Contactless dual-plane positioning method and device

    公开(公告)号:US10352694B2

    公开(公告)日:2019-07-16

    申请号:US15652212

    申请日:2017-07-17

    Abstract: A contactless dual-plane positioning method is disclosed. In this method, an X ray is provided. The X ray passes through a first test piece along a light incident axis. A scattering pattern generated by the X ray passing through the first test piece, and a scatting light intensity corresponding to the scattering pattern are obtained. According to the scattering light intensity, the first test piece is pivoted along a first axis or a second axis until the scattering intensity is greater than or equal to a predetermined intensity. At least three measurement distances between a second test piece and the first test piece are then obtained. According to the measurement distances, an included angle between the second test piece and the light incident axis is adjusted by pivoting the second test piece along a third axis or a fourth axis until the differences between any two measurement distances are less than a predetermined threshold value.

    X-RAY REFLECTOMETRY APPARATUS FOR SAMPLES WITH A MINISCULE MEASUREMENT AREA AND A THICKNESS IN NANOMETERS AND METHOD THEREOF
    15.
    发明申请
    X-RAY REFLECTOMETRY APPARATUS FOR SAMPLES WITH A MINISCULE MEASUREMENT AREA AND A THICKNESS IN NANOMETERS AND METHOD THEREOF 审中-公开
    具有小尺度测量区域的样品的X射线反射测量装置和其中的厚度及其方法

    公开(公告)号:US20160341674A1

    公开(公告)日:2016-11-24

    申请号:US15161046

    申请日:2016-05-20

    CPC classification number: G01N23/20 G01B15/08 G01B2210/56

    Abstract: This application relates to an apparatus and methods for enhancing the performance of X-ray reflectometry (XRR) when used in characterizing thin films and nanostructures supported on a flat substrate. In particular, this application is targeted for addressing the difficulties encountered when XRR is applied to samples with very limited sampling volume, i.e. a combination of small sampling area and miniscule sample thickness or structure height. Point focused X-ray with long wavelength, greater than that from a copper anode or 0.154 nm, is preferably used with appropriately controlled collimations on both incident and detection arms to enable the XRR measurements of samples with limited volumes.

    Abstract translation: 本申请涉及用于表征支撑在平坦基板上的薄膜和纳米结构时用于提高X射线反射测量(XRR)性能的装置和方法。 特别地,本申请的目的在于解决将XRR应用于具有非常有限的取样体积的样品时遇到的困难,即小取样面积和微小样品厚度或结构高度的组合。 优选使用具有比来自铜阳极或0.154nm的波长的长波长的点聚焦X射线,并且在入射和检测臂上具有适当控制的准直,以使XRR测量具有有限体积的样品。

    Apparatus for amplifying intensity during transmission small angle—X-ray scattering measurements
    16.
    发明授权
    Apparatus for amplifying intensity during transmission small angle—X-ray scattering measurements 有权
    用于在透射小角度X射线散射测量期间放大强度的装置

    公开(公告)号:US09297772B2

    公开(公告)日:2016-03-29

    申请号:US14246702

    申请日:2014-04-07

    Inventor: Wei-En Fu Wen-Li Wu

    CPC classification number: G01N23/201

    Abstract: The disclosure provides an apparatus for amplifying scattering intensity during tSAXS measurements. The apparatus includes an enhancement grating object and a placement mechanism. The enhancement grating object is positioned within a longitudinal coherence length of an incident X-ray from a target object. The placement mechanism is capable of placing the enhancement grating object with nanometer precision with respect to the target object in both a lateral and a longitudinal directions.

    Abstract translation: 本公开提供了一种用于在tSAXS测量期间放大散射强度的装置。 该装置包括增强光栅对象和放置机构。 增强光栅对象位于来自目标对象的入射X射线的纵向相干长度内。 放置机构能够在横向和纵向方向上相对于目标物体放置具有纳米精度的增强光栅对象。

    APPARATUS AND METHOD OF APPLYING SMALL-ANGLE ELECTRON SCATTERING TO CHARACTERIZE NANOSTRUCTURES ON OPAQUE SUBSTRATE
    17.
    发明申请
    APPARATUS AND METHOD OF APPLYING SMALL-ANGLE ELECTRON SCATTERING TO CHARACTERIZE NANOSTRUCTURES ON OPAQUE SUBSTRATE 有权
    将小角度电子散射应用于特征基片上的纳米结构的装置和方法

    公开(公告)号:US20150340201A1

    公开(公告)日:2015-11-26

    申请号:US14720122

    申请日:2015-05-22

    Abstract: An apparatus and methods for small-angle electron beam scattering measurements in a reflection or a backscattering mode are provided. The apparatus includes an electron source, electron collimation optics before a sample, electron projection optics after the sample, a sample stage capable of holding the sample, and a electron detector module. The electrons emitted from the source are collimated and positioned to impinge nanostructures on the sample. The signals resulting from the interactions between the impinging electrons and the nanostructures are further magnified by the electron projection optics to reach a sufficient angular resolution before recorded by the electron detector module.

    Abstract translation: 提供了一种用于反射或后向散射模式的小角度电子束散射测量的装置和方法。 该装置包括电子源,样品前的电子准直光学器件,样品后的电子投影光学器件,能够保持样品的样品台,以及电子检测器模块。 从源发射的电子被准直并定位成将纳米结构撞击在样品上。 由撞击电子和纳米结构之间的相互作用产生的信号被电子投影光学器件进一步放大,以在由电子检测器模块记录之前达到足够的角度分辨率。

Patent Agency Ranking