公开(公告)号：US20140008554A1

公开(公告)日：2014-01-09

申请号：US14024198

申请日：2013-09-11

Applicant: GIGAPHOTON INC

Inventor： Takeshi ASAYAMA ,  Kouji KAKIZAKI ,  Akira ENDO ,  Shinji NAGAI

IPC: H05G2/00

CPC classification number: H05G2/008 ,  H05G2/003 ,  H05G2/005

Abstract: An extreme ultraviolet light source apparatus generating an extreme ultraviolet light from plasma generated by irradiating a target material with a laser light within a chamber, and controlling a flow of ions generated together with the extreme ultraviolet light using a magnetic field or an electric field, the extreme ultraviolet light source apparatus comprises an ion collector device collecting the ion via an aperture arranged at a side of the chamber, and an interrupting mechanism interrupting movement of a sputtered particle in a direction toward the aperture, the sputtered particle generated at an ion collision surface collided with the ion in the ion collector device.

Abstract translation: 一种极紫外光源装置，通过在室内产生通过用激光照射目标材料而产生的等离子体的极紫外光，并且利用磁场或电场来控制与极紫外光一起产生的离子的流动， 极紫外光源装置包括离子收集器装置，该离子收集器装置通过布置在腔室一侧的孔收集离子，以及中断机构阻止溅射颗粒朝向孔的方向移动，溅射粒子在离子碰撞面 与离子收集器装置中的离子相撞。

公开(公告)号：US20200274315A1

公开(公告)日：2020-08-27

申请号：US16871758

申请日：2020-05-11

Applicant: Gigaphoton Inc.

Inventor： Keisuke ISHIDA ,  Masato MORIYA ,  Natsuhiko KOUNO ,  Takeshi ASAYAMA ,  Takashi KUSAMA

IPC: H01S3/225 ,  G01J3/26 ,  H01S3/036 ,  G03F7/20 ,  H01S3/104

Abstract: An excimer laser apparatus according to the present disclosure includes an etalon spectrometer configured to measure a fringe waveform of a laser beam; and a controller configured to obtain area of a first ratio in a spectral space obtained based on a result of the measurement by the etalon spectrometer, calculate a first spectral line width of the laser beam based on the obtained area of the first ratio, and calibrate a first spectral line width based on a correlation function representing correlation between the first spectral line width and a second spectral line width of the laser beam measured by a reference meter.

公开(公告)号：US20190280451A1

公开(公告)日：2019-09-12

申请号：US16402270

申请日：2019-05-03

Applicant: Gigaphoton Inc.

Inventor： Takeshi ASAYAMA

IPC: H01S3/104 ,  H01S3/225 ,  H01S3/0943

Abstract: A laser apparatus according to the present disclosure includes: a laser chamber including a pair of electrodes and configured to emit, at each of a plurality of pulse repetition frequencies, a pulse laser beam having a pulse energy corresponding to a voltage applied between the electrodes; an energy detector provided on an optical path of the pulse laser beam and configured to detect the pulse energy of the pulse laser beam; a voltage control unit configured to control the applied voltage based on a target pulse energy and the pulse energy detected by the energy detector; and a pulse energy control unit configured to periodically vary the target pulse energy at a modulation frequency corresponding to each of the pulse repetition frequencies with a reference energy being a center of variation.

公开(公告)号：US20190036290A1

公开(公告)日：2019-01-31

申请号：US16150297

申请日：2018-10-03

Applicant: Gigaphoton Inc.

Inventor： Takeshi ASAYAMA

IPC: H01S3/036 ,  H01S3/225 ,  G03F7/20

Abstract: A laser apparatus includes a controller that selects one of a first gas control and a second gas control based on gas pressure measured by a pressure sensor. The first gas control causes at least one of first laser gas and second laser gas is supplied to a chamber such that the gas pressure in the chamber after the first gas control is higher than the gas pressure in the chamber before the first gas control. The second gas control causes at least the first laser gas is supplied to the chamber and causes a part of the laser gas in the chamber is exhausted such that a difference between the gas pressure in the chamber before the second gas control and the gas pressure in the chamber after the second gas control is smaller than a difference between the gas pressure in the chamber before the first gas control and the gas pressure in the chamber after the first gas control.

公开(公告)号：US20170070023A1

公开(公告)日：2017-03-09

申请号：US15354670

申请日：2016-11-17

Applicant: Gigaphoton Inc.

Inventor： Hiroshi UMEDA ,  Takeshi ASAYAMA ,  Osamu WAKABAYASHI

IPC: H01S3/097 ,  H01S3/23

CPC classification number: H01S3/09702 ,  B23K26/00 ,  B23K26/0608 ,  H01L21/02686 ,  H01L21/67115 ,  H01S3/0057 ,  H01S3/104 ,  H01S3/1305 ,  H01S3/1394 ,  H01S3/225 ,  H01S3/2308 ,  H01S3/2383

Abstract: The laser system may include a delay circuit unit, first and second trigger-correction units, and a clock generator. The delay circuit unit may receive a trigger signal, output a first delay signal obtained by delaying the trigger signal by a first delay time, and output a second delay signal obtained by delaying the trigger signal by a second delay time. The first trigger-correction unit may receive the first delay signal and output a first switch signal obtained by delaying the first delay signal by a first correction time. The second trigger-correction unit may receive the second delay signal and output a second switch signal obtained by delaying the second delay signal by a second correction time. The clock generator may generate a clock signal that is common to the delay circuit unit and the first and second trigger-correction units.

Abstract translation: 激光系统可以包括延迟电路单元，第一和第二触发校正单元以及时钟发生器。 延迟电路单元可以接收触发信号，输出通过将触发信号延迟第一延迟时间而获得的第一延迟信号，并输出通过将触发信号延迟第二延迟时间而获得的第二延迟信号。 第一触发校正单元可以接收第一延迟信号并输出​​通过将第一延迟信号延迟第一校正时间而获得的第一开关信号。 第二触发校正单元可以接收第二延迟信号并输出​​通过将第二延迟信号延迟第二校正时间而获得的第二开关信号。 时钟发生器可以产生延迟电路单元和第一和第二触发校正单元共用的时钟信号。

公开(公告)号：US20160254634A1

公开(公告)日：2016-09-01

申请号：US15150800

申请日：2016-05-10

Applicant: Gigaphoton Inc.

Inventor： Takeshi ASAYAMA ,  Osamu WAKABAYASHI ,  Kouji KAKIZAKI

IPC: H01S3/036 ,  H01S3/134 ,  H01S3/225

CPC classification number: H01S3/036 ,  H01S3/038 ,  H01S3/134 ,  H01S3/225

Abstract: The excimer laser apparatus may include a laser chamber configured to contain gas, a pair of electrodes provided in the laser chamber, a power source unit configured to supply a pulse voltage between the pair of electrodes, a gas supply unit configured to supply gas into the laser chamber, a gas exhaust unit configured to partially exhaust gas from within the laser chamber, and a gas control unit configured to control the gas supply unit and the gas exhaust unit, where a replacement ratio of gas to be replaced from within the laser chamber increases as deterioration of the pair of electrodes progresses, the deterioration being represented by a deterioration parameter of the pair of electrodes.

Abstract translation: 准分子激光装置可以包括配置为容纳气体的激光室，设置在激光室中的一对电极，配置为在一对电极之间提供脉冲电压的电源单元，被配置为将气体供应到 激光室，构成为从激光室内部分地排出气体的排气单元，以及气体控制单元，其配置为控制气体供给单元和排气单元，在所述气体供给单元和所述排气单元中， 随着一对电极的劣化进一步增加，劣化由一对电极的劣化参数表示。