20

Applicant: FUJIFILM Corporation

Inventor： Tomoki MATSUDA ,  Yoko TOKUGAWA ,  Akinori SHIBUYA

IPC: G03F7/004 ,  G03F7/20

CPC classification number: G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a compound represented by the following formula (1-1); an actinic ray-sensitive or radiation-sensitive film using the composition; and a pattern forming method: in the formula, R1, R2, R3, R4 and Y− are the same as those in formula (1-1) set forth in the description.

Abstract translation: 提供了含有（A）由下式（1-1）表示的化合物的光化射线敏感或辐射敏感性树脂组合物。 使用该组合物的光化射线敏感或辐射敏感膜; 和图案形成方法：在该式中，R1，R2，R3，R4和Y-与描述中阐述的式（1-1）中的那些相同。