公开(公告)号：US20140050239A1

公开(公告)日：2014-02-20

申请号：US13947910

申请日：2013-07-22

Applicant: Gigaphoton Inc.

Inventor： Shinji NAGAI ,  Fumika YOSHIDA ,  Osamu WAKABAYASHI ,  Kouji KAKIZAKI

IPC: H01S3/10

CPC classification number: H01S3/10061 ,  H01S3/005 ,  H01S3/2251 ,  H01S3/2316

Abstract: A degree of polarization control device includes: a calcium fluoride crystal substrate for transmitting a laser beam; a polarization monitor for measuring the degree of polarization of a laser beam transmitted through the calcium fluoride crystal substrate; and a controller for controlling the rotation angle of the calcium fluoride crystal substrate according to the degree of polarization measured by the polarization monitor; the calcium fluoride crystal substrate being formed by a flat plate having a laser beam entering surface and a laser beam exiting surface running in parallel with the (111) crystal face, the Brewster angle being selected for the incident angle, the rotation angle around the [111] axis operating as a central axis being controlled by the controller.

Abstract translation: 一种偏光控制装置包括：用于透射激光束的氟化钙晶体基板; 用于测量透射穿过氟化钙晶体衬底的激光束的偏振度的偏振监视器; 以及控制器，用于根据由偏振监视器测量的偏振度来控制氟化钙晶体基板的旋转角度; 所述氟化钙晶体基板由具有激光入射面的平板和与（111）晶面平行地行进的激光束离开表面形成，所述布鲁斯特角为入射角选择，围绕[ 111]轴作为中心轴由控制器控制。

公开(公告)号：US20140008554A1

公开(公告)日：2014-01-09

申请号：US14024198

申请日：2013-09-11

Applicant: GIGAPHOTON INC

Inventor： Takeshi ASAYAMA ,  Kouji KAKIZAKI ,  Akira ENDO ,  Shinji NAGAI

IPC: H05G2/00

CPC classification number: H05G2/008 ,  H05G2/003 ,  H05G2/005

Abstract: An extreme ultraviolet light source apparatus generating an extreme ultraviolet light from plasma generated by irradiating a target material with a laser light within a chamber, and controlling a flow of ions generated together with the extreme ultraviolet light using a magnetic field or an electric field, the extreme ultraviolet light source apparatus comprises an ion collector device collecting the ion via an aperture arranged at a side of the chamber, and an interrupting mechanism interrupting movement of a sputtered particle in a direction toward the aperture, the sputtered particle generated at an ion collision surface collided with the ion in the ion collector device.

Abstract translation: 一种极紫外光源装置，通过在室内产生通过用激光照射目标材料而产生的等离子体的极紫外光，并且利用磁场或电场来控制与极紫外光一起产生的离子的流动， 极紫外光源装置包括离子收集器装置，该离子收集器装置通过布置在腔室一侧的孔收集离子，以及中断机构阻止溅射颗粒朝向孔的方向移动，溅射粒子在离子碰撞面 与离子收集器装置中的离子相撞。

公开(公告)号：US20200301285A1

公开(公告)日：2020-09-24

申请号：US16894652

申请日：2020-06-05

Applicant: Gigaphoton Inc.

Inventor： Shinji NAGAI ,  Takashi SAITO

IPC: G03F7/20 ,  B82Y10/00

Abstract: An extreme ultraviolet light generation device configured to generate extreme ultraviolet light by irradiating a target containing tin with a pulse laser beam includes a chamber container, a hydrogen gas supply unit configured to supply hydrogen gas into the chamber container, a heat shield disposed between the chamber container and a predetermined region in which the target is irradiated with the pulse laser beam inside the chamber container, a first cooling medium flow path disposed in the chamber container, a second cooling medium flow path disposed in the heat shield, and a cooling device configured to supply a first cooling medium to the first cooling medium flow path and supply a second cooling medium to the second cooling medium flow path so that a temperature of the heat shield becomes lower than a temperature of the chamber container.

公开(公告)号：US20200077501A1

公开(公告)日：2020-03-05

申请号：US16677882

申请日：2019-11-08

Applicant: Gigaphoton Inc.

Inventor： Hiroaki TOMURO ,  Shinji NAGAI ,  Yoshiyuki HONDA

IPC: H05G2/00 ,  G03F7/20

Abstract: An extreme ultraviolet light generation apparatus includes: a chamber in which plasma is generated from a target substance at a condensation position of a laser beam; a condenser mirror configured to condense extreme ultraviolet light generated by the plasma; and a magnetic field generation unit configured to generate a magnetic field that converges a charged particle generated by the plasma toward a wall of the chamber, the condenser mirror includes a substrate, a reflective layer, and a protective layer provided on the reflective layer, the protective layer has layer thickness distribution in which a layer thickness of the protective layer from a reflective layer surface changes, and the layer thickness of the protective layer is maximum at a position on a line (CL) on which a plane passing through a magnetic field axis of the magnetic field generation unit and a central axis (CA) of the condenser mirror intersects the reflective layer surface (62F).

公开(公告)号：US20170055336A1

公开(公告)日：2017-02-23

申请号：US15347716

申请日：2016-11-09

Applicant: GIGAPHOTON INC.

Inventor： Shinji NAGAI ,  Tamotsu ABE ,  Hitoshi NAGANO ,  Osamu WAKABAYASHI

IPC: H05G2/00 ,  G03F7/20 ,  G21K1/06

CPC classification number: H05G2/008 ,  B23K10/00 ,  B23K26/12 ,  B23K26/36 ,  G03B27/32 ,  G03F7/70025 ,  G03F7/70033 ,  G21K1/067 ,  G21K5/00 ,  G21K5/02 ,  G21K2201/064 ,  H05G2/005

Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction, unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.

Abstract translation: 一种用于产生与激光装置并且连接到外部装置以便提供极紫外光的极紫外光的装置，包括设置有至少一个入口的腔室，激光束通过该入口引入腔室; 设置在所述室上的目标供给单元，其构造成将目标材料供应到所述室内的预定区域; 连接到所述室的排出泵; 设置在所述室内的至少一个光学元件; 设置在蚀刻气体通过的室的蚀刻气体引入单元; 以及用于控制所述至少一个光学元件的温度的至少一个温度控制机构。

公开(公告)号：US20150296604A1

公开(公告)日：2015-10-15

申请号：US14729723

申请日：2015-06-03

Applicant: GIGAPHOTON INC.

Inventor： Shinji NAGAI ,  Takashi SAITO

IPC: H05G2/00

CPC classification number: H05G2/008 ,  H05G2/003 ,  H05G2/006

Abstract: An extreme ultraviolet light generation system may include a beam focusing optics configured such that a pre-pulse laser beam and a main pulse laser beam are focused on a plasma generation region, and that a beam path axis of the pre-pulse laser beam and a beam path axis of the main pulse laser beam pass through the plasma generation region at an angle equal to or smaller than a loss-cone angle with respect to a central axis of a magnetic field that is generated by a magnetic field generator. A first laser apparatus and a second laser apparatus may be controlled such that, after a target outputted from a target generation unit has been irradiated with the pre-pulse laser beam in the plasma generation region, the target is irradiated with the main pulse laser beam with a delay time ranging from 0.5 μs or longer to 7 μs or shorter.

Abstract translation: 极紫外光发生系统可以包括光束聚焦光学元件，其配置为使得预脉冲激光束和主脉冲激光束聚焦在等离子体产生区域上，并且预脉冲激光束的光束轴线和 主脉冲激光束的光束路径轴相对于由磁场发生器产生的磁场的中心轴以等于或小于损耗锥角的角度通过等离子体产生区域。 可以控制第一激光装置和第二激光装置，使得在从目标产生单元输出的目标已经在等离子体产生区域中的预脉冲激光束照射之后，用主脉冲激光束 延迟时间范围为0.5μs或更长至7μs或更短。

公开(公告)号：US20130319466A1

公开(公告)日：2013-12-05

申请号：US13907818

申请日：2013-05-31

Applicant: GIGAPHOTON INC

Inventor： Hakaru MIZOGUCHI ,  Shinji NAGAI

IPC: G03F7/20

CPC classification number: G03F7/70925

Abstract: A cleaning method for an EUV light generation apparatus may include closing a connection portion so that a chamber interior and the interior of an exposure apparatus do not communicate when EUV light is not being generated, supplying an etchant gas for etching debris that has accumulated on a reflective surface of an optical element to the chamber interior in a state where the connection portion is closed, and exhausting the chamber interior using an exhaust apparatus while supplying the etchant gas.

Abstract translation: EUV发光装置的清洁方法可以包括：关闭连接部分，使得当不产生EUV光时，室内部和曝光装置的内部不通信，提供用于蚀刻积聚在 在连接部分关闭的状态下将光学元件的反射表面连接到室内部，并且在供应蚀刻剂气体的同时使用排气装置排出室内部。

公开(公告)号：US20210364928A1

公开(公告)日：2021-11-25

申请号：US17398054

申请日：2021-08-10

Applicant: Gigaphoton Inc.

Inventor： Gota NIIMI ,  Yoshifumi UENO ,  Shinji NAGAI

IPC: G03F7/20 ,  H05G2/00

Abstract: A tin trap device for collecting tin in a chamber device which causes tin to be turned into plasma with laser light in an internal space thereof may include a housing provided with a gas inlet port through which exhaust gas in the chamber device flows and a gas exhaust port through which the exhaust gas is exhausted; and a main heater arranged in the housing, configured to have a temperature equal to or higher than the melting point of tin and lower than the boiling point thereof, and having a projection surface projected toward a direction in which the exhaust gas flows in the gas inlet port cover the gas inlet port.

公开(公告)号：US20180224748A1

公开(公告)日：2018-08-09

申请号：US15945672

申请日：2018-04-04

Applicant: GIGAPHOTON INC.

Inventor： Shinji NAGAI ,  Atsushi UEDA ,  Takashi SAITO

IPC: G03F7/20 ,  H05G2/00 ,  H01J37/32 ,  G21K1/06

CPC classification number: G03F7/70033 ,  G21K1/06 ,  G21K5/02 ,  H01J37/3244 ,  H05G1/00 ,  H05G2/008

Abstract: An extreme ultraviolet light generating device may include a chamber, an EUV light focusing mirror provided therein, including a reflection surface having a concave curved shape and an outer peripheral portion around an outer edge of the reflection surface, and configured to focus EUV light radiated from plasma generated when a target is irradiated with laser light, a gas supplying device including peripheral heads provided on or along the outer peripheral portion; and a discharge device including a discharge path forming a discharge port near the outer peripheral portion, and configured to discharge an ion or a particle from the discharge port. The peripheral heads each may blow out a gas flow from the outer peripheral portion or a vicinity thereof along the reflection surface, and allow gas flows to join on the reflection surface to thereby form a gas flow along the reflection surface toward the discharge port.

公开(公告)号：US20170238407A1

公开(公告)日：2017-08-17

申请号：US15583001

申请日：2017-05-01

Applicant: Gigaphoton Inc.

Inventor： Shinji NAGAI ,  Georg SOUMAGNE ,  Toshihiro NISHISAKA

IPC: H05G2/00

CPC classification number: H05G2/008 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70916

Abstract: An extreme ultraviolet light generation device may include a chamber in which extreme ultraviolet light is generated from plasma, the plasma generated by irradiation of a target supplied in a plasma generation region inside of the chamber with laser light; a condenser mirror collecting the extreme ultraviolet light and guiding it to outside of the chamber; a first etching gas supply unit blowing an etching gas to a reflective surface of the condenser mirror and the plasma generation region; a magnet forming a magnetic field in the chamber; a port that intersects a central axis of the magnetic field and that takes in suspended substances generated in the chamber; and an ejection path that is in communication with the port and that ejects the suspended substances taken from the port to the outside of the chamber.