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11.发明授权公开(公告)号：US10955751B2
公开(公告)日：2021-03-23
申请号：US16842421
申请日：2020-04-07
Applicant: Gigaphoton Inc.
Inventor： Yuta Takashima , Yoshifumi Ueno
Abstract: An extreme ultraviolet light generation apparatus that generates plasma by irradiating a target substance with a pulse laser beam and generates extreme ultraviolet light from the plasma includes: a droplet detection unit configured to detect a droplet passing through a predetermined position between a target supply unit and a plasma generation region; and a control unit configured to control a laser apparatus configured to output the pulse laser beam. The control unit performs control to determine whether there is a defective droplet based on a droplet detection signal obtained from the droplet detection unit and to stop, when it is determined that there is a defective droplet, irradiation of the defective droplet determined to be defective, a preceding droplet output one droplet before the defective droplet, and a following droplet output one droplet after the defective droplet with the pulse laser beam.
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公开(公告)号：US10111312B2
公开(公告)日：2018-10-23
申请号：US15807067
申请日：2017-11-08
Applicant: Gigaphoton Inc.
Inventor： Toru Suzuki , Kotaro Miyashita , Yoshifumi Ueno , Takuya Ishii
IPC: H05G2/00
Abstract: Output timing of laser light is controlled with high accuracy. An extreme ultraviolet light generation device may include a chamber in which plasma is generated to generate extreme ultraviolet light, a window provided in the chamber, an optical path pipe connected to the chamber, a light source disposed in the optical path pipe and configured to output light into the chamber via the window, a gas supply unit configured to supply gas into the optical path pipe, and an exhaust port configured to discharge the gas in the optical path pipe to an outside of the optical path pipe.
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公开(公告)号：US08841639B2
公开(公告)日：2014-09-23
申请号：US14024306
申请日：2013-09-11
Applicant: Gigaphoton Inc.
Inventor： Takayuki Yabu , Yoshifumi Ueno , Takeshi Kodama
Abstract: A control method for a target supply device may employ a target supply device, provided in an EUV light generation apparatus including an image sensor, that includes a target generator having a nozzle and configured to hold a target material and a pressure control unit configured to control a pressure within the target generator, and the method may include outputting the target material in the target generator from a nozzle hole in the nozzle by pressurizing the interior of the target generator using the pressure control unit, determining whether or not a difference between an output direction of the target material outputted from the nozzle hole that is detected by the image sensor and a set direction is within a predetermined range, and holding the pressure in the target generator using the pressure control unit until the difference falls within the predetermined range.
Abstract translation: 目标供给装置的控制方法可以采用在包括图像传感器的EUV光发生装置中设置的目标供给装置，所述图像传感器包括具有喷嘴的目标发生器，并且被配置为保持目标材料，压力控制单元被配置为控制 目标发电机内的压力，并且该方法可以包括通过使用压力控制单元对目标发电机的内部进行加压，从喷嘴中的喷嘴孔输出目标发电机中的目标材料，确定输出 从由图像传感器检测到的喷嘴孔输出的目标材料的方向和设定方向在预定范围内，并且使用压力控制单元保持在目标发生器中的压力，直到差落在预定范围内。
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公开(公告)号：US11219116B1
公开(公告)日：2022-01-04
申请号：US17314775
申请日：2021-05-07
Applicant: Gigaphoton Inc.
Inventor： Yuta Takashima , Yuichi Nishimura , Takayuki Yabu , Yoshifumi Ueno
Abstract: An extreme ultraviolet light generation system may include an irradiation position adjustment mechanism adjusting an irradiation position of the laser light; an extreme ultraviolet light sensor measuring energy of extreme ultraviolet light; a return light sensor measuring energy of return light traveling backward on the laser light path; and a processor controlling the irradiation position adjustment mechanism. The processor stores measurement results of the extreme ultraviolet light energy and the return light energy in association with each of the irradiation positions, limits a shift region of the irradiation position based on comparison between the return light energy and a threshold, and determines a target irradiation position based on the association between the irradiation position and the extreme ultraviolet light energy in a region where the return light energy does not exceed the threshold, and controlling the irradiation position adjustment mechanism in accordance with the target irradiation position.
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公开(公告)号：US11043784B2
公开(公告)日：2021-06-22
申请号：US16595782
申请日：2019-10-08
Applicant: Gigaphoton Inc.
Inventor： Tsukasa Hori , Yoshifumi Ueno , Takayuki Yabu , Yoshiaki Kurosawa
Abstract: A laser apparatus includes: a plurality of envelope blocks each provided with an optical element and a first temperature sensor and covering part of a laser beam path, the optical element being disposed on the laser beam path, the first temperature sensor being configured to measure a first temperature of gas at a position away from the optical element; an envelope body including the envelope blocks and covering the laser beam path; and a control unit connected with each first temperature sensor and configured to specify an envelope block at which increase of the first temperature is measured in the envelope body as an envelope block at which anomaly is occurring.
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Patent Agency Ranking
16.发明授权公开(公告)号：US10667376B2
公开(公告)日：2020-05-26
申请号：US16593294
申请日：2019-10-04
Applicant: Gigaphoton Inc.
Inventor： Yuta Takashima , Yoshifumi Ueno
Abstract: A target supply device according to an aspect of the present disclosure includes a vibration element configured to generate a droplet by vibrating a target substance to be output from a nozzle 80, a droplet detection unit configured to detect the droplet, and a control unit 70. A first detection threshold and a second detection threshold to be compared with a detection signal from the droplet detection unit are set to the control unit 70. The first detection threshold is used to generate a light emission trigger for a laser beam. The second detection threshold has a smaller absolute value from a base line of the detection signal than the first detection threshold. The control unit 70 calculates an evaluation parameter for a satellite based on the detection signal and the second detection threshold, and determines a duty value of an electric signal suitable for operation of the vibration element based on the evaluation parameter.
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公开(公告)号：US10194515B2
公开(公告)日：2019-01-29
申请号：US15613789
申请日：2017-06-05
Applicant: GIGAPHOTON INC.
Inventor： Yoshifumi Ueno , Takashi Suganuma , Yoshiaki Kurosawa
Abstract: A beam delivery system may include: beam adjusters configured to adjust a divergence angle of a pulse laser beam; a beam sampler configured to separate a part of the pulse laser beam outputted from a first beam adjuster provided at the most downstream among the beam adjusters to acquire a sample beam; a beam monitor configured to receive the sample beam and output a monitored diameter; and a beam delivery controller configured to control the beam adjusters based on the monitored diameter. The beam delivery controller may adjust each of beam adjusters other than the first beam adjuster selected one after another from the most upstream so that the monitored diameter at the beam monitor becomes a predetermined value specific to the beam adjuster, and adjust the first beam adjuster so that the pulse laser beam becomes focused at a position downstream of a target position.
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公开(公告)号：US09942973B2
公开(公告)日：2018-04-10
申请号：US15480400
申请日：2017-04-06
Applicant: GIGAPHOTON INC.
Inventor： Tamotsu Abe , Yoshifumi Ueno , Hirokazu Hosoda , Takashi Saito
Abstract: An extreme ultraviolet light generation apparatus may be configured to generate extreme ultraviolet light by irradiating a target with a pulse laser beam outputted from a laser apparatus to generate plasma. The extreme ultraviolet light generation apparatus may include a chamber; a target supply device configured to supply a target to a plasma generation region inside the chamber; a target sensor located between the target supply device and the plasma generation region and configured to detect the target passing through a detection region; and a shield cover disposed between the detection region and the target supply device, having a through-hole that allows the target to pass through, and configured to reduce pressure waves that reach the target supply device from the plasma generation region.
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19.发明授权公开(公告)号：US09888555B2
公开(公告)日：2018-02-06
申请号：US15422489
申请日：2017-02-02
Applicant: GIGAPHOTON INC.
Inventor： Masahiko Ando , Yoshifumi Ueno , Toru Suzuki
CPC classification number: H05G2/008 , G03F7/70033 , G03F7/70808 , G03F7/70991
Abstract: The transmission system may include: an optical path adjustment device configured to substantially unify optical paths of a first pre-pulse laser beam and a second pre-pulse laser beam; an optical path separation device configured to separate the optical paths of the substantially unified first pre-pulse laser beam and the second pre-pulse laser beam to an optical path for the first pre-pulse laser beam and an optical path for the second pre-pulse laser beam; a first beam adjustment device disposed on the optical path for the first pre-pulse laser beam separated by the optical path separation device and configured to adjust a beam parameter of the first pre-pulse laser beam; and a second beam adjustment device disposed on the optical path for the second pre-pulse laser beam separated by the optical path separation device and configured to adjust a beam parameter of the second pre-pulse laser beam.
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公开(公告)号：US09872372B2
公开(公告)日：2018-01-16
申请号：US15379230
申请日：2016-12-14
Applicant: Gigaphoton Inc.
Inventor： Atsushi Ueda , Shinji Nagai , Yoshifumi Ueno , Tamotsu Abe
Abstract: An extreme ultraviolet light generation device is to generate extreme ultraviolet light by irradiating a target with a pulse laser beam and thereby turning the target into plasma. The device may include a chamber, a magnet configured to form a magnetic field in the chamber, and an ion catcher including a collision unit disposed so that ions guided by the magnetic field collide with the collision unit.
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