摘要:
An off-axis alignment system in a lithographic projection apparatus uses broadband radiation to illuminate a phase grating on the wafer. The broadband radiation source may include fluorescent materials, e.g. Yag:Ce or ND:Yag crystals illuminated by excitation light.
摘要:
In a method of measuring, in a lithographic manufacturing process using a lithographic projection apparatus, overlay between a resist layer, in which a mask pattern is to be imaged, and a substrate, use is made of an alignment-measuring device forming part of the apparatus and of specific overlay marks in the substrate and resist layer. These marks have periodic structures with periods which cannot be resolved by the alignment device, but generate an interference pattern having a period corresponding to the period of a reference mark of the alignment device.
摘要:
For determining the alignment of a substrate with respect to a mask, a substrate alignment mark having a periodic structure, and an additional alignment mark, having a periodic structure and provided in a resist layer (RL) on top of the substrate, are used. Upon illumination of these two marks, having a period which is considerably smaller than that of a reference mark, an interference pattern (Pb) is generated, which has a period corresponding to that of the reference mark. By measuring the movement of the interference pattern with respect to the reference mark, the much smaller mutual movement of the fine alignment marks can be measured. In this way, the resolution and accuracy of a conventional alignment device can be increased considerably.
摘要:
The invention relates to a sensor device (100) in which the spatial distribution of an input light (L1) emission from a light emitting area (121, 122) of a light source (120) can selectively be changed. The input light is propagated through an optical system (110) to produce some output light (L2). Changes of the input light are taken into account when the detected output light (L2) is evaluated. Thus it is for example possible to detect and/or eliminate optical disturbances occurring in the optical path outside an object region (3). The light source (120) may particularly comprise a plurality of a light emitting segments (121, 122) that can selectively be switched on or off.
摘要:
The invention relates to a fluid filtering device comprising a filter (2) for filtering a fluid and a substrate (3) comprising a collecting structure (4) for collecting the filtered fluid from the filter (2). An adhesive (5) holds the filter (2) in place with respect to the collecting structure (4). The filter (2), the substrate (3) with the collecting structure (4) and the adhesive (5) are arranged such that the collecting structure (4) contacts the filter (2) and the filter (2) is attached to the substrate (3) by the adhesive (5). The collecting structure is very close to the filter and the adhesive ensures that the collecting structure remains very close to the filter. The filtered fluid can therefore be collected very efficiently and very fast. The fluid filtering device is preferentially used for filtering blood in a biosensing device.
摘要:
In order to distinguish a duplicated record carrier from an original record carrier a pattern is included in a ROM type record carrier that is oriented perpendicular to the reading direction. During illegal duplication the spatial relationship is disturb which can be easily detected. The patterns can be read out simultaneously by the same single read-out spot by including both patterns within the diameter of the optical spot thus guaranteeing that the read-out patterns are actually still spatially close together. Special patterns can be used that allow an easy detection of disturbances caused by the illegal duplication.
摘要:
An apparatus for examination of a sample includes at least one sample chamber in which the sample can be provided, where the sample chamber has a detection surface; at least one light source for emitting a first input light beam which is totally internally reflected at the detection surface of the sample chamber into a first output light beam, and for emitting a second input light beam which is at least partially transmitted through the sample chamber into a second output light beam. The apparatus further includes at least one light detector for detecting the first and the second output light beams. The sample chamber is elongated and traversed in longitudinal direction by light of the second input light beam.
摘要:
The invention relates to means for the examination of a sample, wherein a first input light beam (L1) is totally internally reflected at a detection surface of a sample chamber (111), while a second input light beam (L1′) is transmitted through the sample chamber (111). The resulting first and second output light beams (L2, L2′) are detected and can be evaluated with respect to frustrated total internal reflection and optical absorbance, respectively. Preferably, both output light beams (L2, L2′) are detected by a single image sensor (155).
摘要:
The invention relates to a double telecentric optical system (100) and its use in a sensor device (1000), wherein said optical system (100) comprises a single focusing element, for example a lens (101). A mirror element (102) is arranged at the focal point (F) of this focusing element (101) to reflect incoming light rays back to the focusing element (101). Incoming and reflected light rays preferably pass through different parts (101a, 101b) of the focusing element (101), allowing a spatially separated arrangement of an object (3) and its image (I).
摘要:
The present invention relates to a data medium to be read out by a focused reading beam having a predetermined wavelength. The data medium implements a new concept of generating a reference beam, by comprising a reference beam interface, which, in the propagation direction of the impinging reading beam, is arranged either in front of a data layer with a pit-and-land structure, and is partially reflective while the pit and land interface sections are fully reflective for the reading beam. Or the reference layer is arranged behind the first and second reflective interface sections, and is fully reflective while the pit and land interlace sections are partially reflective for the reading beam. The data medium of the invention has a number of between 5 and 20 channel-bit cells contained in a reference area A-ef defined by the square of the ratio between the reading beam wavelength WL and the numerical aperture NA of an optical system focusing the reading beam. The ratio between the sum of the areas of all pit interface sections and the sum of the areas of all land interface sections of the pit-and-land structure is between 0.4 and 0.6.