公开(公告)号：US20160010218A1

公开(公告)日：2016-01-14

申请号：US14865334

申请日：2015-09-25

Applicant: FUJIFILM Corporation ,  Japan Technological Research Association of Artificial Photosynthetic Chemical Process

Inventor： Kohei HIGASHI

IPC: C25B1/00 ,  C25B1/10 ,  H01L31/072 ,  H01L31/046 ,  H01L31/05 ,  H01L31/0749

CPC classification number: C25B1/003 ,  C25B1/10 ,  C25B11/04 ,  H01L31/02167 ,  H01L31/02363 ,  H01L31/046 ,  H01L31/0465 ,  H01L31/0512 ,  H01L31/0516 ,  H01L31/072 ,  H01L31/0749 ,  Y02E10/541 ,  Y02E60/366 ,  Y02P20/134 ,  Y02P70/521

Abstract: A gas production apparatus is provided which includes: a module including a plurality of PN junctions connected in series to one another, each being formed of an inorganic semiconductor and having a light receiving surface; two gas generators that are provided at open ends of PN junctions at both extremities of the module, respectively, on a side of the light receiving surface; an electrolysis chamber which contains an aqueous electrolytic solution in contact with the two gas generators and contains gases generated by the two gas generators; and a diaphragm which is ion-permeable but gas-impermeable, and partitions the electrolysis chamber into two regions including the two gas generators, respectively, and containing hydrogen and oxygen, respectively.

Abstract translation: 提供了一种气体制备装置，其包括：模块，包括彼此串联连接的多个PN结，每个PN结由无机半导体形成并具有光接收表面; 两个气体发生器分别设置在光接收表面一侧的模块两端的PN结开口端; 电解室，其含有与两个气体发生器接触的含水电解液，并含有由两个气体发生器产生的气体; 以及隔膜，其是离子可渗透但不透气的隔膜，并且分别将电解室分隔成包括两个气体发生器的两个区域，并分别包含氢气和氧气。

公开(公告)号：US20250017615A1

公开(公告)日：2025-01-16

申请号：US18898638

申请日：2024-09-26

Applicant: FUJIFILM Corporation

Inventor： Nobuyuki TADA ,  Kohei HIGASHI

IPC: A61B17/32 ,  A61B17/00

Abstract: A surgical treatment apparatus comprises a probe that includes a piezoelectric element, a power supply circuit for driving the piezoelectric element, a power supply wiring line to the piezoelectric element, and an impedance matching circuit, in which the probe has electrode layers for power supply on both surfaces of the piezoelectric element, and the impedance matching circuit sets a driving frequency used in the power supply to a frequency lower than a resonance frequency in an impedance characteristic at a treatment start temperature of the probe and a frequency at which a reactance component of impedance becomes 0Ω.

公开(公告)号：US20210055653A1

公开(公告)日：2021-02-25

申请号：US16807496

申请日：2020-03-03

Applicant: FUJIFILM Corporation

Inventor： Tsutomu YOSHIMURA ,  Yasunori YONEKUTA ,  Naoya HATAKEYAMA ,  Kohei HIGASHI ,  Yoichi NISHIDA

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/038 ,  C08F212/14 ,  C08F220/18 ,  C08F212/08

Abstract: Provided are an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A), in which the resin (A) includes a repeating unit having an acidic group and a repeating unit having an acid-decomposable group, a content of the repeating unit having an acidic group is 15% by mole or more with respect to all the repeating units in the resin (A), a content of the repeating unit having an acid-decomposable group is more than 20% by mole with respect to all the repeating units in the resin (A), a glass transition temperature of the resin (A) is 145° C. or lower, and the actinic ray-sensitive or radiation-sensitive resin composition is used for formation of a film having a film thickness of 2 μm or more; and a resist film, a pattern forming method, and a method for manufacturing an electronic device, each using the actinic ray-sensitive or radiation-sensitive resin composition.

公开(公告)号：US20200019058A1

公开(公告)日：2020-01-16

申请号：US16579014

申请日：2019-09-23

Applicant: FUJIFILM Corporation

Inventor： Naoya HATAKEYAMA ,  Yasunori YONEKUTA ,  Tsutomu YOSHIMURA ,  Kohei HIGASHI ,  Yoichi NISHIDA

IPC: G03F7/039 ,  G03F7/038 ,  G03F7/004 ,  C08F212/14 ,  C08F220/68 ,  C08F212/32

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes: a resin, in which the actinic ray-sensitive or radiation-sensitive resin composition has a concentration of a solid content of 10% by mass or more, and in which the resin includes: a repeating unit A which is a repeating unit derived from a monomer allowing a homopolymer formed therefrom to have a glass transition temperature of 50° C. or lower, and a repeating unit B which is a repeating unit having an acid-decomposable group, a content of the repeating unit B is 20% by mole or less with respect to all the repeating units in the resin, and at least one of the repeating unit contained in the resin is a repeating unit having an aromatic ring.

公开(公告)号：US20170107631A1

公开(公告)日：2017-04-20

申请号：US15392440

申请日：2016-12-28

Applicant: FUJIFILM Corporation ,  Japan Technological Research Association of Artificial Photosynthetic Chemical Process

Inventor： Kohei HIGASHI ,  Naotoshi SATO

IPC: C25B1/00 ,  C25B9/08 ,  H01L31/04 ,  C25B11/04 ,  H01L31/032 ,  C25B1/10 ,  C25B15/02

CPC classification number: C25B1/003 ,  C01B3/042 ,  C25B1/10 ,  C25B9/00 ,  C25B9/08 ,  C25B11/04 ,  C25B11/0447 ,  C25B15/02 ,  H01L31/0322 ,  H01L31/0326 ,  H01L31/04 ,  H01L31/072 ,  H01L31/0749 ,  Y02E10/541 ,  Y02E60/368

Abstract: Provided are a water decomposition apparatus and a water decomposition method that can maintain high gas generation efficiency even in an early stage of light irradiation and even in a case where time has elapsed and that can recover the gas generation amount of hydrogen gas or the like, can generate hydrogen gas or the like stably for a long time on an average, and can increase the integrated amount of generation of hydrogen for a long time, even in a case where time has elapsed and the gas generation amount of hydrogen gas or the like has decreased.

公开(公告)号：US20160281241A1

公开(公告)日：2016-09-29

申请号：US15178769

申请日：2016-06-10

Applicant: FUJIFILM Corporation ,  JAPAN TECHNOLOGICAL RESEARCH ASSOCIATION OF ARTIFICIAL PHOTOSYNTHETIC CHEMICAL PROCESS ,  THE UNIVERSITY OF TOKYO

Inventor： Kohei HIGASHI ,  Kazunari DOMEN ,  Jiro TSUKAHARA

IPC: C25B1/00 ,  H01G9/20 ,  C25B1/04 ,  H01L31/032 ,  H01L31/05

CPC classification number: C25B1/003 ,  C25B1/04 ,  C25B9/08 ,  C25B15/02 ,  H01G9/20 ,  H01L31/0322 ,  H01L31/0326 ,  H01L31/0463 ,  H01L31/0504 ,  H01L31/0749 ,  Y02E10/541 ,  Y02E60/368 ,  Y02P70/521

Abstract: A water electrolysis system decomposes an aqueous electrolyte solution into hydrogen and oxygen using light. The water electrolysis system includes a plurality of photoelectric conversion units that have at least one photoelectric conversion element and receive light to generate electrical energy, and a plurality of electrolyte cells in which hydrogen gas and oxygen gas are generated by electrolyzing the aqueous electrolyte solution using the electrical energy obtained by the photoelectric conversion units. The photoelectric conversion units and the electrolyte cells are electrically connected in series. The electrolyte cells are arranged between the photoelectric conversion units, and the photoelectric conversion units or the electrolyte cells located at respective ends in an arrangement state are electrically connected together.

Abstract translation: 水电解系统使用光将电解质水溶液分解成氢和氧。 水电解系统包括具有至少一个光电转换元件并接收光以产生电能的多个光电转换单元，以及多个电解质电池，其中通过使用该电解质电解电解含水电解质溶液而产生氢气和氧气 由光电转换单元获得的电能。 光电转换单元和电解质电池串联电连接。 电解质电池被布置在光电转换单元之间，位于各端的光电转换单元或电解质单元电连接在一起。