公开(公告)号：US09478449B2

公开(公告)日：2016-10-25

申请号：US14232901

申请日：2012-07-13

申请人： Pascal Gustaaf Vermont ,  Wilhelmus Gerardus Van Velzen ,  Vladimir Ivanovich Kuznetsov ,  Ernst Hendrik August Granneman ,  Gonzalo Felipe Ramirez Troxler

发明人： Pascal Gustaaf Vermont ,  Wilhelmus Gerardus Van Velzen ,  Vladimir Ivanovich Kuznetsov ,  Ernst Hendrik August Granneman ,  Gonzalo Felipe Ramirez Troxler

IPC分类号： H01L21/67 ,  H01L21/66 ,  H01L21/677 ,  C23C16/54 ,  C23C16/52 ,  C23C16/455 ,  C23C16/40

CPC分类号： H01L21/67276 ,  C23C16/403 ,  C23C16/45551 ,  C23C16/52 ,  C23C16/54 ,  H01L21/67259 ,  H01L21/6776 ,  H01L21/67784 ,  H01L22/26

摘要： Disclosed is a process tunnel (102) through which substrates (140) may be transported in a floating condition between two gas bearings (124, 134). To monitor the transport of the substrates through the process tunnel, the upper and lower walls (120, 130) of the tunnel are fitted with at least one substrate detection sensor (S1, . . . , S6) at a respective substrate detection sensor location, said substrate detection sensor being configured to generate a reference signal reflecting a presence of a substrate between said first and second walls near and/or at said substrate detection sensor location. Also provided is a monitoring and control unit (160) that is operably connected to the at least one substrate detection sensor (S1, . . . , S6), and that is configured to record said reference signal as a function of time and to process said reference signal.

摘要翻译： 公开了一种工艺通道（102），衬底（140）可以在浮动状态下在两个气体轴承（124,134）之间传送。 为了监测基板通过处理隧道的输送，隧道的上壁和下壁（120,130）在相应的基板检测传感器位置装配有至少一个基板检测传感器（S1，...，S6） 所述衬底检测传感器被配置为产生反映在所述衬底检测传感器位置附近和/或所述第一和第二壁之间的衬底的存在的参考信号。 还提供了可操作地连接到至少一个基板检测传感器（S1，...，S6）的监视和控制单元（160），并且被配置为记录作为时间的函数的所述参考信号并且处理 所述参考信号。

公开(公告)号：US07351293B2

公开(公告)日：2008-04-01

申请号：US10969256

申请日：2004-10-19

申请人： Vladimir Ivanovich Kuznetsov ,  Sijbrand Radelaar ,  Jacobus Cornells Gerardus Van Der Sanden ,  Theo Anjes Maria Ruijl

发明人： Vladimir Ivanovich Kuznetsov ,  Sijbrand Radelaar ,  Jacobus Cornells Gerardus Van Der Sanden ,  Theo Anjes Maria Ruijl

IPC分类号： H01L21/00 ,  C23C16/00 ,  C23C14/00

CPC分类号： H01L21/67784

摘要： Method and device for rotating a wafer which is arranged floating in a reactor. The wafer is treated in a reactor of this nature, and it is important for this treatment to be carried out as uniformly as possible. For this purpose, it is proposed to rotate the wafer by allowing the gas flow to emerge perpendicular to the surface of the wafer and then to impart to this gas a component which is tangential with respect to the wafer, thus generating rotation. This tangential component may be generated by the provision of grooves, which may be of spiral or circular design.

摘要翻译： 用于旋转布置在反应器中的晶片的方法和装置。 将晶片在这种性质的反应器中处理，并且对于该处理应尽可能均匀地进行是重要的。 为此目的，提出通过使气流垂直于晶片的表面出现，然后赋予该气体相对于晶片切向的部件，从而产生旋转来旋转晶片。 这种切向部件可以通过提供可以是螺旋形或圆形设计的凹槽产生。

公开(公告)号：US07048488B1

公开(公告)日：2006-05-23

申请号：US10009851

申请日：2000-05-08

申请人： Vladimir Ivanovich Kuznetsov ,  Theodorus Gerardus Maria Oosterlaken ,  Christianus Gerardus Maria Ridder ,  Ernst Hendrik August Granneman

发明人： Vladimir Ivanovich Kuznetsov ,  Theodorus Gerardus Maria Oosterlaken ,  Christianus Gerardus Maria Ridder ,  Ernst Hendrik August Granneman

IPC分类号： B65G25/00

CPC分类号： H01L21/67109 ,  H01L21/67784

摘要： For wafer processing, wafers are transferred between a thermal treatment chamber and a thermal treatment installation. The treatment chamber has a top section and a bottom section between which the wafer is accommodated during treatment. The thermal treatment installation has a loading chamber having loading means and transport means. The wafer is place on a wafer support while in the loading chamber, wherein the wafer support is configured as a ring having support elements to support the wafer. The wafer support loaded with the wafer is inserted into the thermal treatment chamber so that the wafer and the wafer support are positioned between the top section and the bottom section. The wafer is individually processed in the thermal treatment chamber. After processing the wafer, the wafer support is removed from the thermal treatment chamber.

摘要翻译： 对于晶片处理，晶片在热处理室和热处理设备之间传送。 处理室具有在处理期间容纳晶片的顶部和底部。 热处理装置具有装载室，其具有装载装置和输送装置。 晶片在装载室中放置在晶片支架上，其中晶片支撑构造为具有支撑元件以支撑晶片的环。 将装载有晶片的晶片载体插入热处理室中，使得晶片和晶片支撑件位于顶部和底部之间。 在热处理室中分别处理晶片。 在处理晶片之后，从热处理室移除晶片支架。

公开(公告)号：US06746237B2

公开(公告)日：2004-06-08

申请号：US10151207

申请日：2002-05-16

申请人： Arjen Storm ,  Ronald Bast ,  Vladimir Ivanovich Kuznetsov ,  Jan Zinger

发明人： Arjen Storm ,  Ronald Bast ,  Vladimir Ivanovich Kuznetsov ,  Jan Zinger

IPC分类号： H05B102

CPC分类号： H01L21/00 ,  H01L21/67109

摘要： Method and device for the heat treatment of substrates, wherein the substrates are positioned in the vicinity of a heated, essentially flat furnace body extending over the surface of the substrate. In order to provide a reproducible treatment when treating a number of substrates successively, the temperature of the furnace body is measured so close to the surface adjacent to the substrate that the withdrawal of heat from the furnace body by the substrate can be detected. The introduction of each substrate takes place at a point in time when the temperature measured in this way is, within certain limits, equal to a desired initial treatment temperature Ttrig.

摘要翻译： 用于基板热处理的方法和装置，其中基板位于在衬底的表面上延伸的加热的基本平坦的炉体附近。 为了在连续处理多个基板时提供可再现的处理，炉体的温度被测量为与基板相邻的表面接近，可以检测到通过基板取出炉体的热量。 每个衬底的引入在这样测量的温度在某一限度内等于期望的初始处理温度Ttrig的时间点发生。

公开(公告)号：US4074773A

公开(公告)日：1978-02-21

申请号：US693285

申请日：1976-06-07

申请人： Vladimir Konstantinovich Grigoriev ,  Viktor Dmitrievich Chugunov ,  Mikhail Nikolaevich Kudryakov ,  Alexandr Moiseevich Tsipkis ,  Vladimir Germogenovich Yakovlev ,  Alexandr Samoilovich Averbukh ,  Jury Ilich Scherbakov ,  Natalia Dmitrievna Yakobson ,  Vyacheslav Fedorovich Semikozov ,  Viktor Vladimirovich Medvedev ,  Valery Vasilievich Yartsev ,  July Davydovich Kaganov ,  Vladimir Ivanovich Kuznetsov ,  Alexandr Iosifovich Sinelnikov

发明人： Vladimir Konstantinovich Grigoriev ,  Viktor Dmitrievich Chugunov ,  Mikhail Nikolaevich Kudryakov ,  Alexandr Moiseevich Tsipkis ,  Vladimir Germogenovich Yakovlev ,  Alexandr Samoilovich Averbukh ,  Jury Ilich Scherbakov ,  Natalia Dmitrievna Yakobson ,  Vyacheslav Fedorovich Semikozov ,  Viktor Vladimirovich Medvedev ,  Valery Vasilievich Yartsev ,  July Davydovich Kaganov ,  Vladimir Ivanovich Kuznetsov ,  Alexandr Iosifovich Sinelnikov

IPC分类号： E21B7/02 ,  E21C11/02

CPC分类号： E21B7/025 ,  E21B7/026

摘要： The drlling machine has a bogie accommodated within a gantry frame, the gantry frame carrying the drilling tools and the jacks. In the drilling position and in the gantry position of the machine the gantry frame bears by the jacks upon the ground and with the jacks lifted off the ground the frame bears upon the bogie. The drilling machine has a mechanism for lifting the bogie and a beam with a mechanism effecting displacement of the beam in a direction transverse to the longitudinal geometric axis of the bogie, as well as projectable abutments onto which the gantry frame bears in the transportation position of the drilling machine, the frame having flexible operative connection with the bogie lifting mechanism.

摘要翻译： 排料机具有容纳在龙门架框架内的转向架，承载钻具和千斤顶的龙门框架。 在钻孔位置和机台的龙门架位置，龙门架由地面上的千斤顶支撑，并且千斤顶从地面上抬起，框架承载在转向架上。 钻机具有用于提升转向架和梁的机构，其具有在垂直于转向架的纵向几何轴线的方向上移动梁的机构以及机架框架承载在转向架的运输位置 钻机，框架与转向架提升机构具有灵活的操作连接。