Abstract:
A self-sanitizing surface structure configured to selectively refract light, a method of fabricating a self-sanitizing surface configured to selectively refract light, and a method of decontaminating a surface using selectively refracted light. A waveguide including a support layer below a propagating layer is positioned over a substrate as a self-sanitizing layer. In the absence of a contaminant or residue on the waveguide, UV light injected into the propagating layer is constrained within the propagating layer due to total internal reflection. When a residue is present on the self-sanitizing surface structure, light may be selectively refracted at or near the interface with the residue along the side of the waveguide to destroy the residue. The self-sanitizing surface structure may be configured to refract a suitable amount of UV light in response to a particular type of residue or application.
Abstract:
A two-dimensional phased array beam former comprising at least first and second chips having each top and bottom surfaces, the bottom surface of the first chip being attached to the top surface of the second chip; the first and second chips having each an emitter side surface, the emitter side surfaces of the first and second chips facing a same direction and comprising each a plurality of emitters; wherein each of said first and second chips comprises at least one conductive post extending between said top and bottom surfaces; the at least one conductive post of the first chip being vertically aligned with and connected to the at least one conductive post of the second chip.
Abstract:
A phased array that comprises a predetermined number of emitter/receiver elements; said emitter/receiver elements being arranged on a array formed of stacked rows, wherein the emitter/receiver elements in each row of the array are distributed according to a pseudo-random pattern; and the heights of the rows vary according to a pseudo-random pattern.